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1. 发明授权

US4183146A Process for simultaneously drying mechanical wood pulp and improving mechanical strength and brightness of the pulp 失效
标题翻译：同时干燥机械木浆并提高纸浆的机械强度和亮度的方法
公开(公告)号：US4183146A
公开(公告)日：1980-01-15
申请号：US883208
申请日：1978-03-03
申请人： Haruo Tsukamoto , Kazuo Koide , Yuzo Okazaki , Isao Yamada
发明人： Haruo Tsukamoto , Kazuo Koide , Yuzo Okazaki , Isao Yamada
IPC分类号： D21B1/00 , D21C9/00 , F26B7/00
CPC分类号： D21C9/004
摘要： Disclosed is a process for simultaneously drying mechanical wood pulp and improving the mechanical strength and brightness of the wood pulp by mixing mechanical wood pulp with an aqueous solution of at least one sulfonating compound, the resultant mixture having a dry solid consistency of 20 to 50% of the wood pulp, based on the weight of said mixture and; bringing the mixture into contact with a heating gas having a temperature higher than 100.degree. C. to cause the dry solid consistency of the wood pulp in the mixture to be increased to a range of from 65 to 90% by weight.
摘要翻译：公开了一种同时干燥机械木浆并通过将机械木浆与至少一种磺化化合物的水溶液混合来提高木浆的机械强度和亮度的方法，所得混合物的干固体稠度为20-50％的木浆，基于所述混合物的重量; 使混合物与温度高于100℃的加热气体接触，以使混合物中木浆的干固体稠度增加至65至90重量％的范围。

2. 发明授权

US08384807B2 Imaging element, drive device for an imaging element, drive method for an imaging element, image processing device, image processing method, and imaging device 有权
标题翻译：成像元件，成像元件的驱动装置，成像元件的驱动方法，图像处理装置，图像处理方法和成像装置
公开(公告)号：US08384807B2
公开(公告)日：2013-02-26
申请号：US13264094
申请日：2010-09-10
申请人： Isao Yamada
发明人： Isao Yamada
IPC分类号： H04N3/14 , H04N5/335 , H04N9/04
CPC分类号： H04N9/045 , H04N5/3458 , H04N5/37457
摘要： An imaging element includes: a plurality of color filters arranged in a Bayer array; photoelectric conversion elements provided for the respective color filters; a signal adder circuit which carries out additions in each of the unit grids, by (i) adding up signals outputted from two photoelectric conversion elements corresponding to different colors of two color filters out of four color filters, and (ii) adding up signals outputted from two photoelectric conversion elements corresponding to remaining two color filters; and an A/D converter. The imaging element outputs: (i) a first digital image signal where signals of one color out of Ye (yellow) and Cy (cyan), and signals of G, are alternately placed; and (ii) a second digital image signal where signals of an other color out of Ye and Cy, which is different from the one color, and signals of Mg (magenta), are alternately placed.
摘要翻译：成像元件包括：布置在拜耳阵列中的多个滤色器; 为各个滤色器设置的光电转换元件; 信号加法器电路，通过（i）将从两个滤色器中的两个滤色器的不同颜色相对应的两个光电转换元件输出的信号相加，以及（ii）输出的相加信号，在每个单元格栅中执行加法对应于剩余的两个滤色器的两个光电转换元件; 和A / D转换器。成像元件输出：（i）第一数字图像信号，其中Ye（黄色）和Cy（青色）中的一种颜色的信号和G的信号交替放置; 和（ii）第二数字图像信号，其中与一种颜色不同的Ye和Cy中的另一种颜色的信号和Mg（品红色）的信号交替放置。

3. 发明申请

US20100319545A1 CHARGED PARTICLE SEPARATION APPARATUS AND CHARGED PARTICLE BOMBARDMENT APPARATUS 审中-公开
标题翻译：充电颗粒分离装置和充电颗粒物料装置
公开(公告)号：US20100319545A1
公开(公告)日：2010-12-23
申请号：US12818758
申请日：2010-06-18
申请人： MASAKI NARUSHIMA , Koichi Mori , Isao Yamada , Noriaki Toyoda
发明人： MASAKI NARUSHIMA , Koichi Mori , Isao Yamada , Noriaki Toyoda
IPC分类号： B03C3/68 , B03C3/38
CPC分类号： H01J49/421 , H01J27/026 , H01J37/147 , H01J2237/3142 , H01J2237/3151 , H01J2237/31701
摘要： A charged particle separation apparatus that separates ionized gas clusters is disclosed. The charged particle separation apparatus includes three or more electric field applying parts arranged in an incident direction of an ionized gas cluster, wherein each of the electric field applying parts includes a pair of electrodes; an electric power source configured to supply alternating-current electric voltages to the three or more electric field applying parts in such a manner that an alternating-current electric voltage applied across one pair of the electrodes of one of the three or more electric field applying parts is different in phase from an alternating-current voltage applied across another pair of the electrodes of an adjacent one of the three or more electric field applying parts; and a plate including an opening in an extension of the incident direction.
摘要翻译：公开了一种分离离子化气体簇的带电粒子分离装置。带电粒子分离装置包括沿电离气体簇的入射方向配置的三个以上的电场施加部，其中，各电场施加部包括一对电极; 电源，被配置为向三个或更多个电场施加部提供交流电压，使得施加在三个或更多个电场施加部中的一个的一对电极上的交流电压与施加在三个或更多个电场施加部件中相邻一个的另一对电极上的交流电压的相位不同; 以及包括在入射方向的延伸部中的开口的板。

4. 发明申请

US20090250824A1 METHOD AND APPARATUS TO REDUCE PIN VOIDS 审中-公开
标题翻译：减少PIN VOIDS的方法和装置
公开(公告)号：US20090250824A1
公开(公告)日：2009-10-08
申请号：US12098311
申请日：2008-04-04
申请人： Xiwang Qi , Charan K. Gurumurthy , Tamil Selvy Selvamuniandy , Isao Yamada
发明人： Xiwang Qi , Charan K. Gurumurthy , Tamil Selvy Selvamuniandy , Isao Yamada
IPC分类号： H01L23/48 , H01L21/00
CPC分类号： H05K3/3426 , H01L23/49811 , H01L23/49827 , H01L2224/16225 , H01L2224/16235 , H01L2924/01046 , H01L2924/01079 , H01L2924/01087 , H01L2924/01327 , H01L2924/15312 , H05K2201/10318 , H05K2201/10772 , Y02P70/613 , H01L2924/00
摘要： A semiconductor package comprises a substrate that utilizes one or more pins to form external interconnects. The pins are bonded to bonding pads on the substrate by solder. The pins may each has a pin head that may have a bonding surface, wherein the bonding surface may comprises a center portion and a side portion that is tapered away relative to the center portion. In some embodiments, the bonding surface may comprise a round shape. In some embodiments, a gas escape path may be provided by the shape of the bonding surface to increase pin pull strength and/or solder strength. The package may further comprise a surface finish that may comprise a palladium layer with a reduced thickness to reduce the amount of palladium based IMC precipitation into the solder.
摘要翻译：半导体封装包括利用一个或多个引脚形成外部互连的基板。引脚通过焊料与基板上的焊盘接合。销可以各自具有可以具有接合表面的销头，其中接合表面可以包括中心部分和相对于中心部分逐渐变细的侧部部分。在一些实施例中，接合表面可以包括圆形。在一些实施例中，可以通过接合表面的形状提供气体逸出路径，以增加引脚拉伸强度和/或焊接强度。该封装还可以包括表面光洁度，其可以包括具有减小厚度的钯层，以减少基于钯的IMC沉淀到焊料中的量。

5. 发明授权

US06486478B1 Gas cluster ion beam smoother apparatus 有权
标题翻译：气体束离子束平滑器
公开(公告)号：US06486478B1
公开(公告)日：2002-11-26
申请号：US09731688
申请日：2000-12-06
申请人： Bruce K. Libby , Isao Yamada , James A. Greer , Lester G. Crawford , James G. Bachand , Matthew C. Gwinn , Richard P. Torti
发明人： Bruce K. Libby , Isao Yamada , James A. Greer , Lester G. Crawford , James G. Bachand , Matthew C. Gwinn , Richard P. Torti
IPC分类号： A61N500
CPC分类号： H01J37/3053 , H01J2237/0812
摘要： An apparatus for smoothing a surface of a substrate includes an ionizer to form gas cluster particles; a power supply to accelerate the gas cluster particles; a triode/Einzel lens combination assembly to focus the accelerated gas cluster particles; a permanent magnet beam filter; scan plates to irradiate the filtered accelerated gas cluster particles onto a surface of a workpiece situated in a reduced pressure atmosphere chamber; and a substrate loading/unloading mechanism to load and unload the workpiece. The ionizer includes an alignment device wherein the alignment device includes a X/Y translation element and an angular translation element. The substrate loading/unloading mechanism provides a workpiece from a plurality of workpieces onto a holder positioned at a first position within the reduced pressure atmosphere chamber, the first position being substantially parallel to a central axis of a flow of the filtered accelerated gas cluster particles. The substrate loading/unloading mechanism also moves the holder with a workpiece thereon to a second position, the second position being substantially perpendicular to the first position and the central axis of a flow of the filtered accelerated gas cluster particles.
摘要翻译：用于平滑基板的表面的设备包括：离子发生器，用于形成气体团簇颗粒; 用于加速气体团簇颗粒的电源; 三极管/ Einzel透镜组合组件，用于聚焦加速气体团簇颗粒; 永久磁铁过滤器; 扫描板将过滤的加速气体团簇颗粒照射到位于减压气氛室中的工件的表面上; 以及用于加载和卸载工件的基板装载/卸载机构。电离器包括对准装置，其中对准装置包括X / Y平移元件和角度平移元件。衬底装载/卸载机构将工件从多个工件提供到位于减压气氛室内的第一位置的保持器上，第一位置基本上平行于过滤的加速气体团簇颗粒的流动的中心轴线。衬底装载/卸载机构还将其上的工件的保持器移动到第二位置，第二位置基本上垂直于过滤的加速气体团簇颗粒的流动的第一位置和中心轴线。

6. 发明授权

US06416820B1 Method for forming carbonaceous hard film 失效
标题翻译：形成碳质硬膜的方法
公开(公告)号：US06416820B1
公开(公告)日：2002-07-09
申请号：US09443995
申请日：1999-11-19
申请人： Isao Yamada , Jiro Matsuo , Teruyuki Kitagawa , Allen Kirkpatrick
发明人： Isao Yamada , Jiro Matsuo , Teruyuki Kitagawa , Allen Kirkpatrick
IPC分类号： C23C1406
CPC分类号： C23C14/5833 , B82Y30/00 , C23C14/0605 , C23C14/58 , H01J2237/0812 , Y10T428/30
摘要： A method for enabling the formation of a carbonaceous hard film having a high hardness, strong adherence to the substrate, a wide range of substrate compatibility, and structural stability, which can be formed at room temperature and may cover a large area. The method includes vapor depositing a hard film of a carbonaceous material onto a substrate under vacuum by depositing a vaporized, hydrogen free carbonaceous material, which may be ionized or non-ionized, onto the substrate surface while irradiating the carbonaceous material with gas cluster ions, generated by ionizing gas clusters to form the film.
摘要翻译：能够形成具有高硬度，对基板的强粘附性，宽范围的基板相容性和结构稳定性的碳质硬膜的方法，其可以在室温下形成并且可以覆盖大面积。该方法包括在真空下通过将气化的不含氢的含碳材料（其可被离子化或非离子化）沉积到基底表面上同时用气体团簇离子辐射碳质材料，将碳质材料的硬膜蒸发沉积到基底上，通过电离气体簇形成膜。

7. 发明授权

US5844250A Field emission element with single crystalline or preferred oriented polycrystalline emitter or insulating layer 失效
标题翻译：具有单晶或优选定向多晶发射体或绝缘层的场发射元件
公开(公告)号：US5844250A
公开(公告)日：1998-12-01
申请号：US483853
申请日：1995-06-07
申请人： Shigeo Itoh , Isao Yamada
发明人： Shigeo Itoh , Isao Yamada
IPC分类号： H01J9/02 , H01L29/12 , H01J1/14 , H01J1/48 , H01J9/12
CPC分类号： H01J9/025 , H01J2201/319 , H01J2209/015 , H01J2237/0812 , H01J2237/31732
摘要： A process for manufacturing a field emission element including a substrate, and an emitter and a gate each arranged on the substrate is provided. The emitter is formed at at least a tip portion thereof with an electron discharge section, which is formed of metal or semiconductor into a monocrystalline structure or a polycrystalline structure preferentially oriented in at least a direction perpendicular to the substrate by deposition.
摘要翻译：提供一种制造场致发射元件的方法，该场致发射元件包括基片，以及各自布置在基片上的发射极和栅极。发射极在其至少顶端形成电子放电部，该电子放电部由金属或半导体形成为单晶结构，或者通过沉积在至少沿垂直于衬底的方向优先取向的多晶结构。

8. 发明授权

US08236746B2 Detergent composition comprising a ternary surfactant mixture and a clay 有权
标题翻译：包含三元表面活性剂混合物和粘土的洗涤剂组合物
公开(公告)号：US08236746B2
公开(公告)日：2012-08-07
申请号：US12525471
申请日：2008-01-30
申请人： Yuki Yanagisawa , Kuniaki Mitsuyoshi , Wataru Ueno , Isao Yamada , Teruo Kubota
发明人： Yuki Yanagisawa , Kuniaki Mitsuyoshi , Wataru Ueno , Isao Yamada , Teruo Kubota
IPC分类号： C11D1/86 , C11D3/08
CPC分类号： C11D1/83 , C11D1/72 , C11D3/126
摘要： A detergent composition containing: (a) a nonionic surfactant containing a polyoxyalkylene alkyl ether of which alkylene oxide moiety has an average number of moles of from 4 to 8; (b) an anionic surfactant, excluding a fatty acid and a salt thereof; and (c) a clay mineral represented by the general formula (I): [Si8(MgaAlb)O20(OH)4]X−·MeX+ (I) wherein a, b and x satisfy 0
摘要翻译：一种洗涤剂组合物，其含有：（a）含有氧化烯部分的平均摩尔数为4〜8的聚氧化烯烷基醚的非离子表面活性剂; （b）不含脂肪酸及其盐的阴离子表面活性剂; 和（c）由通式（I）表示的粘土矿物：[Si8（MgaAlb）O20（OH）4] X·MeX +（I）其中a，b和x满足0 ; 4和x = 12-2a-3b，Me为选自Na，K，Li，Ca，Mg和NH 4中的至少一种，其中所述粘土矿物的含量为3重量％以上，其中组分（a）与组分（b），（a）/（b）的重量比超过1并小于5。

9. 发明授权

US07022545B2 Production method of SiC monitor wafer 有权
标题翻译： SiC监测晶圆的生产方法
公开(公告)号：US07022545B2
公开(公告)日：2006-04-04
申请号：US10502537
申请日：2003-01-10
申请人： Isao Yamada , Jiro Matsuo , Noriaki Toyoda , Kazutoshi Murata , Naomasa Miyatake
发明人： Isao Yamada , Jiro Matsuo , Noriaki Toyoda , Kazutoshi Murata , Naomasa Miyatake
IPC分类号： H01L21/02 , H01L21/205 , B24C1/00 , C30B29/36
CPC分类号： C30B29/36 , C23C16/01 , C23C16/325 , C30B25/02 , C30B33/00 , Y10S438/931
摘要： The present invention has its object to obtain an SiC monitor wafer which can flatten the surface until particle detection is possible. SiC of a crystal system 3C is deposited on a substrate by a CVD (Chemical Vapor Deposition) method, and the SiC is detached from a substrate. After the SiC surface is flattened by using mechanical polishing alone or in combination with CMP (Chemo Mechanical Polishing), GCIB (Gas Cluster Ion Beam) is irradiated to the surface until the surface roughness becomes Ra=0.5 nm or less and the impurity density of the wafer surface becomes 1*1011 atoms/cm2 or less to produce the SiC monitor wafer.
摘要翻译：本发明的目的是获得可以使表面变平的SiC监测晶片，直到可以进行粒子检测。通过CVD（化学气相沉积）法将晶体系统3C的SiC沉积在衬底上，并且将SiC从衬底上分离。在通过单独使用机械抛光或与CMP（Chemo Mechanical Polishing）组合使SiC表面平坦化之后，将GCIB（气体簇离子束）照射到表面，直到表面粗糙度变为Ra = 0.5nm以下，杂质浓度晶片表面变为1×10 11原子/ cm 2或更小，以产生SiC监测晶片。

10. 发明授权

US6013332A Boron doping by decaborane 失效
标题翻译：硼氢化硼由硼烷掺杂
公开(公告)号：US6013332A
公开(公告)日：2000-01-11
申请号：US762853
申请日：1996-12-06
申请人： Kenichi Goto , Masataka Kase , Jiro Matsuo , Isao Yamada , Daisuke Takeuchi , Noriaki Toyoda , Norihiro Shimada
发明人： Kenichi Goto , Masataka Kase , Jiro Matsuo , Isao Yamada , Daisuke Takeuchi , Noriaki Toyoda , Norihiro Shimada
IPC分类号： C23C14/48 , H01L21/265 , C23C14/14
CPC分类号： H01L21/2658 , C23C14/48 , H01L21/26513 , H01J2237/31701 , Y10S438/918
摘要： A method of manufacturing a semiconductor device comprising the steps of: ionizing decaborane; and implanting ionized decaborane into a silicon wafer. Solid decaborane can be vaporized in a reduced pressure atmosphere or by heating. A single decaborane molecule can provide 10 boron atoms while the acceleration energy per each boron atom can be reduced to about 1/10 of the acceleration energy for a decaborane molecule.
摘要翻译：一种制造半导体器件的方法，包括以下步骤：电离十硼烷; 并将离子化的十硼烷注入到硅晶片中。固体十硼烷可在减压气氛或加热下汽化。单个十硼烷分子可以提供10个硼原子，而每个硼原子的加速能量可以降低到十五硼烷分子的加速能的约+ E，fra 1/10 + EE。

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