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1. 发明授权

US07595490B2 Charged particle beam emitting device and method for operating a charged particle beam emitting device 有权
标题翻译：带电粒子束发射装置和用于操作带电粒子束发射装置的方法
公开(公告)号：US07595490B2
公开(公告)日：2009-09-29
申请号：US11469728
申请日：2006-09-01
申请人： Fang Zhou , Pavel Adamec , Jürgen Frosien , Jimmy Vishnipolsky
发明人： Fang Zhou , Pavel Adamec , Jürgen Frosien , Jimmy Vishnipolsky
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/073 , H01J2237/022 , H01J2237/06325
摘要： A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission current I0 and a lower stable mean emission current IS under a given electric extraction field; applying the given electric extraction field to the emitter for emitting electrons from the emitter surface; performing a cleaning process by applying at least one heating pulse to the cold field emitter for heating the emitter surface, whereby the cleaning process is performed before the emission current of the cold field emitter has declined to the lower stable mean emission value IS; and repeating the cleaning process to keep the emission current of the emitter continuously above the substantially stable emission value IS.
摘要翻译：提供了一种用于操作带电粒子束发射器件的方法，特别是包括冷场发射器的电子束发射器件。该方法包括以下步骤：将冷场发射器置于给定压力的真空中，发射体在给定的电提取场下表现出高的初始发射电流I0和较低的稳定平均发射电流IS; 将给定的电提取场施加到发射器以从发射器表面发射电子; 通过向冷场发射器施加至少一个加热脉冲来加热发射体表面来执行清洁处理，由此在冷场发射器的发射电流已经下降到较低的稳定平均发射值IS之前进行清洁处理; 并重复清洁处理以将发射极的发射电流连续地保持在基本上稳定的发射值IS上。

2. 发明申请

US20070158588A1 CHARGED PARTICLE BEAM EMITTING DEVICE AND METHOD FOR OPERATING A CHARGED PARTICLE BEAM EMITTING DEVICE 有权
标题翻译：充电颗粒射束发射装置和用于操作充电颗粒光束发射装置的方法
公开(公告)号：US20070158588A1
公开(公告)日：2007-07-12
申请号：US11469728
申请日：2006-09-01
申请人： Fang Zhou , Pavel Adamec , Jurgen Frosien , Jimmy Vishnipolsky
发明人： Fang Zhou , Pavel Adamec , Jurgen Frosien , Jimmy Vishnipolsky
IPC分类号： A61N5/00
CPC分类号： H01J37/073 , H01J2237/022 , H01J2237/06325
摘要： A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission current I0 and a lower stable mean emission current IS under a given electric extraction field; applying the given electric extraction field to the emitter for emitting electrons from the emitter surface; performing a cleaning process by applying at least one heating pulse to the cold field emitter for heating the emitter surface, whereby the cleaning process is performed before the emission current of the cold field emitter has declined to the lower stable mean emission value IS; and repeating the cleaning process to keep the emission current of the emitter continuously above the substantially stable emission value IS.
摘要翻译：提供了一种用于操作带电粒子束发射器件的方法，特别是包括冷场发射器的电子束发射器件。该方法包括以下步骤：将冷场发射器置于给定压力的真空中，发射体表现出高的初始发射电流I 0和较低的稳定平均发射电流I S，在给定的电提取场下; 将给定的电提取场施加到发射器以从发射器表面发射电子; 通过对冷场发射器施加至少一个加热脉冲来加热发射体表面来执行清洁处理，由此在冷场发射器的发射电流已经下降到较低的稳定平均发光值I < S

3. 发明申请

US20100320382A1 HIGH THROUGHPUT SEM TOOL 有权
标题翻译：高通量扫描仪刀具
公开(公告)号：US20100320382A1
公开(公告)日：2010-12-23
申请号：US12528307
申请日：2008-02-22
申请人： Gilad Almogy , Avishai Bartov , Jürgen Frosien , Pavel Adamec , Helmut Banzhof
发明人： Gilad Almogy , Avishai Bartov , Jürgen Frosien , Pavel Adamec , Helmut Banzhof
IPC分类号： G01N23/00 , H01J37/147
CPC分类号： H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28 , H01J2237/0635 , H01J2237/1508 , H01J2237/2449 , H01J2237/2817
摘要： A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.
摘要翻译：描述了多光束扫描电子束装置（100）。具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130）用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

4. 发明授权

US07253417B2 Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens 有权
标题翻译：多轴复合透镜，使用复合透镜的光束系统，以及使用复合透镜的方法
公开(公告)号：US07253417B2
公开(公告)日：2007-08-07
申请号：US10539179
申请日：2003-12-12
申请人： Jürgen Frosien , Pavel Adamec
发明人： Jürgen Frosien , Pavel Adamec
IPC分类号： H01J3/07 , H01J29/51
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/145 , H01J37/3177
摘要： The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are used to focus a plurality of charged particle beams in a separate opening for each of at least a plurality a charged particle beams traveling through the optical system.
摘要翻译：本发明提供了一种用于带电粒子多光束系统的光学系统。光学系统包括静电透镜部件和磁性透镜部件。这些部件用于将多个带电粒子束聚焦在分开的开口中，用于至少多个穿过光学系统的带电粒子束中的每一个。

5. 发明授权

US07638777B2 Imaging system with multi source array 有权
标题翻译：具有多源阵列的成像系统
公开(公告)号：US07638777B2
公开(公告)日：2009-12-29
申请号：US10564752
申请日：2004-05-17
申请人： Hans-Peter Feuerbaum , Jürgen Frosien , Uli Hoffmann , Dieter Winkler , Pavel Adamec
发明人： Hans-Peter Feuerbaum , Jürgen Frosien , Uli Hoffmann , Dieter Winkler , Pavel Adamec
IPC分类号： H01J1/50
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/047 , H01J2237/0635
摘要： The present invention provides a charged particle beam device. The device comprises an emitter array for emitting a plurality of charged particle beams. The plurality of charged particle beams are imaged with a lens. An electrode unit is provided for accelerating the plurality of charged particle beams. The potential differences between a first potential of the emitter array, a second potential of the electrode unit, and a third potential of a specimen, are controlled by a first control unit and a second control unit. Thereby, the second potential is capable of accelerating the plurality of charged particle beams with respect to the first potential, and the third potential is capable of decelerating the plurality of charged particle beams with respect to the second potential.
摘要翻译：本发明提供一种带电粒子束装置。该装置包括用于发射多个带电粒子束的发射极阵列。多个带电粒子束用透镜成像。提供电极单元用于加速多个带电粒子束。第一控制单元和第二控制单元控制发射极阵列的第一电位与电极单元的第二电位和第三电位之间的电位差。因此，第二电位能够相对于第一电位加速多个带电粒子束，并且第三电位能够使多个带电粒子束相对于第二电位减速。

6. 发明授权

US07919749B2 Energy filter for cold field emission electron beam apparatus 有权
标题翻译：用于冷场发射电子束装置的能量滤波器
公开(公告)号：US07919749B2
公开(公告)日：2011-04-05
申请号：US12234453
申请日：2008-09-19
申请人： Fang Zhou , Juergen Frosien , Pavel Adamec
发明人： Fang Zhou , Juergen Frosien , Pavel Adamec
IPC分类号： H01J37/244
CPC分类号： H01J37/05 , H01J37/073 , H01J37/153 , H01J2237/057 , H01J2237/06341 , H01J2237/1207 , H01J2237/1534 , H01J2237/28
摘要： An electron beam apparatus and a method for providing an energy-filtered primary electron beam are described. Therein, a primary electron beam having an asymmetric first energy distribution is generated by means of an electron source. The primary electron beam is high-pass energy filtered using a retarding lens.
摘要翻译：描述了一种用于提供能量过滤的一次电子束的电子束装置和方法。其中，通过电子源产生具有不对称的第一能量分布的一次电子束。一次电子束是使用延迟透镜进行高通能量滤波。

7. 发明申请

US20070018562A1 Field emitter arrangement and method of cleansing an emitting surface of a field emitter 审中-公开
标题翻译：场发射器布置和清洁场发射器的发射表面的方法
公开(公告)号：US20070018562A1
公开(公告)日：2007-01-25
申请号：US11489979
申请日：2006-07-20
申请人： Pavel Adamec , Fang Zhou
发明人： Pavel Adamec , Fang Zhou
IPC分类号： H01J1/02
CPC分类号： H01J37/06 , H01J37/02 , H01J37/073 , H01J49/48 , H01J2237/06316
摘要： A field emitter arrangement and a method of cleaning an emitting surface of a field emitter are provided. The field emitter arrangement may include a field emitter tip having an emitting surface, wherein said field emitter tip is adapted to generate a primary beam of charged particles, and at least one electron source adapted to illuminate the emitting surface of the field emitter tip. The method of cleaning the emitting surface may include providing the field emitter having the emitting surface and at least one electron source adapted to illuminate the emitting surface and illuminating the emitting surface of the field emitter with a cleansing electron beam generated by the at least one electron source.
摘要翻译：提供场发射器布置和清洁场发射器的发射表面的方法。场发射器配置可以包括具有发射表面的场发射器尖端，其中所述场发射极尖端适于产生带电粒子的主光束，以及适于照射场发射器尖端的发射表面的至少一个电子源。清洁发射表面的方法可以包括提供具有发射表面的场致发射体和至少一个电子源，其适于照射发射表面并用由至少一个电子产生的清洁电子束照射场发射器的发射表面资源。

8. 发明授权

US07982179B2 Beam current calibration system 有权
标题翻译：光束电流校准系统
公开(公告)号：US07982179B2
公开(公告)日：2011-07-19
申请号：US12366465
申请日：2009-02-05
申请人： Pavel Adamec , Fang Zhou
发明人： Pavel Adamec , Fang Zhou
IPC分类号： H01J23/00 , G12B13/00
CPC分类号： H01J37/244 , H01J37/261 , H01J2237/2443 , H01J2237/24507 , H01J2237/2826
摘要： A charged particle beam device is described. The charged particle beam device includes an emitter adapted for emitting a primary charged particle beam, a specimen location adapted for holding a specimen, from which secondary and/or backscattered charged particles are released on impingement of the primary charged particle beam, a detection unit adapted for detecting the secondary particles and/or secondary particles, and a beam guiding unit adapted for guiding the primary charged particle beam to the detection unit for impingement of a primary charged particle beam on the detection unit.
摘要翻译：描述带电粒子束装置。带电粒子束装置包括适于发射初级带电粒子束的发射器，适于保持试样的试样位置，从而从初级带电粒子束的冲击中释放辅助和/或反向散射的带电粒子，检测单元适于用于检测二次粒子和/或二次粒子的光束引导单元，以及用于将初级带电粒子束引导到检测单元的光束引导单元，用于将一次带电粒子束撞击在检测单元上。

9. 发明授权

US09153413B2 Multi-beam scanning electron beam device and methods of using the same 有权
标题翻译：多光束扫描电子束装置及其使用方法
公开(公告)号：US09153413B2
公开(公告)日：2015-10-06
申请号：US12528307
申请日：2008-02-22
申请人： Gilad Almogy , Avishai Bartov , Juergen Frosien , Pavel Adamec , Helmut Banzhof
发明人： Gilad Almogy , Avishai Bartov , Juergen Frosien , Pavel Adamec , Helmut Banzhof
IPC分类号： G21K7/00 , H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28
CPC分类号： H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28 , H01J2237/0635 , H01J2237/1508 , H01J2237/2449 , H01J2237/2817
摘要： A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.
摘要翻译：描述了多光束扫描电子束装置（100）。具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130）用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

10. 发明授权

US08878148B2 Method and apparatus of pretreatment of an electron gun chamber 有权
标题翻译：电子枪室预处理方法及装置
公开(公告)号：US08878148B2
公开(公告)日：2014-11-04
申请号：US12888978
申请日：2010-09-23
申请人： Pavel Adamec , Ivo Li{hacek over (s)}ka , Gennadij Gluchman , Milan Snabl
发明人： Pavel Adamec , Ivo Li{hacek over (s)}ka , Gennadij Gluchman , Milan Snabl
IPC分类号： G21K5/00 , H01J37/06
CPC分类号： H01J37/06 , H01J2237/022 , H01J2237/06316 , H01J2237/06341
摘要： A method of pre-treating an ultra high vacuum charged particle gun chamber by ion stimulated desorption is provided. The method includes generating a plasma for providing a plasma ion source, and applying a negative potential to at least one surface in the gun chamber, wherein the negative potential is adapted for extracting an ion flux from the plasma ion source to the at least one surface for desorbing contamination particles from the at least one surface by the ion flux impinging on the at least one surface.
摘要翻译：提供了一种通过离子刺激解吸预处理超高真空带电粒子枪室的方法。该方法包括产生用于提供等离子体离子源的等离子体，以及向枪室中的至少一个表面施加负电位，其中负电位适于将离子通量从等离子体离子源提取到至少一个表面用于通过撞击在至少一个表面上的离子通量从至少一个表面解吸污染颗粒。

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