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    • 1. 发明授权
    • Low ohmic through substrate interconnection for semiconductor carriers
    • 用于半导体载体的低欧姆通过衬底互连
    • US08633572B2
    • 2014-01-21
    • US12293101
    • 2007-03-16
    • Gereon VogtmeierRoger SteadmanRalf DorscheidJeroen Jonkers
    • Gereon VogtmeierRoger SteadmanRalf DorscheidJeroen Jonkers
    • H01L29/40
    • H01L21/76898H01L23/481H01L2224/0401H01L2224/05H01L2224/131H01L2924/014
    • It is described a low ohmic Through Wafer Interconnection (TWI) for electronic chips formed on a semiconductor substrate (600). The TWI comprises a first connection extending between a front surface and a back surface of the substrate (600). The first connection (610) comprises a through hole filled with a low ohmic material having a specific resistivity lower than poly silicon. The TWI further comprises a second connection (615) also extending between the front surface and the back surface. The second connection (615) is spatially separated from the first connection (610) by at least a portion of the semiconductor substrate (600). The front surface is provided with a integrated circuit arrangement (620) wherein the first connection (610) is electrically coupled to at least one node of the integrated circuit arrangement (620) without penetrating the integrated circuit arrangement (620). During processing the TWI the through hole may be filled first with a non-metallic material, e.g. poly silicon. After forming integrated components (620) on top of the front surface the substrate (600) may be thinned and the non-metallic material may be substituted with the low ohmic material, which is in particular a metallic material.
    • 描述了形成在半导体衬底(600)上的电子芯片的低欧姆通晶片互连(TWI)。 TWI包括在基板(600)的前表面和后表面之间延伸的第一连接。 第一连接(610)包括填充有低于多晶硅的比电阻率的低欧姆材料的通孔。 TWI还包括也在前表面和后表面之间延伸的第二连接(615)。 第二连接(615)通过半导体衬底(600)的至少一部分在空间上与第一连接(610)分离。 前表面设置有集成电路装置(620),其中第一连接(610)电耦合到集成电路装置(620)的至少一个节点而不穿透集成电路装置(620)。 在处理TWI期间,通孔可以首先用非金属材料填充,例如, 多晶硅。 在前表面顶部形成集成组件(620)之后,可以使衬底(600)变薄并且非金属材料可以被低欧姆材料代替,这是特别是金属材料。
    • 2. 发明申请
    • LOW OHMIC THROUGH SUBSTRATE INTERCONNECTION FOR SEMICONDUCTOR CARRIERS
    • 通过半导体载体的基板互连的低OHMIC
    • US20090079021A1
    • 2009-03-26
    • US12293101
    • 2007-03-16
    • Gereon VogtmeierRoger SteadmanRalf DorscheidJeroen Jonkers
    • Gereon VogtmeierRoger SteadmanRalf DorscheidJeroen Jonkers
    • H01L31/02H01L23/48H01L21/44
    • H01L21/76898H01L23/481H01L2224/0401H01L2224/05H01L2224/131H01L2924/014
    • It is described a low ohmic Through Wafer Interconnection (TWI) for electronic chips formed on a semiconductor substrate (600). The TWI comprises a first connection extending between a front surface and a back surface of the substrate (600). The first connection (610) comprises a through hole filled with a low ohmic material having a specific resistivity lower than poly silicon. The TWI further comprises a second connection (615) also extending between the front surface and the back surface. The second connection (615) is spatially separated from the first connection (610) by at least a portion of the semiconductor substrate (600). The front surface is provided with a integrated circuit arrangement (620) wherein the first connection (610) is electrically coupled to at least one node of the integrated circuit arrangement (620) without penetrating the integrated circuit arrangement (620). During processing the TWI the through hole may be filled first with a non-metallic material, e.g. poly silicon. After forming integrated components (620) on top of the front surface the substrate (600) may be thinned and the non-metallic material may be substituted with the low ohmic material, which is in particular a metallic material.
    • 描述了形成在半导体衬底(600)上的电子芯片的低欧姆通晶片互连(TWI)。 TWI包括在基板(600)的前表面和后表面之间延伸的第一连接。 第一连接(610)包括填充有低于多晶硅的比电阻率的低欧姆材料的通孔。 TWI还包括也在前表面和后表面之间延伸的第二连接(615)。 第二连接(615)通过半导体衬底(600)的至少一部分在空间上与第一连接(610)分离。 前表面设置有集成电路装置(620),其中第一连接(610)电耦合到集成电路装置(620)的至少一个节点而不穿透集成电路装置(620)。 在处理TWI期间,通孔可以首先用非金属材料填充,例如, 多晶硅。 在前表面顶部形成集成组件(620)之后,可以使衬底(600)变薄并且非金属材料可以被低欧姆材料代替,这是特别是金属材料。