专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07754098B2 Chemical-mechanical polishing composition and method for using the same 有权
标题翻译：化学机械抛光组合物及其使用方法
公开(公告)号：US07754098B2
公开(公告)日：2010-07-13
申请号：US10568727
申请日：2004-09-10
申请人： David J. Schroeder , Kevin J. Moeggenborg
发明人： David J. Schroeder , Kevin J. Moeggenborg
IPC分类号： C09K13/00
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/3212
摘要： The invention provides a chemical-mechanical polishing composition comprising: (a) silica particles, (b) about 5×10−3 to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, barium, and mixtures thereof, based on the total weight of the polishing composition, (c) about 0.1 to about 15 wt. % of an oxidizing agent, and (d) a liquid carrier comprising water. The invention also provides a polishing composition, which optionally comprises an oxidizing agent, comprising about 5×10−3 to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, and mixtures thereof. The invention further provides methods for polishing a substrate using the aforementioned polishing compositions.
摘要翻译：本发明提供了一种化学机械抛光组合物，其包含：（a）二氧化硅颗粒，（b）约5×10 -3至约10毫摩尔/千克至少一种选自钙，锶，钡的碱土金属，及其混合物，基于抛光组合物的总重量，（c）约0.1至约15重量％％的氧化剂，和（d）包含水的液体载体。本发明还提供一种抛光组合物，其任选地包含氧化剂，其包含约5×10 -3至约10毫摩尔/千克至少一种选自钙，锶及其混合物的至少一种碱土金属。本发明还提供了使用上述抛光组合物抛光衬底的方法。

2. 发明申请

US20080057832A1 Chemical-Mechanical Polishing Composition and Method for Using the Same 有权
标题翻译：化学机械抛光组合物及其使用方法
公开(公告)号：US20080057832A1
公开(公告)日：2008-03-06
申请号：US10568727
申请日：2004-09-10
申请人： David J. Schroeder , Kevin J. Moeggenborg
发明人： David J. Schroeder , Kevin J. Moeggenborg
IPC分类号： C09G1/02 , H01L21/321
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/3212
摘要： The invention provides a chemical-mechanical polishing composition comprising: (a) silica particles, (b) about 5×10−3 to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, barium, and mixtures thereof, based on the total weight of the polishing composition, (c) about 0.1 to about 15 wt. % of an oxidizing agent, and (d) a liquid carrier comprising water. The invention also provides a polishing composition, which optionally comprises an oxidizing agent, comprising about 5×10−3 to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, and mixtures thereof. The invention further provides methods for polishing a substrate using the aforementioned polishing compositions.
摘要翻译：本发明提供一种化学机械抛光组合物，其包含：（a）二氧化硅颗粒，（b）约5×10 -3至约10毫摩尔/千克至少一种选自以下的碱土金属：钙，锶，钡及其混合物，基于抛光组合物的总重量，（c）约0.1至约15重量％％的氧化剂，和（d）包含水的液体载体。本发明还提供一种抛光组合物，其任选地包含氧化剂，其包含约5×10 -3至约10毫摩尔/千克至少一种选自钙，锶，及其混合物。本发明还提供了使用上述抛光组合物抛光衬底的方法。

3. 发明授权

US06936543B2 CMP method utilizing amphiphilic nonionic surfactants 有权
标题翻译：使用两亲性非离子表面活性剂的CMP方法
公开(公告)号：US06936543B2
公开(公告)日：2005-08-30
申请号：US10269864
申请日：2002-10-11
申请人： David J. Schroeder , Kevin J. Moeggenborg , Homer Chou , Jeffrey P. Chamberlain , Joseph D. Hawkins , Phillip Carter
发明人： David J. Schroeder , Kevin J. Moeggenborg , Homer Chou , Jeffrey P. Chamberlain , Joseph D. Hawkins , Phillip Carter
IPC分类号： C09G1/02 , C09K3/14 , H01L21/304 , H01L21/3105 , H01L21/312 , H01L21/321 , H01L21/302 , C09K13/00
CPC分类号： C09G1/02 , H01L21/3212
摘要： The invention provides methods of polishing a substrate comprising (i) contacting a substrate comprising at least one metal layer comprising copper with a chemical-mechanical polishing (CMP) system and (ii) abrading at least a portion of the metal layer comprising copper to polish the substrate. The CMP system comprises (a) an abrasive, (b) an amphiphilic nonionic surfactant, (c) a means for oxidizing the metal layer, (d) an organic acid, (e) a corrosion inhibitor, and (f) a liquid carrier. The invention further provides a two-step method of polishing a substrate comprising a first metal layer and a second, different metal layer. The first metal layer is polishing with a first CMP system comprising an abrasive and a liquid carrier, and the second metal layer is polished with a second CMP system comprising (a) an abrasive, (b) an amphiphilic nonionic surfactant, and (c) a liquid carrier.
摘要翻译：本发明提供抛光衬底的方法，其包括（i）使包含铜的至少一个金属层与化学机械抛光（CMP）系统接触的衬底和（ii）研磨包含铜的至少一部分金属以抛光底物。 CMP系统包括（a）研磨剂，（b）两亲性非离子表面活性剂，（c）氧化金属层的方法，（d）有机酸，（e）缓蚀剂，和（f）液体载体。本发明还提供一种抛光包括第一金属层和第二不同金属层的基板的两步法。第一金属层用包括研磨剂和液体载体的第一CMP系统抛光，并且第二金属层用第二CMP系统抛光，所述第二CMP系统包括（a）研磨剂，（b）两亲性非离子表面活性剂，和（c）液体载体。

4. 发明授权

US07485241B2 Chemical-mechanical polishing composition and method for using the same 有权
标题翻译：化学机械抛光组合物及其使用方法
公开(公告)号：US07485241B2
公开(公告)日：2009-02-03
申请号：US10660379
申请日：2003-09-11
申请人： David J. Schroeder , Kevin J. Moeggenborg
发明人： David J. Schroeder , Kevin J. Moeggenborg
IPC分类号： C09K5/00
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/3212
摘要： The invention provides a chemical-mechanical polishing composition comprising: (a) fumed silica particles, (b) about 5×10−3 to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, barium, and mixtures thereof, based on the total weight of the polishing composition, (c) about 0.1 to about 15 wt. % of an oxidizing agent, and (d) a liquid carrier comprising water. The invention also provides a polishing composition, which optionally comprises an oxidizing agent, comprising about 5×10−3 to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, and mixtures thereof. The invention further provides methods for polishing a substrate using the aforementioned polishing compositions.
摘要翻译：本发明提供一种化学机械抛光组合物，其包含：（a）热解法二氧化硅颗粒，（b）约5×10 -3至约10毫摩尔/千克至少一种选自钙，锶，钡，及其混合物，基于抛光组合物的总重量，（c）约0.1至约15重量％％的氧化剂，和（d）包含水的液体载体。本发明还提供一种抛光组合物，其任选地包含氧化剂，其包含约5×10 -3至约10毫摩尔/千克至少一种选自钙，锶及其混合物的至少一种碱土金属。本发明还提供了使用上述抛光组合物抛光衬底的方法。

5. 发明申请

US20100049798A1 FLEXIBLE REMOTE DATA MIRRORING 有权
标题翻译：灵活的远程数据镜像
公开(公告)号：US20100049798A1
公开(公告)日：2010-02-25
申请号：US12612629
申请日：2009-11-04
申请人： Ron McCabe , Robert Church , Tracy Camp , Stuart W. Card , David J. Schroeder
发明人： Ron McCabe , Robert Church , Tracy Camp , Stuart W. Card , David J. Schroeder
IPC分类号： G06F15/16
CPC分类号： H04L67/1095 , G06F3/0619 , G06F3/0626 , G06F3/065 , G06F3/067 , G06F3/0689 , G06F11/1451 , G06F11/2058 , G06F11/2064 , G06F11/2069 , G06F11/2074 , G06F2201/835 , G06F2201/84 , G06F2201/855 , H04L1/08 , H04L1/18 , H04L67/1097
摘要： Methods, systems, and configured storage media are provided for flexible data mirroring. In particular, the invention provides many-to-one data mirroring, including mirroring from local servers running the same or different operating systems and/or file systems at two or more geographically dispersed locations. The invention also provides one-to-many data mirroring, mirroring with or without a dedicated private telecommunications link, and mirroring with or without a dedicated server or another server at the destination(s) to assist the remote mirroring unit(s). In addition, the invention provides flexibility by permitting the use of various combinations of one or more external storage units and/or RAID units to hold mirrored data. Spoofing, SCSI and other bus emulations, and further tools and techniques are used in various embodiments of the invention.
摘要翻译：提供了方法，系统和配置的存储介质，用于灵活的数据镜像。特别地，本发明提供了多对一的数据镜像，包括从在两个或更多地理上分散的位置处运行相同或不同的操作系统和/或文件系统的本地服务器进行镜像。本发明还提供一对多数据镜像，具有或不具有专用私人电信链路的镜像，以及在目的地处有或没有专用服务器或另一服务器的镜像，以协助远程镜像单元。此外，本发明通过允许使用一个或多个外部存储单元和/或RAID单元的各种组合来保存镜像数据来提供灵活性。在本发明的各种实施例中，使用了欺骗，SCSI和其它总线仿真以及其它工具和技术。

6. 发明授权

US06612911B2 Alkali metal-containing polishing system and method 失效
公开(公告)号：US06612911B2
公开(公告)日：2003-09-02
申请号：US10044174
申请日：2002-01-11
申请人： Phillip Carter , Gregory H. Bogush , Francesco M. De Rege , Jeffrey P. Chamberlain , David J. Schroeder , Brian L. Mueller
发明人： Phillip Carter , Gregory H. Bogush , Francesco M. De Rege , Jeffrey P. Chamberlain , David J. Schroeder , Brian L. Mueller
IPC分类号： B24B1900
CPC分类号： C09G1/02 , C09K3/1463 , C09K3/1472
摘要： The invention provides a polishing system comprising (a) a liquid carrier, (b) an alkali metal ion, (c) a compound comprising an amine group and at least one polar moiety, wherein the polar moiety contains at least one oxygen atom, and (d) a polishing pad and/or an abrasive, wherein the total ion concentration of the system is above the critical coagulation concentration. The invention also provides a method of planarizing or polishing a composite substrate comprising contacting the substrate with a the aforementioned polishing system or a polishing system comprising (a) a liquid carrier, (b) an alkali metal ion, (c) a compound comprising an amine group and at least one polar moiety, wherein the polar moiety contains at least one oxygen atom, and (d) a polishing pad and/or an abrasive, and polishing at least a portion of the substrate therewith in about 6 hours or less after the polishing system is prepared.

7. 发明授权

US06821897B2 Method for copper CMP using polymeric complexing agents 有权
标题翻译：使用聚合物络合剂的铜CMP的方法
公开(公告)号：US06821897B2
公开(公告)日：2004-11-23
申请号：US10246280
申请日：2002-09-18
申请人： David J. Schroeder , Phillip Carter , Jeffrey P. Chamberlain , Kyle Miller , Isaac K. Cherian
发明人： David J. Schroeder , Phillip Carter , Jeffrey P. Chamberlain , Kyle Miller , Isaac K. Cherian
IPC分类号： H01L2144
CPC分类号： C23F3/06 , C09G1/02 , C09K3/1436 , C09K3/1463 , H01L21/3212
摘要： The invention provides a method of polishing a substrate comprising a metal layer comprising copper. The method comprises the steps of (i) providing a chemical-mechanical polishing system comprising a liquid carrier, a polishing pad, an abrasive, and a negatively-charged polymer or copolymer, (ii) contacting the substrate with the poloshing system, and (iii) abrading at least a portion of the substrate to polish the metal layer of the substrate. The negatively-charged polymer or copolymer comprises one or more monomers selected from sulfonic acids, sulfonates, sulfates, phosphonic acids, phosphonates, and phosphates, has a molecular weight of about 20,000 g/mol or more, and coats at least a portion of the abrasive such that the abrasive has a zeta potential value that is lowered upon interaction of the negatively-charged polymer or copolymer with the abrasive.
摘要翻译：本发明提供了一种抛光包含铜的金属层的衬底的方法。该方法包括以下步骤：（i）提供包括液体载体，抛光垫，研磨剂和带负电荷的聚合物或共聚物的化学机械抛光系统，（ii）使基底与爆破系统接触，和（ iii）研磨衬底的至少一部分以抛光衬底的金属层。带负电荷的聚合物或共聚物包含一种或多种选自磺酸，磺酸盐，硫酸盐，膦酸，膦酸盐和磷酸盐的单体，其分子量为约20,000g / mol或更高，并且涂覆至少一部分研磨剂使得研磨剂具有在带负电荷的聚合物或共聚物与研磨剂相互作用时降低的ζ电位值。

8. 发明申请

US20100119810A1 COMPOSITIONALLY UNIFORM, MULTI-LAYER, GROUP VB, HYDROGEN TRANSPORT MEMBRANE 审中-公开
标题翻译：组合平衡，多层，VB组，氢运输膜
公开(公告)号：US20100119810A1
公开(公告)日：2010-05-13
申请号：US12268636
申请日：2008-11-11
申请人： Kevin Krist , Shiguang Li , David J. Schroeder , Chakravarthy Sishtla , Estela T. Ong , Qinbai Fan
发明人： Kevin Krist , Shiguang Li , David J. Schroeder , Chakravarthy Sishtla , Estela T. Ong , Qinbai Fan
IPC分类号： B32B3/26
CPC分类号： C22C27/025 , B22F1/0074 , B22F3/1121 , B22F3/22 , B22F7/004 , C01B3/503 , C01B2203/0405 , C01B2203/047 , C01B2203/0475 , C01B2203/048 , C01B2203/0495 , C22C27/02 , Y10T428/24998 , Y10T428/249981
摘要： A hydrogen-selective membrane material having a dense inner membrane layer composed of a Group VB alloy and no Pd disposed between two porous outer membrane support layers composed of the same Group VB alloy and no Pd or other noble metal, the amount of the Group VB alloy being greater than about 90 atomic % of each layer.
摘要翻译：一种氢选择性膜材料，其具有由VB族合金构成的致密的内膜层，并且不配置在由相同的VB族合金和不含Pd或其它贵金属构成的两个多孔外膜支撑层之间，VB组合金大于每层的约90原子％。

9. 发明申请

US20090313389A1 FLEXIBLE REMOTE DATA MIRRORING 有权
标题翻译：灵活的远程数据镜像
公开(公告)号：US20090313389A1
公开(公告)日：2009-12-17
申请号：US12544979
申请日：2009-08-20
申请人： Ron McCabe , Robert Church , Tracy Camp , Stuart W. Card , David J. Schroeder
发明人： Ron McCabe , Robert Church , Tracy Camp , Stuart W. Card , David J. Schroeder
IPC分类号： G06F15/16
CPC分类号： H04L67/1095 , G06F3/0619 , G06F3/0626 , G06F3/065 , G06F3/067 , G06F3/0689 , G06F11/1451 , G06F11/2058 , G06F11/2064 , G06F11/2069 , G06F11/2074 , G06F2201/835 , G06F2201/84 , G06F2201/855 , H04L1/08 , H04L1/18 , H04L67/1097
摘要： Methods, systems, and configured storage media are provided for flexible data mirroring. In particular, the invention provides many-to-one data mirroring, including mirroring from local servers running the same or different operating systems and/or file systems at two or more geographically dispersed locations. The invention also provides one-to-many data mirroring, mirroring with or without a dedicated private telecommunications link, and mirroring with or without a dedicated server or another server at the destination(s) to assist the remote mirroring unit(s). In addition, the invention provides flexibility by permitting the use of various combinations of one or more external storage units and/or RAID units to hold mirrored data. Spoofing, SCSI and other bus emulations, and further tools and techniques are used in various embodiments of the invention.
摘要翻译：提供了方法，系统和配置的存储介质，用于灵活的数据镜像。特别地，本发明提供了多对一的数据镜像，包括从在两个或更多地理上分散的位置处运行相同或不同的操作系统和/或文件系统的本地服务器进行镜像。本发明还提供一对多数据镜像，具有或不具有专用私人电信链路的镜像，以及在目的地处有或没有专用服务器或另一服务器的镜像，以协助远程镜像单元。此外，本发明通过允许使用一个或多个外部存储单元和/或RAID单元的各种组合来保存镜像数据来提供灵活性。在本发明的各种实施例中，使用了欺骗，SCSI和其它总线仿真以及其它工具和技术。

10. 发明授权

US07203732B2 Flexible remote data mirroring 有权
标题翻译：灵活的远程数据镜像
公开(公告)号：US07203732B2
公开(公告)日：2007-04-10
申请号：US09873977
申请日：2001-06-02
申请人： Ron McCabe , Tracy Camp , Stuart W. Card , David J. Schroeder
发明人： Ron McCabe , Tracy Camp , Stuart W. Card , David J. Schroeder
IPC分类号： G06F15/16 , G06F12/00 , G06F11/00
CPC分类号： G06F11/2069 , G06F3/0614 , G06F3/065 , G06F3/067 , G06F11/2058 , G06F11/2064 , G06F11/2071 , G06F11/2074 , G06F11/2079 , G06F11/2082
摘要： Methods, systems, and configured storage media are provided for flexible data mirroring. In particular, the invention provides local-remote role reversal, implementation of hot standby server status through a “media not ready” signal, several alternate buffer contents and buffering schemes, transactioning, many-to-one mirroring through use of “virtual” remote mirroring units, identification of frequently accessed data without application-specific knowledge but based instead on an application's logged and analyzed behavior, and use of the secondary server in a non-authoritative manner.
摘要翻译：提供了方法，系统和配置的存储介质，用于灵活的数据镜像。特别地，本发明通过“媒体未就绪”信号，多个备用缓冲区内容和缓冲方案实现了本地远程角色反转，实现了热备用服务器状态，通过使用“虚拟”远程进行事务处理，多对一镜像镜像单元，识别经常访问的数据，而不是基于应用程序的知识，而是基于应用程序的记录和分析的行为，以及以非授权方式使用辅助服务器。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式