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1. 发明申请

US20090314646A1 Reflective optical systems and their fabrication 有权
标题翻译：反光光学系统及其制造
公开(公告)号：US20090314646A1
公开(公告)日：2009-12-24
申请号：US12306466
申请日：2007-07-02
申请人： Iain Alexander Neil , Robert Banham , John Earl Hill , Guiseppe Valsecchi
发明人： Iain Alexander Neil , Robert Banham , John Earl Hill , Guiseppe Valsecchi
IPC分类号： C25D1/02 , C25D1/06
CPC分类号： G02B7/182 , C25D1/00 , C25D1/06 , C25D1/10 , G02B5/0808 , G02B17/0621
摘要： A process for fabricating a reflective optical system, comprising: (a) providing at least a first mandrel and a second mandrel, each mandrel having an axis of elongation and having at one end thereof a negative end surface defining in negative shape a reflective surface, (c) rigidly and releasably attaching the first mandrel and the second mandrel to each other, thereby forming a mandrel assembly; (d) positioning the mandrel assembly in an electroforming bath and performing an electroforming operation for a predetermined period, thereby forming an optical system on the mandrel assembly; and (e) separating the mandrel assembly from the optical system, the optical system thereby having at least first and second elongate hollow sections, wherein each hollow section has an axis corresponding to the axis of elongation of a respective mandrel, wherein each hollow section has a first end, at which a reflective surface corresponding to the negative end surface of a respective mandrel is disposed, and a second end, the second ends being open, and wherein the axes of said at least first and second hollow sections are oriented whereby an optical path is defined between said second ends via reflections at said reflective surfaces. The process may include providing an intermediate mandrel disposed between the first and second mandrels. A reflective optical system, obtainable by the process, is also disclosed, the optical system comprising: at least first and second electroformed hollow sections, each hollow section having an open end and, at the end thereof opposite said open end, a reflective surface; wherein the reflective surfaces are disposed and oriented such that an optical path is defined therebetween. The fabricated optical system may be for use as an afocal relay, or in numerous image forming or lithography applications.
摘要翻译：一种用于制造反射光学系统的方法，包括：（a）提供至少第一心轴和第二心轴，每个心轴具有延伸轴线，并且其一端具有负反射面的负端面，（c）将第一心轴和第二心轴彼此刚性地和可释放地连接，从而形成心轴组件; （d）将心轴组件定位在电铸浴中并且在预定时间段内进行电铸操作，从而在心轴组件上形成光学系统; 并且（e）将心轴组件与光学系统分离，因此光学系统具有至少第一和第二细长中空部分，其中每个中空部分具有对应于相应心轴的伸长轴线的轴线，其中每个中空部分具有第一端，其中设置有与相应心轴的负端面相对应的反射面，第二端是第二端，第二端是敞开的，并且其中所述至少第一和第二中空部分的轴线被定向，通过所述反射表面处的反射在所述第二端之间限定光路。该过程可以包括提供设置在第一和第二心轴之间的中间心轴。还公开了一种可通过该方法获得的反射光学系统，所述光学系统包括：至少第一和第二电铸中空部分，每个中空部分具有开口端，并且在其与所述开口端相对的端部处具有反射表面; 其中所述反射表面被设置和定向成使得在其间限定光路。制造的光学系统可以用作无源继电器，或者用于许多图像形成或光刻应用中。

2. 发明授权

US08147669B2 Reflective optical systems and their fabrication 有权
标题翻译：反光光学系统及其制造
公开(公告)号：US08147669B2
公开(公告)日：2012-04-03
申请号：US12306466
申请日：2007-07-02
申请人： Iain Alexander Neil , Robert Banham , John Earl Hill , Guiseppe Valsecchi
发明人： Iain Alexander Neil , Robert Banham , John Earl Hill , Guiseppe Valsecchi
IPC分类号： C25D1/00 , G02B5/00
CPC分类号： G02B7/182 , C25D1/00 , C25D1/06 , C25D1/10 , G02B5/0808 , G02B17/0621
摘要： A process for fabricating a reflective optical system is disclosed that includes providing first and second mandrels that form a mandrel assembly, and positioning the mandrel assembly in an electroforming bath. The process also includes performing an electroforming operation for a predetermined period, thereby forming an optical system on the mandrel assembly. The process further involves separating the mandrel assembly from the optical system. The resulting optical system is reflective and has at least first and second elongate hollow sections each having an axis corresponding to the axis of elongation of a respective mandrel. The reflective optical system may be used as an afocal relay and used in lithography applications.
摘要翻译：公开了一种用于制造反射光学系统的方法，其包括提供形成心轴组件的第一和第二心轴，以及将心轴组件定位在电铸浴中。该方法还包括在预定时间内执行电铸操作，从而在心轴组件上形成光学系统。该方法还包括将心轴组件与光学系统分离。所得到的光学系统是反射性的并且具有至少第一和第二细长中空部分，每个具有对应于相应心轴的伸长轴线的轴线。反射光学系统可以用作无源继电器并且用于光刻应用中。

3. 发明申请

US20120212719A1 THERMAL MANAGEMENT SYSTEMS, ASSEMBLIES AND METHODS FOR GRAZING INCIDENCE COLLECTORS FOR EUV LITHOGRAPHY 有权
标题翻译：热管理系统，组装和方法，用于对EUV LITHOGRAPHY进行收集
公开(公告)号：US20120212719A1
公开(公告)日：2012-08-23
申请号：US13355725
申请日：2012-01-23
申请人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Daniel Stearns , Richard A. Levesque , Gordon Yue , Giuseppe Valsecchi
发明人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Daniel Stearns , Richard A. Levesque , Gordon Yue , Giuseppe Valsecchi
IPC分类号： G03B27/54 , G02B5/08
CPC分类号： G02B5/09 , G02B5/10 , G02B7/1815 , G03F7/70033 , G03F7/70166 , G03F7/70891
摘要： Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.
摘要翻译：公开了用于EUV光刻应用的用于热管理掠入射收集器（GIC）的系统，组件和方法。 GIC热管理组件包括与夹套接合以形成密封室的GIC镜壳。开放式电池，传热（OCHT）材料设置在金属室内，并与GIC反射镜外壳和护套热和机械结合。当GIC热管理组件用于被配置为从EUV辐射源接收和形成收集的EUV辐射的GIC镜系统中时，冷却剂以方位角对称的方式通过输入和输出增压室之间的OCHT材料流动，以实现冷却。

4. 发明申请

US20070134908A1 Fabrication of cooling and heat transfer systems by electroforming 有权
公开(公告)号：US20070134908A1
公开(公告)日：2007-06-14
申请号：US10580397
申请日：2004-11-23
申请人： Robert Banham , Armoldo Valenzuela
发明人： Robert Banham , Armoldo Valenzuela
IPC分类号： H01L21/4763
CPC分类号： C25D1/08 , C25D1/003 , C25D1/02 , F23M5/08 , F23M2900/05003 , F23M2900/05004 , F23R3/005 , F28F3/12 , F28F7/02 , F28F13/06 , F28F13/08 , F28F2260/00 , G02B7/1815 , Y02T50/675 , Y10T29/49002 , Y10T29/49117 , Y10T29/494 , Y10T29/4998
摘要： A process for the fabrication of a metallic component, such as those used in energy generation and heat transfer systems (e.g., reactor vessels, combustion chambers), in propulsion systems (e.g., rocket engines), and communications (e.g., optical telescopes). The process comprises: providing an object (e.g. a shaped mandrel) having surface; performing a first electroforming operation, thereby forming a first metallic layer comprising a metallic material (e.g. nickel, copper) on said surface; forming a first mask layer on the first metallic layer, the first mask layer comprising a non-conductive material (e.g. PMMA); patterning the first mask layer, thereby providing a plurality of first recesses in the first mask layer in which the non-conductive material above the first metallic layer is removed, said first recesses having a dimension of elongation; performing second electroforming operation using a metallic material whereby said first recesses are filled with said metallic material and a second metallic layer is formed comprising said metallic material extending at least a first predetermined thickness above, and entirely or partially over the surface of, said first mask layer. The process may include: forming a second mask layer on the upper surface of the second metallic layer, the second mask layer comprising a non-conductive material; patterning the second mask layer, thereby providing a plurality of second recesses in the second mask layer in which the non-conductive material above the second metallic layer is removed, said second recesses having a dimension of elongation; performing a third electroforming operation using said metallic material whereby said second recesses are filled with said metallic material and a third metallic layer is formed comprising said metallic material extending at least a second predetermined thickness above, and entirely or partially over the surface of, said mask layer. The non-conductive material and mandrel are removed, thus producing a component single or multiple layers of cooling or heat transfer channels, the channels in adjacent layers for example having directions at right angles.

5. 发明授权

US08746975B2 Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography 有权
标题翻译：用于EUV光刻的放电收集器的热管理系统，组件和方法
公开(公告)号：US08746975B2
公开(公告)日：2014-06-10
申请号：US13355725
申请日：2012-01-23
申请人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Gordon Yue , Daniel Stearns , Richard A. Levesque , Giuseppe Valsecchi
发明人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Gordon Yue , Daniel Stearns , Richard A. Levesque , Giuseppe Valsecchi
IPC分类号： H01J35/02 , H01J35/16 , G21K1/06
CPC分类号： G02B5/09 , G02B5/10 , G02B7/1815 , G03F7/70033 , G03F7/70166 , G03F7/70891
摘要： Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.
摘要翻译：公开了用于EUV光刻应用的用于热管理掠入射收集器（GIC）的系统，组件和方法。 GIC热管理组件包括与夹套接合以形成密封室的GIC镜壳。开放式电池，传热（OCHT）材料设置在金属室内，并与GIC反射镜外壳和护套热和机械结合。当GIC热管理组件用于被配置为从EUV辐射源接收和形成收集的EUV辐射的GIC镜系统中时，冷却剂以方位角对称的方式通过输入和输出增压室之间的OCHT材料流动，以实现冷却。

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