专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5908889A Polyamide binders for ceramics manufacture 失效
标题翻译：陶瓷制造用聚酰胺粘合剂
公开(公告)号：US5908889A
公开(公告)日：1999-06-01
申请号：US39550
申请日：1998-03-16
申请人： Kristy M. Bailey , Kevin J. Moeggenborg
发明人： Kristy M. Bailey , Kevin J. Moeggenborg
IPC分类号： C04B35/634 , C08F283/10 , C08G69/26 , C08G69/48 , C08K3/00 , C08L63/00 , C08K3/10
CPC分类号： C08K3/0008 , C04B35/634 , C08F283/10 , C08G69/26 , C08G69/48 , C08L63/00
摘要： A method for binding ceramic materials in aqueous media is disclose. The method utilizes water-soluble polyamides prepared by condensation polymerization for binding various classes of ceramic materials.
摘要翻译：公开了一种在水性介质中结合陶瓷材料的方法。该方法利用通过缩聚制备的水溶性聚酰胺结合各种类型的陶瓷材料。

2. 发明授权

US5525665A Co-polymer containing compositions for ceramic processing 失效
标题翻译：含共聚物的陶瓷加工组合物
公开(公告)号：US5525665A
公开(公告)日：1996-06-11
申请号：US447019
申请日：1995-05-22
申请人： Kevin J. Moeggenborg , Peter E. Reed
发明人： Kevin J. Moeggenborg , Peter E. Reed
IPC分类号： C04B35/634 , C08J5/10 , C08K3/18 , C08K3/22 , C08L77/12
CPC分类号： C04B35/634 , C04B35/63444
摘要： A composition suitable for use as a binder of ceramic materials is disclosed. The improved binder contains substantially hydrolyzed copolymer made from monomers having ester or amide functional groups, poly(vinyl formamide) or a copolymer of vinyl alcohol and vinyl amine.
摘要翻译：公开了适合用作陶瓷材料的粘合剂的组合物。改进的粘合剂含有由具有酯或酰胺官能团的单体，聚（乙烯基甲酰胺）或乙烯醇和乙烯基胺的共聚物制成的基本上水解的共聚物。

3. 发明授权

US06974777B2 CMP compositions for low-k dielectric materials 有权
标题翻译：用于低k电介质材料的CMP组合物
公开(公告)号：US06974777B2
公开(公告)日：2005-12-13
申请号：US10165100
申请日：2002-06-07
申请人： Kevin J. Moeggenborg , Homer Chou , Joseph D. Hawkins , Jeffrey P. Chamberlain
发明人： Kevin J. Moeggenborg , Homer Chou , Joseph D. Hawkins , Jeffrey P. Chamberlain
IPC分类号： B24B37/00 , C09G1/02 , C09K3/14 , H01L21/304 , H01L21/3105 , H01L21/312 , H01L21/321 , H01L21/302 , C09K13/00 , C09K13/06
CPC分类号： H01L21/3212 , C09G1/02 , H01L21/02126 , H01L21/31053 , H01L21/312
摘要： The invention provides a method of polishing a substrate containing a low-k dielectric layer comprising (i) contacting the substrate with a chemical-mechanical polishing system comprising (a) an abrasive, a polishing pad, or a combination thereof, (b) an amphiphilic nonionic surfactant, and (c) a liquid carrier, and (ii) abrading at least a portion of the substrate to polish the substrate.
摘要翻译：本发明提供了一种抛光含有低k电介质层的衬底的方法，包括（i）使衬底与化学机械抛光系统接触，所述化学机械抛光系统包括（a）研磨剂，抛光垫或其组合，（b）两亲性非离子表面活性剂，和（c）液体载体，和（ii）研磨至少一部分基材以抛光基材。

4. 发明授权

US06527622B1 CMP method for noble metals 有权
标题翻译：贵金属的CMP方法
公开(公告)号：US06527622B1
公开(公告)日：2003-03-04
申请号：US10054059
申请日：2002-01-22
申请人： Vlasta Brusic , Francesco M. De Rege , Kevin J. Moeggenborg , Isaac K. Cherian , Renjie Zhou
发明人： Vlasta Brusic , Francesco M. De Rege , Kevin J. Moeggenborg , Isaac K. Cherian , Renjie Zhou
IPC分类号： B24B100
CPC分类号： H01L21/3212 , B24B37/044 , C09G1/02 , C09K3/1463 , C23F3/04 , C23F3/06 , H01L28/65
摘要： The invention provides a method of polishing a substrate comprising a noble metal comprising (i) contacting the substrate with a CMP system and (ii) abrading at least a portion of the substrate to polish the substrate. The CMP systems each comprise an abrasive and/or polishing pad, a liquid carrier, and optionally one or more polishing additives. In a first embodiment, the polishing additives are selected from the group consisting of diketones, diketonates, heterocyclic nitrogen-containing compounds, heterocyclic oxygen-containing compounds, heterocyclic phosphorus-containing compounds, urea compounds, nitrogen-containing compounds that can be zwitterionic compounds, salts thereof, and combinations thereof. In a second embodiment, the polishing additive is a metal compound with two or more oxidation states and is used in conjunction with a peroxy-type oxidizer. In a third embodiment, the CMP system comprises &agr;-alumina and fumed alumina, wherein the weight ratio of &agr;-alumina to fumed alumina is about 0.6:1 to about 9:1.
摘要翻译：本发明提供一种抛光包括贵金属的基材的方法，包括（i）使基板与CMP系统接触，以及（ii）研磨基材的至少一部分以抛光基材。 CMP系统各自包括磨料和/或抛光垫，液体载体和任选的一种或多种抛光添加剂。在第一实施方案中，抛光添加剂选自二酮，二酮，杂环含氮化合物，含杂环氧的化合物，含杂环的化合物，尿素化合物，可以是两性离子化合物的含氮化合物，其盐，及其组合。在第二实施方案中，抛光添加剂是具有两种或更多种氧化态的金属化合物，并与过氧型氧化剂结合使用。在第三个实施方案中，CMP系统包括α-氧化铝和热解氧化铝，其中α-氧化铝与热解氧化铝的重量比为约0.6:1至约9:1。

5. 发明授权

US6153106A Method for inhibiting the formation and deposition of silica scale in water systems 失效
标题翻译：抑制二氧化硅垢在水体系中的形成和沉积的方法
公开(公告)号：US6153106A
公开(公告)日：2000-11-28
申请号：US261821
申请日：1999-03-03
申请人： Douglas G. Kelley , Kevin J. Moeggenborg , David P. Workman
发明人： Douglas G. Kelley , Kevin J. Moeggenborg , David P. Workman
IPC分类号： C02F5/12
CPC分类号： C02F5/12
摘要： The present invention relates to a method for inhibiting the formation and deposition of silica scale in water systems. The method includes treating the water in such water systems with an effective amount of a polyamide that exhibits secondary amine and/or ether and amide functional groups.
摘要翻译：本发明涉及一种抑制二氧化硅垢在水体系中的形成和沉积的方法。该方法包括用有效量的显示仲胺和/或醚和酰胺官能团的聚酰胺处理这种水体系中的水。

6. 发明授权

US5880237A Preparation and utility of water-soluble polymers having pendant derivatized amide, ester or ether functionalities as ceramics dispersants and binders 失效
公开(公告)号：US5880237A
公开(公告)日：1999-03-09
申请号：US982590
申请日：1997-12-04
申请人： Christopher P. Howland , Kevin J. Moeggenborg , John D. Morris , Peter E. Reed , Jiansheng Tang , Jin-Shan Wang
发明人： Christopher P. Howland , Kevin J. Moeggenborg , John D. Morris , Peter E. Reed , Jiansheng Tang , Jin-Shan Wang
IPC分类号： C04B35/632 , C02F5/12 , C04B35/634 , C08F20/58 , C08F220/26 , C08F220/54 , C08F222/38
CPC分类号： C04B35/634 , C02F5/12 , C02F5/125 , C04B35/63444 , C08F20/58 , C04B2103/0053
摘要： Methods for dispersing and binding ceramic materials in aqueous media are disclosed. The methods utilize water-soluble polymers having pendant derivatized amide, ester or ether functionalities for dispersing and binding various classes of ceramic materials.

7. 发明授权

US07485241B2 Chemical-mechanical polishing composition and method for using the same 有权
标题翻译：化学机械抛光组合物及其使用方法
公开(公告)号：US07485241B2
公开(公告)日：2009-02-03
申请号：US10660379
申请日：2003-09-11
申请人： David J. Schroeder , Kevin J. Moeggenborg
发明人： David J. Schroeder , Kevin J. Moeggenborg
IPC分类号： C09K5/00
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/3212
摘要： The invention provides a chemical-mechanical polishing composition comprising: (a) fumed silica particles, (b) about 5×10−3 to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, barium, and mixtures thereof, based on the total weight of the polishing composition, (c) about 0.1 to about 15 wt. % of an oxidizing agent, and (d) a liquid carrier comprising water. The invention also provides a polishing composition, which optionally comprises an oxidizing agent, comprising about 5×10−3 to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, and mixtures thereof. The invention further provides methods for polishing a substrate using the aforementioned polishing compositions.
摘要翻译：本发明提供一种化学机械抛光组合物，其包含：（a）热解法二氧化硅颗粒，（b）约5×10 -3至约10毫摩尔/千克至少一种选自钙，锶，钡，及其混合物，基于抛光组合物的总重量，（c）约0.1至约15重量％％的氧化剂，和（d）包含水的液体载体。本发明还提供一种抛光组合物，其任选地包含氧化剂，其包含约5×10 -3至约10毫摩尔/千克至少一种选自钙，锶及其混合物的至少一种碱土金属。本发明还提供了使用上述抛光组合物抛光衬底的方法。

8. 发明授权

US06841479B2 Method of reducing in-trench smearing during polishing 失效
标题翻译：减少抛光过程中槽内拖尾的方法
公开(公告)号：US06841479B2
公开(公告)日：2005-01-11
申请号：US10119862
申请日：2002-04-10
申请人： Isaac K. Cherian , Paul M. Feeney , Kevin J. Moeggenborg
发明人： Isaac K. Cherian , Paul M. Feeney , Kevin J. Moeggenborg
IPC分类号： H01L21/02 , H01L21/3105 , H01L21/321 , H01L21/762 , H01L21/302
CPC分类号： H01L21/76224 , H01L21/31053 , H01L21/31058 , H01L21/3212 , H01L28/91
摘要： The invention provides a method of reducing in-trench smearing during polishing. The method comprises providing a substrate comprising a first layer comprising an insulating material, a second layer comprising a filling material, and a plurality of field and trench regions. A polymeric material is infiltrated over the substrate, wherein the polymeric material fills the trench regions and covers the field regions. The polymeric material optionally is removed from the field regions, followed by baking of the substrate such that the polymeric material in the trench regions becomes recessed below the insulating material of the field regions. The substrate is then subjected to a temperature of about 100° C. or more for about 30 minutes or longer, such that during polishing of the substrate, smearing of the filling material in the trench regions is reduced as compared to polishing of the substrate under the same conditions except for subjecting the substrate to the temperature of about 100° C. or more for about 30 minutes or longer. When desirable, a layer of additional material can be deposited over the polymeric material such that it forms a layer over the polymeric material in the trench regions and the filling material in the field regions. The substrate is then polished to obtain a substantially planar surface.
摘要翻译：本发明提供一种在抛光过程中减少槽内拖尾的方法。该方法包括提供一种包括第一层的衬底，该第一层包括绝缘材料，第二层包括填充材料，以及多个场和沟槽区域。聚合物材料渗透到基底上，其中聚合物材料填充沟槽区域并覆盖场区域。聚合物材料任选地从场区域移除，随后烘烤基底，使得沟槽区域中的聚合物材料变得凹陷在场区域的绝缘材料之下。然后将衬底经受约100℃或更长的温度约30分钟或更长时间，使得在衬底的抛光期间，与在衬底下方的衬底的抛光相比，沟槽区域中填充材料的污迹减少除了对基板进行约100℃以上的温度约30分钟以上的条件以外，进行相同的条件。当需要时，可以在聚合物材料上沉积一层附加材料，使得其在沟槽区域中的聚合物材料和场区域中的填充材料上形成一层。然后将基底抛光以获得基本平坦的表面。

9. 发明授权

US6075082A Cross-linked polymide binders for ceramics manufacture 失效
标题翻译：用于陶瓷制造的交联聚酰胺粘合剂
公开(公告)号：US6075082A
公开(公告)日：2000-06-13
申请号：US162960
申请日：1998-09-29
申请人： David P. Workman , Kristy M. Bailey , Kevin J. Moeggenborg
发明人： David P. Workman , Kristy M. Bailey , Kevin J. Moeggenborg
IPC分类号： C04B35/632 , C04B35/634 , C08F283/10 , C08G69/26 , C08G69/48 , C08K3/00 , C08K3/10 , C08L63/00
CPC分类号： C04B35/63472 , C04B35/634 , C08F283/10 , C08G69/26 , C08G69/48 , C08K3/0008 , C08L63/00
摘要： A method for binding ceramic materials in aqueous media is disclosed. The method utilizes water-soluble cross-linked polyamides prepared by condensation polymerization for binding various classes of ceramic materials.
摘要翻译：公开了一种在水介质中结合陶瓷材料的方法。该方法利用通过缩聚制备的水溶性交联聚酰胺来结合各种类型的陶瓷材料。

10. 发明授权

US5726267A Preparation and utility of water-soluble polymers having pendant derivatized amide, ester or ether functionalities as ceramics dispersants and binders 失效
公开(公告)号：US5726267A
公开(公告)日：1998-03-10
申请号：US792610
申请日：1997-01-31
申请人： Christopher P. Howland , Kevin J. Moeggenborg , John D. Morris , Peter E. Reed , Jiansheng Tang , Jin-shan Wang
发明人： Christopher P. Howland , Kevin J. Moeggenborg , John D. Morris , Peter E. Reed , Jiansheng Tang , Jin-shan Wang
IPC分类号： C04B35/632 , C02F5/12 , C04B35/634 , C08F20/58 , C08F220/26 , C08F220/54 , C08F222/38
CPC分类号： C08F20/58 , C02F5/12 , C02F5/125 , C04B35/634 , C04B35/63444
摘要： Methods for dispersing and binding ceramic materials in aqueous media are disclosed. The methods utilize water-soluble polymers having pendant derivatized amide, ester or ether functionalities for dispersing and binding various classes of ceramic materials.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式