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1. 发明申请

US20070284542A1 Charged particle beam apparatus and method for charged particle beam adjustment 有权
标题翻译：带电粒子束装置和带电粒子束调整方法
公开(公告)号：US20070284542A1
公开(公告)日：2007-12-13
申请号：US11715506
申请日：2007-03-08
申请人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
发明人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
IPC分类号： G01N21/00
CPC分类号： G01N23/22 , H01J37/1471 , H01J37/28 , H01J2237/1501
摘要： A charged particle beam apparatus facilitating adjusting the beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of the charged particle beam is moved due to state variation of the apparatus. When the beam center axis of a primary charged particle beam is adjusted with a deflector (aligner), a processing step (1) for measuring the sensitivity of the aligner and a processing step (2) for detecting the deviation between the center of the primary charged particle beam and the center of the objective aperture are provided. The charged particle beam apparatus has means for determining the aligner set values, using the aligner sensitivity measured in the processing step (1) and the amount of deviation detected in the processing step (2), such that the primary charged particle beam passes through the center of the objective aperture and controlling the aligner using the aligner set values.
摘要翻译：在光学条件被修改的情况下或者由于装置的状态变化使带电粒子束的束中心轴移动的情况下，有利于调整带电粒子束的束中心轴的带电粒子束装置。当用偏转器（对准器）调整初级带电粒子束的束中心轴时，用于测量对准器的灵敏度的处理步骤（1）和用于检测初级带电粒子的中心之间的偏差的处理步骤（2）提供带电粒子束和物镜孔的中心。带电粒子束装置具有使用在处理步骤（1）中测量的对准器灵敏度和在处理步骤（2）中检测到的偏差量来确定对准器设定值的装置，使得初级带电粒子束通过物镜光圈中心，并使用对准器设定值控制对准器。

2. 发明授权

US08026491B2 Charged particle beam apparatus and method for charged particle beam adjustment 有权
标题翻译：带电粒子束装置和带电粒子束调整方法
公开(公告)号：US08026491B2
公开(公告)日：2011-09-27
申请号：US11715506
申请日：2007-03-08
申请人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
发明人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
IPC分类号： G01N21/00
CPC分类号： G01N23/22 , H01J37/1471 , H01J37/28 , H01J2237/1501
摘要： A charged particle beam apparatus facilitating adjusting a beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of the charged particle beam is moved due to state variation of the apparatus. When the beam center axis of a primary charged particle beam is adjusted with a deflector (aligner), a first processing step for measuring the sensitivity of the aligner and a second processing step for detecting the deviation between the center of the primary charged particle beam and the center of the objective aperture are provided. The charged particle beam apparatus determines the aligner set values, using the aligner sensitivity measured in the first processing step and the amount of deviation detected in the second processing step, such that the primary charged particle beam passes through the center of the objective aperture and controls the aligner using the aligner set values.
摘要翻译：在光学条件被修改的情况下或者由于装置的状态变化使带电粒子束的束中心轴移动的情况下，有利于调整带电粒子束的束中心轴的带电粒子束装置。当用偏转器（对准器）调整初级带电粒子束的束中心轴时，用于测量对准器的灵敏度的第一处理步骤和用于检测初级带电粒子束的中心与第一带电粒子束的中心之间的偏差的第二处理步骤提供了物镜孔的中心。带电粒子束装置使用在第一处理步骤中测量的对准器灵敏度和在第二处理步骤中检测到的偏差量来确定对准器设定值，使得初级带电粒子束通过物镜孔的中心并控制对齐器使用对准器设置值。

3. 发明申请

US20070057185A1 Electron beam device and its control method 有权
标题翻译：电子束装置及其控制方法
公开(公告)号：US20070057185A1
公开(公告)日：2007-03-15
申请号：US11520605
申请日：2006-09-14
申请人： Takashi Ichimura , Takeshi Ogashiwa , Toshihide Agemura , Kenji Aoki
发明人： Takashi Ichimura , Takeshi Ogashiwa , Toshihide Agemura , Kenji Aoki
IPC分类号： H01J37/09 , H01J37/28
CPC分类号： H01J37/09 , H01J37/265 , H01J37/28 , H01J2237/0458
摘要： An electron beam device includes an electron gun section having an internal space kept at an ultrahigh vacuum level for generating a primary electron beam, a mirror section having an internal space kept at a vacuum level lower than that of the electron gun section for scanning a specimen with an electron probe of the primary electron beam generated in the electron gun section and focused on the specimen, a differential exhaust diaphragm for providing communication in internal space between the electron gun section and the mirror section and passing the primary electron beam, and a control section for controlling respective constituent elements in the electron beam device. A diaphragm mechanism having a plurality of different diaphragm aperture diameters is provided between a second anode and a first condenser lens.
摘要翻译：电子束装置包括具有保持在超高真空度的内部空间以产生一次电子束的电子枪部分，具有保持在比用于扫描样本的电子枪部分的真空度更低的真空度的内部空间的镜部分在电子枪部分中产生的一次电子束的电子探针聚焦在试样上，用于在电子枪部分和反射镜部分之间的内部空间中提供通信并使一次电子束通过的差动排气隔膜，以及控制用于控制电子束装置中的各个组成元件。具有多个不同光阑孔径的光阑机构设置在第二阳极和第一聚光透镜之间。

4. 发明授权

US07550724B2 Electron beam device and its control method 有权
标题翻译：电子束装置及其控制方法
公开(公告)号：US07550724B2
公开(公告)日：2009-06-23
申请号：US11520605
申请日：2006-09-14
申请人： Takashi Ichimura , Takeshi Ogashiwa , Toshihide Agemura , Kenji Aoki
发明人： Takashi Ichimura , Takeshi Ogashiwa , Toshihide Agemura , Kenji Aoki
IPC分类号： G01N23/00
CPC分类号： H01J37/09 , H01J37/265 , H01J37/28 , H01J2237/0458
摘要： An electron beam device includes an electron gun section having an internal space kept at an ultrahigh vacuum level for generating a primary electron beam, a mirror section having an internal space kept at a vacuum level lower than that of the electron gun section for scanning a specimen with an electron probe of the primary electron beam generated in the electron gun section and focused on the specimen, a differential exhaust diaphragm for providing communication in internal space between the electron gun section and the mirror section and passing the primary electron beam, and a control section for controlling respective constituent elements in the electron beam device. A diaphragm mechanism having a plurality of different diaphragm aperture diameters is provided between a second anode and a first condenser lens.
摘要翻译：电子束装置包括具有保持在超高真空度的内部空间以产生一次电子束的电子枪部分，具有保持在比用于扫描样本的电子枪部分的真空度更低的真空度的内部空间的镜部分在电子枪部分中产生的一次电子束的电子探针聚焦在试样上，用于在电子枪部分和反射镜部分之间的内部空间中提供通信并使一次电子束通过的差动排气隔膜，以及控制用于控制电子束装置中的各个组成元件。具有多个不同光阑孔径的光阑机构设置在第二阳极和第一聚光透镜之间。

5. 发明授权

US07582885B2 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US07582885B2
公开(公告)日：2009-09-01
申请号：US11401878
申请日：2006-04-12
申请人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato , Takashi Furukawa
发明人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato , Takashi Furukawa
IPC分类号： H01J1/50
CPC分类号： H01J41/14 , H01J37/28 , H01J41/12 , H01J2237/0245 , H01J2237/062 , H01J2237/06341 , H01J2237/1825
摘要： A small-sized charged particle beam apparatus capable of maintaining high vacuum even during emission of an electron beam is provided. A nonevaporative getter pump is placed upstream of differential pumping of an electron optical system of the charged particle beam apparatus, and a minimum number of ion pumps are placed downstream, so that both the pumps are used in combination. Further, by mounting a detachable coil on an electron gun part, the inside of a column can be maintained under high vacuum with a degree of vacuum in the order of 10−8 Pa.
摘要翻译：提供即使在电子束的发射期间也能保持高真空的小尺寸带电粒子束装置。将非蒸发性吸气泵放置在带电粒子束装置的电子光学系统的差分泵浦的上游，并且将最少数量的离子泵放置在下游，使得两个泵组合使用。此外，通过将可拆卸线圈安装在电子枪部件上，可以将真空度保持在10-8Pa以下的真空度的高真空下。

6. 发明授权

US07112792B2 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US07112792B2
公开(公告)日：2006-09-26
申请号：US11139609
申请日：2005-05-31
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： G01N23/00
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化妈妈还是更多缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

7. 发明授权

US07348559B2 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US07348559B2
公开(公告)日：2008-03-25
申请号：US11498125
申请日：2006-08-03
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： G01N23/00
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化妈妈还是更多缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

8. 发明申请

US20050263702A1 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US20050263702A1
公开(公告)日：2005-12-01
申请号：US11139609
申请日：2005-05-31
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： G01N23/225 , G01N23/00 , G01N27/00 , G01R31/302 , G01R31/307 , H01J37/147 , H01J37/153 , H01J37/22 , H01J37/28 , H01L21/66
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化妈妈还是更多缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

9. 发明授权

US08304723B2 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US08304723B2
公开(公告)日：2012-11-06
申请号：US12725857
申请日：2010-03-17
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： H01J37/04 , H01J37/28
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化 μm以上。缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

10. 发明授权

US07705303B2 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US07705303B2
公开(公告)日：2010-04-27
申请号：US12068789
申请日：2008-02-12
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： H01J37/304
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化 μm以上。缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

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