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1. 发明专利

JP2006023845A Lost property preventive apparatus 审中-公开
标题翻译：丢失物业预防手段
公开(公告)号：JP2006023845A
公开(公告)日：2006-01-26
申请号：JP2004199617
申请日：2004-07-06
申请人： Hiroshi Maehara , 博前原
发明人： MAEHARA HIROSHI
IPC分类号： G06K17/00 , B42D15/10
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for preventing two or more articles to be carried from being left behind. SOLUTION: On a display surface composed of a check card 1 and the screen of a cellular phone 13, two or more article name display fields 6, 22 for displaying article names are provided, and article presence/absence display parts 8, 25 are provided in correspondence with respective article name display fields 6, 22. The check card 1 and the cellular phone 13 each includes IC tag readers 3, 15 for reading two or more IC tags 7a without contact and a data processing means for varying the article presence/absence display parts 8 on the basis of identification information of the IC tag 7a read by the IC tag readers 3, 15. An IC tag seal 7 is prepared which includes a noncontact IC tag to be affixed on an article to be carried, information of the IC tag 7a attached on the article to be carried is read by the IC readers 3, 15, and the read result is displayed on the article presence/absence display parts 8, 25. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于防止两个或更多个携带物品被遗留的装置。解决方案：在由支票卡1和蜂窝电话13的屏幕组成的显示表面上，提供用于显示商品名称的两个或更多个商品名称显示字段6,22，并且文章存在/不存在显示部分8，检查卡1和蜂窝电话13各自包括用于读取两个或更多个IC标签7a而没有接触的IC标签读取器3,15，以及用于改变图像数据的数据处理装置基于由IC标签读取器3,15读取的IC标签7a的识别信息的文章存在/不存在显示部件8.准备IC标签密封件7，其包括要附着在待携带物品上的非接触IC标签通过IC阅读器3,15读取附着在待携带物品上的IC标签7a的信息，将读取结果显示在物品存在/不显示部8,25上。（C） 2006年，JPO＆NCIPI

2. 发明授权

US07009007B2 Recyclable polymer, process for production thereof, and recycling treatment thereof 失效
标题翻译：可回收聚合物，其生产方法及其再循环处理
公开(公告)号：US07009007B2
公开(公告)日：2006-03-07
申请号：US10443089
申请日：2003-05-22
申请人： Hiroshi Maehara , Chieko Mihara , Yoshihiko Kikuchi
发明人： Hiroshi Maehara , Chieko Mihara , Yoshihiko Kikuchi
IPC分类号： C08C19/22 , C08C19/30 , C08C19/34
CPC分类号： C08J11/10 , C08F8/14 , C08F8/32 , C08F2810/40 , C08G81/021 , Y02W30/702 , C08F112/08
摘要： A novel resin is provided, which is renewable with less energy. A process for renewing the resin is also provided. The present invention includes a polymer having the repeating unit represented by Structural Formula (1) [—P1—R—]n (1). In the formula, P1 indicates an addition polymer moiety having a continuous hydrocarbon chain as the skeleton containing no condensation system, and is a polymer or oligomer prepared by addition polymerization of one or more monomers having a double bond; R indicates a linking group constituted of a condensation system for linking the polymer moieties P; and n is a number of repeating units and is an integer of 2 or more.
摘要翻译：提供了一种新颖的树脂，可以以更少的能量再生。还提供了更新树脂的方法。本发明包括具有由结构式（1）表示的重复单元的聚合物[-P 1→R 1] n（1）。在该式中，P 1'表示具有连续烃链作为不含缩合体系的骨架的加成聚合物部分，是通过一种或多种具有双键的单体的加成聚合制备的聚合物或低聚物 ; R表示由用于连接聚合物部分P的缩合体系构成的连接基团; n为重复单元数，为2以上的整数。

3. 发明授权

US06872952B2 Electron optical system array, method of manufacturing the same, charged-particle beam exposure apparatus, and device manufacturing method 失效
标题翻译：电子光学系统阵列，其制造方法，带电粒子束曝光装置和器件制造方法
公开(公告)号：US06872952B2
公开(公告)日：2005-03-29
申请号：US09819906
申请日：2001-03-29
申请人： Yasuhiro Shimada , Takayuki Yagi , Haruhito Ono , Hiroshi Maehara
发明人： Yasuhiro Shimada , Takayuki Yagi , Haruhito Ono , Hiroshi Maehara
IPC分类号： G03F7/20 , G21K1/087 , H01J9/14 , H01J37/04 , H01J37/12 , H01J37/305 , H01L21/027 , H01J37/302
CPC分类号： G21K1/087
摘要： This invention relates to an electron optical system array having a plurality of electron lenses. The electron optical system array includes a plurality of electrode structures which are arranged along the paths of a plurality of charged-particle beams and have pluralities of apertures on the paths of the plurality of charged-particle beams. At least one of the plurality of electrode structures includes a substrate having a plurality of apertures for transmitting the plurality of charged-particle beams, and a plurality of electrodes extending from the side surfaces of the plurality of apertures to the peripheries of the plurality of apertures. At least the surface of the substrate is insulated.
摘要翻译：本发明涉及具有多个电子透镜的电子光学系统阵列。电子光学系统阵列包括沿着多个带电粒子束的路径布置并在多个带电粒子束的路径上具有多个孔的多个电极结构。多个电极结构中的至少一个包括具有多个用于透射多个带电粒子束的孔的基板和从多个孔的侧表面延伸到多个孔的周边的多个电极。至少衬底的表面是绝缘的。

4. 发明授权

US06728332B2 X-ray mask, and exposure method and apparatus using the same 失效
标题翻译： X射线掩模和使用其的曝光方法和装置
公开(公告)号：US06728332B2
公开(公告)日：2004-04-27
申请号：US09970826
申请日：2001-10-05
申请人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
发明人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
IPC分类号： G21K300
CPC分类号： G03F1/62 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： An exposure method for transferring a pattern of a mask onto a member to be exposed. The method includes the steps of making preparations for exposure while a protection cover is attached to the mask, executing alignment between the member to be exposed and the mask while the protection cover is detached from the mask, and executing exposure with X-rays while the protection cover is detached from the mask.
摘要翻译：一种用于将掩模图案转印到要曝光的构件上的曝光方法。该方法包括以下步骤：当保护盖附着到掩模上时，进行曝光准备，在保护盖与掩模分离的同时执行被曝光元件与掩模之间的对准，并且执行X射线曝光防护罩与面罩分离。

5. 发明授权

US6087076A Method of manufacturing semiconductor devices by performing coating, heating, exposing and developing in a low-oxygen or oxygen free controlled environment 失效
标题翻译：通过在低氧或无氧的受控环境中进行涂覆，加热，曝光和显影来制造半导体器件的方法
公开(公告)号：US6087076A
公开(公告)日：2000-07-11
申请号：US968589
申请日：1997-11-13
申请人： Keita Sakai , Keiko Chiba , Hiroshi Maehara
发明人： Keita Sakai , Keiko Chiba , Hiroshi Maehara
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , H01L21/027 , G03C5/00
CPC分类号： G03F7/0048
摘要： A method of manufacturing semiconductor devices includes a coating step for coating a substrate using a resist solution including a base resin and a low-oxygen or oxygen-free solvent in which oxygen is removed by nitrogen bubbling, a heating step for heating the substrate coated with the resist, an exposing step for exposing the substrate with radiation to transfer a pattern, and a developing step for developing the exposed substrate. The coating step, the heating step, the exposing step and the developing step are performed under an environment controlled in a low-oxygen or oxygen-free state.
摘要翻译：一种制造半导体器件的方法包括：涂覆步骤，用于使用包含基础树脂的抗蚀剂溶液和通过氮气鼓泡除去氧的低氧或无氧溶剂的涂覆步骤，用于加热涂覆有抗蚀剂，用于用辐射曝光衬底以转印图案的曝光步骤，以及用于显影曝光的衬底的显影步骤。涂布步骤，加热步骤，曝光步骤和显影步骤在控制在低氧或无氧状态的环境下进行。

6. 发明授权

US6008942A Diffractive optical element and optical instrument having the same 失效
$Diffractive optical element and optical instrument having the same$
标题翻译：衍射光学元件和具有该衍射光学元件的光学仪器
公开(公告)号：US6008942A
公开(公告)日：1999-12-28
申请号：US997704
申请日：1997-12-23
申请人： Makoto Ogusu , Hiroshi Maehara , Keita Sakai
发明人： Makoto Ogusu , Hiroshi Maehara , Keita Sakai
IPC分类号： G02B5/18 , G02B27/44
CPC分类号： G02B5/1866
摘要： A diffractive optical element for diffracting non-collimated light includes a base surface and a periodic structure formed on the base surface and having a plurality of diffractive surfaces and a plurality of boundary surfaces. The boundary surfaces are separated into plural zones, and in each zone, the boundary surface is placed substantially parallel to a main portion of a light beam impinging on that zone.
摘要翻译：用于衍射非准直光的衍射光学元件包括形成在基底表面上并具有多个衍射面和多个边界面的基底表面和周期性结构。边界表面被分成多个区域，并且在每个区域中，边界表面基本上平行于入射到该区域上的光束的主要部分。

7. 发明授权

US5485495A X-ray mask, and exposure apparatus and device production using the mask 失效
标题翻译： X射线掩模，以及使用掩模的曝光装置和装置制造
公开(公告)号：US5485495A
公开(公告)日：1996-01-16
申请号：US286904
申请日：1994-08-08
申请人： Takeshi Miyachi , Nobutoshi Mizusawa , Shinichi Hara , Hiroshi Maehara
发明人： Takeshi Miyachi , Nobutoshi Mizusawa , Shinichi Hara , Hiroshi Maehara
IPC分类号： G03F1/22 , G03F7/20 , G21K5/04 , H01L21/027 , G21K5/00
CPC分类号： G03F1/22 , G03F7/70783 , G21K5/04
摘要： A method of producing an X-ray mask includes a step of forming a mask pattern on a mask substrate having an amount of warp, and a step of bonding the mask substrate to a mask frame. In both steps, the mask substrate maintains a shape obtained due to the amount of warp. Since the mask substrate is fixed to the mask frame in a warped state, distortion is not produced in the mask pattern. As a result, an X-ray mask, which is suitable for very precise exposure, is provided.
摘要翻译：制造X射线掩模的方法包括在具有翘曲量的掩模基板上形成掩模图案的步骤，以及将掩模基板接合到掩模框架的步骤。在两个步骤中，掩模基板保持由于翘曲量而获得的形状。由于掩模基板以翘曲状态固定在荫罩框架上，所以在掩模图案中不产生畸变。因此，提供了适合于非常精确的曝光的X射线掩模。

8. 发明授权

US07608593B2 Resin composition with biodegradable non-liquid-crystalline and liquid-crystalline polymers 失效
标题翻译：具有可生物降解的非液晶和液晶聚合物的树脂组合物
公开(公告)号：US07608593B2
公开(公告)日：2009-10-27
申请号：US11251790
申请日：2005-10-18
申请人： Hiroshi Maehara
发明人： Hiroshi Maehara
IPC分类号： A61K31/70
CPC分类号： C08L1/284 , C08J11/14 , C08J11/16 , C08J2301/26 , C08J2301/28 , C08J2367/04 , C08L1/26 , C08L1/28 , C08L67/025 , C09K19/0422 , C09K19/3819 , Y02W30/704 , Y02W30/705 , C08L2666/02 , C08L2666/26
摘要： Processes for producing and recycling resin composition, which comprises a biodegradable polymer and a biodegradable liquid crystalline polymer, are provided. Also, a process for recycling waste paper is disclosed.
摘要翻译：提供了包含可生物降解的聚合物和可生物降解的液晶聚合物的生产和再循环树脂组合物的方法。另外，公开了一种回收废纸的方法。

9. 发明申请

US20070232742A1 LAYERED SILICATE COMPOUND AND RESIN COMPOSITION CONTAINING THE LAYERED SILICATE COMPOUND 审中-公开
标题翻译：层状硅酸盐化合物和含有层状硅酸盐化合物的树脂组合物
公开(公告)号：US20070232742A1
公开(公告)日：2007-10-04
申请号：US11676815
申请日：2007-02-20
申请人： HIROSHI MAEHARA
发明人： HIROSHI MAEHARA
IPC分类号： C08K9/04
CPC分类号： C08K9/04
摘要： Provided are a layered silicate compound capable of developing high flame retardancy in a small mixing amount, and a resin composition containing the layered silicate compound. The layered silicate compound is obtained by being organophilized with an organophilizing agent having a flame retardant skeleton.
摘要翻译：提供能够以小的混合量发挥高阻燃性的层状硅酸盐化合物和含有层状硅酸盐化合物的树脂组合物。层状硅酸盐化合物是通过具有阻燃性骨架的有机发泡剂被有机化的方法得到的。

10. 发明授权

US07072438B2 Reflection type mask 失效
标题翻译：反射型面具
公开(公告)号：US07072438B2
公开(公告)日：2006-07-04
申请号：US10736693
申请日：2003-12-17
申请人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
发明人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
IPC分类号： G21K3/00
CPC分类号： G03F1/62 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： A reflection type mask includes a substrate on which a multi-layered film for reflecting X-rays is provided, a mask pattern which is formed on the multi-layered film for absorbing the X-rays, and a cover for protecting the mask pattern. The cover is detachably attached to the substrate.
摘要翻译：反射型掩模包括其上设置有用于反射X射线的多层膜的基板，形成在用于吸收X射线的多层膜上的掩模图案，以及用于保护掩模图案的盖。盖可拆卸地附接到基板。

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