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1. 发明授权

US08390201B2 Multi-column electron beam exposure apparatus and magnetic field generation device 有权
标题翻译：多列电子束曝光装置及磁场发生装置
公开(公告)号：US08390201B2
公开(公告)日：2013-03-05
申请号：US12928899
申请日：2010-12-22
申请人： Hiroshi Yasuda , Yoshihisa Ooae , Takeshi Haraguchi
发明人： Hiroshi Yasuda , Yoshihisa Ooae , Takeshi Haraguchi
IPC分类号： H01J25/50
CPC分类号： H01J37/143 , B82Y10/00 , B82Y40/00 , H01J37/06 , H01J37/3174 , H01J2237/0635 , H01J2237/14
摘要： A multi-column electron beam exposure apparatus includes: multiple column cells; an electron beam converging unit in which two annular permanent magnets and electromagnetic coils are surrounded by a ferromagnetic frame, the two annular permanent magnets being magnetized in an optical axis direction and symmetrical about the optical axis, where the electromagnetic coils adjust magnetic fields of the annular permanent magnets; and a substrate provided with circular apertures through which electron beams used in the column cells pass, respectively, where the electron beam converging unit is disposed in each of the circular apertures. The two annular permanent magnets may be disposed one above the other in the optical axis direction, and the electromagnetic coils may be provided inside or outside the annular permanent magnets in their radial direction.
摘要翻译：多列电子束曝光装置包括：多列细胞; 电子束会聚单元，其中两个环形永磁体和电磁线圈被铁磁框架包围，两个环形永磁体沿光轴方向被磁化并且围绕光轴对称，其中电磁线圈调节环形磁场永久磁铁以及设置有圆孔的基板，分别在列单元中使用的电子束通过其中电子束会聚单元设置在每个圆形孔中。两个环形永久磁铁可以在光轴方向上彼此上下配置，并且电磁线圈可以设置在环形永磁体的径向内侧或外侧。

2. 发明申请

US20080315089A1 Electron gun, electron beam exposure apparatus, and exposure method 有权
标题翻译：电子枪，电子束曝光装置和曝光方法
公开(公告)号：US20080315089A1
公开(公告)日：2008-12-25
申请号：US12151500
申请日：2008-05-07
申请人： Hiroshi Yasuda , Takeshi Haraguchi , Yoshihisa Ooae , Takamasa Satoh , Yoshinori Terui , Seiichi Sakawa , Ryozo Nonogaki
发明人： Hiroshi Yasuda , Takeshi Haraguchi , Yoshihisa Ooae , Takamasa Satoh , Yoshinori Terui , Seiichi Sakawa , Ryozo Nonogaki
IPC分类号： H01J3/02
CPC分类号： H01J37/073 , H01J2237/06316 , H01J2237/06341 , H01J2237/3175
摘要： An electron gun includes an electron source configured to emit electrons. The electron source includes an electron emission region configured to emit the electrons and an electron emission restrictive region configured to restrict emission of the electrons. The electron emission restrictive region is located on a side surface of the electron source except an electron emission surface on a tip of the electron source and is covered with a different material from the electron source. The electron gun emits thermal field-emitted electrons by applying an electric field to the tip while maintaining a sufficiently low temperature to avoid sublimation of a material of the electron source. The material of the electron source may be lanthanum hexaboride (LaB6) or cerium hexaboride (CeB6). The electron emission restrictive region may be covered with carbon.
摘要翻译：电子枪包括被配置为发射电子的电子源。电子源包括配置为发射电子的电子发射区域和被配置为限制电子发射的电子发射限制区域。电子发射限制区域位于电子源的除了电子源的尖端上的电子发射表面以外的电子源的侧表面上，并被与电子源不同的材料覆盖。电子枪通过向尖端施加电场而发射热场发射的电子，同时保持足够低的温度以避免电子源的材料的升华。电子源的材料可以是六硼化镧（LaB 6）或六硼化铈（CeB 6）。电子发射限制区域可以被碳覆盖。

3. 发明授权

US07919750B2 Electron gun, electron beam exposure apparatus, and exposure method 有权
标题翻译：电子枪，电子束曝光装置和曝光方法
公开(公告)号：US07919750B2
公开(公告)日：2011-04-05
申请号：US12151500
申请日：2008-05-07
申请人： Hiroshi Yasuda , Takeshi Haraguchi , Yoshihisa Ooae , Takamasa Satoh , Yoshinori Terui , Seiichi Sakawa , Ryozo Nonogaki
发明人： Hiroshi Yasuda , Takeshi Haraguchi , Yoshihisa Ooae , Takamasa Satoh , Yoshinori Terui , Seiichi Sakawa , Ryozo Nonogaki
IPC分类号： H01J29/48 , H01J37/073
CPC分类号： H01J37/073 , H01J2237/06316 , H01J2237/06341 , H01J2237/3175
摘要： An electron gun includes an electron source configured to emit electrons. The electron source includes an electron emission region configured to emit the electrons and an electron emission restrictive region configured to restrict emission of the electrons. The electron emission restrictive region is located on a side surface of the electron source except an electron emission surface on a tip of the electron source and is covered with a different material from the electron source. The electron gun emits thermal field-emitted electrons by applying an electric field to the tip while maintaining a sufficiently low temperature to avoid sublimation of a material of the electron source. The material of the electron source may be lanthanum hexaboride (LaB6) or cerium hexaboride (CeB6). The electron emission restrictive region may be covered with carbon.
摘要翻译：电子枪包括被配置为发射电子的电子源。电子源包括配置为发射电子的电子发射区域和被配置为限制电子发射的电子发射限制区域。电子发射限制区域位于电子源的除了电子源的尖端上的电子发射表面以外的电子源的侧表面上，并被与电子源不同的材料覆盖。电子枪通过向尖端施加电场而发射热场发射的电子，同时保持足够低的温度以避免电子源的材料的升华。电子源的材料可以是六硼化镧（LaB 6）或六硼化铈（CeB 6）。电子发射限制区域可以被碳覆盖。

4. 发明申请

US20110148297A1 Multi-column electron beam exposure apparatus and magnetic field generation device 有权
标题翻译：多列电子束曝光装置及磁场发生装置
公开(公告)号：US20110148297A1
公开(公告)日：2011-06-23
申请号：US12928899
申请日：2010-12-22
申请人： Hiroshi Yasuda , Yoshihisa Ooae , Takeshi Haraguchi
发明人： Hiroshi Yasuda , Yoshihisa Ooae , Takeshi Haraguchi
IPC分类号： H01J23/08 , H01F7/00
CPC分类号： H01J37/143 , B82Y10/00 , B82Y40/00 , H01J37/06 , H01J37/3174 , H01J2237/0635 , H01J2237/14
摘要： A multi-column electron beam exposure apparatus includes: multiple column cells; an electron beam converging unit in which two annular permanent magnets and electromagnetic coils are surrounded by a ferromagnetic frame, each of the two annular permanent magnets being magnetized in an optical axis direction and being symmetrical about the optical axis, the electromagnetic coils disposed near the annular permanent magnets and used to adjust magnetic fields of the annular permanent magnets; and a substrate provided with circular apertures through which electron beams used in the column cells pass, respectively, the substrate having the electron beam converging unit disposed in a side portion of each of the circular apertures. The two annular permanent magnets may be disposed one above the other in the optical axis direction with same polarities facing each other, and the electromagnetic coils may be provided inside or outside the annular permanent magnets in their radial direction.
摘要翻译：多列电子束曝光装置包括：多列细胞; 电子束会聚单元，其中两个环形永磁体和电磁线圈被铁磁框架包围，两个环形永磁体中的每一个在光轴方向上被磁化并且围绕光轴对称，电磁线圈设置在环形永磁体，用于调整环形永磁体的磁场; 以及设置有圆孔的基板，通过该圆形孔分别通过电子束会聚单元的基板，每个圆形孔的侧面部分通过电子束。两个环形永磁体可以沿着光轴方向一个一个地设置在彼此相同的极性上，并且电磁线圈可以设置在环形永磁体的径向内侧或外侧。

5. 发明授权

US06727658B2 Electron beam generating apparatus and electron beam exposure apparatus 有权
标题翻译：电子束发生装置和电子束曝光装置
公开(公告)号：US06727658B2
公开(公告)日：2004-04-27
申请号：US10383953
申请日：2003-03-07
申请人： Yoshihisa Ooae , Yoichi Shimizu , Takamasa Satoh , Takeshi Haraguchi
发明人： Yoshihisa Ooae , Yoichi Shimizu , Takamasa Satoh , Takeshi Haraguchi
IPC分类号： G09G310
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/065 , H01J37/3177
摘要： An electron beam generating apparatus for generating a plurality of electron beams, which includes: a plurality of cathodes for generating thermoelectrons; a cathode power supply unit for applying negative voltage to the cathodes so as to emit the thermoelectrons from the cathodes; a plurality of grids, which correspond to the plurality of cathodes respectively, for focusing the thermoelectrons emitted from each of the plurality of cathodes, and shaping the plurality of electron beams; and an insulator on which the plurality of cathodes and the plurality of grids are attached.
摘要翻译：一种用于产生多个电子束的电子束产生装置，包括：多个用于产生热电子的阴极; 用于向阴极施加负电压以从阴极发射热电子的阴极电源单元; 分别对应于多个阴极的多个栅格，用于聚焦从多个阴极中的每一个发射的热电子，并对多个电子束进行成形; 以及绝缘体，多个阴极和多个栅极连接在该绝缘体上。

6. 发明授权

US06509568B1 Electrostatic deflector for electron beam exposure apparatus 有权
公开(公告)号：US06509568B1
公开(公告)日：2003-01-21
申请号：US09431441
申请日：1999-11-01
申请人： Yoshihisa Ooae , Hitoshi Tanaka , Takeshi Haraguchi , Kazuto Ashiwara , Tomohiko Abe , Ryoji Kato
发明人： Yoshihisa Ooae , Hitoshi Tanaka , Takeshi Haraguchi , Kazuto Ashiwara , Tomohiko Abe , Ryoji Kato
IPC分类号： H01J338
CPC分类号： H01J37/1477 , H01J2237/151
摘要： An electron beam radiation apparatus having an electrostatic deflector capable of deflecting the electron beam with high accuracy and with a reduced displacement of the deflection position, is disclosed. The electrostatic deflector comprises a cylindrical holding member made of an insulating material and a plurality of electrodes separately fixed from each other inside of the holding member with at least a part of the surface thereof covered with a metal film. The holding member has a plurality of wedge-shaped fixing holes corresponding to the portions of the electrodes where they are fixed, respectively, the holes having a larger diameter on the outer peripheral surface than on the inner peripheral surface of the holding member. The electrodes are fixed on the holding member in such a manner that a molten joining metal is injected in the fixing holes with the electrodes arranged on the holding member and the joining metal is hardened in close contact with the metal film of the electrodes. The electrodes fixed on the holding member are so shaped that the inner wall of the holding member is invisible from the cylinder axis of the holding member. The electrodes have a metal thin film formed, by vapor deposition, on the inner wall surface of the electrodes after being fixed on the holding member.

7. 发明授权

US06465796B1 Charge-particle beam lithography system of blanking aperture array type 失效
标题翻译：消隐孔径阵列型电荷粒子光刻系统
公开(公告)号：US06465796B1
公开(公告)日：2002-10-15
申请号：US09350238
申请日：1999-07-09
申请人： Takeshi Haraguchi , Tomohiko Abe , Yoshihisa Ooae
发明人： Takeshi Haraguchi , Tomohiko Abe , Yoshihisa Ooae
IPC分类号： H01J37304
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/0453 , H01J2237/0458
摘要： Disclosed is a charged-particle beam lithography system in which deterioration of a BAA chip is prevented without a reduction in the magnitude of a charged-particle beam used for exposure. The charged-particle beam lithography system has a charged-particle beam emitter source and a chip having a plurality of apertures arrayed therein. The plurality of apertures shapes a charged-particle beam emitted from the emitter source so that the cross section thereof will have a predetermined shape. The charged-particle beam lithography system uses the charged-particle beam having passed through the apertures to pattern an exposed sample. The charged-particle beam lithography system includes a mask having a plurality of apertures bored therein. The plurality of apertures is arrayed in the same manner as the plurality of apertures arrayed in the chip, and has a size that is any multiple of the size of the apertures of the chip. The mask is located on a path, along which the charged-particle beam travels, between the charged-particle beam emitter source and chip.
摘要翻译：公开了一种带电粒子束光刻系统，其中防止BAA芯片的劣化，而不会减少用于曝光的带电粒子束的幅度。带电粒子束光刻系统具有带电粒子束发射源和在其中排列有多个孔的芯片。多个孔形成从发射源发射的带电粒子束，使得其截面具有预定形状。带电粒子束光刻系统使用穿过孔的带电粒子束来图案化暴露的样品。带电粒子束光刻系统包括具有在其中钻孔的多个孔的掩模。多个孔以与排列在芯片中的多个孔相同的方式排列，并且其尺寸是芯片的孔的大小的任何倍数。掩模位于带电粒子束在其上行进的路径上，在带电粒子束发射源和芯片之间。

8. 发明授权

US5945683A Electron beam exposure device 失效
标题翻译：电子束曝光装置
公开(公告)号：US5945683A
公开(公告)日：1999-08-31
申请号：US906389
申请日：1997-08-05
申请人： Tatsuro Ohkawa , Yoshihisa Ooae , Hitoshi Tanaka , Hiroshi Yasuda
发明人： Tatsuro Ohkawa , Yoshihisa Ooae , Hitoshi Tanaka , Hiroshi Yasuda
IPC分类号： H01J37/06 , H01J37/063 , H01J37/305 , H01L21/027
CPC分类号： H01J37/063 , H01J2237/30433 , H01J2237/3175
摘要： An electron beam exposure device includes an alignment optical system; an electromagnetic lens system; a stage on which the sample is provided; and an electron gun. The electron gun is comprised of an electron generating source; an electron generating source heating element which generates heat for increasing the temperature of the electron generating source; a supporting member which supports the electron generating source and the electron generating source heating element; and a Wehnelt. The electron beam exposure device is provided with at least one auxiliary heating element located at respective portion thermally connected to the electron generating source heating element.
摘要翻译：电子束曝光装置包括对准光学系统; 电磁透镜系统; 提供样品的阶段; 和电子枪。电子枪由电子发生源组成; 电子发生源加热元件，其产生用于增加电子发生源的温度的热量; 支撑电子发生源和电子发生源加热元件的支撑构件; 和一个Wehnelt。电子束曝光装置设置有至少一个位于与电子发生源加热元件热连接的相应部分处的辅助加热元件。

9. 发明申请

US20080169433A1 Electron beam exposure apparatus and method for cleaning the same 有权
标题翻译：电子束曝光装置及其清洗方法
公开(公告)号：US20080169433A1
公开(公告)日：2008-07-17
申请号：US12077153
申请日：2008-03-17
申请人： Hiroshi Yasuda , Yoshihisa Ooae
发明人： Hiroshi Yasuda , Yoshihisa Ooae
IPC分类号： A61N5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31793
摘要： Provided is an electron beam exposure apparatus for forming a desired pattern on a sample mounted on a wafer stage by exposure with an electron beam generated form an electron gun. The electron beam exposure apparatus includes: supplying device of injecting a reducing gas into a column in which the electron gun and the wafer stage are housed; and control unit of performing control so that the injection of the reducing gas into the column is continued for a predetermined period of time. Organic contamination is combined with H generated from the reducing gas by irradiation of an electron beam, and then evaporates. Further included is supplying device of injecting an ozone gas into the column. The control unit may perform control so that the injection of the ozone gas into the column in addition to the injection of the reducing gas is continued for a predetermined period of time.
摘要翻译：提供一种电子束曝光装置，用于通过用电子枪产生的电子束曝光在安装在晶片台上的样品上形成所需图案。电子束曝光装置包括：将还原气体注入到容纳电子枪和晶片台的列中的供给装置; 以及执行控制的控制单元，使得将还原气体注入到所述列中持续预定时间段。有机污染与通过照射电子束从还原气体生成的H结合，然后蒸发。还包括将臭氧气体注入塔的供给装置。控制单元可以执行控制，使得除了注入还原气体之外，将臭氧气体注入到塔中持续预定的时间段。

10. 发明授权

US06268606B1 Electrostatic deflector, for electron beam exposure apparatus, with reduced charge-up 失效
标题翻译：静电偏转器，用于电子束曝光设备，具有减小的充电
公开(公告)号：US06268606B1
公开(公告)日：2001-07-31
申请号：US09337795
申请日：1999-06-22
申请人： Tomohiko Abe , Yoshihisa Ooae , Hiroshi Yasuda
发明人： Tomohiko Abe , Yoshihisa Ooae , Hiroshi Yasuda
IPC分类号： H01J3700
CPC分类号： H01J37/1472 , H01J2237/1516 , H01J2237/3175
摘要： An electrostatic deflector of an electron beam exposure apparatus is disclosed. A cylindrical holding member is made of an insulating material. An electrode including a plurality of electrode members fixedly arranged in spaced relationship to each other and having at least a portion of the surface thereof grown with a metal film is disposed inside the holding member. The electrode members each formed with a metal film on the surface thereof are made of a conductive ceramic having a resistivity selected at least in the range of 0.001 &OHgr;•cm to 1000 &OHgr;•cm.
摘要翻译：公开了电子束曝光设备的静电偏转器。圆柱形保持构件由绝缘材料制成。一种电极，其包括以彼此间隔开的关系固定地布置并且其表面的至少一部分由金属膜生长的多个电极部件设置在保持部件的内部。每个在其表面上由金属膜形成的电极构件由电阻率选择为至少在0.001欧姆·厘米到1000欧姆·厘米的范围内的导电陶瓷制成。

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