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1. 发明申请

US20070284542A1 Charged particle beam apparatus and method for charged particle beam adjustment 有权
标题翻译：带电粒子束装置和带电粒子束调整方法
公开(公告)号：US20070284542A1
公开(公告)日：2007-12-13
申请号：US11715506
申请日：2007-03-08
申请人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
发明人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
IPC分类号： G01N21/00
CPC分类号： G01N23/22 , H01J37/1471 , H01J37/28 , H01J2237/1501
摘要： A charged particle beam apparatus facilitating adjusting the beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of the charged particle beam is moved due to state variation of the apparatus. When the beam center axis of a primary charged particle beam is adjusted with a deflector (aligner), a processing step (1) for measuring the sensitivity of the aligner and a processing step (2) for detecting the deviation between the center of the primary charged particle beam and the center of the objective aperture are provided. The charged particle beam apparatus has means for determining the aligner set values, using the aligner sensitivity measured in the processing step (1) and the amount of deviation detected in the processing step (2), such that the primary charged particle beam passes through the center of the objective aperture and controlling the aligner using the aligner set values.
摘要翻译：在光学条件被修改的情况下或者由于装置的状态变化使带电粒子束的束中心轴移动的情况下，有利于调整带电粒子束的束中心轴的带电粒子束装置。当用偏转器（对准器）调整初级带电粒子束的束中心轴时，用于测量对准器的灵敏度的处理步骤（1）和用于检测初级带电粒子的中心之间的偏差的处理步骤（2）提供带电粒子束和物镜孔的中心。带电粒子束装置具有使用在处理步骤（1）中测量的对准器灵敏度和在处理步骤（2）中检测到的偏差量来确定对准器设定值的装置，使得初级带电粒子束通过物镜光圈中心，并使用对准器设定值控制对准器。

2. 发明授权

US08026491B2 Charged particle beam apparatus and method for charged particle beam adjustment 有权
标题翻译：带电粒子束装置和带电粒子束调整方法
公开(公告)号：US08026491B2
公开(公告)日：2011-09-27
申请号：US11715506
申请日：2007-03-08
申请人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
发明人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
IPC分类号： G01N21/00
CPC分类号： G01N23/22 , H01J37/1471 , H01J37/28 , H01J2237/1501
摘要： A charged particle beam apparatus facilitating adjusting a beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of the charged particle beam is moved due to state variation of the apparatus. When the beam center axis of a primary charged particle beam is adjusted with a deflector (aligner), a first processing step for measuring the sensitivity of the aligner and a second processing step for detecting the deviation between the center of the primary charged particle beam and the center of the objective aperture are provided. The charged particle beam apparatus determines the aligner set values, using the aligner sensitivity measured in the first processing step and the amount of deviation detected in the second processing step, such that the primary charged particle beam passes through the center of the objective aperture and controls the aligner using the aligner set values.
摘要翻译：在光学条件被修改的情况下或者由于装置的状态变化使带电粒子束的束中心轴移动的情况下，有利于调整带电粒子束的束中心轴的带电粒子束装置。当用偏转器（对准器）调整初级带电粒子束的束中心轴时，用于测量对准器的灵敏度的第一处理步骤和用于检测初级带电粒子束的中心与第一带电粒子束的中心之间的偏差的第二处理步骤提供了物镜孔的中心。带电粒子束装置使用在第一处理步骤中测量的对准器灵敏度和在第二处理步骤中检测到的偏差量来确定对准器设定值，使得初级带电粒子束通过物镜孔的中心并控制对齐器使用对准器设置值。

3. 发明申请

US20060219907A1 Charged particle beam apparatus, method of displaying sample image, and method of measuring image shift sensitivity 审中-公开
标题翻译：带电粒子束装置，显示样本图像的方法以及测量图像偏移灵敏度的方法
公开(公告)号：US20060219907A1
公开(公告)日：2006-10-05
申请号：US11311425
申请日：2005-12-20
申请人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane
发明人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane
IPC分类号： G21K7/00 , G01N23/00
CPC分类号： H01J37/222
摘要： A sample image display method and an image shift sensitivity measuring method to be executed in a charged particle beam apparatus are provided for accurately correcting an image drift in any observing and analyzing condition such as an accelerating voltage, a working distance or a raster rotation. When obtaining a reference image used for detecting a drift, the process is executed to obtain an image having the different image shift amount from that of the reference image at a time and to occasionally measure an image shift sensitivity. Then, the process is executed to automatically register this reference image and the image shift sensitivity and to detect a drift amount and control an image shift (correct a drift) according to the registered conditions when correcting the drift.
摘要翻译：在带电粒子束装置中执行的样本图像显示方法和图像偏移灵敏度测量方法被提供用于在诸如加速电压，工作距离或光栅旋转的观察和分析条件中精确校正图像漂移。当获得用于检测漂移的参考图像时，执行该处理以一次获得具有与参考图像的图像偏移量不同的图像偏移量的图像，并且偶尔测量图像偏移灵敏度。然后，执行该处理以自动登记该参考图像和图像移位灵敏度，并且在校正漂移时根据注册条件来检测漂移量并控制图像偏移（校正漂移）。

4. 发明申请

US20070057185A1 Electron beam device and its control method 有权
标题翻译：电子束装置及其控制方法
公开(公告)号：US20070057185A1
公开(公告)日：2007-03-15
申请号：US11520605
申请日：2006-09-14
申请人： Takashi Ichimura , Takeshi Ogashiwa , Toshihide Agemura , Kenji Aoki
发明人： Takashi Ichimura , Takeshi Ogashiwa , Toshihide Agemura , Kenji Aoki
IPC分类号： H01J37/09 , H01J37/28
CPC分类号： H01J37/09 , H01J37/265 , H01J37/28 , H01J2237/0458
摘要： An electron beam device includes an electron gun section having an internal space kept at an ultrahigh vacuum level for generating a primary electron beam, a mirror section having an internal space kept at a vacuum level lower than that of the electron gun section for scanning a specimen with an electron probe of the primary electron beam generated in the electron gun section and focused on the specimen, a differential exhaust diaphragm for providing communication in internal space between the electron gun section and the mirror section and passing the primary electron beam, and a control section for controlling respective constituent elements in the electron beam device. A diaphragm mechanism having a plurality of different diaphragm aperture diameters is provided between a second anode and a first condenser lens.
摘要翻译：电子束装置包括具有保持在超高真空度的内部空间以产生一次电子束的电子枪部分，具有保持在比用于扫描样本的电子枪部分的真空度更低的真空度的内部空间的镜部分在电子枪部分中产生的一次电子束的电子探针聚焦在试样上，用于在电子枪部分和反射镜部分之间的内部空间中提供通信并使一次电子束通过的差动排气隔膜，以及控制用于控制电子束装置中的各个组成元件。具有多个不同光阑孔径的光阑机构设置在第二阳极和第一聚光透镜之间。

5. 发明授权

US07550724B2 Electron beam device and its control method 有权
标题翻译：电子束装置及其控制方法
公开(公告)号：US07550724B2
公开(公告)日：2009-06-23
申请号：US11520605
申请日：2006-09-14
申请人： Takashi Ichimura , Takeshi Ogashiwa , Toshihide Agemura , Kenji Aoki
发明人： Takashi Ichimura , Takeshi Ogashiwa , Toshihide Agemura , Kenji Aoki
IPC分类号： G01N23/00
CPC分类号： H01J37/09 , H01J37/265 , H01J37/28 , H01J2237/0458
摘要： An electron beam device includes an electron gun section having an internal space kept at an ultrahigh vacuum level for generating a primary electron beam, a mirror section having an internal space kept at a vacuum level lower than that of the electron gun section for scanning a specimen with an electron probe of the primary electron beam generated in the electron gun section and focused on the specimen, a differential exhaust diaphragm for providing communication in internal space between the electron gun section and the mirror section and passing the primary electron beam, and a control section for controlling respective constituent elements in the electron beam device. A diaphragm mechanism having a plurality of different diaphragm aperture diameters is provided between a second anode and a first condenser lens.
摘要翻译：电子束装置包括具有保持在超高真空度的内部空间以产生一次电子束的电子枪部分，具有保持在比用于扫描样本的电子枪部分的真空度更低的真空度的内部空间的镜部分在电子枪部分中产生的一次电子束的电子探针聚焦在试样上，用于在电子枪部分和反射镜部分之间的内部空间中提供通信并使一次电子束通过的差动排气隔膜，以及控制用于控制电子束装置中的各个组成元件。具有多个不同光阑孔径的光阑机构设置在第二阳极和第一聚光透镜之间。

6. 发明申请

US20140151555A1 ELECTRON MICROSCOPE 有权
标题翻译：电子显微镜
公开(公告)号：US20140151555A1
公开(公告)日：2014-06-05
申请号：US14130919
申请日：2012-05-16
申请人： Takeshi Ogashiwa , Masahiro Akatsu
发明人： Takeshi Ogashiwa , Masahiro Akatsu
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/20 , H01J2237/0203
摘要： Provided is an electron microscope on which a specimen holder with high voltage applied is mountable. The specimen holder has safety (electric shock prevention means), and attention is paid to the specimen holder in terms of operability.The present invention includes a specimen holder having a function of applying a voltage to a specimen mount, disposed to load a specimen, a voltage source that supplies the voltage to be applied to the specimen mount, a voltage cable connected at one end thereof to the specimen holder, and a relay unit to which the other end of the voltage cable is connected, the relay unit being placed on a supporting base that supports a lens barrel of the electron microscope.
摘要翻译：提供一种电子显微镜，其上安装有高电压的检体保持器。试样架具有安全（防电击装置），并且在可操作性方面注意试样架。本发明包括一个试样保持器，其具有向样本载体施加电压的功能，该载体被设置成装载试样，提供施加到样品载体上的电压的电压源，一端连接到该试样载体上的电压电缆试样架和电压电缆的另一端连接的继电器单元，将继电器单元放置在支撑电子显微镜的镜筒的支撑座上。

7. 发明授权

US08853647B2 Electron microscope 有权
标题翻译：电子显微镜
公开(公告)号：US08853647B2
公开(公告)日：2014-10-07
申请号：US14130919
申请日：2012-05-16
申请人： Takeshi Ogashiwa , Masahiro Akatsu
发明人： Takeshi Ogashiwa , Masahiro Akatsu
IPC分类号： G21K5/10 , G21K5/08 , H01J37/26 , H01J37/28
CPC分类号： H01J37/28 , H01J37/20 , H01J2237/0203
摘要： Provided is an electron microscope on which a specimen holder to have high voltage applied is mountable. The specimen holder has safety (electric shock prevention) features, and attention is paid to the specimen holder in terms of operability. The microscope includes a specimen holder having a function of applying a voltage to a specimen mount disposed to load a specimen, a voltage source that supplies the voltage to be applied to the specimen mount, a voltage cable connected at one end thereof to the specimen holder, and a relay unit to which the other end of the voltage cable is connected, the relay unit being placed on a supporting base that supports a lens barrel of the electron microscope.
摘要翻译：提供一种电子显微镜，其上安装有施加高电压的试样保持器。样品架具有安全（防电击）特征，在可操作性方面注意样品架。该显微镜包括：试样保持器，其具有向载置试样的试样台架施加电压的电压，向试样台提供施加电压的电压源，将其一端连接于试样架的电压电缆以及连接有电压电缆的另一端的中继单元，将继电器单元配置在支撑电子显微镜的镜筒的支撑基座上。

8. 发明授权

US08124940B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US08124940B2
公开(公告)日：2012-02-28
申请号：US12351523
申请日：2009-01-09
申请人： Kunji Shigeto , Takeshi Ogashiwa
发明人： Kunji Shigeto , Takeshi Ogashiwa
IPC分类号： G21K1/08 , H01J3/14 , H01J49/42 , H01J3/26
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/216 , H01J2237/2487 , H01J2237/2826
摘要： Disclosed herein is a scanning electron microscope having a function for positioning an object point of an objective lens at a defined position even under an electronic optical condition in which it is difficult to accurately control the position of the object point of the objective lens. A deflector is provided to deflect an electron beam in order to detect the object point and located at a desired position of the object point of the objective lens. The deflector is not used to scan a sample with the electron beam. The scanning electron microscope has a function for automatically adjusting the position of the object point to ensure that the object point of the objective lens is located at the position of the object point detection deflector by using a characteristic in which a displacement of an image by the deflector is minimal when the object point is located at the position of the deflector.
摘要翻译：这里公开了一种扫描电子显微镜，其具有即使在难以精确地控制物镜的物体的位置的电子光学条件下将物镜的物体点定位在限定位置的功能。提供偏转器以偏转电子束以便检测物点并且位于物镜的物点的期望位置处。偏转器不用于用电子束扫描样品。扫描电子显微镜具有自动调整物点的位置的功能，以通过使用图像的位移由特征来确定物镜的物点位于物点检测偏转器的位置当物点位于偏转器的位置时，偏转器最小。

9. 发明申请

US20110233399A1 CHARGED PARTICLE BEAM DEVICE 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20110233399A1
公开(公告)日：2011-09-29
申请号：US13132373
申请日：2009-11-11
申请人： Takashi Ichimura , Takeshi Ogashiwa , Yasuko Aoki
发明人： Takashi Ichimura , Takeshi Ogashiwa , Yasuko Aoki
IPC分类号： G01N23/225
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/226 , H01J2237/24485 , H01J2237/2449 , H01J2237/24585 , H01J2237/24592
摘要： The present invention provides a charged particle beam device in which signal electrons (14) are generated from a sample when the sample (11) is irradiated with a primary charged particle beam (3), and then enter different positions of a position-sensitive signal detector (16) in accordance with energy of the signal electrons (14), whereby an energy distribution image of the signal electrons generated from the sample is acquired. Accordingly, it becomes possible to discriminate and select signal electrons having arbitrary energy to thereby obtain an image to which information specific to the arbitrary energy is reflected, and to acquire various characteristic information of the sample.
摘要翻译：本发明提供了一种带电粒子束装置，其中当样品（11）被初级带电粒子束（3）照射时，从样品产生信号电子（14），然后进入位置敏感信号的不同位置检测器（16）根据信号电子（14）的能量，从而获得从样品产生的信号电子的能量分布图像。因此，可以区分和选择具有任意能量的信号电子，从而获得反映任意能量特有的信息的图像，并获取样本的各种特征信息。

10. 发明授权

US08455823B2 Charged particle beam device 有权
标题翻译：带电粒子束装置
公开(公告)号：US08455823B2
公开(公告)日：2013-06-04
申请号：US13132373
申请日：2009-11-11
申请人： Takashi Ichimura , Takeshi Ogashiwa , Yasuko Aoki
发明人： Takashi Ichimura , Takeshi Ogashiwa , Yasuko Aoki
IPC分类号： H01J37/244 , H01J37/28 , G01N23/225
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/226 , H01J2237/24485 , H01J2237/2449 , H01J2237/24585 , H01J2237/24592
摘要： The present invention provides a charged particle beam device in which signal electrons (14) are generated from a sample when the sample (11) is irradiated with a primary charged particle beam (3), and then enter different positions of a position-sensitive signal detector (16) in accordance with energy of the signal electrons (14), whereby an energy distribution image of the signal electrons generated from the sample is acquired. Accordingly, it becomes possible to discriminate and select signal electrons having arbitrary energy to thereby obtain an image to which information specific to the arbitrary energy is reflected, and to acquire various characteristic information of the sample.
摘要翻译：本发明提供了一种带电粒子束装置，其中当样品（11）被初级带电粒子束（3）照射时，从样品产生信号电子（14），然后进入位置敏感信号的不同位置检测器（16）根据信号电子（14）的能量，从而获得从样品产生的信号电子的能量分布图像。因此，可以区分和选择具有任意能量的信号电子，从而获得反映任意能量特有的信息的图像，并获取样本的各种特征信息。

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