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1. 发明授权

US06337872B1 Once through fan for excimer laser apparatus 有权
标题翻译：一次通过风扇进行准分子激光设备
公开(公告)号：US06337872B1
公开(公告)日：2002-01-08
申请号：US09422857
申请日：1999-10-25
申请人： Hisashi Nara , Kiyoharu Nakao , Hakaru Mizoguchi , Toshihiro Nishisaka , Tatsuo Enami
发明人： Hisashi Nara , Kiyoharu Nakao , Hakaru Mizoguchi , Toshihiro Nishisaka , Tatsuo Enami
IPC分类号： H01S322
CPC分类号： H01S3/036 , H01S3/225
摘要： The invention provides an once through fan for an excimer laser apparatus having a reduced vibration and being capable of increasing a rotational speed. In order to obtain this, in an once through fan (1) for an excimer laser apparatus provided with a blade portion (6) having a plurality of blades, a rotary shaft (4) for rotating the blade portion and a magnetic bearing (7) rotatably supporting the rotary shaft in a non-contact manner so as to circulate a laser gas sealed within a chamber (2) in accordance with a rotation of the blade portion, a rotor (21) of a motor (23) installed within the chamber (2) and rotating the rotary shaft (4) is mounted on an outer peripheral portion of the rotary shaft, and at least one magnetic bearing (7, 7) for supporting the rotary shaft is arranged in each of both sides in an axial direction of the rotor.
摘要翻译：本发明提供了一种具有减小的振动并能够增加转速的准分子激光装置的一次通过风扇。为了获得这一点，在设置有具有多个叶片的叶片部分（6）的准分子激光装置的一次通过风扇（1）中，用于使叶片部分旋转的旋转轴（4）和磁性轴承（7））以不接触的方式可旋转地支撑旋转轴，以便根据叶片部分的旋转使密封在腔室（2）内的激光气体循环;马达（23）的转子（21）安装在室（2）并旋转旋转轴（4）安装在旋转轴的外周部分上，并且至少一个用于支撑旋转轴的磁轴承（7,7）以轴向方向布置在两侧转子方向。

2. 发明申请

US20090224181A1 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US20090224181A1
公开(公告)日：2009-09-10
申请号：US12382108
申请日：2009-03-09
申请人： Tamotsu Abe , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
发明人： Tamotsu Abe , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
IPC分类号： G01J3/10
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/70916
摘要： An extreme ultra violet light source apparatus in which debris staying and accumulating within a chamber can be prevented from contaminating the chamber and deteriorating the performance of important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
摘要翻译：可以防止残留在室内积聚的碎片的极紫外光源装置污染室，劣化重要的光学部件的性能。极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

3. 发明授权

US08779401B2 Target supply unit 有权
标题翻译：目标供应单位
公开(公告)号：US08779401B2
公开(公告)日：2014-07-15
申请号：US13533464
申请日：2012-06-26
申请人： Hakaru Mizoguchi , Takayuki Yabu , Toshihiro Nishisaka
发明人： Hakaru Mizoguchi , Takayuki Yabu , Toshihiro Nishisaka
IPC分类号： G21K5/00
CPC分类号： H05G2/005 , H05G2/006 , H05G2/008
摘要： A target supply unit includes a nozzle unit having a through-hole to allow a target material to be outputted therethrough. A cover is provided to cover the nozzle unit, the cover having a through-hole to allow the target material to pass therethrough. A discharge device is included to pump out gas inside a space defined by the cover.
摘要翻译：目标供给单元包括具有通孔以允许目标材料从其中输出的喷嘴单元。提供盖以覆盖喷嘴单元，盖具有通孔以允许目标材料通过。包括排出装置以在由盖限定的空间内排出气体。

4. 发明申请

US20130048878A1 TARGET SUPPLY UNIT 有权
标题翻译：目标供应单位
公开(公告)号：US20130048878A1
公开(公告)日：2013-02-28
申请号：US13533464
申请日：2012-06-26
申请人： Hakaru MIZOGUCHI , Takayuki Yabu , Toshihiro Nishisaka
发明人： Hakaru MIZOGUCHI , Takayuki Yabu , Toshihiro Nishisaka
IPC分类号： G21G5/00
CPC分类号： H05G2/005 , H05G2/006 , H05G2/008
摘要： A target supply unit includes a nozzle unit having a through-hole to allow a target material to be outputted therethrough. A cover is provided to cover the nozzle unit, the cover having a through-hole to allow the target material to pass therethrough. A discharge device is included to pump out gas inside a space defined by the cover.
摘要翻译：目标供给单元包括具有通孔以允许目标材料从其中输出的喷嘴单元。提供盖以覆盖喷嘴单元，盖具有通孔以允许目标材料通过。包括排出装置以在由盖限定的空间内排出气体。

5. 发明申请

US20120228527A1 EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS 审中-公开
标题翻译：极光紫外线光源设备
公开(公告)号：US20120228527A1
公开(公告)日：2012-09-13
申请号：US13477940
申请日：2012-05-22
申请人： Tamotsu ABE , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
发明人： Tamotsu ABE , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
IPC分类号： G21K5/02
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/70916
摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
摘要翻译：极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

6. 发明授权

US08212228B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08212228B2
公开(公告)日：2012-07-03
申请号：US12382108
申请日：2009-03-09
申请人： Tamotsu Abe , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
发明人： Tamotsu Abe , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
IPC分类号： H05G2/00
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/70916
摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
摘要翻译：极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

7. 发明授权

US5754579A Laser gas controller and charging/discharging device for discharge-excited laser 失效
标题翻译：激光气体控制器和放电激光激光器的充放电装置
公开(公告)号：US5754579A
公开(公告)日：1998-05-19
申请号：US750538
申请日：1996-12-13
申请人： Hakaru Mizoguchi , Toshihiro Nishisaka , Hiroshi Komori
发明人： Hakaru Mizoguchi , Toshihiro Nishisaka , Hiroshi Komori
IPC分类号： H01S3/036 , H01S3/134 , H01S3/22
CPC分类号： H01S3/036 , H01S3/134
摘要： A first object is to stabilize output of laser light. In order to achieve the first object, if it is detected by an output detection means (15) that the output (E) of laser light (La) has departed from a target value, whilst maintaining the voltage of a power source (17) at a fixed value or in a fixed range, the amount of laser gas supplied to a laser chamber (4) is controlled such that the output (E) of laser light becomes the target value. A second object is to reduce the wear of the pre-ionization electrodes and to prevent drop in output of laser light. The second object is achieved as follows. Specifically, the pulse current discharged from primary capacitor (C1) is stepped up in voltage by a pulse transformer and is charged onto a secondary capacitor (C2). At this point a magnetic switch (SR) that is connected to the downstream side of secondary capacitor (C2) becomes saturated and becomes conductive, allowing current to pass through pre-ionization electrodes (6) that are connected in series with the magnetic switch (SR). At the time-point where the movement of charge of secondary capacitor (C2) has finished, a discharge current in the reverse direction tries to flow in secondary capacitor (C2) but magnetic switch (SR) acts to block the reverse current, stopping the pre-ionization discharge. Concurrently with this the core of pulse transformer (20) is saturated, with the result that charge starts to move from secondary capacitor (C2) to peaking capacitor (C4). The voltage of peaking capacitor (C4) therefore rises until it reaches the discharge initiation voltage, and laser oscillation is performed.
摘要翻译： PCT No.PCT / JP95 / 01015 Sec。 371日期1996年12月13日第 102（e）日期1996年12月13日PCT提交1995年5月26日PCT公布。第WO95 / 34927号公报日期1995年12月21日第一个目标是稳定激光输出。为了实现第一目的，如果由输出检测装置（15）检测到激光（La）的输出（E）已经脱离目标值，同时保持电源（17）的电压，在固定值或固定范围内，供给激光室（4）的激光气体的量被控制成激光的输出（E）成为目标值。第二个目的是减少预电离电极的磨损并防止激光输出的下降。第二个目的是如下实现的。具体地说，从主电容器（C1）放出的脉冲电流通过脉冲变压器升压成电压并充电到次级电容器（C2）上。此时，与次级电容器（C2）的下游侧连接的磁性开关（SR）饱和并变成导通状态，使电流通过与磁性开关串联连接的预电离电极（6） SR）。在二次电容器（C2）的充电移动完成的时间点，反向放电电流试图在二次电容器（C2）中流动，但是磁性开关（SR）用于阻止反向电流，停止预电离放电。与此同时，脉冲变压器（20）的核心是饱和的，结果是充电开始从次级电容器（C2）移动到峰值电容器（C4）。峰值电容器（C4）的电压因此上升直到达到放电起始电压，并且执行激光振荡。

8. 发明授权

US06577664B1 Excimer laser device 有权
标题翻译：准分子激光装置
公开(公告)号：US06577664B1
公开(公告)日：2003-06-10
申请号：US09466063
申请日：1999-12-17
申请人： Hisashi Nara , Toshihiro Nishisaka
发明人： Hisashi Nara , Toshihiro Nishisaka
IPC分类号： H01S322
CPC分类号： F16C39/02 , F16C32/0442 , H01S3/02 , H01S3/03 , H01S3/225
摘要： An excimer laser device capable of suppressing vibration of a cross flow fan, and preventing breakage of magnetic bearings when the vibration increases is provided. For this purpose, the device has a configuration that in the excimer laser device including magnetic bearings (12) each having an inner ring section (10, 30) and an outer ring section (11, 31), and a cross flow fan (1) for circulating a laser gas in a chamber (2), touch-down bearings (15) are provided on the outer peripheral side of a rotating shaft (9), and the inner peripheral face of an inner peripheral portion (15B) of the touch-down bearing (15) and the outer peripheral face of the rotating shaft (9) are disposed opposite each other with a predetermined clearance smaller than a gap (4) between the outer peripheral face of the inner ring section (10, 30) and the inner peripheral face of the outer ring section (11, 31).
摘要翻译：提供能够抑制横流风扇的振动并且防止振动增加时磁轴承断裂的准分子激光装置。为此，该装置具有在准分子激光装置中具有各自具有内圈部（10,30）和外圈部（11,31）以及横流风扇（1）的磁性轴承（12）的结构），用于在腔室（2）中循环激光气体，在旋转轴（9）的外周侧设置有触下轴承（15），并且内周部（15B）的内周面下降轴承（15）和旋转轴（9）的外周面以比内圈部（10,30）的外周面之间的间隙（4）小的规定间隙相对配置，和外圈部（11,31）的内周面。

9. 发明授权

US09052615B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US09052615B2
公开(公告)日：2015-06-09
申请号：US12543582
申请日：2009-08-19
申请人： Toshihiro Nishisaka , Yukio Watanabe , Osamu Wakabayashi , Kouji Kakizaki , Michio Shinozaki
发明人： Toshihiro Nishisaka , Yukio Watanabe , Osamu Wakabayashi , Kouji Kakizaki , Michio Shinozaki
IPC分类号： G21K5/04 , G03F7/20
CPC分类号： G03F7/70033 , G03F7/70975 , H05G2/00 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
摘要翻译： EUV光源装置能够容易地进行EUV光源装置的维护，EUV光源装置能够容易地进行腔室或腔室的一部分的移动，到维护区域的移动以及相对于投影光学元件的高精度放置。 EUV光源装置是通过将激光束施加到室内的目标材料并且将从等离子体辐射的EUV光输入到曝光设备的投影光学器件中来产生等离子体的装置，并且包括用于定位腔室或维护的定位机构在所述收集的极紫外光的光轴和所述曝光设备的投影光学元件的光轴对准的预定位置处的所述室的单元，以及用于将所述室或所述室的维护单元移动到所述室预定位置和维护区域。

10. 发明申请

US20100193711A1 EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM 审中-公开
标题翻译：极致超紫外光源系统
公开(公告)号：US20100193711A1
公开(公告)日：2010-08-05
申请号：US12685835
申请日：2010-01-12
申请人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
发明人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
IPC分类号： G21K5/02
CPC分类号： G03F7/70975 , G03F7/70033
摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.
摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。

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