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1. 发明授权

US08746975B2 Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography 有权
标题翻译：用于EUV光刻的放电收集器的热管理系统，组件和方法
公开(公告)号：US08746975B2
公开(公告)日：2014-06-10
申请号：US13355725
申请日：2012-01-23
申请人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Gordon Yue , Daniel Stearns , Richard A. Levesque , Giuseppe Valsecchi
发明人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Gordon Yue , Daniel Stearns , Richard A. Levesque , Giuseppe Valsecchi
IPC分类号： H01J35/02 , H01J35/16 , G21K1/06
CPC分类号： G02B5/09 , G02B5/10 , G02B7/1815 , G03F7/70033 , G03F7/70166 , G03F7/70891
摘要： Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.
摘要翻译：公开了用于EUV光刻应用的用于热管理掠入射收集器（GIC）的系统，组件和方法。 GIC热管理组件包括与夹套接合以形成密封室的GIC镜壳。开放式电池，传热（OCHT）材料设置在金属室内，并与GIC反射镜外壳和护套热和机械结合。当GIC热管理组件用于被配置为从EUV辐射源接收和形成收集的EUV辐射的GIC镜系统中时，冷却剂以方位角对称的方式通过输入和输出增压室之间的OCHT材料流动，以实现冷却。

2. 发明申请

US20120212719A1 THERMAL MANAGEMENT SYSTEMS, ASSEMBLIES AND METHODS FOR GRAZING INCIDENCE COLLECTORS FOR EUV LITHOGRAPHY 有权
标题翻译：热管理系统，组装和方法，用于对EUV LITHOGRAPHY进行收集
公开(公告)号：US20120212719A1
公开(公告)日：2012-08-23
申请号：US13355725
申请日：2012-01-23
申请人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Daniel Stearns , Richard A. Levesque , Gordon Yue , Giuseppe Valsecchi
发明人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Daniel Stearns , Richard A. Levesque , Gordon Yue , Giuseppe Valsecchi
IPC分类号： G03B27/54 , G02B5/08
CPC分类号： G02B5/09 , G02B5/10 , G02B7/1815 , G03F7/70033 , G03F7/70166 , G03F7/70891
摘要： Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.
摘要翻译：公开了用于EUV光刻应用的用于热管理掠入射收集器（GIC）的系统，组件和方法。 GIC热管理组件包括与夹套接合以形成密封室的GIC镜壳。开放式电池，传热（OCHT）材料设置在金属室内，并与GIC反射镜外壳和护套热和机械结合。当GIC热管理组件用于被配置为从EUV辐射源接收和形成收集的EUV辐射的GIC镜系统中时，冷却剂以方位角对称的方式通过输入和输出增压室之间的OCHT材料流动，以实现冷却。

3. 发明授权

US08731139B2 Evaporative thermal management of grazing incidence collectors for EUV lithography 有权
标题翻译：用于EUV光刻的放射收集器的蒸发热管理
公开(公告)号：US08731139B2
公开(公告)日：2014-05-20
申请号：US13136784
申请日：2011-08-10
申请人： Boris Grek , Daniel Stearns , Natale M. Ceglio
发明人： Boris Grek , Daniel Stearns , Natale M. Ceglio
IPC分类号： G02B7/195 , G21K1/06 , H01J35/16 , H05G1/02 , G02B5/08
CPC分类号： G03F7/70891 , F28D15/0208 , F28D15/04 , F28D15/046 , G02B7/1815 , G03F7/70166 , G21K1/067 , H05G2/001
摘要： Evaporate thermal management systems for and methods of grazing incidence collectors (GICs) for extreme ultraviolet (EUV) lithography include a GIC shell interfaced with a jacket to form a structure having a leading end and that defines a chamber. The chamber operably supports at least one wicking layer. A conduit connects the wicking layer to a condenser system that support cooling fluid in a reservoir. When heat is applied to the leading end, the cooling fluid is drawn into the chamber from the condenser unit via capillary action in the wicking layer and an optional gravity assist, while vapor is drawn in the opposite direction from the chamber to the condenser unit. Heat is removed from the condensed vapor at the condenser unit, thereby cooling the GIC mirror shell.
摘要翻译：蒸发热管理系统和用于极紫外（EUV）光刻的掠入射收集器（GIC）的方法包括与外壳相接合的GIC壳，以形成具有前端并且限定腔室的结构。腔室可操作地支撑至少一个芯吸层。导管将芯吸层连接到支撑储存器中的冷却流体的冷凝器系统。当向前端施加热量时，冷却流体通过芯吸层中的毛细管作用和可选的重力辅助从冷凝器单元吸入室中，同时蒸气沿着从室到冷凝器单元的相反方向被抽吸。在冷凝器单元处从冷凝的蒸汽中除去热量，从而冷却GIC镜壳。

4. 发明申请

US20120281189A1 Evaporative thermal management of grazing incidence collectors for EUV lithography 有权
标题翻译：用于EUV光刻的放射收集器的蒸发热管理
公开(公告)号：US20120281189A1
公开(公告)日：2012-11-08
申请号：US13136784
申请日：2011-08-10
申请人： Boris Grek , Daniel Stearns , Natale M. Ceglio
发明人： Boris Grek , Daniel Stearns , Natale M. Ceglio
IPC分类号： G03B27/52 , F28D15/04
CPC分类号： G03F7/70891 , F28D15/0208 , F28D15/04 , F28D15/046 , G02B7/1815 , G03F7/70166 , G21K1/067 , H05G2/001
摘要： Evaporate thermal management systems for and methods of grazing incidence collectors (GICs) for extreme ultraviolet (EUV) lithography include a GIC shell interfaced with a jacket to form a structure having a leading end and that defines a chamber. The chamber operably supports at least one wicking layer. A conduit connects the wicking layer to a condenser system that support cooling fluid in a reservoir. When heat is applied to the leading end, the cooling fluid is drawn into the chamber from the condenser unit via capillary action in the wicking layer and an optional gravity assist, while vapor is drawn in the opposite direction from the chamber to the condenser unit. Heat is removed from the condensed vapor at the condenser unit, thereby cooling the GIC mirror shell.
摘要翻译：蒸发热管理系统和用于极紫外（EUV）光刻的掠入射收集器（GIC）的方法包括与外壳相接合的GIC壳，以形成具有前端并且限定腔室的结构。腔室可操作地支撑至少一个芯吸层。导管将芯吸层连接到支撑储存器中的冷却流体的冷凝器系统。当向前端施加热量时，冷却流体通过芯吸层中的毛细管作用和可选的重力辅助从冷凝器单元吸入室中，同时蒸气沿着从室到冷凝器单元的相反方向被抽吸。在冷凝器单元处从冷凝的蒸汽中除去热量，从而冷却GIC镜壳。

5. 发明申请

US20090185806A1 Broadcasting arrayed waveguide 有权
标题翻译：广播阵列波导
公开(公告)号：US20090185806A1
公开(公告)日：2009-07-23
申请号：US12011070
申请日：2008-01-23
申请人： Saurav Das , Boris Grek , Jacob Sun
发明人： Saurav Das , Boris Grek , Jacob Sun
IPC分类号： H04J14/02 , G02B6/28
CPC分类号： G02B6/12019 , G02B6/12011 , H04J14/0226 , H04J14/0232 , H04J14/0238 , H04J14/0246 , H04J14/025 , H04J14/0282
摘要： The invention is a data transmission device that includes: an input Free Propagation Region (FPR) receiving a multi-wavelength signal and a single-wavelength signal, and two sets of arrayed waveguides coupled to the input FPR to carry the multi-wavelength signal and the single-wavelength signal, respectively. The arrayed waveguides demultiplex the multi-wavelength signal and create copies of the single-wavelength signal. The output plane of an output FPR receives the demultiplexed wavelengths and the copies of the single-wavelength signal such that one of the demultiplexed wavelengths and one of the copies of the single-wavelength signal focus onto the same position on the output plane. The device allows data (e.g., video stream) to be broadcast to all subscribers in a Wavelength-Division-Multiplexed Passive Optical Network (WDM-PON) architecture. A multicasting apparatus can be implemented by using a plurality of these devices and using different wavelengths for the single-wavelength signal for the different devices.
摘要翻译：本发明是一种数据传输装置，包括：接收多波长信号和单波长信号的输入自由传播区域（FPR）和耦合到输入FPR的两组阵列波导，以承载多波长信号;以及单波长信号。阵列波导将多波长信号解复用并产生单波长信号的副本。输出FPR的输出平面接收解复用的波长和单波长信号的副本，使得解复用的波长中的一个和单波长信号的一个副本聚焦到输出平面上的相同位置。该设备允许在波分复用无源光网络（WDM-PON）架构中向所有用户广播数据（例如，视频流）。可以通过使用多个这些设备并且为不同设备使用不同波长的单波长信号来实现多播设备。

6. 发明授权

US07238915B2 Methods and apparatus for irradiating a substrate to avoid substrate edge damage 有权
标题翻译：用于照射基板以避免基板边缘损坏的方法和装置
公开(公告)号：US07238915B2
公开(公告)日：2007-07-03
申请号：US11236271
申请日：2005-09-26
申请人： Boris Grek , David A. Markle
发明人： Boris Grek , David A. Markle
IPC分类号： B23K26/08
CPC分类号： B23K26/0853 , B23K26/0006 , B23K26/352 , B23K26/40 , B23K26/703 , B23K2101/40 , B23K2103/50 , B23K2103/56
摘要： Methods and apparatus (100) for scanning a surface (12) of a substrate (10) with an obliquely incident radiation beam (20) over a select scan path (210) to avoid damage (30) to the curved edge (14) of the substrate. The methods and apparatus allow for the substrate edge to be irradiated with the full intensity of the radiation beam, provided that the edge crossing positions avoid a region where the polar angle is less than a scan path critical (SPC) polar angle (φC). At the SPC polar angle the temperatures produced by scanning the beam on the substrate surface and on the edge are the same. The scan path is arranged so the edge crossing positions are located where the polar angle corresponding to each meets or exceeds the SPC polar angle. Ensuring that the substrate edge temperature (TE) remains at or below the substrate surface temperature (TS). The invention has particular utility in laser thermal processing (LTP) of circular silicon substrates when forming transistor-based integrated circuits.
摘要翻译：用于在选择扫描路径（210）上用倾斜入射的辐射束（20）扫描衬底（10）的表面（12）的方法和装置（100），以避免对弯曲边缘（14）的损伤（30）底物。如果边缘交叉位置避免极角小于扫描路径临界（SPC）极角（phi C ）。在SPC极角时，通过在基板表面和边缘上扫描光束产生的温度是相同的。扫描路径被布置成使得边缘交叉位置位于与每个相对应的极角相交或超过SPC极角的位置。确保衬底边缘温度（T EL）保持在或低于衬底表面温度（T S S S S S）。当形成基于晶体管的集成电路时，本发明在圆形硅衬底的激光热处理（LTP）中具有特别的用途。

7. 发明申请

US20060237403A1 Heat shield for thermal processing 有权
标题翻译：用于热处理的隔热罩
公开(公告)号：US20060237403A1
公开(公告)日：2006-10-26
申请号：US11112647
申请日：2005-04-22
申请人： Iqbal Shareef , Boris Grek , Michael Thompson
发明人： Iqbal Shareef , Boris Grek , Michael Thompson
IPC分类号： B23K26/00
CPC分类号： B23K26/703
摘要： A heat shield (10) that facilitates thermally processing a substrate (22) with a radiation beam (150) is disclosed. The heat shield is in the form of a cooled plate adapted to allow the radiation beam to communicate with the substrate upper surface (20) over a radiation beam path (BP), either through an aperture or a transparent region. The heat shield has an operating position that forms a relatively small gap (170) between the lower surface (54) of the heat shield and the upper surface of the wafer. The gap is sized such that the formation of convection cells (200) is suppressed during substrate surface irradiation. If convection cells do form, they are kept out of the radiation beam path. This prevents the radiation beam from wandering from the desired radiation beam path, which in turn allows for uniform heating of the substrate during thermal processing.
摘要翻译：公开了一种有助于用辐射束（150）热处理衬底（22）的隔热罩（10）。隔热板是冷却板的形式，其适于允许辐射束通过光圈或透明区域在辐射束路径（BP）上与衬底上表面（20）连通。隔热罩具有在隔热罩的下表面（54）和晶片的上表面之间形成相对小的间隙（170）的操作位置。间隙的尺寸使得在衬底表面照射期间抑制形成对流电池（200）。如果形成对流电池，则它们被保持在辐射束路径之外。这防止辐射束从所需的辐射束路径移动，这又允许在热处理期间对衬底的均匀加热。

8. 发明申请

US20060132764A1 Integrated optics based high-resolution spectrophotometer 有权
标题翻译：集成光学基于高分辨率分光光度计
公开(公告)号：US20060132764A1
公开(公告)日：2006-06-22
申请号：US11015482
申请日：2004-12-16
申请人： Boris Grek , Saurav Das
发明人： Boris Grek , Saurav Das
IPC分类号： G01J3/30 , G01J3/28
CPC分类号： G01N21/31 , G01J3/02 , G01J3/0259 , G01J3/10 , G01J3/18 , G01J3/42 , G01N2021/0346 , G01N2201/08 , G02B6/12019
摘要： A spectrophotometer capable of high spectral resolution (e.g., in the GHz range) is presented. The spectrophotometer includes a container for holding a sample, an arrayed-waveguide grating coupled to the sample holder, and a detector array coupled to the arrayed-waveguide grating. The arrayed-waveguide grating may be a monolithic chip, and the container may be integrated into the chip. An integrated container may be a microfluidic channel formed through the layers in the chip and positioned in such a way that light is transferable from the microfluidic channel to the waveguides of the arrayed-waveguide grating. The invention is also a method of making the spectrophotometer. The method entails providing an arrayed-waveguide grating having an input end and an output end, coupling a container to the input end, wherein the container is capable of holding a sample, and coupling a detector array to the output end of the arrayed-waveguide grating.
摘要翻译：提出了能够具有高光谱分辨率（例如，在GHz范围内）的分光光度计。分光光度计包括用于保持样品的容器，耦合到样品保持器的阵列波导光栅以及耦合到阵列波导光栅的检测器阵列。阵列波导光栅可以是单片芯片，并且容器可以集成到芯片中。集成容器可以是通过芯片中的层形成的微流体通道，并且以这样的方式定位，使得光从微流体通道传输到阵列波导光栅的波导。本发明也是制造分光光度计的方法。该方法需要提供具有输入端和输出端的阵列波导光栅，将容器连接到输入端，其中容器能够保持样品，并将检测器阵列耦合到阵列波导的输出端光栅。

9. 发明授权

US06347176B1 Acousto-optical light tunnel apparatus and method 有权
标题翻译：声光通道装置及方法
公开(公告)号：US06347176B1
公开(公告)日：2002-02-12
申请号：US09595169
申请日：2000-06-15
申请人： Andrew M. Hawryluk , David G. Stites , Boris Grek
发明人： Andrew M. Hawryluk , David G. Stites , Boris Grek
IPC分类号： G02B600
CPC分类号： G02B6/14 , G02B6/032 , G02B6/2808 , G02B6/4206
摘要： A light tunnel apparatus (200 or 300) having an output end (56 or 98), for uniformizing light (L) that travels through a light tunnel (30 or 80). The apparatus comprises a light tunnel having first and second sides (36, 40 or 86, 90), and one or more AO modulators (210 or 310) respectively arranged on at least one of the first and second sides. The AO modulators are arranged such that activating the one or more of them causes at least one of the first and second sides to be displaced. This displacement changes the path of light traveling through the light tunnel by an amount sufficient to reduce illumination non-uniformities at the output end. The light tunnel may be a hollow light tunnel (30) with reflective inner surfaces, or a solid light tunnel (80) with a refractive index. A method of uniformizing illumination using a light tunnel is also disclosed.
摘要翻译：具有输出端（56或98）的光通道装置（200或300），用于使穿过光通道（30或80）的光（L）均匀化。该装置包括具有分别布置在第一和第二侧中的至少一个上的第一和第二侧面（36,40或86,90）以及一个或多个AO调制器（210或310）的光通道。 AO调制器被布置成使得激活其中的一个或多个使得第一和第二侧中的至少一个被移位。该位移使通过光通道的光的路径改变足以减少输出端的照明不均匀性的量。光通道可以是具有反射内表面的空心光通道（30）或具有折射率的固体光通道（80）。还公开了使用光通道使照明均匀化的方法。

10. 发明授权

US08153930B1 Apparatus and methods for improving the intensity profile of a beam image used to process a substrate 有权
标题翻译：用于改善用于处理衬底的光束图像的强度分布的装置和方法
公开(公告)号：US08153930B1
公开(公告)日：2012-04-10
申请号：US12381061
申请日：2009-03-06
申请人： Andrew M Hawryluk , Boris Grek , David A Markle
发明人： Andrew M Hawryluk , Boris Grek , David A Markle
IPC分类号： B23K26/00
CPC分类号： H01L21/2636 , H01L21/67115 , H01L21/67248
摘要： Methods and apparatuses are provided for improving the intensity profile of a beam image used to process a semiconductor substrate. At least one photonic beam may be generated and manipulated to form an image having an intensity profile with an extended uniform region useful for thermally processing the surface of the substrate. The image may be scanned across the surface to heat at least a portion of the substrate surface to achieve a desired temperature within a predetermined dwell time. Such processing may achieve a high efficiency due to the large proportion of energy contained in the uniform portion of the beam.
摘要翻译：提供了用于改善用于处理半导体衬底的光束图像的强度分布的方法和装置。可以产生和操纵至少一个光子束以形成具有强度分布的图像，其具有用于热处理基板的表面的延伸的均匀区域。可以跨越表面扫描图像以加热衬底表面的至少一部分以在预定的停留时间内实现期望的温度。这种处理可以由于束的均匀部分中包含的大量能量而实现高效率。

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