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1. 发明授权

US07536774B2 Method and apparatus for integrating a stair notch and a gap bump at a pole tip in a write head 失效
标题翻译：用于将台阶缺口和间隙凸起集成在写头中的极尖处的方法和装置
公开(公告)号：US07536774B2
公开(公告)日：2009-05-26
申请号：US11399821
申请日：2006-04-07
申请人： Daniel Wayne Bedell , Wen-Chien David Hsiao , Ming Jiang , Hieu Lam , Kim Y. Lee , Jyh-Shuey Lo , Aron Pentek
发明人： Daniel Wayne Bedell , Wen-Chien David Hsiao , Ming Jiang , Hieu Lam , Kim Y. Lee , Jyh-Shuey Lo , Aron Pentek
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , Y10T29/49043
摘要： A method and apparatus for integrating a stair notch and a gap bump at a pole tip in a write head is disclosed. A protective plated layer is formed over the bump to prevent the bump form being damaged during formation of the notch at the pole tip. The flux from the second pole outside of the track will be effectively channeled to the first pole piece under the alumina bump.
摘要翻译：公开了一种用于将写入头中的极尖处的台阶缺口和间隙凸起集成的方法和装置。在凸起之上形成保护镀层，以防止在极尖处形成凹口期间凸起形状被损坏。来自轨道外部的第二极的磁通将有效地引导到氧化铝凸块下方的第一极靴。

2. 发明授权

US07593186B2 P1 write pole with shoulder formation 失效
标题翻译： P1写柱与肩形
公开(公告)号：US07593186B2
公开(公告)日：2009-09-22
申请号：US11046740
申请日：2005-01-31
申请人： Daniel Wayne Bedell , Hung-Chin Guthrie , Ming Jiang , Hieu Lam , Jyh-Shuey Lo , Edward Hin Pong Lee , Aron Pentek
发明人： Daniel Wayne Bedell , Hung-Chin Guthrie , Ming Jiang , Hieu Lam , Jyh-Shuey Lo , Edward Hin Pong Lee , Aron Pentek
IPC分类号： G11B5/39 , G11B5/147
CPC分类号： G11B5/1871 , G11B5/3116
摘要： A magnetic disk drive head is disclosed including a write head, which includes a P1 layer having a pedestal portion, a gap layer formed on the P1 layer, and a P2 layer formed on the gap layer. The P1 layer includes a shoulder formation having a neck portion and a beveled portion. Also disclosed is a disk drive having a write head with a P1 layer with shoulder formation, and a method for fabricating a write pole for a magnetic recording head having a P1 layer with shoulder formation.
摘要翻译：公开了一种包括写头的磁盘驱动器头，该写头包括具有基座部分的P1层，在P1层上形成的间隙层和形成在间隙层上的P2层。 P1层包括具有颈部和斜面部分的肩部结构。还公开了具有具有肩部形成的P1层的写入头的磁盘驱动器，以及用于制造具有具有肩部形成的P1层的磁性记录头的写入磁极的方法。

3. 发明申请

US20100107402A1 Methods Of Making Magnetic Write Heads With Use Of A Resist Channel Shrinking Solution Having Corrosion Inhibitors 失效
标题翻译：使用具有腐蚀抑制剂的抗蚀剂通道收缩溶液制造磁性写头的方法
公开(公告)号：US20100107402A1
公开(公告)日：2010-05-06
申请号：US12685455
申请日：2010-01-11
申请人： Christian Rene Bonhote , Jila Tabib , Dennis Richard Mckean , Daniel Wayne Bedell , Jyh-Shuey Lo , Hieu Lam , Kim Y. Lee
发明人： Christian Rene Bonhote , Jila Tabib , Dennis Richard Mckean , Daniel Wayne Bedell , Jyh-Shuey Lo , Hieu Lam , Kim Y. Lee
IPC分类号： G11B5/127 , B05D3/02
CPC分类号： G11B5/3116 , G11B5/3163 , Y10T29/49032 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49048 , Y10T29/49052
摘要： One preferred method for use in making a device structure with use of the resist channel shrinking solution includes the steps of forming a first pedestal portion within a channel of a patterned resist; applying a resist channel shrinking solution comprising a resist channel shrinking film and corrosion inhibitors within the channel of the patterned resist; baking the resist channel shrinking solution over the patterned resist to thereby reduce a width of the channel of the patterned resist; removing the resist channel shrinking solution; and forming a second pedestal portion within the reduced-width channel of the patterned resist. Advantageously, the oxide layer and the corrosion inhibitors of the resist channel shrinking solution reduce corrosion in the pedestal during the act of baking the resist channel shrinking solution.
摘要翻译：用于制造使用抗蚀剂通道收缩溶液的器件结构的一种优选方法包括在图案化抗蚀剂的通道内形成第一基座部分的步骤; 在图案化的抗蚀剂的通道内施加包含抗蚀剂通道收缩膜和腐蚀抑制剂的抗蚀剂通道收缩溶液; 在图案化的抗蚀剂上烘烤抗蚀剂通道收缩溶液，从而减小图案化抗蚀剂的通道的宽度; 去除抗蚀剂通道收缩溶液; 以及在所述图案化抗蚀剂的所述减小宽度的通道内形成第二基座部分。有利地，抗蚀剂通道收缩溶液的氧化物层和腐蚀抑制剂在烘烤抗蚀剂通道收缩溶液的作用下降低了基座中的腐蚀。

4. 发明授权

US07612964B2 Magnetic write head having a self aligned, steep shoulder pole structure and method of manufacture thereof 失效
标题翻译：具有自对准陡肩极结构的磁写头及其制造方法
公开(公告)号：US07612964B2
公开(公告)日：2009-11-03
申请号：US11228783
申请日：2005-09-15
申请人： Daniel Wayne Bedell , Hieu Lam , Kim Y. Lee , Jyh-Shuey Lo
发明人： Daniel Wayne Bedell , Hieu Lam , Kim Y. Lee , Jyh-Shuey Lo
IPC分类号： G11B5/187
CPC分类号： G11B5/3116 , G11B5/3163
摘要： A magnetic write head and method of manufacture thereof that has a first pole structure having a notched structure configured with a steep shoulder portion and a narrow vertical notch portion extending from the top of the steep shoulder portion. The write head also includes a second pole structure (P2) that has a very narrow width (track width) and that is self aligned with the narrow vertical notch structure of the first pole structure. The write head provides excellent magnetic properties including a very narrow track width and minimal side writing, while avoiding magnetic saturation of the poles.
摘要翻译：一种磁写头及其制造方法，其具有第一极结构，其具有构造为具有陡峭肩部的切口结构和从陡峭肩部的顶部延伸的窄垂直切口部。写头还包括具有非常窄的宽度（轨道宽度）并且与第一极结构的窄垂直切口结构自对准的第二极结构（P2）。写头提供优异的磁性，包括非常窄的轨道宽度和最小的侧面写入，同时避免极点的磁饱和。

5. 发明授权

US08230582B2 Methods of making magnetic write heads with use of a resist channel shrinking solution having corrosion inhibitors 失效
标题翻译：使用具有腐蚀抑制剂的抗蚀剂通道收缩溶液制造磁性写入头的方法
公开(公告)号：US08230582B2
公开(公告)日：2012-07-31
申请号：US12685455
申请日：2010-01-11
申请人： Christian Rene Bonhote , Jila Tabib , Dennis Richard Mckean , Daniel Wayne Bedell , Jyh-Shuey Lo , Heiu Lam , Kim Y Lee
发明人： Christian Rene Bonhote , Jila Tabib , Dennis Richard Mckean , Daniel Wayne Bedell , Jyh-Shuey Lo , Heiu Lam , Kim Y Lee
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3116 , G11B5/3163 , Y10T29/49032 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49048 , Y10T29/49052
摘要： One preferred method for use in making a device structure with use of the resist channel shrinking solution includes the steps of forming a first pedestal portion within a channel of a patterned resist; applying a resist channel shrinking solution comprising a resist channel shrinking film and corrosion inhibitors within the channel of the patterned resist; baking the resist channel shrinking solution over the patterned resist to thereby reduce a width of the channel of the patterned resist; removing the resist channel shrinking solution; and forming a second pedestal portion within the reduced-width channel of the patterned resist. Advantageously, the oxide layer and the corrosion inhibitors of the resist channel shrinking solution reduce corrosion in the pedestal during the act of baking the resist channel shrinking solution.
摘要翻译：用于制造使用抗蚀剂通道收缩溶液的器件结构的一种优选方法包括在图案化抗蚀剂的通道内形成第一基座部分的步骤; 在图案化的抗蚀剂的通道内施加包含抗蚀剂通道收缩膜和腐蚀抑制剂的抗蚀剂通道收缩溶液; 在图案化的抗蚀剂上烘烤抗蚀剂通道收缩溶液，从而减小图案化抗蚀剂的通道的宽度; 去除抗蚀剂通道收缩溶液; 以及在所述图案化抗蚀剂的所述减小宽度的通道内形成第二基座部分。有利地，抗蚀剂通道收缩溶液的氧化物层和腐蚀抑制剂在烘烤抗蚀剂通道收缩溶液的作用下降低了基座中的腐蚀。

6. 发明授权

US07363698B2 Process for creating a write head by forming a bump after the top pole is formed 失效
标题翻译：用于通过在形成顶极之后形成凸起来产生写入头的过程
公开(公告)号：US07363698B2
公开(公告)日：2008-04-29
申请号：US10956221
申请日：2004-09-30
申请人： Amanda Baer , Hamid Balamane , Daniel Wayne Bedell , Jyh-Shuey Jerry Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
发明人： Amanda Baer , Hamid Balamane , Daniel Wayne Bedell , Jyh-Shuey Jerry Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/1871 , G11B5/3163 , Y10T29/49021 , Y10T29/49032 , Y10T29/49034 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods for creating a write head by forming a bump after the top pole is formed are provided. In one embodiment, a bottom pole is created out of a first layer. A non-magnetic gap material is applied to the surface of the wafer. A top pole is created out of a second layer. After creating the top pole, a bump is created. The bump is used to protect at least a portion of the first layer while etching to create a stray flux absorber.
摘要翻译：提供了通过在形成顶极之后形成凸块来创建写入头的方法。在一个实施例中，从第一层产生底极。将非磁隙材料施加到晶片的表面。第二层创建顶杆。创建顶极后，会创建一个凸起。凸块用于在蚀刻时保护第一层的至少一部分以产生杂散通量吸收体。

7. 发明授权

US07515381B2 Method for fabricating a side shield for a flux guide layer for perpendicular magnetic recording 失效
标题翻译：用于制造用于垂直磁记录的磁通引导层的侧屏蔽的方法
公开(公告)号：US07515381B2
公开(公告)日：2009-04-07
申请号：US11317917
申请日：2005-12-22
申请人： Amanda Baer , Daniel Wayne Bedell , Quang Le , Aron Pentek
发明人： Amanda Baer , Daniel Wayne Bedell , Quang Le , Aron Pentek
IPC分类号： G11B5/147 , G11B5/187
CPC分类号： G11B5/3116 , G11B5/112 , G11B5/1278 , G11B5/3146 , G11B5/3163
摘要： A magnetic head for use in a perpendicular recording system having a novel shield structure that provides exceptional magnetic shielding from extraneous magnetic fields such as from a write coil, shaping layer or return pole of the write head. The shield structure is constructed to have a bottom or leading surface that is generally coplanar with the bottom or leading surface of the shaping layer, but all or a portion of the shield structure is not as thick as the shaping layer so as to have a top surface that does not extend to the same elevation (in a trailing direction) as that of the shaping layer. Making the shields extend to a lower level than the shaping layer improves magnetic performance by reducing flux leakage from the write pole, and also provides manufacturing advantages, such as during the manufacturing of the write pole. These manufacturing advantages include the advantage of having the shields covered with a protective layer of, for example, alumina during the ion milling of the write pole.
摘要翻译：一种用于垂直记录系统的磁头，其具有新的屏蔽结构，其提供例如来自写入磁头的写入线圈，成形层或返回磁极的外部磁场的卓越的磁屏蔽。屏蔽结构被构造成具有与成形层的底部或前表面大致共面的底部或前表面，但是屏蔽结构的全部或一部分不像成形层那样厚，以便具有顶部表面不延伸到与成形层相同的高度（在拖尾方向上）。使屏蔽层延伸到比成形层更低的水平，通过减小来自写入极的磁通泄漏来提高磁性能，并且还提供制造优点，例如在写入磁极的制造期间。这些制造优点包括在写入极的离子铣削期间使屏蔽覆盖有例如氧化铝的保护层的优点。

8. 发明授权

US07506428B2 Ion mill process with sacrificial mask layer to fabricate pole tip for perpendicular recording 失效
标题翻译：离子磨工艺用牺牲掩模层制造极尖用于垂直记录
公开(公告)号：US07506428B2
公开(公告)日：2009-03-24
申请号：US10676728
申请日：2003-09-30
申请人： Daniel Wayne Bedell , Tom King Harris, III , Gautam Khera , Quang Le , Aron Pentek
发明人： Daniel Wayne Bedell , Tom King Harris, III , Gautam Khera , Quang Le , Aron Pentek
IPC分类号： G11B5/187
CPC分类号： G11B5/33 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/4906
摘要： A method of fabrication of the write head of a perpendicular recording head allows for production of P3 pole tips of width less than 200 nm (200×10−9 meters). The method includes fabricating the P2 flux shaping layer, depositing the P3 layer, depositing a layer of ion-milling resistant material, depositing at least one sacrificial layer, shaping the P3 layer into P3 pole tip, removing the at least one sacrificial layer to leave the P3 pole tip, and encapsulating the P3 pole tip.
摘要翻译：制造垂直记录头的写入头的方法允许制造宽度小于200nm（200x10-9米）的P3极尖。该方法包括制造P2通量成形层，沉积P3层，沉积抗离子碾磨材料层，沉积至少一个牺牲层，将P3层成形为P3极尖，去除至少一个牺牲层以离开 P3极尖，并封装P3极尖。

9. 发明授权

US07818875B2 Method of manufacturing a magnetic head with integration of a small flash field, zero bias, and non-reactive ion milling for pole tip uniformity 有权
标题翻译：制造具有小闪电场，零偏压和非反应离子铣削的磁头的磁头的均匀性的制造方法
公开(公告)号：US07818875B2
公开(公告)日：2010-10-26
申请号：US11297228
申请日：2005-12-07
申请人： Hamid Balamame , Daniel Wayne Bedell , Mary Kathryn Gutberlet , Clarence Kai-Sheng Hsieh , Aron Pentek , Yi Zheng
发明人： Hamid Balamame , Daniel Wayne Bedell , Mary Kathryn Gutberlet , Clarence Kai-Sheng Hsieh , Aron Pentek , Yi Zheng
IPC分类号： G11B5/187
CPC分类号： G11B5/3163 , G11B5/3116 , Y10T29/49039 , Y10T29/49041 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method of manufacturing a magnetic write head that provides improved pole critical dimension control, such as improved track width control (improved sigma) and improved flare point control. The method involves a combination of several process improvements, such as photolithographically patterning a P2 pole tip defining photoresist frame using a zero print bias and also using a small flash field. The method also involves the use of a non-reactive ion etch to notch the first pole (P1) using the second pole (P2) as a mask.
摘要翻译：一种制造磁写头的方法，其提供改进的极关键尺寸控制，例如改进的轨道宽度控制（改进的σ）和改进的闪点控制。该方法涉及几个工艺改进的组合，例如使用零印刷偏压光刻地图案化限定光致抗蚀剂框架的P2极尖端并且还使用小的闪光场。该方法还涉及使用非反应性离子蚀刻来使用第二极（P2）作为掩模来切割第一极（P1）。

10. 发明授权

US07770283B2 Method of fabricating a magnetic head 有权
标题翻译：制造磁头的方法
公开(公告)号：US07770283B2
公开(公告)日：2010-08-10
申请号：US11347356
申请日：2006-02-03
申请人： Daniel Wayne Bedell , Vladimir Nikitin , Aron Pentek , Sue Siyang Zhang
发明人： Daniel Wayne Bedell , Vladimir Nikitin , Aron Pentek , Sue Siyang Zhang
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3116 , G11B5/3163 , Y10T29/49032 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A multi-step process for notching the P1 pole of the write head element of a magnetic head. In a first step following the fabrication of the P2 pole tip, a layer of protective material is deposited on the approximately vertical side surfaces of the P2 pole tip. Thereafter, a first ion milling step, utilizing a species such as argon, is performed to mill through the write gap layer and to notch into the P1 pole layer therebelow. The removal of redeposited material from the side surfaces of the P2 pole tip is thereafter accomplished and the protective material formed on the side surfaces of the P2 pole tip protects the P2 pole tip during the redeposition clean up step. Thereafter, the protective material is removed from the side surfaces of the P2 pole tip, and a second ion milling step is performed to further notch the P1 pole material.
摘要翻译：用于切割磁头的写入头元件的P1极的多步骤过程。在制造P2极尖之后的第一步骤中，在P2极尖的大致垂直侧表面上沉积有一层保护材料。此后，进行利用物质如氩的第一离子研磨步骤，通过写入间隙层研磨并陷入其下方的P1极层。然后，从P2极尖端的侧面去除再沉积材料，并且形成在P2极端部的侧表面上的保护材料在再沉积清洁步骤期间保护P2极尖。然后，从P2极端部的侧面除去保护材料，进行第二离子研磨工序，进一步切断P1极材料。

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