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1. 发明授权

US08028399B2 Magnetic write pole fabrication 有权
标题翻译：磁写磁极制造
公开(公告)号：US08028399B2
公开(公告)日：2011-10-04
申请号：US11957481
申请日：2007-12-16
申请人： Amanda Baer , Jeffrey S. Lille , Aron Pentek
发明人： Amanda Baer , Jeffrey S. Lille , Aron Pentek
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , Y10T29/49032 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Write elements and methods of fabricating magnetic write poles are described. For one method, a vertical mask structure is formed on a magnetic layer in locations of a pole tip and a yoke of a write pole. The vertical mask structure may be formed by coating vertical surfaces of resists with an atomic layer deposition (ALD) process or a similar process. A removal process is then performed around the vertical mask structure to define the pole tip and part of the yoke of the write pole, and the vertical mask structure is removed. A lower portion of the pole tip is them masked while the upper portion of the pole tip and the part of the yoke is exposed. The upper portion of the pole tip and the part of the yoke are then expanded with magnetic material, such as with a plating process.
摘要翻译：描述制造磁性写入极的写入元件和方法。对于一种方法，在写入极的极尖和磁轭的位置的磁性层上形成垂直掩模结构。垂直掩模结构可以通过用原子层沉积（ALD）工艺或类似工艺涂覆抗蚀剂的垂直表面而形成。然后围绕垂直掩模结构执行去除处理以限定磁极尖端和写极的磁轭的一部分，并且去除垂直掩模结构。极尖的下部被掩蔽，而极尖的上部和轭的一部分露出。然后用磁性材料例如电镀工艺使磁极尖端的上部和磁轭的一部分膨胀。

2. 发明申请

US20100159154A1 METHODS FOR CREATING A STEPPED PERPENDICULAR MAGNETIC POLE VIA MILLING AND/OR METAL LIFTOFF 失效
标题翻译：用于通过铣削和/或金属提升来形成步进的贯通磁体的方法
公开(公告)号：US20100159154A1
公开(公告)日：2010-06-24
申请号：US12341866
申请日：2008-12-22
申请人： Amanda Baer , Wen-Chien David Hsiao , John I. Kim , Vladimir Nikitin , Trevor W. Olson , John Bruce Piggott, JR. , Yuan Yao
发明人： Amanda Baer , Wen-Chien David Hsiao , John I. Kim , Vladimir Nikitin , Trevor W. Olson , John Bruce Piggott, JR. , Yuan Yao
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163
摘要： A method in one embodiment includes forming a layer of a nonmagnetic material above an upper surface of a substrate; forming a resist structure above the layer of nonmagnetic material, wherein the resist structure has an undercut; removing a portion of the layer of nonmagnetic material not covered by the resist structure; depositing a layer of magnetic material above the substrate adjacent a remaining portion of the layer of nonmagnetic material such that at least portions of the layer of magnetic material and the remaining portion of the layer of nonmagnetic material lie in a common plane; removing the resist structure; and forming a write pole above the layer of magnetic material and the remaining portion of the layer of nonmagnetic material. Additional methods are also presented.
摘要翻译：一个实施例中的方法包括在衬底的上表面上方形成非磁性材料层; 在非磁性材料层之上形成抗蚀剂结构，其中抗蚀剂结构具有底切; 去除未被抗蚀剂结构覆盖的非磁性材料层的一部分; 在所述基板的上方邻近所述非磁性材料层的剩余部分沉积一层磁性材料，使得所述磁性材料层和所述非磁性材料层的剩余部分的至少部分位于公共平面中; 去除抗蚀剂结构; 以及在磁性材料层和非磁性材料层的剩余部分之上形成写入极。还介绍了其他方法。

3. 发明授权

US07588884B2 Method for enhancing wafer alignment marks 失效
标题翻译：增强晶圆对准标记的方法
公开(公告)号：US07588884B2
公开(公告)日：2009-09-15
申请号：US10857151
申请日：2004-05-28
申请人： Amanda Baer , Nian-Xiang Sun , Sue Siyang Zhang , Yi Zheng
发明人： Amanda Baer , Nian-Xiang Sun , Sue Siyang Zhang , Yi Zheng
IPC分类号： G03F1/00
CPC分类号： G03F9/7084 , G03F9/7076 , G03F9/708
摘要： A method of enhancing alignment marks defined in a relatively thin layer on a wafer by etching the alignment marks into an underlying alignment mark transfer layer is described. The target area for the alignment marks is prepared by depositing material for the transfer layer. In alternative embodiments an oversized trench is formed in the target area prior to the deposition of the transfer layer. The alignment marks can fabricated in the layer(s) deposited by the existing process or alternatively, the original layers can be removed and replaced with a layer of material selected to have comparable etching properties (definition layer).
摘要翻译：描述了通过将对准标记蚀刻到下面的对准标记转印层中来增强在晶片上相对薄的层中限定的对准标记的方法。通过沉积用于转印层的材料来制备对准标记的目标区域。在替代实施例中，在沉积转移层之前，在目标区域中形成尺寸过大的沟槽。对准标记可以在通过现有工艺沉积的层中制造，或者替代地，原始层可被移除并被选择为具有相当的蚀刻性质（定义层）的材料层替代。

4. 发明授权

US07563381B2 High milling resistance write pole fabrication method for perpendicular recording 失效
标题翻译：用于垂直记录的高铣削电阻写极制造方法
公开(公告)号：US07563381B2
公开(公告)日：2009-07-21
申请号：US10836867
申请日：2004-04-30
申请人： Amanda Baer , Quang Le , Kim Lee , Aron Pentek , Douglas J. Werner , Sue S. Zhang
发明人： Amanda Baer , Quang Le , Kim Lee , Aron Pentek , Douglas J. Werner , Sue S. Zhang
IPC分类号： G11B5/187
CPC分类号： G11B5/1871 , G11B5/3116 , G11B5/3163 , Y10T29/49021 , Y10T29/49043
摘要： A method for constructing a tapered write pole, the method including the use of a bilayer hard mask.
摘要翻译：一种用于构造锥形写入极的方法，该方法包括使用双层硬掩模。

5. 发明申请

US20080151422A1 Enhanced planarization liftoff structure and method for making the same 有权
标题翻译：增强平面化提升结构及其制作方法
公开(公告)号：US20080151422A1
公开(公告)日：2008-06-26
申请号：US11644159
申请日：2006-12-22
申请人： Jeffrey S. Lille , Amanda Baer , John Jaekoyun Yang
发明人： Jeffrey S. Lille , Amanda Baer , John Jaekoyun Yang
IPC分类号： G11B5/127 , B44C1/22
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3163 , G11B5/3169 , G11B5/3173
摘要： Systems and methods for enhanced planarization liftoff structures. In accordance with a first method embodiment, a method for manufacturing a pole tip for magnetic recording comprises accessing a wafer comprising a plurality of pole tips and a plurality of pole tip masks corresponding to the plurality of pole tips. Non magnetic material is filled adjacent to the plurality of pole tips. Material adjacent to the plurality of pole tips is etched. Subsequent to the etching, the wafer is planarized to a level equal to or higher than a level of the trailing edges of the plurality of pole tips. The enhanced liftoff structure enables decreased planarization processing, resulting in a decreased process window. As a beneficial result, manufacturing throughput and quality are improved.
摘要翻译：用于增强平面化起飞结构的系统和方法。根据第一方法实施例，一种用于制造用于磁记录的极尖的方法包括访问包括多个极尖的晶片和与多个极尖相对应的多个极尖端掩模。非磁性材料与多个极尖相邻地填充。蚀刻与多个极尖相邻的材料。在蚀刻之后，晶片被平坦化到等于或高于多个极尖的后缘的水平的水平。增强的提升结构使平坦化处理减少，从而减少了处理窗口。作为有益的结果，提高了生产量和质量。

6. 发明申请

US20070146931A1 Method for fabricating a side shield for a flux guide layer for perpendicular magnetic recording 失效
标题翻译：用于制造用于垂直磁记录的磁通引导层的侧屏蔽的方法
公开(公告)号：US20070146931A1
公开(公告)日：2007-06-28
申请号：US11317917
申请日：2005-12-22
申请人： Amanda Baer , Daniel Bedell , Quang Le , Aron Pentek
发明人： Amanda Baer , Daniel Bedell , Quang Le , Aron Pentek
IPC分类号： G11B5/147
CPC分类号： G11B5/3116 , G11B5/112 , G11B5/1278 , G11B5/3146 , G11B5/3163
摘要： A magnetic head for use in a perpendicular recording system having a novel shield structure that provides exceptional magnetic shielding from extraneous magnetic fields such as from a write coil, shaping layer or return pole of the write head. The shield structure is constructed to have a bottom or leading surface that is generally coplanar with the bottom or leading surface of the shaping layer, but all or a portion of the shield structure is not as thick as the shaping layer so as to have a top surface that does not extend to the same elevation (in a trailing direction) as that of the shaping layer. Making the shields extend to a lower level than the shaping layer improves magnetic performance by reducing flux leakage from the write pole, and also provides manufacturing advantages, such as during the manufacturing of the write pole. These manufacturing advantages include the advantage of having the shields covered with a protective layer of, for example, alumina during the ion milling of the write pole.
摘要翻译：一种用于垂直记录系统的磁头，其具有新的屏蔽结构，其提供例如来自写入磁头的写入线圈，成形层或返回磁极的外部磁场的卓越的磁屏蔽。屏蔽结构被构造成具有与成形层的底部或前表面大致共面的底部或前表面，但是屏蔽结构的全部或一部分不像成形层那样厚，以便具有顶部表面不延伸到与成形层相同的高度（在拖尾方向上）。使屏蔽层延伸到比成形层更低的水平，通过减小来自写入极的磁通泄漏来提高磁性能，并且还提供制造优点，例如在写入磁极的制造期间。这些制造优点包括在写入极的离子铣削期间使屏蔽覆盖有例如氧化铝的保护层的优点。

7. 发明授权

US07813080B2 Enhanced planarization liftoff structure and method for making the same 有权
标题翻译：增强平面化提升结构及其制作方法
公开(公告)号：US07813080B2
公开(公告)日：2010-10-12
申请号：US11644159
申请日：2006-12-22
申请人： Jeffrey S. Lille , Amanda Baer , John Jaekoyun Yang
发明人： Jeffrey S. Lille , Amanda Baer , John Jaekoyun Yang
IPC分类号： G11B5/127
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3163 , G11B5/3169 , G11B5/3173
摘要： Systems and methods for enhanced planarization liftoff structures. In accordance with a first method embodiment, a method for manufacturing a pole tip for magnetic recording comprises accessing a wafer comprising a plurality of pole tips and a plurality of pole tip masks corresponding to the plurality of pole tips. Non magnetic material is filled adjacent to the plurality of pole tips. Material adjacent to the plurality of pole tips is etched. Subsequent to the etching, the wafer is planarized to a level equal to or higher than a level of the trailing edges of the plurality of pole tips. The enhanced liftoff structure enables decreased planarization processing, resulting in a decreased process window. As a beneficial result, manufacturing throughput and quality are improved.
摘要翻译：用于增强平面化起飞结构的系统和方法。根据第一方法实施例，一种用于制造用于磁记录的极尖的方法包括访问包括多个极尖的晶片和与多个极尖相对应的多个极尖端掩模。非磁性材料与多个极尖相邻地填充。蚀刻与多个极尖相邻的材料。在蚀刻之后，晶片被平坦化到等于或高于多个极尖的后缘的水平的水平。增强的提升结构使平坦化处理减少，从而减少了处理窗口。作为有益的结果，提高了生产量和质量。

8. 发明授权

US07757380B2 Methods for the manufacture of notched trailing shields 失效
标题翻译：开槽后挡板的制造方法
公开(公告)号：US07757380B2
公开(公告)日：2010-07-20
申请号：US11595654
申请日：2006-11-10
申请人： Amanda Baer , Hung-chin Guthrie , Yimin Hsu , Ming Jiang , Aron Pentek
发明人： Amanda Baer , Hung-chin Guthrie , Yimin Hsu , Ming Jiang , Aron Pentek
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/1278 , G11B5/112 , G11B5/3163 , Y10T29/49032 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods for improving within wafer and wafer to wafer yields during fabrication of notched trailing shield structures are disclosed. Ta/Rh CMP stop layers are deposited prior to planarization and notch formation to ensure a planar surface for trailing shield structures. These stop layers may be blanket deposited or patterned prior to CMP. Patterned stop layers produce the highest yields.
摘要翻译：公开了在制造缺口尾部屏蔽结构期间在晶片和晶片之间改善晶片产量的方法。在平坦化和切口形成之前沉积Ta / Rh CMP停止层以确保用于尾部屏蔽结构的平坦表面。这些停止层可以在CMP之前被毯式沉积或图案化。图案化的停止层产生最高的产量。

9. 发明申请

US20100157470A1 METHODS FOR CREATING SLANTED PERPENDICULAR MAGNETIC POLE VIA METAL LIFTOFF 有权
标题翻译：用于通过金属升降机创建抛光的扁平磁铁的方法
公开(公告)号：US20100157470A1
公开(公告)日：2010-06-24
申请号：US12341893
申请日：2008-12-22
申请人： Amanda Baer , Wen-Chien David Hsiao , Vladimir Nikitin , Trevor W. Olson , Yuan Yao
发明人： Amanda Baer , Wen-Chien David Hsiao , Vladimir Nikitin , Trevor W. Olson , Yuan Yao
IPC分类号： G11B5/187
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method in one embodiment includes forming a resist structure above an upper surface of a substrate, wherein a portion of the upper surface of the substrate is a shaping layer, wherein the resist structure has an undercut; depositing a layer of magnetic material above exposed regions of the substrate, wherein a portion of the layer of magnetic material tapers towards the substrate as it approaches the undercut; removing the resist structure; and forming a write pole above the layer of magnetic material. Additional methods are disclosed.
摘要翻译：在一个实施例中的方法包括在基板的上表面上方形成抗蚀剂结构，其中基板的上表面的一部分是成形层，其中抗蚀剂结构具有底切; 在衬底的暴露区域上方沉积一层磁性材料，其中磁性材料层的一部分在接近底切时朝着衬底逐渐变细; 去除抗蚀剂结构; 并在磁性材料层之上形成写入极。公开了另外的方法。

10. 发明申请

US20090154015A1 MAGNETIC WRITE POLE FABRICATION 有权
标题翻译：磁性写字槽制造
公开(公告)号：US20090154015A1
公开(公告)日：2009-06-18
申请号：US11957481
申请日：2007-12-16
申请人： Amanda Baer , Jeffrey S. Lille , Aron Pentek
发明人： Amanda Baer , Jeffrey S. Lille , Aron Pentek
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , Y10T29/49032 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Write elements and methods of fabricating magnetic write poles are described. For one method, a vertical mask structure is formed on a magnetic layer in locations of a pole tip and a yoke of a write pole. The vertical mask structure may be formed by coating vertical surfaces of resists with an atomic layer deposition (ALD) process or a similar process. A removal process is then performed around the vertical mask structure to define the pole tip and part of the yoke of the write pole, and the vertical mask structure is removed. A lower portion of the pole tip is them masked while the upper portion of the pole tip and the part of the yoke is exposed. The upper portion of the pole tip and the part of the yoke are then expanded with magnetic material, such as with a plating process.
摘要翻译：描述制造磁性写入极的写入元件和方法。对于一种方法，在写入极的极尖和磁轭的位置的磁性层上形成垂直掩模结构。垂直掩模结构可以通过用原子层沉积（ALD）工艺或类似工艺涂覆抗蚀剂的垂直表面而形成。然后围绕垂直掩模结构执行去除处理以限定磁极尖端和写极的磁轭的一部分，并且去除垂直掩模结构。极尖的下部被掩蔽，而极尖的上部和轭的一部分露出。然后用磁性材料例如电镀工艺使磁极尖端的上部和磁轭的一部分膨胀。

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