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    • 4. 发明授权
    • Method and apparatus for cleaning collector mirror in EUV light generator
    • 在EUV光发生器中清洁集光镜的方法和装置
    • US08536550B2
    • 2013-09-17
    • US12478083
    • 2009-06-04
    • Takeshi AsayamaHiroshi SomeyaMasato MoriyaHideo HoshinoTamotsu Abe
    • Takeshi AsayamaHiroshi SomeyaMasato MoriyaHideo HoshinoTamotsu Abe
    • B08B7/00
    • B08B7/00B08B7/0035B08B13/00
    • A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
    • 一种在EUV光发生器中清洁收集反射镜的方法,其中靶产生等离子体状态,并且通过集光镜收集产生的EUV光,该方法被用于EUV发光器,用于清除附着在其上的污染物,该方法包括 :准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置,同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁,同时确定在聚光位置的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁,则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置 到聚光位置。
    • 5. 发明申请
    • METHOD AND APPARATUS FOR CLEANING COLLECTOR MIRROR IN EUV LIGHT GENERATOR
    • EUV光发生器清洗收集器镜的方法和装置
    • US20090301517A1
    • 2009-12-10
    • US12478083
    • 2009-06-04
    • Takeshi AsayamaHiroshi SomeyaMasato MoriyaHideo HoshinoTamotsu Abe
    • Takeshi AsayamaHiroshi SomeyaMasato MoriyaHideo HoshinoTamotsu Abe
    • B08B7/00
    • B08B7/00B08B7/0035B08B13/00
    • A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
    • 一种在EUV光发生器中清洁收集反射镜的方法,其中靶产生等离子体状态,并且通过集光镜收集产生的EUV光,该方法被用于EUV发光器,用于清除附着在其上的污染物,该方法包括 :准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置,同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁,同时确定在聚光位置处的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁,则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置 到聚光位置。