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1. 发明授权

US08779401B2 Target supply unit 有权
标题翻译：目标供应单位
公开(公告)号：US08779401B2
公开(公告)日：2014-07-15
申请号：US13533464
申请日：2012-06-26
申请人： Hakaru Mizoguchi , Takayuki Yabu , Toshihiro Nishisaka
发明人： Hakaru Mizoguchi , Takayuki Yabu , Toshihiro Nishisaka
IPC分类号： G21K5/00
CPC分类号： H05G2/005 , H05G2/006 , H05G2/008
摘要： A target supply unit includes a nozzle unit having a through-hole to allow a target material to be outputted therethrough. A cover is provided to cover the nozzle unit, the cover having a through-hole to allow the target material to pass therethrough. A discharge device is included to pump out gas inside a space defined by the cover.
摘要翻译：目标供给单元包括具有通孔以允许目标材料从其中输出的喷嘴单元。提供盖以覆盖喷嘴单元，盖具有通孔以允许目标材料通过。包括排出装置以在由盖限定的空间内排出气体。

2. 发明申请

US20130048878A1 TARGET SUPPLY UNIT 有权
标题翻译：目标供应单位
公开(公告)号：US20130048878A1
公开(公告)日：2013-02-28
申请号：US13533464
申请日：2012-06-26
申请人： Hakaru MIZOGUCHI , Takayuki Yabu , Toshihiro Nishisaka
发明人： Hakaru MIZOGUCHI , Takayuki Yabu , Toshihiro Nishisaka
IPC分类号： G21G5/00
CPC分类号： H05G2/005 , H05G2/006 , H05G2/008
摘要： A target supply unit includes a nozzle unit having a through-hole to allow a target material to be outputted therethrough. A cover is provided to cover the nozzle unit, the cover having a through-hole to allow the target material to pass therethrough. A discharge device is included to pump out gas inside a space defined by the cover.
摘要翻译：目标供给单元包括具有通孔以允许目标材料从其中输出的喷嘴单元。提供盖以覆盖喷嘴单元，盖具有通孔以允许目标材料通过。包括排出装置以在由盖限定的空间内排出气体。

3. 发明授权

US08809819B2 Target supply unit and extreme ultraviolet light generation apparatus 有权
标题翻译：目标供应单元和极紫外光发生装置
公开(公告)号：US08809819B2
公开(公告)日：2014-08-19
申请号：US13419148
申请日：2012-03-13
申请人： Takayuki Yabu , Hiroshi Umeda , Hakaru Mizoguchi
发明人： Takayuki Yabu , Hiroshi Umeda , Hakaru Mizoguchi
IPC分类号： G21K5/00 , G03G15/02
CPC分类号： H05G2/008 , H05G2/003 , H05G2/006
摘要： A target supply unit may include: a target storage unit for storing a target material thereinside; a target output unit having a through-hole formed therein, through which the target material stored inside the target storage unit is outputted; an electrode having a through-hole formed therein arranged to face the target output unit, the electrode being coated with an electrically conductive material at least on a part of a surface facing the target output unit; and a voltage generator for applying a voltage between the target material and the electrode.
摘要翻译：目标供应单元可以包括：目标存储单元，用于存储其内部的目标材料; 目标输出单元，其中形成有通孔，通过该目标输出单元输出存储在目标存储单元内的目标材料; 具有形成在其中的通孔的电极，其布置成面对所述目标输出单元，所述电极至少在面向所述目标输出单元的表面的一部分上涂覆有导电材料; 以及用于在目标材料和电极之间施加电压的电压发生器。

4. 发明授权

US06810061B2 Discharge electrode and discharge electrode manufacturing method 有权
标题翻译：放电电极和放电电极的制造方法
公开(公告)号：US06810061B2
公开(公告)日：2004-10-26
申请号：US10225286
申请日：2002-08-22
申请人： Tsukasa Hori , Akira Sumitani , Takayuki Yabu , Teiichirou Chiba , Hakaru Mizoguchi , Osamu Wakabayashi , Junichi Fujimoto
发明人： Tsukasa Hori , Akira Sumitani , Takayuki Yabu , Teiichirou Chiba , Hakaru Mizoguchi , Osamu Wakabayashi , Junichi Fujimoto
IPC分类号： H01S3097
CPC分类号： H01S3/038 , H01S3/0388 , H01S3/225
摘要： A film is formed on the discharge parts of the main discharge electrodes. In order to prevent erosion of the discharge parts by the halogen gas contained in the laser gas, a substance that tends not to react with the halogen gas, i.e., a halogen-resistant substance, is used for this film. Furthermore, in order to prevent deformation of the discharge parts by the bombardment and heat of the main discharge, a substance that has a higher hardness than the metal of the main discharge electrodes or a substance that has a higher melting point than the metal of the main discharge electrodes is used for this film. As a result, deterioration of the electrodes can be inhibited, so that a stable laser output can be obtained, and the replacement interval of the electrodes can be extended.
摘要翻译：在主放电电极的放电部分上形成膜。为了防止由激光气体中所含的卤素气体引起的排出部件的侵蚀，使用与卤素气体即不耐卤素物质倾向不反应的物质。此外，为了防止放电部件由于主放电的轰击和热而发生变形，所以具有比主放电电极的金属更高的硬度的物质或具有比金属的熔点高的物质主放电电极用于该膜。结果，可以抑制电极的劣化，从而可以获得稳定的激光输出，并且可以延长电极的替换间隔。

5. 发明申请

US20100176310A1 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US20100176310A1
公开(公告)日：2010-07-15
申请号：US12385835
申请日：2009-04-21
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： H01J99/00
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/7085 , G03F7/70883 , H05G2/008
摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.
摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。

6. 发明授权

US07683355B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07683355B2
公开(公告)日：2010-03-23
申请号：US11902596
申请日：2007-09-24
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani
IPC分类号： H05G2/00 , G21G4/00 , A61N5/06 , G01J3/10
CPC分类号： H05G2/001
摘要： An EUV light source apparatus capable of preventing the efficiency of generation of EUV light from decreasing due to deterioration of a window of an EUV light generation chamber. The EUV light source apparatus includes an EUV light generation chamber provided with a window, a driver laser which generates a laser beam, a concave lens which enlarges the laser beam, a convex lens which collimates the enlarged laser beam, a parabolic concave mirror which is arranged in the EUV light generation chamber and reflects the collimated laser beam to collect the laser beam to a target material, a parabolic concave mirror adjusting mechanism which adjusts position and angle of the parabolic concave mirror, an EUV light collector mirror which collects EUV light, and a purge gas supply unit which supplies a purge gas for protecting the window and the parabolic concave mirror.
摘要翻译： EUV光源装置能够防止由于EUV光产生室的窗口的劣化导致的EUV光的产生效率降低。 EUV光源装置包括：具有窗口的EUV光产生室，产生激光束的驱动激光器，放大激光束的凹透镜;使激光束准直的凸透镜;抛物面凹面镜; 布置在EUV光产生室中，并且反射准直激光束以将激光束收集到目标材料上，调整抛物面凹面镜的位置和角度的抛物面凹面镜调节机构，收集EUV光的EUV聚光镜，以及净化气体供给单元，其供给用于保护窗口和抛物面凹面镜的吹扫气体。

7. 发明授权

US07006546B2 Gas laser electrode, laser chamber employing the electrode, and gas laser device 有权
标题翻译：气体激光电极，采用电极的激光室和气体激光装置
公开(公告)号：US07006546B2
公开(公告)日：2006-02-28
申请号：US09795401
申请日：2001-03-01
申请人： Tsukasa Hori , Junichi Fujimoto , Takayuki Yabu
发明人： Tsukasa Hori , Junichi Fujimoto , Takayuki Yabu
IPC分类号： H01S3/22
CPC分类号： H01S3/038 , H01S3/225
摘要： Provided is a gas laser electrode in which a stable laser output can be obtained by inhibiting the deterioration of the electrode (discharge characteristics). In an anode 3, a dielectric material 4 is applied on the surface of a discharging portion 3a in order to inhibit the deterioration of the electrode. Used as a dielectric material 4 may be, for example, fluorides such as calcium fluoride and strontium fluoride. Further, the dielectric material 4 is of a thickness (in a range of 0.005 mm˜1.5 mm, preferably 0.1 mm˜1 mm, for example) sufficient to prevent the erosion of halogen gas in the discharging portion 3a of the anode 3 and to secure a conductivity thereof, whereby it is enabled to form mono-fluoride evenly in extreme precision.
摘要翻译：提供一种气体激光电极，其中通过抑制电极的劣化（放电特性）可以获得稳定的激光输出。在阳极3中，为了抑制电极的劣化，在放电部分3a的表面上施加电介质材料4。用作电介质材料4可以是例如氟化物如氟化钙和氟化锶。此外，电介质材料4的厚度（例如在0.005mm〜1.5mm的范围内，优选为0.1mm〜1mm），足以防止阳极3的放电部分3a中的卤素气体的侵蚀，以及以确保其导电性，从而能够以极高的精度均匀地形成单氟化物。

8. 发明授权

US06771685B1 Discharge electrodes connecting structure for laser apparatus and laser apparatus therewith 有权
标题翻译：激光装置的放电电极连接结构和激光装置
公开(公告)号：US06771685B1
公开(公告)日：2004-08-03
申请号：US09648632
申请日：2000-08-28
申请人： Takayuki Yabu , Takanobu Ishihara , Takashi Matsunaga , Yasufumi Kawasuji
发明人： Takayuki Yabu , Takanobu Ishihara , Takashi Matsunaga , Yasufumi Kawasuji
IPC分类号： H01S3097
CPC分类号： H01S3/038 , H01S3/0971 , H01S3/225
摘要： The invention provides a discharge electrodes connecting structure for a laser apparatus in which a thickness of the return plate is set to be within an optimum range, and a laser apparatus employing the same. Accordingly, a laser apparatus is provided with a laser chamber (2) sealing a laser gas, a pair of anode (5A) and cathode (5B) provided within the laser chamber in an opposing manner, generating a discharge so as to excite a laser gas flowing therebetween and oscillating a laser beam, a conductive anode base (6) holding the anode, an insulative cathode base (8) holding the cathode, and a return plate (9) electrically connecting the anode base to the laser chamber so as to supply a current to the anode. A thickness (t) of the return plate is set to be equal to or more than 100 &mgr;m and equal to or less than 500 &mgr;m, and the return plate is arranged substantially in parallel to a gas flow of the laser gas flowing between the discharge electrodes.
摘要翻译：本发明提供一种用于激光装置的放电电极连接结构，其中将返回板的厚度设置在最佳范围内，以及采用该放电电极连接结构的激光装置。因此，激光装置设置有激光室（2），密封激光气体，以相对的方式设置在激光室内的一对阳极（5A）和阴极（5B），产生放电以激发激光在其间流动的气体和激光束的振荡，保持阳极的导电阳极基座（6），保持阴极的绝缘阴极基座（8）和将阳极基座电连接到激光室的回流板（9）向阳极提供电流。返回板的厚度（t）设定为100μm以上且500μm以下，返回板大致平行于在排出口之间流动的激光气体的气流电极。

9. 发明授权

US08450706B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08450706B2
公开(公告)日：2013-05-28
申请号：US12453058
申请日：2009-04-28
申请人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
发明人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
IPC分类号： G21F5/02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70808 , G03F7/70916 , G03F7/70941 , G03F7/7095 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus in which only particles having a high transmittance for EUV light adhere to an EUV collector mirror even if fast ions emitted from plasma collide with a structural member in a vacuum chamber, and thereby, the reflectance thereof is not easily degraded. The apparatus includes: a vacuum chamber; a target supply unit for supplying a target to a predetermined position in the vacuum chamber; a driver laser for applying a laser beam to the target to generate the plasma; a collector mirror for collecting and outputting extreme ultraviolet light emitted from the plasma; a collector mirror holder for supporting the collector mirror; and a shielding member formed of a material having a high transmittance for the extreme ultraviolet light, for shielding the structural member such as the collector mirror holder from the ions generated from the plasma.
摘要翻译：即使在从等离子体发射的快速离子体与真空室内的结构部件碰撞的情况下，仅将EuV光透射率高的粒子附着在EUV集光镜上的极紫外光源装置，其反射率也不易降解。该装置包括：真空室; 目标供给单元，用于将目标供给到真空室中的预定位置; 用于将激光束施加到靶以产生等离子体的驱动器激光器; 用于收集和输出从等离子体发射的极紫外光的收集镜; 用于支撑收集镜的收集镜支架; 以及由对于极紫外光具有高透射率的材料形成的屏蔽构件，用于将诸如集电镜支架的结构构件与从等离子体产生的离子相屏蔽。

10. 发明授权

US08294129B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08294129B2
公开(公告)日：2012-10-23
申请号：US13081899
申请日：2011-04-07
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.
摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光产生室内的激光束聚焦光学元件中的光学元件的劣化。该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

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