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1. 发明授权

US4904569A Method of forming pattern and projection aligner for carrying out the same 失效
标题翻译：形成图案和投影对准器的方法，用于执行它们
公开(公告)号：US4904569A
公开(公告)日：1990-02-27
申请号：US144065
申请日：1988-01-15
申请人： Hiroshi Fukuda , Norio Hasegawa , Toshihiko Tanaka , Toshiei Kurosaki , Saburo Nonogaki , Yoshio Taniguchi , Toshiharu Matsuzawa
发明人： Hiroshi Fukuda , Norio Hasegawa , Toshihiko Tanaka , Toshiei Kurosaki , Saburo Nonogaki , Yoshio Taniguchi , Toshiharu Matsuzawa
IPC分类号： G03F7/20
CPC分类号： G03F7/70575 , G03F7/2022 , G03F7/70241 , G03F7/70333 , G03F7/70858
摘要： An area on a photoresist film which is formed on a substrate surface having a topography, is exposed a plurality of times in such a manner that the image plane of a mask pattern is formed at a plurality of positions which are spaced apart from a reference plane in the substrate in the direction of an optical axis, and then the photoresist film is developed to form a resist pattern. According to the above method, the effective focal depth of the projection aligner used is enhanced, and moreover the reduction of the image contrast at the photoresist film is made very small by the plural exposure operations. Accordingly, a fine pattern can be formed accurately on the substrate surface having the topography.
摘要翻译：在具有形貌的基板表面上形成的光致抗蚀剂膜上的区域被曝光多次，使得掩模图案的像平面形成在与参考平面间隔开的多个位置在光轴方向上的基板中，然后使光致抗蚀剂膜显影以形成抗蚀剂图案。根据上述方法，增强了所使用的投影对准器的有效焦深，并且通过多次曝光操作使得光致抗蚀剂膜上的图像对比度的降低非常小。因此，可以在具有形貌的基板表面上精确地形成精细图案。

2. 发明授权

US5235400A Method of and apparatus for detecting defect on photomask 失效
标题翻译：检测光掩模缺陷的方法和装置
公开(公告)号：US5235400A
公开(公告)日：1993-08-10
申请号：US418525
申请日：1989-10-10
申请人： Tsuneo Terasawa , Norio Hasegawa , Toshihiko Tanaka , Hiroshi Fukuda , Toshiei Kurosaki
发明人： Tsuneo Terasawa , Norio Hasegawa , Toshihiko Tanaka , Hiroshi Fukuda , Toshiei Kurosaki
IPC分类号： G01N21/45 , G01N21/956 , G03F7/20
CPC分类号： G03F7/70866 , G01N21/956 , G01N21/45
摘要： A method of and an apparatus for detecting a defect on a phase-shifting mask for use in a projection aligner in which either or both of respective intensities of transmitted and reflected light beams from the mask illuminated with light are used for detecting a defect on the mask.
摘要翻译：一种用于检测用于投影对准器的相移掩模上的缺陷的方法和装置，其中使用由光照射的掩模的透射和反射光束的各个强度中的任一个或两个来检测面具。

3. 发明授权

US4992825A Method of forming pattern and projection aligner for carrying out the same 失效
标题翻译：形成图案和投影对准器的方法，用于执行它们
公开(公告)号：US4992825A
公开(公告)日：1991-02-12
申请号：US369150
申请日：1989-06-21
申请人： Hiroshi Fukuda , Norio Hasegawa , Toshihiko Tanaka , Toshiei Kurosaki
发明人： Hiroshi Fukuda , Norio Hasegawa , Toshihiko Tanaka , Toshiei Kurosaki
IPC分类号： G03F7/20
CPC分类号： G03F7/70575 , G03F7/2022 , G03F7/70241 , G03F7/70333 , G03F7/70858
摘要： An area on a photoresist film which is formed on a substrate surface having a topography, is exposed a plurality of times in such a manner that the image plane of a mask pattern is formed at a plurality of positions which are spaced apart from a reference plane in the substrate in the direction of an optical axis, and then the photoresist film is developed to form a resist pattern. According to the above method, the effective focal depth of the projection aligner used is enhanced, and moreover the reduction of the image contrast at the photoresist film is very small by the plural exposure operations. Accordingly, a fine pattern can be formed accurately on the substrate surface having the topography.

4. 再颁专利

USRE36731E Method of forming pattern and projection aligner for carrying out the same 失效
标题翻译：形成图案和投影对准器的方法，用于执行它们
公开(公告)号：USRE36731E
公开(公告)日：2000-06-13
申请号：US190580
申请日：1994-02-02
申请人： Hiroshi Fukuda , Norio Hasegawa , Toshihiko Tanaka , Toshiei Kurosaki
发明人： Hiroshi Fukuda , Norio Hasegawa , Toshihiko Tanaka , Toshiei Kurosaki
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70575 , G03F7/2022 , G03F7/70241 , G03F7/70333 , G03F7/70858
摘要： An area on a photoresist film which is formed on a substrate surface having a topography, is exposed a plurality of times in such a manner that the image plane of a mask pattern is formed at a plurality of positions which are spaced apart from a reference plane in the substrate in the direction of an optical axis, and then the photoresist film is developed to form a resist pattern. According to the above method, the effective focal depth of the projection aligner used is enhanced, and moreover the reduction of the image contrast at the photoresist film is very small by the plural exposure operations. Accordingly, a fine pattern can be formed accurately on the substrate surface having the topography.
摘要翻译：在具有形貌的基板表面上形成的光致抗蚀剂膜上的区域被曝光多次，使得掩模图案的像面形成在与参考平面间隔开的多个位置在光轴方向上的基板中，然后使光致抗蚀剂膜显影以形成抗蚀剂图案。根据上述方法，增强了所使用的投影对准器的有效焦深，并且通过多次曝光操作，光致抗蚀剂膜的图像对比度的降低非常小。因此，可以在具有形貌的基板表面上精确地形成精细图案。

5. 发明授权

US4869999A Method of forming pattern and projection aligner for carrying out the same 失效
标题翻译：形成图案和投影对准器的方法，用于执行它们
公开(公告)号：US4869999A
公开(公告)日：1989-09-26
申请号：US83211
申请日：1987-08-10
申请人： Hiroshi Fukuda , Norio Hasegawa , Toshihiko Tanaka , Toshiei Kurosaki
发明人： Hiroshi Fukuda , Norio Hasegawa , Toshihiko Tanaka , Toshiei Kurosaki
IPC分类号： G03F7/20
CPC分类号： G03F7/70575 , G03F7/2022 , G03F7/70241 , G03F7/70333 , G03F7/70858
摘要： An area on a photoresist film which is formed on a substrate surface having a topography, is exposed a plurality of times in such a manner that the image plane of a mask pattern is formed at a plurality of positions which are spaced apart from a reference plane in the substrate in the direction of an optical axis, and then the photoresist film is developed to form a resist pattern. According to the above method, the effective focal depth of the projection aligner used is enhanced, and moreover the reduction of the image contrast at the photoresist film is very small by the plural exposure operations. Accordingly, a fine pattern can be formed accurately on the substrate surface having the topography.
摘要翻译：在具有形貌的基板表面上形成的光致抗蚀剂膜上的区域被曝光多次，使得掩模图案的像面形成在与参考平面间隔开的多个位置在光轴方向上的基板中，然后使光致抗蚀剂膜显影以形成抗蚀剂图案。根据上述方法，增强了所使用的投影对准器的有效焦深，并且通过多次曝光操作，光致抗蚀剂膜的图像对比度的降低非常小。因此，可以在具有形貌的基板表面上精确地形成精细图案。

6. 发明授权

US07356177B2 Defect image classifying method and apparatus and a semiconductor device manufacturing process based on the method and apparatus 有权
标题翻译：基于该方法和装置的缺陷图像分类方法和装置以及半导体器件制造方法
公开(公告)号：US07356177B2
公开(公告)日：2008-04-08
申请号：US11506310
申请日：2006-08-17
申请人： Kenji Obara , Yuji Takagi , Ryo Nakagaki , Yasuhiko Ozawa , Toshiei Kurosaki , Seiji Isogai
发明人： Kenji Obara , Yuji Takagi , Ryo Nakagaki , Yasuhiko Ozawa , Toshiei Kurosaki , Seiji Isogai
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： According to the present invention, techniques including a method and apparatus for classifying and displaying images are provided. In an embodiment of the present invention a defect image classification method using inspected objects is provided. The method includes defect images obtained from at least one inspected object. Next a set of defect images is classified into a specified category, which has a feature. The defect images are arranged for display according to the feature and then displayed. The arranging of the defect images may also be based on an evaluation value for each defect image. Another embodiment provides a defect image classification method using inspected objects. Defect images are obtained from at least one inspected object. Next the defect images are classified into a plurality of categories and at least two information items for example, a defect distribution diagram showing locations of defects in the inspected object, information associated with a category of the plurality of categories, and a defect size distribution, are displayed.
摘要翻译：根据本发明，提供包括用于分类和显示图像的方法和装置的技术。在本发明的一个实施例中，提供了使用检查对象的缺陷图像分类方法。该方法包括从至少一个检查对象获得的缺陷图像。接下来，一组缺陷图像被分类为具有特征的指定类别。故障图像根据特征进行显示，然后显示。缺陷图像的布置也可以基于每个缺陷图像的评估值。另一实施例提供使用检查对象的缺陷图像分类方法。从至少一个检查对象获得缺陷图像。接下来，将缺陷图像分为多个类别和至少两个信息项，例如，示出被检查对象中的缺陷的位置的缺陷分布图，与多个类别的类别相关联的信息以及缺陷尺寸分布，被显示。

7. 发明申请

US20060274933A1 Defect image classifying method and apparatus and a semiconductor device manufacturing process based on the method and apparatus 有权
标题翻译：基于该方法和装置的缺陷图像分类方法和装置以及半导体器件制造方法
公开(公告)号：US20060274933A1
公开(公告)日：2006-12-07
申请号：US11506310
申请日：2006-08-17
申请人： Kenji Obara , Yuji Takagi , Ryo Nakagaki , Yasuhiro Ozawa , Toshiei Kurosaki , Seiji Isogai
发明人： Kenji Obara , Yuji Takagi , Ryo Nakagaki , Yasuhiro Ozawa , Toshiei Kurosaki , Seiji Isogai
IPC分类号： G06K9/00 , G06K9/62
CPC分类号： G06T7/001 , G06T2207/30148
摘要： According to the present invention, techniques including a method and apparatus for classifying and displaying images are provided. In an embodiment of the present invention a defect image classification method using inspected objects is provided. The method includes defect images obtained from at least one inspected object. Next a set of defect images is classified into a specified category, which has a feature. The defect images are arranged for display according to the feature and then displayed. The arranging of the defect images may also be based on an evaluation value for each defect image. Another embodiment provides a defect image classification method using inspected objects. Defect images are obtained from at least one inspected object. Next the defect images are classified into a plurality of categories and at least two information items for example, a defect distribution diagram showing locations of defects in the inspected object, information associated with a category of the plurality of categories, and a defect size distribution, are displayed.
摘要翻译：根据本发明，提供了包括用于分类和显示图像的方法和装置的技术。在本发明的一个实施例中，提供了使用检查对象的缺陷图像分类方法。该方法包括从至少一个检查对象获得的缺陷图像。接下来，一组缺陷图像被分类为具有特征的指定类别。故障图像根据特征进行显示，然后显示。缺陷图像的布置也可以基于每个缺陷图像的评估值。另一实施例提供使用检查对象的缺陷图像分类方法。从至少一个检查对象获得缺陷图像。接下来，将缺陷图像分为多个类别和至少两个信息项，例如，示出被检查对象中的缺陷的位置的缺陷分布图，与多个类别的类别相关联的信息以及缺陷尺寸分布，被显示。

8. 发明授权

US06476388B1 Scanning electron microscope having magnification switching control 有权
标题翻译：具有倍率切换控制的扫描电子显微镜
公开(公告)号：US06476388B1
公开(公告)日：2002-11-05
申请号：US09421093
申请日：1999-10-19
申请人： Ryo Nakagaki , Yuji Takagi , Atsushi Shimoda , Kenji Obara , Yasuhiko Ozawa , Hideka Bamba , Seiji Isogai , Kenji Watanabe , Chie Shishido , Toshiei Kurosaki
发明人： Ryo Nakagaki , Yuji Takagi , Atsushi Shimoda , Kenji Obara , Yasuhiko Ozawa , Hideka Bamba , Seiji Isogai , Kenji Watanabe , Chie Shishido , Toshiei Kurosaki
IPC分类号： G21K700
CPC分类号： G01N23/225 , H01J37/222 , H01J37/265 , H01J2237/24495 , H01J2237/2485 , H01J2237/2817
摘要： The invention is a scanning electron microscope including a switching control unit for controlling to switch at least scanning unit to switch a digital image signal of a low magnification based on a wide image taking field of view to and from a digital image signal of a high magnification based on a narrow image taking field of view from an A/D conversion unit and a beam spot diameter control unit for controlling to switch a spot diameter of electron beam on a surface of an object substrate in controlling to switch the signals by the switching control unit and a defect portion analyzing method using the scanning electron microscope.
摘要翻译：本发明是一种扫描电子显微镜，其特征在于，具备切换控制部，该切换控制部基于与高倍率的数字图像信号相对应的宽拍摄视场，至少切换扫描部，切换低倍率的数字图像信号基于来自A / D转换单元的窄图像拍摄视场和光束光斑直径控制单元，用于控制通过切换控制切换信号来控制在对象基板的表面上切换电子束的光斑直径单元和使用扫描电子显微镜的缺陷部分析方法。

9. 发明授权

US5078495A Monochromator 失效
标题翻译：单色器
公开(公告)号：US5078495A
公开(公告)日：1992-01-07
申请号：US478568
申请日：1990-02-12
申请人： Tatsuo Harada , Toshiei Kurosaki , Tsuneo Terasawa , Toshiaki Kita
发明人： Tatsuo Harada , Toshiei Kurosaki , Tsuneo Terasawa , Toshiaki Kita
IPC分类号： G01J3/18 , G02B5/18
CPC分类号： G01J3/1804 , G01J2003/1847
摘要： A plane grating, particularly for a monochronomator, is provided with varied-spaced straight and parallel grooves in a light beam path to compensate for other light affecting components, for example a spherical mirror used for collimating or focusing the light beam. The angle of incidence with respect to the light for each of the grooves may vary and the angle of diffraction with respect to the light for each groove may be required to vary with the imperfection of collimation and focusing of the beam. The grooves are varied in their spacing to compensate for the variation of both incidence and diffraction direction.
摘要翻译：特别是用于单声道同步器的平面光栅在光束路径中设置有不同间隔的直的和平行的凹槽，以补偿其它影响光的部件，例如用于准直或聚焦光束的球面镜。相对于每个凹槽的光的入射角可以变化，并且可能需要相对于每个凹槽的光的衍射角度随着光束的准直和聚焦的不完善而变化。凹槽的间距是变化的，以补偿入射和衍射方向的变化。

10. 发明授权

US4597669A Pattern detector 失效
标题翻译：图案检测器
公开(公告)号：US4597669A
公开(公告)日：1986-07-01
申请号：US539760
申请日：1983-10-07
申请人： Tsuneo Terasawa , Shinji Kuniyoshi , Akihiro Takanashi , Toshiei Kurosaki , Yoshio Kawamura , Sumio Hosaka
发明人： Tsuneo Terasawa , Shinji Kuniyoshi , Akihiro Takanashi , Toshiei Kurosaki , Yoshio Kawamura , Sumio Hosaka
IPC分类号： G01B11/00 , G03F9/00 , G05D3/12 , H01L21/027 , H01L21/30 , G01N21/86
CPC分类号： G03F9/70 , H01L21/30
摘要： A pattern detector according to the present invention adopts a processing method wherein means is provided anew with which the intensity distribution of light reflected from or transmitted through an illuminated specimen is photoelectrically converted, and a pattern position is detected at high speed from the ratio between the primary moment and integral value of a detection signal thus derived, whereupon a symmetry calculation is executed within a narrow range around the detected value, whereby the pattern position is found fast and precisely.
摘要翻译：根据本发明的图案检测器采用一种处理方法，其中重新提供装置，其中从被照射的样品反射或透射的光的光强分布被光电转换，并且以高速的比例检测图案位置这样得到的检测信号的初始矩和积分值，由此在检测值附近的窄范围内执行对称计算，从而快速且精确地找到图案位置。

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