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    • 7. 发明申请
    • Broadcasting arrayed waveguide
    • 广播阵列波导
    • US20090185806A1
    • 2009-07-23
    • US12011070
    • 2008-01-23
    • Saurav DasBoris GrekJacob Sun
    • Saurav DasBoris GrekJacob Sun
    • H04J14/02G02B6/28
    • G02B6/12019G02B6/12011H04J14/0226H04J14/0232H04J14/0238H04J14/0246H04J14/025H04J14/0282
    • The invention is a data transmission device that includes: an input Free Propagation Region (FPR) receiving a multi-wavelength signal and a single-wavelength signal, and two sets of arrayed waveguides coupled to the input FPR to carry the multi-wavelength signal and the single-wavelength signal, respectively. The arrayed waveguides demultiplex the multi-wavelength signal and create copies of the single-wavelength signal. The output plane of an output FPR receives the demultiplexed wavelengths and the copies of the single-wavelength signal such that one of the demultiplexed wavelengths and one of the copies of the single-wavelength signal focus onto the same position on the output plane. The device allows data (e.g., video stream) to be broadcast to all subscribers in a Wavelength-Division-Multiplexed Passive Optical Network (WDM-PON) architecture. A multicasting apparatus can be implemented by using a plurality of these devices and using different wavelengths for the single-wavelength signal for the different devices.
    • 本发明是一种数据传输装置,包括:接收多波长信号和单波长信号的输入自由传播区域(FPR)和耦合到输入FPR的两组阵列波导,以承载多波长信号;以及 单波长信号。 阵列波导将多波长信号解复用并产生单波长信号的副本。 输出FPR的输出平面接收解复用的波长和单波长信号的副本,使得解复用的波长中的一个和单波长信号的一个副本聚焦到输出平面上的相同位置。 该设备允许在波分复用无源光网络(WDM-PON)架构中向所有用户广播数据(例如,视频流)。 可以通过使用多个这些设备并且为不同设备使用不同波长的单波长信号来实现多播设备。
    • 8. 发明授权
    • Low loss optical waveguide device
    • US07008551B2
    • 2006-03-07
    • US10427558
    • 2003-04-30
    • C. Jacob SunJames K. Eu
    • C. Jacob SunJames K. Eu
    • B29D11/00C23F1/00
    • G02B6/136G02B6/12009G02B6/132G02B2006/12038
    • A method for forming optical devices on-planar substrates, as well as optical devices formed by the method are described. The method uses a linear injection APCVD process to form optical waveguide devices on planar substrates. The method is performed at approximately atmospheric pressure. According to the method, a wafer with a lower cladding layer already formed by either CVD or oxidation is placed on a conveyer, which may include a heating element. The heated wafer is transported underneath a linear injector such that the chemicals from the linear injector react on the wafer surface to form a core layer. After the core layer is formed, photoresist is spun on the surface of the wafer, and then standard lithography is used to pattern the optical devices. Next, reactive ion etching (RIE) is used to form waveguide lines. The remaining photoresist is then removed. An upper cladding layer is formed to substantially cover the core regions. The upper cladding layer may be formed in a manner similar to that used to form the core layer. The refractive index of the upper cladding layer is generally the same as that of the lower cladding layer. The refractive index of the core layer is generally 0.2% to 2% greater than that of the upper and lower cladding layers.