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1. 发明授权

US5157700A Exposure apparatus for controlling intensity of exposure radiation 失效
标题翻译：用于控制接触辐射强度的曝光装置
公开(公告)号：US5157700A
公开(公告)日：1992-10-20
申请号：US401615
申请日：1989-08-31
申请人： Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
发明人： Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
IPC分类号： G03F7/20
CPC分类号： G03F7/70691 , G03F7/70058 , G03F7/70091 , G03F7/702
摘要： An exposure apparatus usable with synchrotron radiation source wherein the synchrotron radiation is generated by electron injection into a ring. The exposure apparatus is to transfer a semiconductor element pattern of a mask onto a semiconductor wafer by the synchrotron radiation. The apparatus includes a shutter for controlling the exposure of the wafer. The shutter controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined in response to the electron injection, and thereafter, the illuminance distribution is corrected in a predetermined manner. By this, the illuminance distribution data for controlling the shutter always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer are exposed with high precision.

2. 发明授权

US5063582A Liquid cooled X-ray lithographic exposure apparatus 失效
标题翻译：液体冷却X射线光刻曝光装置
公开(公告)号：US5063582A
公开(公告)日：1991-11-05
申请号：US658434
申请日：1991-02-20
申请人： Tetsuzo Mori , Eiji Sakamoto , Shinichi Hara , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa
发明人： Tetsuzo Mori , Eiji Sakamoto , Shinichi Hara , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa
IPC分类号： G03F7/20
CPC分类号： G03F7/709 , G03F7/707 , G03F7/70716 , G03F7/70866 , G03F7/70875
摘要： The present invention relates to a temperature control system for a lithographic exposure apparatus wherein a mask and wafer are closely disposed, and predetermined exposure energy is applied to respective shot areas of the wafer through the mask. The exposure energy is a soft-X-ray source, for example. The pattern of the mask is transferred onto the respective shot areas in a step-and-repeat manner. In the apparatus, a temperature control medium liquid is supplied into the wafer chuck which supports the wafer at the exposure position. The flow rate of the temperature control liquid is different during an exposure operation than during a non-exposure-operation. The flow control is determined in consideration of the wafer chuck vibration attributable to the supply of the liquid medium and also, of the heat generation in the wafer by the exposure energy, so that the vibration of the wafer chuck during the exposure operation is suppressed. Simultaneously the temperature rise of the wafer can also be suppressed. The pattern transfer from the mask to the wafer thus be precisely performed.

3. 发明授权

US6167111A Exposure apparatus for synchrotron radiation lithography 失效
标题翻译：用于同步辐射光刻的曝光装置
公开(公告)号：US6167111A
公开(公告)日：2000-12-26
申请号：US108373
申请日：1998-07-01
申请人： Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Shinichi Hara
发明人： Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Shinichi Hara
IPC分类号： G03F7/20 , G21K1/06 , G21K5/00
CPC分类号： G03F7/70058 , G21K1/06
摘要： An apparatus for transferring a pattern of a mask onto a substrate with radiation light from a synchrotron radiation light source, includes a first mirror for collectively reflecting radiation light from the synchrotron radiation light source, and a second mirror for reflecting radiation light from the first mirror and for projecting the same to the mask. When a light ray advancing from a light emission point of the light source toward a center of a predetermined region of the mask, to be transferred to the substrate, is taken as a chief ray, when a normal to each of the first and second mirrors at an incidence position of a corresponding chief ray is taken as a Z axis, when a direction perpendicular to a plane defined by the Z axis of each mirror and a corresponding chief ray is taken as an X axis, and when a Y axis is taken along a direction perpendicular to the Z axis and X axis of each mirror, the first mirror has a reflection surface of a shape which is concave with respect to the X axis direction and concave with respect to the Y axis direction, while the second mirror has a reflection surface of a shape which is convex with respect to the Y axis direction.
摘要翻译：一种用于利用来自同步加速器辐射光源的辐射光将掩模图案转印到基板上的装置，包括用于共同地反射来自同步加速器辐射光源的辐射光的第一反射镜和用于反射来自第一反射镜的辐射光的第二反射镜并将其投射到面罩。当将从光源的发光点向掩模的预定区域的中心传播的光线作为主光线时，当第一和第二反射镜中的每一个的法线当将相应的主光线的入射位置作为Z轴时，当将与每个反射镜的Z轴和相应的主光线所定义的平面垂直的方向作为X轴，并且当采用Y轴时沿着与每个反射镜的Z轴和X轴垂直的方向，第一反射镜具有相对于X轴方向为凹形且相对于Y轴方向凹陷的形状的反射面，而第二反射镜具有相对于Y轴方向凸出的形状的反射面。

4. 发明授权

US5323440A X-ray lithography apparatus including a dose detectable mask 失效
标题翻译： X射线光刻设备包括剂量可检测的掩模
公开(公告)号：US5323440A
公开(公告)日：1994-06-21
申请号：US22407
申请日：1993-02-24
申请人： Shinichi Hara , Mitsuaki Amemiya , Shunichi Uzawa
发明人： Shinichi Hara , Mitsuaki Amemiya , Shunichi Uzawa
IPC分类号： G03F1/22 , G03F7/20 , H01L21/027 , H01L21/30 , G21K5/00
CPC分类号： G03F1/22 , G03F7/70541 , G03F7/70558 , G03F7/70875
摘要： An X-ray exposure apparatus using radiation light as exposure light, wherein the apparatus includes: a display device; a detecting device for detecting in each exposure the amount of exposure absorbed by a mask during the exposure; a memory for memorizing an accumulated dose of the mask; and a controller for causing the display device to display a dose of the mask, wherein the dose to be displayed corresponds to the sum of the accumulated dose memorized in the memory and the amount of exposure detected by the detecting device. Also a mask structure suitably usable in such an exposure apparatus.
摘要翻译：一种使用放射线作为曝光光的X射线曝光装置，其中，所述装置包括：显示装置; 检测装置，用于在曝光期间检测由掩模吸收的曝光量; 用于记忆掩模的累积剂量的存储器; 以及用于使显示装置显示剂量的控制器，其中待显示的剂量对应于存储在存储器中的累积剂量与检测装置检测到的曝光量的总和。也可适用于这种曝光装置的掩模结构。

5. 发明授权

US4969168A Wafer supporting apparatus 失效
标题翻译：晶圆支撑装置
公开(公告)号：US4969168A
公开(公告)日：1990-11-06
申请号：US401654
申请日：1989-08-31
申请人： Eiji Sakamoto , Shinichi Hara , Isamu Shimoda , Shunichi Uzawa
发明人： Eiji Sakamoto , Shinichi Hara , Isamu Shimoda , Shunichi Uzawa
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30 , H01L21/683
CPC分类号： G03F7/707 , G03F7/70866 , G03F7/70875 , H01L21/6833 , H01L21/6838
摘要： A wafer chuck usable with a semiconductor exposure apparatus wherein a mask and a semiconductor wafer are placed in a vacuum ambience or a pressure-reduced gas ambience, and wherein the wafer is exposed through the mask to radiation energy such as X-rays contained in a synchrotron radiation beam, by which the pattern of the mask is transferred onto the wafer. The wafer is first attracted on the wafer supporting surface of the chuck by vacuum attraction, and thereafter, the wafer is attracted by the electrostatic attraction force. Thereafter, the vacuum attraction is broken by supplying a gas. When the pattern of the mask is transferred onto the wafer, the wafer is retained on the wafer supporting surface by the electrostatic attraction force only. By this, the sheet-like member (wafer) supporting apparatus can correctly contact the wafer supporting surface to the wafer without being influenced by the undulation of the wafer. In addition, the heat produced in the wafer during exposure can be removed efficiently by temperature controlled water supplied to the wafer supporting apparatus.

6. 发明授权

US5883932A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5883932A
公开(公告)日：1999-03-16
申请号：US464225
申请日：1995-06-05
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding apparatus in which first and second vacuum clamping devices each have a holding surface for holding a portion of a substrate, a first driving device for rotating the first vacuum clamping device relative to the second vacuum clamping device, and a second driving device for reciprocally moving the first vacuum clamping device between a position in which it protrudes by a predetermined amount from the holding surface of the second vacuum clamping device and a position in which it does not protrude from that holding surface. Also disclosed is a substrate holding device in which a vacuum clamping device creates a vacuum clamp force on the holding surface thereof, a cylindrical delivering member surrounds at least a portion of the holding surface and is reciprocally movable between a position in which it protrudes by a predetermined amount from the holding surface and a position in which it does not protrude from the holding surface, and a driving device for moving the delivering member.
摘要翻译：一种基板保持装置，其中第一和第二真空夹紧装置各自具有用于保持基板的一部分的保持表面，用于使第一真空夹紧装置相对于第二真空夹紧装置旋转的第一驱动装置，以及用于在第一真空夹紧装置从第二真空夹紧装置的保持表面突出预定量的位置和不从该保持表面突出的位置之间往复移动第一真空夹紧装置。还公开了一种基板保持装置，其中真空夹持装置在其保持表面上产生真空夹紧力，圆柱形输送构件围绕保持表面的至少一部分，并且可在其突出位置之间往复运动从保持表面预定量和不从保持表面突出的位置，以及用于移动输送构件的驱动装置。

7. 发明授权

US5999589A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5999589A
公开(公告)日：1999-12-07
申请号：US140679
申请日：1998-08-26
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding device includes a vacuum supplying device for supplying a vacuum to a holding surface to hold a substrate, a hollow member surrounding at least a portion of the holding surface and movable between a position in which the holding member protrudes from the holding surface and a position in which the hollow member does not protrude from the holding surface, and a moving mechanism for relatively moving between the hollow member and the holding surface.
摘要翻译：基板保持装置包括用于向保持表面提供真空以保持基板的真空供应装置，围绕保持表面的至少一部分的中空构件，并且可在保持构件从保持表面突出的位置和中空构件不从保持表面突出的位置，以及用于在中空构件和保持表面之间相对移动的移动机构。

8. 发明授权

US5825463A Mask and mask supporting mechanism 失效
标题翻译：面罩和面罩支撑机构
公开(公告)号：US5825463A
公开(公告)日：1998-10-20
申请号：US791545
申请日：1997-01-31
申请人： Shinichi Hara , Nobutoshi Mizusawa , Yuji Chiba
发明人： Shinichi Hara , Nobutoshi Mizusawa , Yuji Chiba
IPC分类号： G03F1/22 , G03F7/20 , G03B27/62
CPC分类号： G03F1/22 , G03F7/707
摘要： A mask and a mask supporting mechanism wherein the outside periphery of a mask frame, having a rectangular shape, which supports the mask, is supported at three supporting points which are substantially the same distance from the center line of a mask membrane, whereby the mask frame is positioned with respect to X, Y and .theta. directions. Two pressing mechanisms press the mask frame at two points substantially opposed to two of the supporting points. The mask is supported at three points on the bottom surface thereof for positioning in the Z direction.
摘要翻译：一种掩模和掩模支撑机构，其中具有矩形形状的支撑掩模的掩模框架的外周被支撑在与掩模膜的中心线基本相同的距离处的三个支撑点处，由此掩模框架相对于X，Y和θ方向定位。两个按压机构在基本上与两个支撑点相对的两点处按压面罩框架。掩模在其底表面上的三个点处被支撑以在Z方向上定位。

9. 发明授权

US5485495A X-ray mask, and exposure apparatus and device production using the mask 失效
标题翻译： X射线掩模，以及使用掩模的曝光装置和装置制造
公开(公告)号：US5485495A
公开(公告)日：1996-01-16
申请号：US286904
申请日：1994-08-08
申请人： Takeshi Miyachi , Nobutoshi Mizusawa , Shinichi Hara , Hiroshi Maehara
发明人： Takeshi Miyachi , Nobutoshi Mizusawa , Shinichi Hara , Hiroshi Maehara
IPC分类号： G03F1/22 , G03F7/20 , G21K5/04 , H01L21/027 , G21K5/00
CPC分类号： G03F1/22 , G03F7/70783 , G21K5/04
摘要： A method of producing an X-ray mask includes a step of forming a mask pattern on a mask substrate having an amount of warp, and a step of bonding the mask substrate to a mask frame. In both steps, the mask substrate maintains a shape obtained due to the amount of warp. Since the mask substrate is fixed to the mask frame in a warped state, distortion is not produced in the mask pattern. As a result, an X-ray mask, which is suitable for very precise exposure, is provided.
摘要翻译：制造X射线掩模的方法包括在具有翘曲量的掩模基板上形成掩模图案的步骤，以及将掩模基板接合到掩模框架的步骤。在两个步骤中，掩模基板保持由于翘曲量而获得的形状。由于掩模基板以翘曲状态固定在荫罩框架上，所以在掩模图案中不产生畸变。因此，提供了适合于非常精确的曝光的X射线掩模。

10. 发明授权

US5854819A Mask supporting device and correction method therefor, and exposure apparatus and device producing method utilizing the same 失效
标题翻译：掩模支撑装置及其校正方法，以及利用其的曝光装置和装置的制造方法
公开(公告)号：US5854819A
公开(公告)日：1998-12-29
申请号：US797467
申请日：1997-02-06
申请人： Shinichi Hara , Takeshi Miyachi , Nobutoshi Mizusawa , Yuji Chiba , Kazuyuki Kasumi
发明人： Shinichi Hara , Takeshi Miyachi , Nobutoshi Mizusawa , Yuji Chiba , Kazuyuki Kasumi
IPC分类号： G03F7/20 , H01L21/30
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70783 , G03F7/708
摘要： There is disclosed a mask supporting device comprising a chuck mechanism for supporting a mask substrate provided with a rectangular window in which a mask pattern is formed, and a frame for reinforcing the mask substrate, and a mechanism for applying, to said frame of the mask, loads from mutually orthogonal directions. The mechanism for applying loads includes a fixed reference contacting two positions on the external periphery of the mask frame and two pressing mechanism for applying loads to the mask frame from two directions respectively opposed to the two contact positions.
摘要翻译：公开了一种掩模支撑装置，其包括用于支撑设置有其中形成有掩模图案的矩形窗口的掩模基板的卡盘机构和用于加强掩模基板的框架，以及用于将所述掩模，来自相互正交的方向的载荷。用于施加载荷的机构包括固定的参考，其接触在荫罩框架的外周上的两个位置，以及两个按压机构，用于从两个接触位置相对的两个方向向荫罩框架施加负载。

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