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1. 发明申请

US20120298864A1 Charged Particle Beam Apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US20120298864A1
公开(公告)日：2012-11-29
申请号：US13521273
申请日：2011-01-12
申请人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
发明人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
IPC分类号： H01J37/26
CPC分类号： H01J49/067 , H01J37/244 , H01J2237/2441 , H01J2237/24465 , H01J2237/2448 , H01J2237/28
摘要： In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector (40) is provided with a first small detector (51) having a first detection sensitivity and a second small detector (52) having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam (4) is to be radiated, to be the same for the first small detector (51) and the second small detector (52).
摘要翻译：为了提供一种带电粒子束装置，其能够将鉴别中的带电粒子束信号检测为多个能带，并且使用该信号获得每个能带的高分辨率图像，带电粒子束装置具有带电粒子来源（12-1）; 限制带电粒子束（4）的直径的孔（16）; 用于带电粒子束的光学器件（14,17,19）样品架（21）; 检测来自试样的二次带电粒子和反射带电粒子的带电粒子检测器（40）以及处理来自带电粒子检测器的输出信号的信号计算单元。带电粒子检测器（40）具有第一检测灵敏度的第一小检测器（51）和具有第二检测灵敏度的第二小检测器（52），并从检体上的位置观察检测立体角，对于第一小型检测器（51）和第二小型检测器（52），带电粒子束（4）将被照射到其上。

2. 发明授权

US08217363B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US08217363B2
公开(公告)日：2012-07-10
申请号：US12073948
申请日：2008-03-12
申请人： Michio Hatano , Takashi Ohshima , Mitsugu Sato
发明人： Michio Hatano , Takashi Ohshima , Mitsugu Sato
IPC分类号： H01J1/50
CPC分类号： G01N23/225 , H01J37/244 , H01J2237/2446 , H01J2237/24485 , H01J2237/28
摘要： A scanning electron microscope can discriminate secondary particles in a desired energy region by band-pass and detect the secondary particles with a high yield point. Even when a lens 23 is disposed on an electron source side of an objective lens 18, and a primary electron beam forms any optical system on the electron gun side of the lens, the lens operates the primary electron beam to be converged to a convergent point 24 that is a specific position. A detection ExB 16 that supplies a field that affects the locus of the secondary particles that are generated from a specimen 2 is disposed at the convergent point 24 of the primary electron beam so as to lead only the secondary particles in a specific energy range to a detection unit 13. Because a position to which the field that affects the locus of the secondary particles is supplied is the convergent point of the primary electron beam 19, it is possible to lead only the secondary particles of the desired energy to the detection unit without enlarging the aberration of the primary electron beam 19 and also to effectively conduct the band-pass discrimination of the energy. As a result, the signal electrons according to an observation object can be discriminated and detected.
摘要翻译：扫描电子显微镜可以通过带通来区分所需能量区域中的二次粒子，并以高屈服点检测二次粒子。即使当透镜23设置在物镜18的电子源侧，并且一次电子束在透镜的电子枪侧形成任何光学系统时，该透镜操作一次电子束以收敛到会聚点 24这是一个具体的位置。提供影响从样本2产生的二次粒子的轨迹的场的检测ExB 16设置在一次电子束的会聚点24处，以便仅将二次粒子在特定能量范围内引导到因为提供影响二次粒子的轨迹的场的位置是一次电子束19的会聚点，所以只能将具有所需能量的二次粒子仅引导到检测单元而没有扩大一次电子束19的像差，并且有效地进行能量的通带鉴别。结果，可以区分和检测根据观察对象的信号电子。

3. 发明申请

US20130043388A1 CHARGED PARTICLE RADIATION DEVICE 有权
标题翻译：充电颗粒辐射装置
公开(公告)号：US20130043388A1
公开(公告)日：2013-02-21
申请号：US13521092
申请日：2010-08-11
申请人： Michio Hatano , Tetsuya Sawahata , Yasuko Watanabe , Mitsugu Sato , Sukehiro Ito , Takashi Ohshima , Hiroyuki Honda
发明人： Michio Hatano , Tetsuya Sawahata , Yasuko Watanabe , Mitsugu Sato , Sukehiro Ito , Takashi Ohshima , Hiroyuki Honda
IPC分类号： H01J37/26
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2448
摘要： Disclosed is a charged particle radiation device having a charged particle source which generates a charged particle as a probe, a charged particle optical system, a sample stage, a vacuum discharge system, an aperture which restricts a probe, a conductive film, and a charged particle detector, wherein the conductive film is provided at a position excluding the optical axis of the optical system between the sample stage and the aperture; and the distance between the sensing surface of the surface of the charged particle detector and the sample stage is larger than the distance between the sample stage and the conductive film, so that the surface of the conductive film and the sensing surface of the detector are inclined.
摘要翻译：公开了一种具有带电粒子源的带电粒子辐射装置，其产生作为探针的带电粒子，带电粒子光学系统，样品台，真空放电系统，限制探针的孔，导电膜和带电粒子粒子检测器，其中所述导电膜设置在除了所述样品台和所述孔之间的所述光学系统的光轴之外的位置处; 并且带电粒子检测器的表面的感测表面与样品台之间的距离大于样品台和导电膜之间的距离，使得导电膜的表面和检测器的感测表面倾斜。

4. 发明授权

US08629395B2 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US08629395B2
公开(公告)日：2014-01-14
申请号：US13521273
申请日：2011-01-12
申请人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
发明人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
IPC分类号： H01J37/28 , H01J37/244 , G01N23/22
CPC分类号： H01J49/067 , H01J37/244 , H01J2237/2441 , H01J2237/24465 , H01J2237/2448 , H01J2237/28
摘要： In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector (40) is provided with a first small detector (51) having a first detection sensitivity and a second small detector (52) having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam (4) is to be radiated, to be the same for the first small detector (51) and the second small detector (52).
摘要翻译：为了提供一种带电粒子束装置，其能够将鉴别中的带电粒子束信号检测为多个能带，并且使用该信号获得每个能带的高分辨率图像，带电粒子束装置具有带电粒子来源（12-1）; 限制带电粒子束（4）的直径的孔（16）; 用于带电粒子束的光学器件（14,17,19）样品架（21）; 检测来自试样的二次带电粒子和反射带电粒子的带电粒子检测器（40）以及处理来自带电粒子检测器的输出信号的信号计算单元。带电粒子检测器（40）具有第一检测灵敏度的第一小检测器（51）和具有第二检测灵敏度的第二小检测器（52），并从检体上的位置观察检测立体角，对于第一小型检测器（51）和第二小型检测器（52），带电粒子束（4）将被照射到其上。

5. 发明申请

US20080237465A1 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US20080237465A1
公开(公告)日：2008-10-02
申请号：US12073948
申请日：2008-03-12
申请人： Michio Hatano , Takashi Ohshima , Mitsugu Sato
发明人： Michio Hatano , Takashi Ohshima , Mitsugu Sato
IPC分类号： G01N23/02
CPC分类号： G01N23/225 , H01J37/244 , H01J2237/2446 , H01J2237/24485 , H01J2237/28
摘要： A scanning electron microscope can discriminate secondary particles in a desired energy region by band-pass and detect the secondary particles with a high yield point. Even when a lens 23 is disposed on an electron source side of an objective lens 18, and a primary electron beam forms any optical system on the electron gun side of the lens, the lens operates the primary electron beam to be converged to a convergent point 24 that is a specific position. A detection ExB 16 that supplies a field that affects the locus of the secondary particles that are generated from a specimen 2 is disposed at the convergent point 24 of the primary electron beam so as to lead only the secondary particles in a specific energy range to a detection unit 13. Because a position to which the field that affects the locus of the secondary particles is supplied is the convergent point of the primary electron beam 19, it is possible to lead only the secondary particles of the desired energy to the detection unit without enlarging the aberration of the primary electron beam 19 and also to effectively conduct the band-pass discrimination of the energy. As a result, the signal electrons according to an observation object can be discriminated and detected.
摘要翻译：扫描电子显微镜可以通过带通来区分所需能量区域中的二次粒子，并以高屈服点检测二次粒子。即使当透镜23设置在物镜18的电子源侧，并且一次电子束在透镜的电子枪侧形成任何光学系统时，该透镜操作一次电子束以收敛到会聚点 24这是一个具体的位置。提供影响从样本2产生的二次粒子的轨迹的场的检测ExB 16设置在一次电子束的会聚点24处，以便仅将二次粒子在特定能量范围内引导到检测单元13。由于施加影响次级粒子的轨迹的场的位置是一次电子束19的会聚点，所以只能将所需能量的二次粒子引导到检测单元，而不会增大像差一次电子束19并且还有效地进行能量的带通辨别。结果，可以区分和检测根据观察对象的信号电子。

6. 发明授权

US09202667B2 Charged particle radiation device with bandpass detection 有权
标题翻译：带通滤波器的带电粒子辐射装置
公开(公告)号：US09202667B2
公开(公告)日：2015-12-01
申请号：US13521092
申请日：2010-08-11
申请人： Michio Hatano , Tetsuya Sawahata , Yasuko Watanabe , Mitsugu Sato , Sukehiro Ito , Takashi Ohshima , Hiroyuki Honda
发明人： Michio Hatano , Tetsuya Sawahata , Yasuko Watanabe , Mitsugu Sato , Sukehiro Ito , Takashi Ohshima , Hiroyuki Honda
IPC分类号： H01J37/28 , H01J37/244
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2448
摘要： Disclosed is a charged particle radiation device having a charged particle source which generates a charged particle as a probe, a charged particle optical system, a sample stage, a vacuum discharge system, an aperture which restricts a probe, a conductive film, and a charged particle detector, wherein the conductive film is provided at a position excluding the optical axis of the optical system between the sample stage and the aperture; and the distance between the sensing surface of the surface of the charged particle detector and the sample stage is larger than the distance between the sample stage and the conductive film, so that the surface of the conductive film and the sensing surface of the detector are inclined.
摘要翻译：公开了一种具有带电粒子源的带电粒子辐射装置，其产生作为探针的带电粒子，带电粒子光学系统，样品台，真空放电系统，限制探针的孔，导电膜和带电粒子粒子检测器，其中所述导电膜设置在除了所述样品台和所述孔之间的所述光学系统的光轴之外的位置处; 并且带电粒子检测器的表面的感测表面与样品台之间的距离大于样品台和导电膜之间的距离，使得导电膜的表面和检测器的感测表面倾斜。

7. 发明授权

US09208994B2 Electron beam apparatus for visualizing a displacement of an electric field 有权
标题翻译：用于可视化电场位移的电子束装置
公开(公告)号：US09208994B2
公开(公告)日：2015-12-08
申请号：US13817086
申请日：2011-07-07
申请人： Takashi Ohshima , Michio Hatano , Hideo Morishita
发明人： Takashi Ohshima , Michio Hatano , Hideo Morishita
IPC分类号： G01N23/00 , H01J37/26 , H01J37/28
CPC分类号： H01J37/261 , H01J37/265 , H01J37/28 , H01J2237/153 , H01J2237/202 , H01J2237/20207 , H01J2237/20221
摘要： The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate (6), and an optical system (2, 3) for converging a secondary electron beam (9) on the reflective plate (6), and the axial displacement adjusting means includes an incline rotation mechanism (8) for a sample stage (5). With this configuration, in electron beam apparatuses such as SEM and the like, such problems as visual field displacement caused by displacement of the axial symmetry of the electric field between an objective lens (3) and a sample (4) and inability to measure secondary electrons and reflected electrons that provide desired information can be eliminated.
摘要翻译：本发明提供了一种电子束装置，包括用于使延迟电场的轴向位移可视化的装置和用于调节轴向位移的装置。轴向位移可视化装置包括反射板（6）和用于会聚反射板（6）上的二次电子束（9）的光学系统（2,3），并且轴向位移调节装置包括倾斜旋转机构（8）用于样品台（5）。利用这种结构，在诸如SEM等的电子束装置中，存在由物镜（3）和样品（4）之间的电场的轴对称位移引起的视野位移的问题，并且不能测量次级可以消除提供所需信息的电子和反射电子。

8. 发明授权

US09029766B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US09029766B2
公开(公告)日：2015-05-12
申请号：US14241121
申请日：2012-05-28
申请人： Hideo Morishita , Takashi Ohshima , Michio Hatano , Sukehiro Ito
发明人： Hideo Morishita , Takashi Ohshima , Michio Hatano , Sukehiro Ito
IPC分类号： H01J37/244 , H01J37/28 , H01J37/04
CPC分类号： H01J37/28 , H01J37/04 , H01J37/244 , H01J2237/2443 , H01J2237/2444 , H01J2237/24475 , H01J2237/2448 , H01J2237/2804 , H01J2237/2806
摘要： To provide a low acceleration scanning electron microscope that can discriminate and detect reflected electrons and secondary electrons even with a low probe current, this scanning electron microscope is provided with an electron gun (29), an aperture (26), a sample table (3), an electron optical system (4-1) for making an electron beam (31) converge on a sample (2), a deflection means (10), a secondary electron detector (8), a reflected electron detector (9), and a cylindrical electron transport means (5) in a position between the electron gun (29) and sample (2). The reflected electron detector (9) is provided within the electron transport means (5) and on a side further away from the electron gun (29) than the secondary electron detector (8) and the deflection means (10). The reception surface (9-1) of the reflected electron detector (9) is electrically wired so as to have the same potential as the electron transport means (5).
摘要翻译：为了提供即使在低探针电流下能够区分和检测反射电子和二次电子的低加速度扫描电子显微镜，该扫描电子显微镜设置有电子枪（29），孔（26），样品台（3 ），用于使电子束（31）会聚在样品（2）上的电子光学系统（4-1），偏转装置（10），二次电子检测器（8），反射电子检测器（9）以及在电子枪（29）和样品（2）之间的位置的圆柱形电子传输装置（5）。反射电子检测器（9）设置在电子传输装置（5）内并且比二次电子检测器（8）和偏转装置（10）更远离电子枪（29）的一侧。反射电子检测器（9）的接收表面（9-1）被电连接以具有与电子传输装置（5）相同的电位。

9. 发明申请

US20130146766A1 Electron Beam Apparatus 有权
标题翻译：电子束装置
公开(公告)号：US20130146766A1
公开(公告)日：2013-06-13
申请号：US13817086
申请日：2011-07-07
申请人： Takashi Ohshima , Michio Hatano , Hideo Morishita
发明人： Takashi Ohshima , Michio Hatano , Hideo Morishita
IPC分类号： H01J37/26
CPC分类号： H01J37/261 , H01J37/265 , H01J37/28 , H01J2237/153 , H01J2237/202 , H01J2237/20207 , H01J2237/20221
摘要： The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate (6), and an optical system (2,3) for converging a secondary electron beam (9) on the reflective plate (6), and the axial displacement adjusting means includes an incline rotation mechanism (8) for a sample stage (5). With this configuration, in electron beam apparatuses such as SEM and the like, such problems as visual field displacement caused by displacement of the axial symmetry of the electric field between an objective lens (3) and a sample (4) and inability to measure secondary electrons and reflected electrons that provide desired information can be eliminated.
摘要翻译：本发明提供了一种电子束装置，包括用于使延迟电场的轴向位移可视化的装置和用于调节轴向位移的装置。轴向位移可视化装置包括反射板（6）和用于会聚反射板（6）上的二次电子束（9）的光学系统（2,3），并且轴向位移调节装置包括倾斜旋转机构（8）用于样品台（5）。利用这种结构，在诸如SEM等的电子束装置中，存在由物镜（3）和样品（4）之间的电场的轴对称位移引起的视野位移的问题，并且不能测量次级可以消除提供所需信息的电子和反射电子。

10. 发明申请

US20060076489A1 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US20060076489A1
公开(公告)日：2006-04-13
申请号：US11196399
申请日：2005-08-04
申请人： Takashi Ohshima , Mitsugu Sato , Soichi Katagiri
发明人： Takashi Ohshima , Mitsugu Sato , Soichi Katagiri
IPC分类号： G21K7/00
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/0268 , H01J2237/04756 , H01J2237/1205 , H01J2237/121 , H01J2237/188 , H01J2237/24465 , H01J2237/2611 , H01J2237/31749
摘要： A charged particle beam apparatus in which an electrostatic lens is used as a main focusing element to obtain a subminiature high-sensitivity high-resolution SEM, a drift tube for an electron beam is located inside a column between an electron source and a sample, and a detector for secondary electrons is located inside the drift tube. This solves the problem associated with the provision of a secondary electron detector, which heretofore has been a bottleneck in making a subminiature high-resolution SEM column.
摘要翻译：使用静电透镜作为主聚焦元件以获得超小型高灵敏度高分辨率SEM的带电粒子束装置，用于电子束的漂移管位于电子源和样品之间的列内，并且用于二次电子的检测器位于漂移管内。这解决了与提供二次电子检测器相关的问题，这种二次电子检测器迄今已成为制造超小型高分辨率SEM柱的瓶颈。

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