会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明授权
    • Top coating composition for photoresist and method of forming photoresist pattern using same
    • 用于光致抗蚀剂的顶涂层组合物和使用其形成光刻胶图案的方法
    • US07384730B2
    • 2008-06-10
    • US11281775
    • 2005-11-17
    • Mitsuhiro HataMan-Hyoung RyooSang-Gyun WooHyun-Woo KimJin-Young YoonJung-Hwan Hah
    • Mitsuhiro HataMan-Hyoung RyooSang-Gyun WooHyun-Woo KimJin-Young YoonJung-Hwan Hah
    • G03F7/38H01L21/027G03F7/11
    • G03F7/11C08F220/06C08F220/18G03F7/2041Y10S430/146Y10S430/162
    • Top coating compositions capable of being used in immersion lithography, and methods of forming photoresist patterns using the same, are provided. The top coating composition includes: a polymer, a base; and a solvent, wherein the polymer may be represented by Formula I: wherein R1 and R2 are independently selected from the group consisting of hydrogen, fluoro, methyl, and trifluoromethyl; X is a carboxylic acid group or a sulfonic acid group; Y is a carboxylic acid group or a sulfonic acid group, wherein the carboxylic acid group or sulfonic acid group is protected; Z is a monomer selected from the group consisting of a vinyl monomer, an alkyleneglycol, a maleic anhydride, an ethyleneimine, an oxazoline-containing monomer, acrylonitrile, an allylamide, a 3,4-dihydropyran, a 2,3-dihydrofuran, tetrafluoroethylene, or a combination thereof; and m, n, and q are integers wherein 0.03≦m/(m+n+q)≦0.97, 0.03≦n/(m+n+q)≦0.97, 0≦q/(m+n+q)≦0.5; and wherein the solvent includes deionized water.
    • 提供能够用于浸没式光刻的顶涂层组合物,以及使用其形成光刻胶图案的方法。 顶部涂料组合物包括:聚合物,碱; 和溶剂,其中所述聚合物可以由式I表示:其中R 1和R 2独立地选自氢,氟,甲基和三氟甲基 ; X是羧酸基或磺酸基; Y是羧酸基或磺酸基,其中羧酸基或磺酸基被保护; Z是选自乙烯基单体,亚烷基二醇,马来酸酐,乙烯亚胺,含恶唑啉的单体,丙烯腈,烯丙基酰胺,3,4-二氢吡喃,2,3-二氢呋喃,四氟乙烯 ,或其组合; 并且m,n和q是整数,其中<?in-line-formula description =“In-line Formulas”end =“lead”?> 0.03 <= m /(m + n + q)<= 0.97, in-line-formula description =“In-line Formulas”end =“tail”?> <?in-line-formula description =“In-line Formulas”end =“lead”?> 0.03 <= n /(m + n + q)<= 0.97,<?in-line-formula description =“In-line Formulas”end =“tail”?> <?in-line-formula description =“In-line Formulas”end =“lead” α> 0 <= q /(m + n + q)<= 0.5; <?in-line-formula description =“In-line Formulas”end =“tail”?>,其中溶剂包括去离子水。