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1. 发明授权

US07485024B2 Fabricating method of field emission triodes 有权
标题翻译：场致发射三极管的制作方法
公开(公告)号：US07485024B2
公开(公告)日：2009-02-03
申请号：US11249954
申请日：2005-10-12
申请人： Fu-Ming Pan , Po-Lin Chen , Chen-Chun Lin , Mei Liu , Chi-Neng Mo
发明人： Fu-Ming Pan , Po-Lin Chen , Chen-Chun Lin , Mei Liu , Chi-Neng Mo
IPC分类号： H01J9/00 , H01J9/24
CPC分类号： H01J9/025 , B82Y10/00 , H01J2201/30469
摘要： A fabricating method of field emission triodes is provided. First, a cathode conductive layer, an insulator layer, and a gate layer are formed on a substrate. An opening is formed in the insulator layer and the gate layer to expose a portion of the cathode conductive layer. A metal layer is formed on the cathode conductive layer. A first anodization is performed so as to form a first metal anodization layer from a portion of the metal layer. After the first metal anodization layer is removed, a second metal anodization layer having a plurality of pores is formed. Thereafter, a catalyst layer is formed in the pores. Then, a plurality of carbon nanotubes are formed in the pores.
摘要翻译：提供场致发射三极管的制造方法。首先，在基板上形成阴极导电层，绝缘体层和栅极层。在绝缘体层和栅极层中形成开口以露出阴极导电层的一部分。在阴极导电层上形成金属层。进行第一阳极氧化以便从金属层的一部分形成第一金属阳极氧化层。在去除第一金属阳极氧化层之后，形成具有多个孔的第二金属阳极氧化层。此后，在孔中形成催化剂层。然后，在孔中形成多个碳纳米管。

2. 发明申请

US20070243787A1 Fabricating method of field emission triodes 有权
标题翻译：场致发射三极管的制作方法
公开(公告)号：US20070243787A1
公开(公告)日：2007-10-18
申请号：US11249954
申请日：2005-10-12
申请人： Fu-Ming Pan , Po-Lin Chen , Chen-Chun Lin , Mei Liu , Chi-Neng Mo
发明人： Fu-Ming Pan , Po-Lin Chen , Chen-Chun Lin , Mei Liu , Chi-Neng Mo
IPC分类号： H01J9/12
CPC分类号： H01J9/025 , B82Y10/00 , H01J2201/30469
摘要： A fabricating method of field emission triodes is provided. First, a cathode conductive layer, an insulator layer, and a gate layer are formed on a substrate. An opening is formed in the insulator layer and the gate layer to expose a portion of the cathode conductive layer. A metal layer is formed on the cathode conductive layer. A first anodization is performed so as to form a first metal anodization layer from a portion of the metal layer. After the first metal anodization layer is removed, a second metal anodization layer having a plurality of pores is formed. Thereafter, a catalyst layer is formed in the pores. Then, a plurality of carbon nanotubes are formed in the pores.
摘要翻译：提供场致发射三极管的制造方法。首先，在基板上形成阴极导电层，绝缘体层和栅极层。在绝缘体层和栅极层中形成开口以露出阴极导电层的一部分。在阴极导电层上形成金属层。进行第一阳极氧化以便从金属层的一部分形成第一金属阳极氧化层。在去除第一金属阳极氧化层之后，形成具有多个孔的第二金属阳极氧化层。此后，在孔中形成催化剂层。然后，在孔中形成多个碳纳米管。

3. 发明申请

US20140141576A1 Manufacturing Method for Switch and Array Substrate 有权
标题翻译：开关阵列基板的制造方法
公开(公告)号：US20140141576A1
公开(公告)日：2014-05-22
申请号：US13701863
申请日：2012-11-23
申请人： Yu-Lien Chou , Po-Lin Chen
发明人： Yu-Lien Chou , Po-Lin Chen
IPC分类号： H01L29/66 , H01L21/8234
CPC分类号： H01L29/458 , H01L29/66765
摘要： The present invention discloses a manufacturing method for a switch and an array substrate. The method comprises: firstly, forming sequentially a first metal layer, an insulating layer, a semiconductor layer, an ohmic contact layer, a second metal layer, a third metal layer and a photoresist layer on a base substrate; after patterning the photoresist layer, etching the third metal layer and the second metal layer to form the input electrode and the output electrode of the switch; using a stripper comprising at least 30% by weight of amine in order to remove the photoresist layer and the residual second metal layer; and finally, etching the ohmic contact layer. Through the above steps, the present invention can avoid the electrical abnormality of the switch and increase process yield of the array substrate.
摘要翻译：本发明公开了一种开关和阵列基板的制造方法。该方法包括：首先在基底基板上依次形成第一金属层，绝缘层，半导体层，欧姆接触层，第二金属层，第三金属层和光致抗蚀剂层; 在图案化光致抗蚀剂层之后，蚀刻第三金属层和第二金属层以形成开关的输入电极和输出电极; 使用包含至少30重量％的胺的汽提器以除去光致抗蚀剂层和残留的第二金属层; 最后蚀刻欧姆接触层。通过上述步骤，本发明可以避免开关的电气异常并提高阵列基板的工艺成品率。

4. 发明授权

US07625788B2 Display element and method of manufacturing the same 有权
标题翻译：显示元件及其制造方法
公开(公告)号：US07625788B2
公开(公告)日：2009-12-01
申请号：US12115855
申请日：2008-05-06
申请人： Po-Lin Chen , Wen-Ching Tsai , Chun-Nan Lin , Kuo-Yuan Tu
发明人： Po-Lin Chen , Wen-Ching Tsai , Chun-Nan Lin , Kuo-Yuan Tu
IPC分类号： H01L21/00 , H01L21/44
CPC分类号： H01L29/458 , H01L27/124 , H01L29/41733
摘要： A display element and a method of manufacturing the same are provided. The method comprises the following steps: forming a first patterned conducting layer with a gate on a substrate and a dielectric layer thereon; forming a patterned semiconductor layer on the dielectric layer, wherein the patterned semiconductor layer has a channel region, a source and a drain, and wherein the source and the drain lie on the opposite sides of the channel region; selectively depositing a barrier layer, which only wraps the patterned semiconductor layer; forming a second patterned conducting layer on the barrier layer and above the source and the drain. In the display element manufactured by the method, the barrier layer only wraps the patterned semiconductor layer.
摘要翻译：提供了一种显示元件及其制造方法。该方法包括以下步骤：在衬底上形成具有栅极的第一图案化导电层和其上的电介质层; 在所述电介质层上形成图案化的半导体层，其中所述图案化半导体层具有沟道区，源极和漏极，并且其中所述源极和漏极位于所述沟道区的相对侧上; 选择性地沉积仅包裹图案化半导体层的阻挡层; 在阻挡层上和源极和漏极之上形成第二图案化导电层。在通过该方法制造的显示元件中，阻挡层仅包裹图案化的半导体层。

5. 发明申请

US20090173944A1 THIN FILM TRANSISTOR, ACTIVE DEVICE ARRAY SUBSTRATE AND LIQUID CRYSTAL DISPLAY PANEL 审中-公开
标题翻译：薄膜晶体管，有源器件阵列基板和液晶显示面板
公开(公告)号：US20090173944A1
公开(公告)日：2009-07-09
申请号：US12049362
申请日：2008-03-16
申请人： Po-Lin Chen , Ting Hsieh , Chun-Nan Lin , Wen-Ching Tsai
发明人： Po-Lin Chen , Ting Hsieh , Chun-Nan Lin , Wen-Ching Tsai
IPC分类号： H01L33/00 , H01L29/786
CPC分类号： H01L29/4908 , H01L29/41733 , H01L29/42384 , H01L29/458 , H01L29/78669
摘要： A thin film transistor (TFT) includes a substrate, a gate, a gate dielectric layer, a channel layer, a source and a drain. The gate and the gate dielectric layer are disposed on the substrate and the gate dielectric layer covers the gate. The channel layer is disposed on the gate dielectric layer over the gate, and the source and the drain are respectively disposed on a portion of the channel layer at both sides of the gate. At least one of the gate, the source and the drain has a lower conductive layer, an upper conductive layer and an intermediate conductive layer located between the lower conductive layer and the upper conductive layer. The material of the lower conductive layer is different from the material of the intermediate conductive layer, and the thickness of the lower conductive layer is less than or equal to about 150 Å.
摘要翻译：薄膜晶体管（TFT）包括衬底，栅极，栅极电介质层，沟道层，源极和漏极。栅极和栅极介电层设置在基板上，栅极电介质层覆盖栅极。沟道层设置在栅极上的栅极介电层上，源极和漏极分别设置在栅极两侧的沟道层的一部分上。栅极，源极和漏极中的至少一个具有位于下导电层和上导电层之间的下导电层，上导电层和中间导电层。下导电层的材料与中间导电层的材料不同，下导电层的厚度小于或等于约150。

6. 发明申请

US20090153056A1 PIXEL STRUCTURE, DISPLAY PANEL, ELETRO-OPTICAL APPARATUS, AND METHOD THEREROF 有权
标题翻译：像素结构，显示面板，ELETRO-OPTICAL设备及其方法
公开(公告)号：US20090153056A1
公开(公告)日：2009-06-18
申请号：US12060873
申请日：2008-04-02
申请人： Po-Lin Chen , Chun-Nan Lin , Shu-Feng Wu , Wen-Ching Tsai
发明人： Po-Lin Chen , Chun-Nan Lin , Shu-Feng Wu , Wen-Ching Tsai
IPC分类号： H01J7/44 , H01L21/04 , H01J9/00
CPC分类号： H01L29/458 , H01L27/124 , H01L27/1255
摘要： A pixel structure disposed on a substrate including a thin film transistor (TFT), a bottom capacitor electrode, a dielectric layer, an upper capacitor electrode, a passivation layer, and a pixel electrode is provided. The TFT having a source/drain and the bottom capacitor electrode are disposed on the substrate. The dielectric layer is disposed on the bottom capacitor electrode. The upper capacitor electrode has a semiconductor layer, a barrier layer, and a metal layer. The semiconductor layer is disposed on the dielectric layer above the bottom capacitor electrode. The barrier layer is disposed on the semiconductor layer. The metal layer whose material includes copper, a copper alloy, or a combination thereof is disposed on the barrier layer. The passivation layer covers the TFT and the upper capacitor electrode and has a first opening exposing the source/drain. The pixel electrode is electrically connected to the TFT through the first opening.
摘要翻译：提供了一种设置在包括薄膜晶体管（TFT），底部电容器电极，电介质层，上部电容器电极，钝化层和像素电极的基板上的像素结构。具有源极/漏极和底部电容器电极的TFT设置在衬底上。电介质层设置在底部电容器电极上。上部电容器电极具有半导体层，阻挡层和金属层。半导体层设置在底部电容器电极上方的电介质层上。阻挡层设置在半导体层上。其材料包括铜，铜合金或其组合的金属层设置在阻挡层上。钝化层覆盖TFT和上电容器电极，并且具有暴露源极/漏极的第一开口。像素电极通过第一开口与TFT电连接。

7. 发明申请

US20070061657A1 Delay fault testing apparatus 审中-公开
标题翻译：延时故障测试仪
公开(公告)号：US20070061657A1
公开(公告)日：2007-03-15
申请号：US11203381
申请日：2005-08-12
申请人： Tsin-Yuan Chang , Po-Lin Chen , Hao-Hsuan Chiu
发明人： Tsin-Yuan Chang , Po-Lin Chen , Hao-Hsuan Chiu
IPC分类号： G01R31/28 , G06F11/00
CPC分类号： G01R31/31858
摘要： A delay fault testing apparatus includes a scan device having a first input for receiving a data to the core under test, an update device including an input electrically connected to a first output of the scan device, a first multiplexer including a first input electrically connected to the output of the scan device, a second input electrically connected to a first output of the update device, and an output electrically connected to an input of the core under test. The first input of the first multiplexer is switched to the output when a first control signal is asserted so that the output of the scan device is allowed to directly connect to the output of the first multiplexer to launch a transition by switching the first multiplexer rather than triggering an update event, which is restricted to be triggered in the time of a negative edge.
摘要翻译：一种延迟故障测试装置包括：扫描装置，具有用于向被测核心接收数据的第一输入端，包括电连接到扫描装置的第一输出端的输入端的更新装置;第一多路复用器，包括电连接到扫描装置的输出，电连接到更新装置的第一输出的第二输入，以及电连接到被测核心的输入的输出。当第一控制信号被断言时，第一多路复用器的第一输入被切换到输出，使得允许扫描装置的输出直接连接到第一多路复用器的输出，以通过切换第一多路复用器来发射转换，而不是触发一个更新事件，这个更新事件被限制为在一个负边缘的时间被触发。

8. 发明申请

US20120270392A1 FABRICATING METHOD OF ACTIVE DEVICE ARRAY SUBSTRATE 审中-公开
标题翻译：主动装置阵列基板的制作方法
公开(公告)号：US20120270392A1
公开(公告)日：2012-10-25
申请号：US13537054
申请日：2012-06-29
申请人： Po-Lin Chen , Chih-Yuan Lin , Yu-Min Lin , Chun-Nan Lin
发明人： Po-Lin Chen , Chih-Yuan Lin , Yu-Min Lin , Chun-Nan Lin
IPC分类号： H01L21/768
CPC分类号： C23C14/165 , C23C14/3492 , H01L27/124 , H01L29/458 , H01L29/4908
摘要： A fabricating method of an active device array substrate is provided. The active device array substrate has at least one patterned conductive layer. The patterned conductive layer includes a copper layer. A cross-section of the copper layer which is parallel to a normal line direction of the copper layer includes a first trapezoid and a second trapezoid stacked on the first trapezoid. A base angle of the first trapezoid and a base angle of the second trapezoid are acute angles, and a difference between the base angle of the first trapezoid and the base angle of the second trapezoid is from about 5° to about 30°.
摘要翻译：提供了一种有源器件阵列衬底的制造方法。有源器件阵列衬底具有至少一个图案化导电层。图案化导电层包括铜层。铜层的与铜层的法线平行的截面包括层叠在第一梯形上的第一梯形和第二梯形。第一梯形的底角和第二梯形的底角是锐角，第一梯形的底角与第二梯形的底角之间的差为约5°至约30°。

9. 发明申请

US20100038645A1 Display Element and Method of Manufacturing the Same 有权
标题翻译：显示元件及其制造方法
公开(公告)号：US20100038645A1
公开(公告)日：2010-02-18
申请号：US12582964
申请日：2009-10-21
申请人： Po-Lin Chen , Wen-Ching Tsai , Chun-Nan Lin , Kuo-Yuan Tu
发明人： Po-Lin Chen , Wen-Ching Tsai , Chun-Nan Lin , Kuo-Yuan Tu
IPC分类号： H01L33/00
CPC分类号： H01L29/458 , H01L27/124 , H01L29/41733
摘要： A display element and a method of manufacturing the same are provided. The method comprises the following steps: forming a first patterned conducting layer with a gate on a substrate and a dielectric layer thereon; forming a patterned semiconductor layer on the dielectric layer, wherein the patterned semiconductor layer has a channel region, a source and a drain, and wherein the source and the drain lie on the opposite sides of the channel region; selectively depositing a barrier layer, which only wraps the patterned semiconductor layer; forming a second patterned conducting layer on the barrier layer and above the source and the drain. In the display element manufactured by the method, the barrier layer only wraps the patterned semiconductor layer.
摘要翻译：提供了一种显示元件及其制造方法。该方法包括以下步骤：在衬底上形成具有栅极的第一图案化导电层和其上的电介质层; 在所述电介质层上形成图案化的半导体层，其中所述图案化半导体层具有沟道区，源极和漏极，并且其中所述源极和漏极位于所述沟道区的相对侧上; 选择性地沉积仅包裹图案化半导体层的阻挡层; 在阻挡层上和源极和漏极之上形成第二图案化导电层。在通过该方法制造的显示元件中，阻挡层仅包裹图案化的半导体层。

10. 发明授权

US08270178B2 Active device array substrate 有权
标题翻译：有源器件阵列衬底
公开(公告)号：US08270178B2
公开(公告)日：2012-09-18
申请号：US12822201
申请日：2010-06-24
申请人： Po-Lin Chen , Chih-Yuan Lin , Yu-Min Lin , Chun-Nan Lin
发明人： Po-Lin Chen , Chih-Yuan Lin , Yu-Min Lin , Chun-Nan Lin
IPC分类号： H05K7/00 , H01L27/14 , H01L23/48
CPC分类号： C23C14/165 , C23C14/3492 , H01L27/124 , H01L29/458 , H01L29/4908
摘要： An active device array substrate has at least one patterned conductive layer. The patterned conductive layer includes a copper layer. A cross-section of the copper layer which is parallel to a normal line direction of the copper layer includes a first trapezoid and a second trapezoid stacked on the first trapezoid. A base angle of the first trapezoid and a base angle of the second trapezoid are acute angles, and a difference between the base angle of the first trapezoid and the base angle of the second trapezoid is from about 5° to about 30°.
摘要翻译：有源器件阵列衬底具有至少一个图案化导电层。图案化导电层包括铜层。铜层的与铜层的法线平行的截面包括层叠在第一梯形上的第一梯形和第二梯形。第一梯形的底角和第二梯形的底角是锐角，第一梯形的底角与第二梯形的底角之间的差为约5°至约30°。

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