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1. 发明申请

US20080038732A1 Oligomer Probe Array and Method of Producing the Same 失效
标题翻译：低聚物探针阵列及其制备方法
公开(公告)号：US20080038732A1
公开(公告)日：2008-02-14
申请号：US11686506
申请日：2007-03-15
申请人： Jung-Hwan Hah , Sung-min Chi , Kyoung-seon Kim , Won-sun Kim , Han-ku Cho , Sang-jun Choi , Man-hyoung Ryoo
发明人： Jung-Hwan Hah , Sung-min Chi , Kyoung-seon Kim , Won-sun Kim , Han-ku Cho , Sang-jun Choi , Man-hyoung Ryoo
IPC分类号： C12Q1/68 , C07H21/00
CPC分类号： C12Q1/6834 , C12Q2563/155
摘要： An oligomer probe array having improved reaction yield is provided. The oligomer probe array includes a substrate, an immobilization layer on the substrate, a plurality of nano particles coupled with a surface of the immobilization layer, and a plurality of oligomer probes coupled with surfaces of the nano particles.
摘要翻译：提供了具有改善的反应产率的低聚物探针阵列。低聚物探针阵列包括基底，基底上的固定层，与固定层的表面耦合的多个纳米颗粒以及与纳米颗粒的表面耦合的多个低聚物探针。

2. 发明申请

US20090137426A1 MICROARRAY, SUBSTRATE FOR MICROARRAY AND METHODS OF FABRICATING THE SAME 有权
标题翻译：微波炉，微波炉基板及其制造方法
公开(公告)号：US20090137426A1
公开(公告)日：2009-05-28
申请号：US12137608
申请日：2008-06-12
申请人： Sun-Ok Jung , Song-Jun Choi , Man-Hyoung Ryoo , Sung-Min Chi , Jung-Hwan Hah , Kyoung-Seon Kim , Won-Sun Kim
发明人： Sun-Ok Jung , Song-Jun Choi , Man-Hyoung Ryoo , Sung-Min Chi , Jung-Hwan Hah , Kyoung-Seon Kim , Won-Sun Kim
IPC分类号： C40B40/06 , C40B50/08
CPC分类号： C12Q1/6834 , B01J19/0046 , B01J2219/00382 , B01J2219/00387 , B01J2219/00432 , B01J2219/00529 , B01J2219/00596 , B01J2219/00608 , B01J2219/00617 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00662 , B01J2219/00711 , B01J2219/00722 , B01L3/5027 , B01L3/502707 , B01L2300/0654 , B01L2300/0867 , B82Y30/00 , C40B50/18 , C40B60/08
摘要： A microarray, a substrate for a microarray and more productive methods of fabricating the microarray and the substrate are provided. The microarray includes a substrate divided into a first region and a second region; a plurality of linkers represented by formula 1 or 2: wherein X is a site coupled to the substrate, R is a hydroxyl, aldehyde, carboxyl, amino, amide, thiol, halo, epoxy, or sulfonate group, m is an integer in the range of 3 to 16, p is an integer in the range of 1 to 30, and q is an integer in the range of 1 to 15,directly coupled to the substrate in the first region but not coupled to the substrate in the second region; anda plurality of probes coupled to the respective linkers.
摘要翻译：提供微阵列，用于微阵列的基底和制备微阵列和基底的更有生产力的方法。微阵列包括分为第一区域和第二区域的衬底; 由式1或2表示的多个接头：其中X是与基底偶联的位点，R是羟基，醛，羧基，氨基，酰胺，硫醇，卤素，环氧基或磺酸酯基，m是范围为3〜16，p为1〜30的整数，q为1〜15的整数，直接与第1区域的基板结合，但不与第2区域的基板结合 ; 以及耦合到各个接头的多个探头。

3. 发明授权

US07994097B2 Microarray, substrate for microarray and methods of fabricating the same 有权
标题翻译：微阵列，微阵列基片及其制造方法
公开(公告)号：US07994097B2
公开(公告)日：2011-08-09
申请号：US12137608
申请日：2008-06-12
申请人： Sun-Ok Jung , Song-Jun Choi , Man-Hyoung Ryoo , Sung-Min Chi , Jung-Hwan Hah , Kyoung-Seon Kim , Won-Sun Kim
发明人： Sun-Ok Jung , Song-Jun Choi , Man-Hyoung Ryoo , Sung-Min Chi , Jung-Hwan Hah , Kyoung-Seon Kim , Won-Sun Kim
IPC分类号： C40B40/00 , C40B40/06 , G01N33/543 , C12Q1/68
CPC分类号： C12Q1/6834 , B01J19/0046 , B01J2219/00382 , B01J2219/00387 , B01J2219/00432 , B01J2219/00529 , B01J2219/00596 , B01J2219/00608 , B01J2219/00617 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00662 , B01J2219/00711 , B01J2219/00722 , B01L3/5027 , B01L3/502707 , B01L2300/0654 , B01L2300/0867 , B82Y30/00 , C40B50/18 , C40B60/08
摘要： A microarray, a substrate for a microarray and more productive methods of fabricating the microarray and the substrate are provided. The microarray includes a substrate divided into a first region and a second region; a plurality of linkers represented by formula 1 or 2: wherein X is a site coupled to the substrate, R is a hydroxyl, aldehyde, carboxyl, amino, amide, thiol, halo, epoxy, or sulfonate group, m is an integer in the range of 3 to 16, p is an integer in the range of 1 to 30, and q is an integer in the range of 1 to 15, directly coupled to the substrate in the first region but not coupled to the substrate in the second region; and a plurality of probes coupled to the respective linkers.
摘要翻译：提供微阵列，用于微阵列的基底和制备微阵列和基底的更有生产力的方法。微阵列包括分为第一区域和第二区域的衬底; 由式1或2表示的多个接头：其中X是与基底偶联的位点，R是羟基，醛，羧基，氨基，酰胺，硫醇，卤素，环氧基或磺酸酯基，m是范围为3〜16，p为1〜30的整数，q为1〜15的整数，直接与第1区域的基板结合，但不与第2区域的基板结合 ; 以及耦合到各个接头的多个探头。

4. 发明申请

US20090131635A1 Method for synthesizing polymer on substrate 审中-公开
标题翻译：在基材上合成聚合物的方法
公开(公告)号：US20090131635A1
公开(公告)日：2009-05-21
申请号：US12220923
申请日：2008-07-30
申请人： Sung-Min Chi , Man-Hyoung Ryoo , Jung-Hwan Hah , Kyoung-Seon Kim , Won-Sun Kim , Sun-Ok Jung
发明人： Sung-Min Chi , Man-Hyoung Ryoo , Jung-Hwan Hah , Kyoung-Seon Kim , Won-Sun Kim , Sun-Ok Jung
IPC分类号： C07K1/04 , C07H1/00
CPC分类号： H01L21/6715 , B01J19/0046 , B01J2219/00484 , B01J2219/00493 , B01J2219/00527 , B01J2219/00529 , B01J2219/00612 , B01J2219/00722 , B01J2219/00725 , H01L21/67126
摘要： For synthesizing a polymer, a substrate is placed within a reaction chamber, and a polymer synthesis sample is fed into the reaction chamber for forming the polymer on the substrate. In addition, the reaction chamber is shaken during formation of the polymer on the substrate within the reaction chamber for increased reaction yield. In addition, forming bubbles of the inactive gas in the polymer synthesis sample during formation of the polymer on the substrate further increases reaction yield.
摘要翻译：为了合成聚合物，将基板放置在反应室内，并将聚合物合成样品进料到反应室中，以在基板上形成聚合物。此外，在反应室内的基底上形成聚合物期间，反应室被振动，以提高反应产率。此外，在聚合物合成样品中在基材上形成聚合物期间形成无活性气体的气泡进一步提高了反应产率。

5. 发明申请

US20090093625A1 APPARATUS FOR AND METHOD OF SYNTHESIZING BIOPOLYMER AND METHOD OF RECOVERING REAGENT FOR SYNTHESIZING BIOPOLYMER 审中-公开
标题翻译：合成生物聚合物的方法和方法和用于合成生物聚合物的回收试剂的方法
公开(公告)号：US20090093625A1
公开(公告)日：2009-04-09
申请号：US12238162
申请日：2008-09-25
申请人： Sung-Min Chi , Man-Hyoung Ryoo , Hyeong-Jun Kim , Jung-Hwan Hah , Won-Sun Kim , Sun-Ok Jung
发明人： Sung-Min Chi , Man-Hyoung Ryoo , Hyeong-Jun Kim , Jung-Hwan Hah , Won-Sun Kim , Sun-Ok Jung
IPC分类号： C07H21/04 , B01J19/24
CPC分类号： B01J19/0046 , B01J2219/00286 , B01J2219/00389 , B01J2219/00394 , B01J2219/00418 , B01J2219/00423 , B01J2219/00432 , B01J2219/00452 , B01J2219/00484 , B01J2219/00495 , B01J2219/00529 , B01J2219/00585 , B01J2219/00596 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00626 , B01J2219/00635 , B01J2219/00637 , B01J2219/00659 , B01J2219/00711 , B82Y30/00 , Y02P20/582
摘要： An apparatus for synthesizing a biopolymer includes a reaction chamber, an outlet tube connected to the reaction chamber, a plurality of recovery tanks connected to the outlet tube, and a plurality of recovery valves configured to open or block the passageway between the outlet tube and each of the recovery tanks.
摘要翻译：用于合成生物聚合物的装置包括反应室，连接到反应室的出口管，连接到出口管的多个回收罐，以及多个回收阀，其配置成打开或阻塞出口管与每个的回收罐。

6. 发明申请

US20090117645A1 Biochips and methods of fabricating the same 审中-公开
标题翻译：生物芯片及其制造方法
公开(公告)号：US20090117645A1
公开(公告)日：2009-05-07
申请号：US12229645
申请日：2008-08-26
申请人： Won-Sun Kim , Jung-Hwan Hah , Sung-Min Chi , Sun-Ok Jung , Man-Hyoung Ryoo
发明人： Won-Sun Kim , Jung-Hwan Hah , Sung-Min Chi , Sun-Ok Jung , Man-Hyoung Ryoo
IPC分类号： C12M1/34 , B05D5/00
CPC分类号： G01N33/54373 , B01J19/0046 , B01J2219/00432 , B01J2219/00443 , B01J2219/00529 , B01J2219/00596 , B01J2219/00608 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00711 , B01J2219/00722 , B82Y30/00 , C12Q1/6837
摘要： Biochips for analyzing components of a biological sample using probes and methods of fabricating the same are provided. In some embodiments, a biochip includes a substrate, a plurality of probes immobilized on a top surface of the substrate, and a capping layer formed on a bottom surface of the substrate.
摘要翻译：提供了用于使用探针分析生物样品的组分的生物芯片及其制造方法。在一些实施例中，生物芯片包括衬底，固定在衬底的顶表面上的多个探针和形成在衬底的底表面上的覆盖层。

7. 发明申请

US20060111550A1 Top coating composition for photoresist and method of forming photoresist pattern using same 有权
标题翻译：用于光致抗蚀剂的顶涂层组合物和使用其形成光刻胶图案的方法
公开(公告)号：US20060111550A1
公开(公告)日：2006-05-25
申请号：US11281775
申请日：2005-11-17
申请人： Mitsuhiro Hata , Man-Hyoung Ryoo , Sang-Gyun Woo , Hyun-Woo Kim , Jin-Young Yoon , Jung-Hwan Hah
发明人： Mitsuhiro Hata , Man-Hyoung Ryoo , Sang-Gyun Woo , Hyun-Woo Kim , Jin-Young Yoon , Jung-Hwan Hah
IPC分类号： C08F6/00
CPC分类号： G03F7/11 , C08F220/06 , C08F220/18 , G03F7/2041 , Y10S430/146 , Y10S430/162
摘要： Top coating compositions capable of being used in immersion lithography, and methods of forming photoresist patterns using the same, are provided. The top coating composition includes: a polymer, a base; and a solvent, wherein the polymer may be represented by Formula I: wherein R1 and R2 are independently selected from the group consisting of hydrogen, fluoro, methyl, and trifluoromethyl; X is a carboxylic acid group or a sulfonic acid group; Y is a carboxylic acid group or a sulfonic acid group, wherein the carboxylic acid group or sulfonic acid group is protected; Z is a monomer selected from the group consisting of a vinyl monomer, an alkyleneglycol, a maleic anhydride, an ethyleneimine, an oxazoline-containing monomer, acrylonitrile, an allylamide, a 3,4-dihydropyran, a 2,3-dihydrofuran, tetrafluoroethylene, or a combination thereof; and m, n, and q are integers wherein 0.03≦m/(m+n+q)≦0.97, 0.03≦n/(m+n+q)≦0.97, 0≦q/(m+n+q)≦0.5; and wherein the solvent includes deionized water.
摘要翻译：提供能够用于浸没式光刻的顶涂层组合物，以及使用其形成光刻胶图案的方法。顶部涂料组合物包括：聚合物，碱; 和溶剂，其中所述聚合物可以由式I表示：其中R 1和R 2独立地选自氢，氟，甲基和三氟甲基 ; X是羧酸基或磺酸基; Y是羧酸基或磺酸基，其中羧酸基或磺酸基被保护; Z是选自乙烯基单体，亚烷基二醇，马来酸酐，乙烯亚胺，含恶唑啉的单体，丙烯腈，烯丙基酰胺，3,4-二氢吡喃，2,3-二氢呋喃，四氟乙烯，或其组合; 并且m，n和q是其中0.03 <= m /（m + n + q）<=0.97,0.03≤n/（m + n + q）<= 0.97,0 <= q /（m + n + q）<= 0.5; 并且其中所述溶剂包括去离子水。

8. 发明申请

US20090085072A1 Biosensor using nanoscale material as transistor channel and method of fabricating the same 有权
标题翻译：使用纳米级材料作为晶体管沟道的生物传感器及其制造方法
公开(公告)号：US20090085072A1
公开(公告)日：2009-04-02
申请号：US12232243
申请日：2008-09-12
申请人： Moon-Sook Lee , Byeong-Ok Cho , Man-Hyoung Ryoo , Takahiro Yasue , Jung-Hwan Hah
发明人： Moon-Sook Lee , Byeong-Ok Cho , Man-Hyoung Ryoo , Takahiro Yasue , Jung-Hwan Hah
IPC分类号： H01L21/28 , H01L29/772
CPC分类号： G01N27/4145 , B82Y10/00 , B82Y15/00 , G01N27/4146 , H01L51/0595 , H01L2924/0002 , H01L2924/00
摘要： Example embodiments relate to a biosensor using a nanoscale material as a channel of a transistor and a method of fabricating the same. A biosensor according to example embodiments may include a plurality of insulating films. A first signal line and a second signal line may be interposed between the plurality of insulating films. A semiconductor nanostructure may be disposed on the plurality of insulating films, the semiconductor nanostructure having a first side electrically connected to the first signal line and a second side electrically connected to the second signal line. A plurality of probes may be coupled to the semiconductor nanostructure. A biosensor according to example embodiments may have a reduced analysis time.
摘要翻译：实施例涉及使用纳米级材料作为晶体管的沟道的生物传感器及其制造方法。根据示例性实施例的生物传感器可以包括多个绝缘膜。第一信号线和第二信号线可以插入在多个绝缘膜之间。半导体纳米结构可以设置在多个绝缘膜上，半导体纳米结构具有电连接到第一信号线的第一侧和与第二信号线电连接的第二侧。多个探针可以耦合到半导体纳米结构。根据示例性实施例的生物传感器可以具有减少的分析时间。

9. 发明授权

US07384730B2 Top coating composition for photoresist and method of forming photoresist pattern using same 有权
标题翻译：用于光致抗蚀剂的顶涂层组合物和使用其形成光刻胶图案的方法
公开(公告)号：US07384730B2
公开(公告)日：2008-06-10
申请号：US11281775
申请日：2005-11-17
申请人： Mitsuhiro Hata , Man-Hyoung Ryoo , Sang-Gyun Woo , Hyun-Woo Kim , Jin-Young Yoon , Jung-Hwan Hah
发明人： Mitsuhiro Hata , Man-Hyoung Ryoo , Sang-Gyun Woo , Hyun-Woo Kim , Jin-Young Yoon , Jung-Hwan Hah
IPC分类号： G03F7/38 , H01L21/027 , G03F7/11
CPC分类号： G03F7/11 , C08F220/06 , C08F220/18 , G03F7/2041 , Y10S430/146 , Y10S430/162
摘要： Top coating compositions capable of being used in immersion lithography, and methods of forming photoresist patterns using the same, are provided. The top coating composition includes: a polymer, a base; and a solvent, wherein the polymer may be represented by Formula I: wherein R1 and R2 are independently selected from the group consisting of hydrogen, fluoro, methyl, and trifluoromethyl; X is a carboxylic acid group or a sulfonic acid group; Y is a carboxylic acid group or a sulfonic acid group, wherein the carboxylic acid group or sulfonic acid group is protected; Z is a monomer selected from the group consisting of a vinyl monomer, an alkyleneglycol, a maleic anhydride, an ethyleneimine, an oxazoline-containing monomer, acrylonitrile, an allylamide, a 3,4-dihydropyran, a 2,3-dihydrofuran, tetrafluoroethylene, or a combination thereof; and m, n, and q are integers wherein 0.03≦m/(m+n+q)≦0.97, 0.03≦n/(m+n+q)≦0.97, 0≦q/(m+n+q)≦0.5; and wherein the solvent includes deionized water.
摘要翻译：提供能够用于浸没式光刻的顶涂层组合物，以及使用其形成光刻胶图案的方法。顶部涂料组合物包括：聚合物，碱; 和溶剂，其中所述聚合物可以由式I表示：其中R 1和R 2独立地选自氢，氟，甲基和三氟甲基 ; X是羧酸基或磺酸基; Y是羧酸基或磺酸基，其中羧酸基或磺酸基被保护; Z是选自乙烯基单体，亚烷基二醇，马来酸酐，乙烯亚胺，含恶唑啉的单体，丙烯腈，烯丙基酰胺，3,4-二氢吡喃，2,3-二氢呋喃，四氟乙烯，或其组合; 并且m，n和q是整数，其中<？in-line-formula description =“In-line Formulas”end =“lead”？> 0.03 <= m /（m + n + q）<= 0.97， in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> 0.03 <= n /（m + n + q）<= 0.97，<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead” α> 0 <= q /（m + n + q）<= 0.5; <？in-line-formula description =“In-line Formulas”end =“tail”？>，其中溶剂包括去离子水。

10. 发明申请

US20060275697A1 Top coating composition for photoresist and method of forming photoresist pattern using the same 审中-公开
标题翻译：用于光致抗蚀剂的顶涂层组合物和使用其形成光刻胶图案的方法
公开(公告)号：US20060275697A1
公开(公告)日：2006-12-07
申请号：US11364707
申请日：2006-02-27
申请人： Mitsuhiro Hata , Man-Hyoung Ryoo , Hyun-Woo Kim , Sang-Gyun Woo , Jin-Young Yoon , Jung-Hwan Hah
发明人： Mitsuhiro Hata , Man-Hyoung Ryoo , Hyun-Woo Kim , Sang-Gyun Woo , Jin-Young Yoon , Jung-Hwan Hah
IPC分类号： G03C1/00
CPC分类号： G03F7/11 , G03F7/2041
摘要： Provided are a top coating composition for a photoresist which can be used in immersion lithography, and a method of forming a photoresist pattern using the same. The top coating composition includes: a polymer including at least three different structural repeating units including a first repeating unit comprising a carboxy group substituted by an alkyl protecting group or an acid-labile group, a second repeating unit comprising an acid group, and a third repeating unit comprising a polar group, and an organic solvent comprising an alcohol.
摘要翻译：提供了可用于浸没式光刻的光致抗蚀剂的顶涂层组合物，以及使用其形成光致抗蚀剂图案的方法。顶部涂料组合物包括：包含至少三种不同结构重复单元的聚合物，其包括第一重复单元，其包含被烷基保护基团或酸不稳定基团取代的羧基，第二重复单元包含酸基，和第三重复单元包含极性基团的重复单元和包含醇的有机溶剂。

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