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1. 发明授权

US08629395B2 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US08629395B2
公开(公告)日：2014-01-14
申请号：US13521273
申请日：2011-01-12
申请人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
发明人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
IPC分类号： H01J37/28 , H01J37/244 , G01N23/22
CPC分类号： H01J49/067 , H01J37/244 , H01J2237/2441 , H01J2237/24465 , H01J2237/2448 , H01J2237/28
摘要： In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector (40) is provided with a first small detector (51) having a first detection sensitivity and a second small detector (52) having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam (4) is to be radiated, to be the same for the first small detector (51) and the second small detector (52).
摘要翻译：为了提供一种带电粒子束装置，其能够将鉴别中的带电粒子束信号检测为多个能带，并且使用该信号获得每个能带的高分辨率图像，带电粒子束装置具有带电粒子来源（12-1）; 限制带电粒子束（4）的直径的孔（16）; 用于带电粒子束的光学器件（14,17,19）样品架（21）; 检测来自试样的二次带电粒子和反射带电粒子的带电粒子检测器（40）以及处理来自带电粒子检测器的输出信号的信号计算单元。带电粒子检测器（40）具有第一检测灵敏度的第一小检测器（51）和具有第二检测灵敏度的第二小检测器（52），并从检体上的位置观察检测立体角，对于第一小型检测器（51）和第二小型检测器（52），带电粒子束（4）将被照射到其上。

2. 发明申请

US20120298864A1 Charged Particle Beam Apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US20120298864A1
公开(公告)日：2012-11-29
申请号：US13521273
申请日：2011-01-12
申请人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
发明人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
IPC分类号： H01J37/26
CPC分类号： H01J49/067 , H01J37/244 , H01J2237/2441 , H01J2237/24465 , H01J2237/2448 , H01J2237/28
摘要： In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector (40) is provided with a first small detector (51) having a first detection sensitivity and a second small detector (52) having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam (4) is to be radiated, to be the same for the first small detector (51) and the second small detector (52).
摘要翻译：为了提供一种带电粒子束装置，其能够将鉴别中的带电粒子束信号检测为多个能带，并且使用该信号获得每个能带的高分辨率图像，带电粒子束装置具有带电粒子来源（12-1）; 限制带电粒子束（4）的直径的孔（16）; 用于带电粒子束的光学器件（14,17,19）样品架（21）; 检测来自试样的二次带电粒子和反射带电粒子的带电粒子检测器（40）以及处理来自带电粒子检测器的输出信号的信号计算单元。带电粒子检测器（40）具有第一检测灵敏度的第一小检测器（51）和具有第二检测灵敏度的第二小检测器（52），并从检体上的位置观察检测立体角，对于第一小型检测器（51）和第二小型检测器（52），带电粒子束（4）将被照射到其上。

3. 发明授权

US09202667B2 Charged particle radiation device with bandpass detection 有权
标题翻译：带通滤波器的带电粒子辐射装置
公开(公告)号：US09202667B2
公开(公告)日：2015-12-01
申请号：US13521092
申请日：2010-08-11
申请人： Michio Hatano , Tetsuya Sawahata , Yasuko Watanabe , Mitsugu Sato , Sukehiro Ito , Takashi Ohshima , Hiroyuki Honda
发明人： Michio Hatano , Tetsuya Sawahata , Yasuko Watanabe , Mitsugu Sato , Sukehiro Ito , Takashi Ohshima , Hiroyuki Honda
IPC分类号： H01J37/28 , H01J37/244
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2448
摘要： Disclosed is a charged particle radiation device having a charged particle source which generates a charged particle as a probe, a charged particle optical system, a sample stage, a vacuum discharge system, an aperture which restricts a probe, a conductive film, and a charged particle detector, wherein the conductive film is provided at a position excluding the optical axis of the optical system between the sample stage and the aperture; and the distance between the sensing surface of the surface of the charged particle detector and the sample stage is larger than the distance between the sample stage and the conductive film, so that the surface of the conductive film and the sensing surface of the detector are inclined.
摘要翻译：公开了一种具有带电粒子源的带电粒子辐射装置，其产生作为探针的带电粒子，带电粒子光学系统，样品台，真空放电系统，限制探针的孔，导电膜和带电粒子粒子检测器，其中所述导电膜设置在除了所述样品台和所述孔之间的所述光学系统的光轴之外的位置处; 并且带电粒子检测器的表面的感测表面与样品台之间的距离大于样品台和导电膜之间的距离，使得导电膜的表面和检测器的感测表面倾斜。

4. 发明申请

US20130043388A1 CHARGED PARTICLE RADIATION DEVICE 有权
标题翻译：充电颗粒辐射装置
公开(公告)号：US20130043388A1
公开(公告)日：2013-02-21
申请号：US13521092
申请日：2010-08-11
申请人： Michio Hatano , Tetsuya Sawahata , Yasuko Watanabe , Mitsugu Sato , Sukehiro Ito , Takashi Ohshima , Hiroyuki Honda
发明人： Michio Hatano , Tetsuya Sawahata , Yasuko Watanabe , Mitsugu Sato , Sukehiro Ito , Takashi Ohshima , Hiroyuki Honda
IPC分类号： H01J37/26
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2448
摘要： Disclosed is a charged particle radiation device having a charged particle source which generates a charged particle as a probe, a charged particle optical system, a sample stage, a vacuum discharge system, an aperture which restricts a probe, a conductive film, and a charged particle detector, wherein the conductive film is provided at a position excluding the optical axis of the optical system between the sample stage and the aperture; and the distance between the sensing surface of the surface of the charged particle detector and the sample stage is larger than the distance between the sample stage and the conductive film, so that the surface of the conductive film and the sensing surface of the detector are inclined.
摘要翻译：公开了一种具有带电粒子源的带电粒子辐射装置，其产生作为探针的带电粒子，带电粒子光学系统，样品台，真空放电系统，限制探针的孔，导电膜和带电粒子粒子检测器，其中所述导电膜设置在除了所述样品台和所述孔之间的所述光学系统的光轴之外的位置处; 并且带电粒子检测器的表面的感测表面与样品台之间的距离大于样品台和导电膜之间的距离，使得导电膜的表面和检测器的感测表面倾斜。

5. 发明申请

US20090101817A1 CHARGED PARTICLE APPLICATION APPARATUS 审中-公开
标题翻译：充电颗粒应用设备
公开(公告)号：US20090101817A1
公开(公告)日：2009-04-23
申请号：US12252862
申请日：2008-10-16
申请人： Takashi OHSHIMA , Michio Hatano , Hideyuki Nagaishi , Mitsugu Sato , Muneyuki Fukuda
发明人： Takashi OHSHIMA , Michio Hatano , Hideyuki Nagaishi , Mitsugu Sato , Muneyuki Fukuda
IPC分类号： G01N23/00
CPC分类号： H01J37/244 , H01J37/28 , H01J37/3056 , H01J2237/2441 , H01J2237/2443 , H01J2237/2444 , H01J2237/2445 , H01J2237/2482
摘要： The present invention provides a highly sensitive, thin detector useful for observing low-voltage, high-resolution SEM images, and provides a charged particle beam application apparatus based on such a detector. The charged particle beam application apparatus includes a charged particle irradiation source, a charged particle optics for irradiating a sample with a charged particle beam emitted from the charged particle irradiation source, and an electron detection section for detecting electrons that are secondarily generated from the sample. The electron detection section includes a diode device that is a combination of a phosphor layer, which converts the electrons to an optical signal, and a device for converting the optical signal to electrons and subjecting the electrons to avalanche multiplication, or includes a diode device having an electron absorption region that is composed of at least a wide-gap semiconductor substrate with a bandgap greater than 2 eV.
摘要翻译：本发明提供了一种用于观察低电压，高分辨率SEM图像的高灵敏度，薄的检测器，并提供了基于这种检测器的带电粒子束施加装置。带电粒子束施加装置包括带电粒子照射源，用于从带电粒子照射源发射的带电粒子束照射样品的带电粒子光学器件和用于检测从样品二次产生的电子的电子检测部分。电子检测部分包括二极管器件，其是将电子转换成光信号的荧光体层的组合，以及用于将光信号转换为电子并使电子进行雪崩倍增的器件，或包括具有至少由带隙大于2eV的宽间隙半导体衬底构成的电子吸收区域。

6. 发明申请

US20080237465A1 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US20080237465A1
公开(公告)日：2008-10-02
申请号：US12073948
申请日：2008-03-12
申请人： Michio Hatano , Takashi Ohshima , Mitsugu Sato
发明人： Michio Hatano , Takashi Ohshima , Mitsugu Sato
IPC分类号： G01N23/02
CPC分类号： G01N23/225 , H01J37/244 , H01J2237/2446 , H01J2237/24485 , H01J2237/28
摘要： A scanning electron microscope can discriminate secondary particles in a desired energy region by band-pass and detect the secondary particles with a high yield point. Even when a lens 23 is disposed on an electron source side of an objective lens 18, and a primary electron beam forms any optical system on the electron gun side of the lens, the lens operates the primary electron beam to be converged to a convergent point 24 that is a specific position. A detection ExB 16 that supplies a field that affects the locus of the secondary particles that are generated from a specimen 2 is disposed at the convergent point 24 of the primary electron beam so as to lead only the secondary particles in a specific energy range to a detection unit 13. Because a position to which the field that affects the locus of the secondary particles is supplied is the convergent point of the primary electron beam 19, it is possible to lead only the secondary particles of the desired energy to the detection unit without enlarging the aberration of the primary electron beam 19 and also to effectively conduct the band-pass discrimination of the energy. As a result, the signal electrons according to an observation object can be discriminated and detected.
摘要翻译：扫描电子显微镜可以通过带通来区分所需能量区域中的二次粒子，并以高屈服点检测二次粒子。即使当透镜23设置在物镜18的电子源侧，并且一次电子束在透镜的电子枪侧形成任何光学系统时，该透镜操作一次电子束以收敛到会聚点 24这是一个具体的位置。提供影响从样本2产生的二次粒子的轨迹的场的检测ExB 16设置在一次电子束的会聚点24处，以便仅将二次粒子在特定能量范围内引导到检测单元13。由于施加影响次级粒子的轨迹的场的位置是一次电子束19的会聚点，所以只能将所需能量的二次粒子引导到检测单元，而不会增大像差一次电子束19并且还有效地进行能量的带通辨别。结果，可以区分和检测根据观察对象的信号电子。

7. 发明授权

US08217363B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US08217363B2
公开(公告)日：2012-07-10
申请号：US12073948
申请日：2008-03-12
申请人： Michio Hatano , Takashi Ohshima , Mitsugu Sato
发明人： Michio Hatano , Takashi Ohshima , Mitsugu Sato
IPC分类号： H01J1/50
CPC分类号： G01N23/225 , H01J37/244 , H01J2237/2446 , H01J2237/24485 , H01J2237/28
摘要： A scanning electron microscope can discriminate secondary particles in a desired energy region by band-pass and detect the secondary particles with a high yield point. Even when a lens 23 is disposed on an electron source side of an objective lens 18, and a primary electron beam forms any optical system on the electron gun side of the lens, the lens operates the primary electron beam to be converged to a convergent point 24 that is a specific position. A detection ExB 16 that supplies a field that affects the locus of the secondary particles that are generated from a specimen 2 is disposed at the convergent point 24 of the primary electron beam so as to lead only the secondary particles in a specific energy range to a detection unit 13. Because a position to which the field that affects the locus of the secondary particles is supplied is the convergent point of the primary electron beam 19, it is possible to lead only the secondary particles of the desired energy to the detection unit without enlarging the aberration of the primary electron beam 19 and also to effectively conduct the band-pass discrimination of the energy. As a result, the signal electrons according to an observation object can be discriminated and detected.
摘要翻译：扫描电子显微镜可以通过带通来区分所需能量区域中的二次粒子，并以高屈服点检测二次粒子。即使当透镜23设置在物镜18的电子源侧，并且一次电子束在透镜的电子枪侧形成任何光学系统时，该透镜操作一次电子束以收敛到会聚点 24这是一个具体的位置。提供影响从样本2产生的二次粒子的轨迹的场的检测ExB 16设置在一次电子束的会聚点24处，以便仅将二次粒子在特定能量范围内引导到因为提供影响二次粒子的轨迹的场的位置是一次电子束19的会聚点，所以只能将具有所需能量的二次粒子仅引导到检测单元而没有扩大一次电子束19的像差，并且有效地进行能量的通带鉴别。结果，可以区分和检测根据观察对象的信号电子。

8. 发明申请

US20070284542A1 Charged particle beam apparatus and method for charged particle beam adjustment 有权
标题翻译：带电粒子束装置和带电粒子束调整方法
公开(公告)号：US20070284542A1
公开(公告)日：2007-12-13
申请号：US11715506
申请日：2007-03-08
申请人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
发明人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
IPC分类号： G01N21/00
CPC分类号： G01N23/22 , H01J37/1471 , H01J37/28 , H01J2237/1501
摘要： A charged particle beam apparatus facilitating adjusting the beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of the charged particle beam is moved due to state variation of the apparatus. When the beam center axis of a primary charged particle beam is adjusted with a deflector (aligner), a processing step (1) for measuring the sensitivity of the aligner and a processing step (2) for detecting the deviation between the center of the primary charged particle beam and the center of the objective aperture are provided. The charged particle beam apparatus has means for determining the aligner set values, using the aligner sensitivity measured in the processing step (1) and the amount of deviation detected in the processing step (2), such that the primary charged particle beam passes through the center of the objective aperture and controlling the aligner using the aligner set values.
摘要翻译：在光学条件被修改的情况下或者由于装置的状态变化使带电粒子束的束中心轴移动的情况下，有利于调整带电粒子束的束中心轴的带电粒子束装置。当用偏转器（对准器）调整初级带电粒子束的束中心轴时，用于测量对准器的灵敏度的处理步骤（1）和用于检测初级带电粒子的中心之间的偏差的处理步骤（2）提供带电粒子束和物镜孔的中心。带电粒子束装置具有使用在处理步骤（1）中测量的对准器灵敏度和在处理步骤（2）中检测到的偏差量来确定对准器设定值的装置，使得初级带电粒子束通过物镜光圈中心，并使用对准器设定值控制对准器。

9. 发明授权

US06740877B2 Scanning electron microscope and sample observation method using the same 有权
公开(公告)号：US06740877B2
公开(公告)日：2004-05-25
申请号：US10406455
申请日：2003-04-04
申请人： Tetsuya Sawahata , Mitsugu Sato
发明人： Tetsuya Sawahata , Mitsugu Sato
IPC分类号： G01N2300
CPC分类号： H01J37/256 , G01N23/2252 , H01J37/141 , H01J2237/2561
摘要： According to the present invention, there are newly provided in a scanning electron microscope with an in-lens system a first low-magnification mode that sets the current of the object lens to be zero or in a weak excitation state, and a second low-magnification mode that sets the current of the object lens to be a value that changes in proportion to the square root of the accelerating voltage. The scanning electron microscope has a configuration wherein normal sample image (secondary electron image) observation is performed in the first low-magnification mode, and it switches the first low-magnification mode to the second low-magnification mode when X-ray analysis is performed. As a result, both sample image (secondary electron image) observation and X-ray analysis can be performed in low-magnification mode.

10. 发明授权

US06501077B1 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US06501077B1
公开(公告)日：2002-12-31
申请号：US09462769
申请日：2000-01-13
申请人： Tetsuya Sawahata , Mitsugu Sato , Yoichi Ose
发明人： Tetsuya Sawahata , Mitsugu Sato , Yoichi Ose
IPC分类号： H01J37141
CPC分类号： H01J37/244 , H01J37/28
摘要： A scanning electron microscope which obtains a two-dimensional scan image of a sample includes an electron source and a scan deflector for scanning a primary electron ray generated from said electron source onto the sample. An objective lens forms a focusing magnetic field onto the sample, such as to surround the sample, the focusing magnetic field focusing the primary electron ray. A secondary signal detector for deflecting and detecting a secondary signal generated from the sample by irradiation of the primary electron ray obtains secondary electrons from a secondary electron conversion electrode for generating secondary electrons by collision of electrons, which is disposed between the objective lens and the detector at a location that is closer to the electron source than the objective lens is and at a location that is closer to the sample than the secondary signal detector is.
摘要翻译：获得样品的二维扫描图像的扫描电子显微镜包括用于将从所述电子源产生的一次电子束扫描到样品上的电子源和扫描偏转器。物镜在样品上形成聚焦磁场，例如围绕样品，聚焦磁场聚焦初级电子。用于偏转和检测从样品通过一次电子射线照射产生的二次信号的二次信号检测器从二次电子转换电极获得二次电子，用于通过电子碰撞产生二次电子，该电子被设置在物镜和检测器之间在比物镜更靠近电子源的位置处，并且位于比次级信号检测器更靠近样品的位置处。

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