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1. 发明授权

US06486478B1 Gas cluster ion beam smoother apparatus 有权
标题翻译：气体束离子束平滑器
公开(公告)号：US06486478B1
公开(公告)日：2002-11-26
申请号：US09731688
申请日：2000-12-06
申请人： Bruce K. Libby , Isao Yamada , James A. Greer , Lester G. Crawford , James G. Bachand , Matthew C. Gwinn , Richard P. Torti
发明人： Bruce K. Libby , Isao Yamada , James A. Greer , Lester G. Crawford , James G. Bachand , Matthew C. Gwinn , Richard P. Torti
IPC分类号： A61N500
CPC分类号： H01J37/3053 , H01J2237/0812
摘要： An apparatus for smoothing a surface of a substrate includes an ionizer to form gas cluster particles; a power supply to accelerate the gas cluster particles; a triode/Einzel lens combination assembly to focus the accelerated gas cluster particles; a permanent magnet beam filter; scan plates to irradiate the filtered accelerated gas cluster particles onto a surface of a workpiece situated in a reduced pressure atmosphere chamber; and a substrate loading/unloading mechanism to load and unload the workpiece. The ionizer includes an alignment device wherein the alignment device includes a X/Y translation element and an angular translation element. The substrate loading/unloading mechanism provides a workpiece from a plurality of workpieces onto a holder positioned at a first position within the reduced pressure atmosphere chamber, the first position being substantially parallel to a central axis of a flow of the filtered accelerated gas cluster particles. The substrate loading/unloading mechanism also moves the holder with a workpiece thereon to a second position, the second position being substantially perpendicular to the first position and the central axis of a flow of the filtered accelerated gas cluster particles.
摘要翻译：用于平滑基板的表面的设备包括：离子发生器，用于形成气体团簇颗粒; 用于加速气体团簇颗粒的电源; 三极管/ Einzel透镜组合组件，用于聚焦加速气体团簇颗粒; 永久磁铁过滤器; 扫描板将过滤的加速气体团簇颗粒照射到位于减压气氛室中的工件的表面上; 以及用于加载和卸载工件的基板装载/卸载机构。电离器包括对准装置，其中对准装置包括X / Y平移元件和角度平移元件。衬底装载/卸载机构将工件从多个工件提供到位于减压气氛室内的第一位置的保持器上，第一位置基本上平行于过滤的加速气体团簇颗粒的流动的中心轴线。衬底装载/卸载机构还将其上的工件的保持器移动到第二位置，第二位置基本上垂直于过滤的加速气体团簇颗粒的流动的第一位置和中心轴线。

2. 发明授权

US06737643B2 Detector and method for cluster ion beam diagnostics 有权
标题翻译：用于集群离子束诊断的检测器和方法
公开(公告)号：US06737643B2
公开(公告)日：2004-05-18
申请号：US09811904
申请日：2001-03-19
申请人： Richard P. Torti , Matthew C. Gwinn , Jerald P. Dykstra
发明人： Richard P. Torti , Matthew C. Gwinn , Jerald P. Dykstra
IPC分类号： H01J4926
CPC分类号： H01J49/10 , H01J27/026 , H01J49/0422 , H01J2237/0812 , H01J2237/24485
摘要： A detector apparatus and its use for cluster ion beam diagnostics are described. The detector has a Faraday cup with a conductance path to a gas pressure detector and a conductance to the detector exit. The detector acquires ion current, which is a measure of the ion beam flux, and also acquires mass flux, through a pressure measurement. The pressure measurement responds to the mass of dissociated gas clusters and is combined with information about instantaneous ion current to estimate mean gas cluster ion size ({overscore (N)}i).
摘要翻译：描述了一种检测器装置及其用于群集离子束诊断的用途。检测器具有法拉第杯，其具有通向气体压力检测器的电导路径和对检测器出口的电导。检测器获取离子电流，其是离子束通量的量度，并且还通过压力测量获得质量通量。压力测量响应于解离的气体团簇的质量，并结合关于瞬时离子电流的信息来估计平均气体团簇离子大小（{超核（Ni））。

3. 发明申请

US20090140165A1 Method and apparatus for controlling a gas cluster ion beam formed from a gas mixture 有权
标题翻译：用于控制由气体混合物形成的气体团簇离子束的方法和装置
公开(公告)号：US20090140165A1
公开(公告)日：2009-06-04
申请号：US11950128
申请日：2007-12-04
申请人： John J. Hautala , Matthew C. Gwinn , Jerald P. Dykstra
发明人： John J. Hautala , Matthew C. Gwinn , Jerald P. Dykstra
IPC分类号： G21K5/00 , G21K5/08
CPC分类号： H01J37/304 , H01J27/026 , H01J37/3053 , H01J2237/006 , H01J2237/0812 , H01J2237/24507 , H01J2237/30455 , H01L21/26566
摘要： Methods and apparatus for controlling a gas cluster ion beam formed from a plurality of process gases in a gas mixture. The methods and apparatus involve measuring gas analysis data relating to the composition of the gas mixture and modifying the irradiation of the workpiece in response to the detected parameter. The gas analysis data can be derived from samples of the composition of the gas mixture flowing from a gas source to the gas cluster ion beam apparatus or samples of the residual gases inside the vacuum vessel of the gas cluster ion beam apparatus.
摘要翻译：用于控制由气体混合物中的多种处理气体形成的气体簇离子束的方法和装置。所述方法和装置包括测量与气体混合物的组成相关的气体分析数据，并响应于检测到的参数来修改工件的照射。气体分析数据可以从气体源到气体簇离子束装置的气体混合物的组成的样本或气体团簇离子束装置的真空容器内的残留气体的样品的样品得到。

4. 发明申请

US20110240602A1 HIGH-VOLTAGE GAS CLUSTER ION BEAM (GCIB) PROCESSING SYSTEM 审中-公开
标题翻译：高压气体离子束（GCIB）处理系统
公开(公告)号：US20110240602A1
公开(公告)日：2011-10-06
申请号：US12750052
申请日：2010-03-30
申请人： Robert K. Becker , Matthew C. Gwinn , Kenneth P. Regan
发明人： Robert K. Becker , Matthew C. Gwinn , Kenneth P. Regan
IPC分类号： C23F1/02 , C23C14/46
CPC分类号： H01J37/317 , H01J37/08 , H01J37/241 , H01J2237/038 , H01J2237/0812
摘要： The invention includes a high-voltage gas cluster ion beam (GCIB) processing system for treating a workpiece using a gas cluster ion beam. The high-voltage GCIB processing system includes a high-voltage (HV) source system that includes a high-voltage (HV) source chamber having a high-voltage (HV) nozzle subassembly, a nozzle element, and a high-voltage (HV) skimmer subassembly therein. The high-voltage gas cluster ion beam (GCIB) processing system includes a high-voltage (HV) power supply coupled to the HV nozzle subassembly and the HV skimmer subassembly. A high-voltage (HV) ionization chamber can be coupled to the HV source chamber and can include an ionizer coupled to the chamber wall by an isolation structure. In addition, a grounded GCIB processing chamber can be coupled to the HV ionization chamber by an isolation structure and can include a scanable workpiece holder.
摘要翻译：本发明包括使用气体团簇离子束处理工件的高压气体团簇离子束（GCIB）处理系统。高压GCIB处理系统包括高压（HV）源系统，其包括具有高压（HV）喷嘴子组件，喷嘴元件和高压（HV）的高压（HV）源室）撇渣器组件。高压气体簇离子束（GCIB）处理系统包括耦合到HV喷嘴子组件和HV分离器子组件的高压（HV）电源。高压（HV）电离室可以耦合到HV源室，并且可以包括通过隔离结构耦合到室壁的离子发生器。此外，接地的GCIB处理室可以通过隔离结构耦合到HV电离室，并且可以包括可扫描工件保持器。

5. 发明申请

US20100193708A1 METHOD OF FORMING TRENCH ISOLATION USING A MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESS 有权
标题翻译：使用多个喷嘴气体聚集体离子束工艺形成热分离的方法
公开(公告)号：US20100193708A1
公开(公告)日：2010-08-05
申请号：US12428973
申请日：2009-04-23
申请人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
发明人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
IPC分类号： A61N5/00
CPC分类号： H01J37/08 , H01J37/317 , H01J2237/061 , H01J2237/0812 , H01J2237/0825 , H01J2237/0827
摘要： Disclosed are methods of operation to grow, modify, deposit, or dope a layer upon a substrate using a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system. Also disclosed is a method of forming a shallow trench isolation (STI) structure on a substrate, for example, an SiO2 STI structure, using a multiple nozzle system with two separate gas supplies, for example providing a silicon-containing gas and an oxygen-containing gas.
摘要翻译：公开了使用多喷嘴和撇渣器组件在基底上生长，改性，沉积或掺杂层的操作方法，用于在气体簇离子束（GCIB）系统中引入工艺气体混合物或多种工艺气体混合物。还公开了一种在衬底上形成浅沟槽隔离（STI）结构的方法，例如使用具有两个单独气体供应的多喷嘴系统的SiO 2 STI结构，例如提供含硅气体和含氧气体，含气。

6. 发明授权

US08304033B2 Method of irradiating substrate with gas cluster ion beam formed from multiple gas nozzles 有权
标题翻译：用多个气体喷嘴形成的气体簇离子束照射基板的方法
公开(公告)号：US08304033B2
公开(公告)日：2012-11-06
申请号：US12428973
申请日：2009-04-23
申请人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
发明人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
IPC分类号： C23C14/10 , C23C14/48 , C23C14/14 , B05D3/06 , H01L21/263 , C23C14/08 , H01L21/423 , H01L21/425 , H01L21/265
CPC分类号： H01J37/08 , H01J37/317 , H01J2237/061 , H01J2237/0812 , H01J2237/0825 , H01J2237/0827
摘要： Disclosed are methods of operation to grow, modify, deposit, or dope a layer upon a substrate using a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system. Also disclosed is a method of forming a shallow trench isolation (STI) structure on a substrate, for example, an SiO2 STI structure, using a multiple nozzle system with two separate gas supplies, for example providing a silicon-containing gas and an oxygen-containing gas.
摘要翻译：公开了使用多喷嘴和撇渣器组件在基底上生长，改性，沉积或掺杂层的操作方法，用于在气体簇离子束（GCIB）系统中引入工艺气体混合物或多种工艺气体混合物。还公开了一种在衬底上形成浅沟槽隔离（STI）结构的方法，例如使用具有两个单独气体供应的多喷嘴系统的SiO 2 STI结构，例如提供含硅气体和含氧气体，含气。

7. 发明授权

US07825389B2 Method and apparatus for controlling a gas cluster ion beam formed from a gas mixture 有权
标题翻译：用于控制由气体混合物形成的气体团簇离子束的方法和装置
公开(公告)号：US07825389B2
公开(公告)日：2010-11-02
申请号：US11950128
申请日：2007-12-04
申请人： John J. Hautala , Matthew C. Gwinn , Jerald P. Dykstra
发明人： John J. Hautala , Matthew C. Gwinn , Jerald P. Dykstra
IPC分类号： G21G5/00
CPC分类号： H01J37/304 , H01J27/026 , H01J37/3053 , H01J2237/006 , H01J2237/0812 , H01J2237/24507 , H01J2237/30455 , H01L21/26566
摘要： Methods and apparatus for controlling a gas cluster ion beam formed from a plurality of process gases in a gas mixture. The methods and apparatus involve measuring gas analysis data relating to the composition of the gas mixture and modifying the irradiation of the workpiece in response to the detected parameter. The gas analysis data can be derived from samples of the composition of the gas mixture flowing from a gas source to the gas cluster ion beam apparatus or samples of the residual gases inside the vacuum vessel of the gas cluster ion beam apparatus.
摘要翻译：用于控制由气体混合物中的多种处理气体形成的气体簇离子束的方法和装置。所述方法和装置包括测量与气体混合物的组成相关的气体分析数据，并响应于检测到的参数来修改工件的照射。气体分析数据可以从气体源到气体簇离子束装置的气体混合物的组成的样本或气体团簇离子束装置的真空容器内的残留气体的样品的样品得到。

8. 发明授权

US07060989B2 Method and apparatus for improved processing with a gas-cluster ion beam 有权
标题翻译：利用气体簇离子束改进处理的方法和装置
公开(公告)号：US07060989B2
公开(公告)日：2006-06-13
申请号：US11084632
申请日：2005-03-18
申请人： David R. Swenson , John J. Hautala , Michael E. Mack , Martin D. Tabat , Matthew C. Gwinn
发明人： David R. Swenson , John J. Hautala , Michael E. Mack , Martin D. Tabat , Matthew C. Gwinn
IPC分类号： H01J27/00
CPC分类号： H01J27/026 , H01J37/3056 , H01J2237/0812 , H01J2237/188 , H01J2237/3151
摘要： Apparatus and methods for improving processing of workpieces with gas-cluster ion beams and modifying the gas-cluster ion energy distribution in the GCIB. In a reduced-pressure environment, generating an energetic gas-cluster ion beam and subjecting the beam to increased pressure region.
摘要翻译：用气团聚合离子束改善工件加工并改进GCIB中气团离子能量分布的装置和方法。在减压环境中，产生高能气体团簇离子束，并使束受到增加的压力区域。

9. 发明授权

US07060988B2 Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system 有权
标题翻译：在大电流气体簇离子束处理系统中改善光束稳定性的方法和装置
公开(公告)号：US07060988B2
公开(公告)日：2006-06-13
申请号：US11082584
申请日：2005-03-17
申请人： Michael E. Mack , Robert K. Becker , Matthew C. Gwinn
发明人： Michael E. Mack , Robert K. Becker , Matthew C. Gwinn
IPC分类号： H01J27/00
CPC分类号： H01J27/026 , H01J27/02 , H01J37/08 , H01J37/3056 , H01J37/317 , H01J2237/0812 , H01J2237/188 , H01J2237/3151 , H01J2237/31701 , H01J2237/31732 , H01J2237/3174
摘要： Apparatus and methods for improving beam stability in high current gas-cluster ion beam systems by reducing the frequency of transients occurring in the vicinity of the ionizer through use of shielding conductors and distinct component electrical biasing to inhibit backward extraction of ions from the ionizer towards the gas-jet generator.
摘要翻译：通过使用屏蔽导体减少在离子发生器附近发生的瞬变的频率，以及不同的分量电偏压来抑制离子从离子发生器的向后提取向着向离子束的反向提取，从而改善高电流气体簇离子束系统中的束稳定性的装置和方法气喷发电机。

10. 发明授权

US5962858A Method of implanting low doses of ions into a substrate 失效
标题翻译：将低剂量离子注入底物的方法
公开(公告)号：US5962858A
公开(公告)日：1999-10-05
申请号：US891415
申请日：1997-07-10
申请人： Matthew C. Gwinn
发明人： Matthew C. Gwinn
IPC分类号： C23C14/48 , H01J37/317 , H01L21/265
CPC分类号： C23C14/48 , H01J37/3171 , H01J2237/08
摘要： The present invention provides for an ion implantation system that employs an ion source for ionizing and implanting into a substrate a noble diluent gas and a particular dopant gas. The noble diluent gas of the present invention preferably does not react with the dopant gas, or with dopant residue which coats the walls of the ionization chamber of the ion source, thus allowing the ion source to be used for accurate, stable low dose implants. Additionally, the noble diluent gas does not introduce conductivity altering ions, or impurities, into the substrate S. Consequently, the dosage of the dopant ions implanted into the substrate can be precisely controlled, especially in low dose applications.
摘要翻译：本发明提供了一种离子注入系统，其使用离子源将电离和注入衬底中的稀有稀释气体和特定掺杂气体。本发明的稀释稀释气体优选不与掺杂剂气体反应，或者与掺杂离子源的离子化室的壁的掺杂剂残留物反应，从而允许离子源用于精确，稳定的低剂量植入物。此外，惰性稀释气体不会将导电性改变离子或杂质引入衬底S.因此，可以精确地控制注入到衬底中的掺杂剂离子的剂量，特别是在低剂量应用中。

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