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1. 发明授权

US07770283B2 Method of fabricating a magnetic head 有权
标题翻译：制造磁头的方法
公开(公告)号：US07770283B2
公开(公告)日：2010-08-10
申请号：US11347356
申请日：2006-02-03
申请人： Daniel Wayne Bedell , Vladimir Nikitin , Aron Pentek , Sue Siyang Zhang
发明人： Daniel Wayne Bedell , Vladimir Nikitin , Aron Pentek , Sue Siyang Zhang
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3116 , G11B5/3163 , Y10T29/49032 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A multi-step process for notching the P1 pole of the write head element of a magnetic head. In a first step following the fabrication of the P2 pole tip, a layer of protective material is deposited on the approximately vertical side surfaces of the P2 pole tip. Thereafter, a first ion milling step, utilizing a species such as argon, is performed to mill through the write gap layer and to notch into the P1 pole layer therebelow. The removal of redeposited material from the side surfaces of the P2 pole tip is thereafter accomplished and the protective material formed on the side surfaces of the P2 pole tip protects the P2 pole tip during the redeposition clean up step. Thereafter, the protective material is removed from the side surfaces of the P2 pole tip, and a second ion milling step is performed to further notch the P1 pole material.
摘要翻译：用于切割磁头的写入头元件的P1极的多步骤过程。在制造P2极尖之后的第一步骤中，在P2极尖的大致垂直侧表面上沉积有一层保护材料。此后，进行利用物质如氩的第一离子研磨步骤，通过写入间隙层研磨并陷入其下方的P1极层。然后，从P2极尖端的侧面去除再沉积材料，并且形成在P2极端部的侧表面上的保护材料在再沉积清洁步骤期间保护P2极尖。然后，从P2极端部的侧面除去保护材料，进行第二离子研磨工序，进一步切断P1极材料。

2. 发明申请

US20100163523A1 FORMATION OF LOW RESISTANCE DAMASCENE COILS 失效
标题翻译：形成低电阻大线圈
公开(公告)号：US20100163523A1
公开(公告)日：2010-07-01
申请号：US12707652
申请日：2010-02-17
申请人： Daniel Wayne Bedell , David Patrick Druist , Edward Hin Pong Lee , Jennifer Ai-Ming Loo , Vladimir Nikitin , Sue Siyang Zhang
发明人： Daniel Wayne Bedell , David Patrick Druist , Edward Hin Pong Lee , Jennifer Ai-Ming Loo , Vladimir Nikitin , Sue Siyang Zhang
IPC分类号： G11B5/127
CPC分类号： G11B5/3123 , Y10T29/49043 , Y10T29/4906 , Y10T29/49064
摘要： In one embodiment and method of the present invention, a coil of a write head is created by forming a P1 pedestal layer and a back gap layer and further forming a coil pattern consistent with the coil to be formed and insulator spacers dispersed in the coil pattern, using a non-damascene process, thereafter the coil is formed by plating using a damascene process.
摘要翻译：在本发明的一个实施例和方法中，通过形成P1基座层和后间隙层，并且进一步形成与要形成的线圈一致的线圈图案并且将绝缘体间隔物分散在线圈图案中，形成写入头的线圈，使用非镶嵌工艺，然后通过使用镶嵌工艺电镀形成线圈。

3. 发明授权

US08108985B2 Method for manufacturing a perpendicular magnetic write head 有权
标题翻译：用于制造垂直磁写头的方法
公开(公告)号：US08108985B2
公开(公告)日：2012-02-07
申请号：US11934687
申请日：2007-11-02
申请人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
发明人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3166 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T428/11 , Y10T428/1186
摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.
摘要翻译：一种用于制造用于垂直磁记录的磁写头的方法。该方法包括形成写极，然后沉积补充层。掩模结构可以形成在写极和再填充层上，掩模结构被配置为限定缝合极。然后可以执行离子铣或反应离子研磨以去除未被掩模结构保护的部分填充层。然后可以沉积磁性材料以形成限定二次闪光点的缝合写入极。缝合的杆也可以与电动研磨引导件自对准，以便相对于写入头的空气轴承表面精确地定位二次扩张点的前边缘。

4. 发明授权

US08503131B2 Perpendicular magnetic write head having a novel shield structure 有权
标题翻译：具有新型屏蔽结构的垂直磁头写头
公开(公告)号：US08503131B2
公开(公告)日：2013-08-06
申请号：US13339310
申请日：2011-12-28
申请人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
发明人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
IPC分类号： G11B5/147
CPC分类号： G11B5/3166 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T428/11 , Y10T428/1186
摘要： A magnetic write head for perpendicular magnetic data recording. The write head includes a substrate and a magnetic write pole formed on the substrate, the write pole having a trailing edge and first and second sides. A magnetic stitched pole is formed over a portion of the magnetic write pole, the stitched pole having a front edge that defines a secondary flare point. First and second non-magnetic side walls are formed at the first and second sides of the write pole. The non-magnetic side walls extend from the substrate at least to the trailing edge of the write pole in a first region near an air bearing surface and wherein the first and second non-magnetic side walls extend from the substrate to a point between the substrate and the trailing edge, allowing the stitched magnetic pole to extend partially over the sides of the write pole.
摘要翻译：用于垂直磁数据记录的磁写头。写入头包括形成在衬底上的衬底和磁性写入磁极，写入极具有后缘和第一和第二侧。在磁性写入磁极的一部分上形成有磁性的缝合磁极，缝合的磁极具有限定二次闪光点的前部边缘。第一和第二非磁性侧壁形成在写入极的第一和第二侧。所述非磁性侧壁在靠近空气支承表面的第一区域中从所述基板至少延伸到所述写柱的后缘，并且其中所述第一和第二非磁性侧壁从所述基板延伸到所述基板之间的点和后缘，允许缝合的磁极部分地延伸在写柱的侧面上。

5. 发明授权

US08085497B2 Method of multi-angled bump processing for magnetic pole fabrication and systems thereof 有权
标题翻译：用于磁极制造的多角度凸块加工方法及其系统
公开(公告)号：US08085497B2
公开(公告)日：2011-12-27
申请号：US12341834
申请日：2008-12-22
申请人： Wen-Chien David Hsiao , Vladimir Nikitin , Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Wen-Chien David Hsiao , Vladimir Nikitin , Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/3163
摘要： A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.
摘要翻译：根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面，并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向所述极的沉积平面，其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层，以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面，以及从该平面以1°至89°之间的第二角度定向的第二表面所述凸起层的沉积，其中所述第二角度大于所述第一角度。

6. 发明申请

US20100157474A1 METHOD OF MULTI-ANGLED BUMP PROCESSING FOR MAGNETIC POLE FABRICATION AND SYSTEMS THEREOF 有权
标题翻译：用于磁极制造及其系统的多重保护加工方法
公开(公告)号：US20100157474A1
公开(公告)日：2010-06-24
申请号：US12341834
申请日：2008-12-22
申请人： Wen-Chien David Hsiao , Vladimir Nikitin , Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Wen-Chien David Hsiao , Vladimir Nikitin , Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/3163
摘要： A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.
摘要翻译：根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面，并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向所述极的沉积平面，其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层，以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面，以及从该平面以1°至89°之间的第二角度定向的第二表面所述凸起层的沉积，其中所述第二角度大于所述第一角度。

7. 发明授权

US08397371B2 Process of manufacturing low resistance damascene coils 失效
标题翻译：制造低阻大马士革线圈的工艺
公开(公告)号：US08397371B2
公开(公告)日：2013-03-19
申请号：US12707652
申请日：2010-02-17
申请人： Daniel Wayne Bedell , David Patrick Druist , Edward Hin Pong Lee , Jennifer Ai-Ming Loo , Vladimir Nikitin , Sue Siyang Zhang
发明人： Daniel Wayne Bedell , David Patrick Druist , Edward Hin Pong Lee , Jennifer Ai-Ming Loo , Vladimir Nikitin , Sue Siyang Zhang
IPC分类号： G11B5/17 , G11B5/187
CPC分类号： G11B5/3123 , Y10T29/49043 , Y10T29/4906 , Y10T29/49064
摘要： In one embodiment and method of the present invention, a coil of a write head is created by forming a P1 pedestal layer and a back gap layer and further forming a coil pattern consistent with the coil to be formed and insulator spacers dispersed in the coil pattern, using a non-damascene process, thereafter the coil is formed by plating using a damascene process.
摘要翻译：在本发明的一个实施例和方法中，通过形成P1基座层和后间隙层，并且进一步形成与要形成的线圈一致的线圈图案并且将绝缘体间隔物分散在线圈图案中，形成写入头的线圈，使用非镶嵌工艺，然后通过使用镶嵌工艺电镀形成线圈。

8. 发明申请

US20120107645A1 METHOD FOR MANUFACTURING A SHORT FLARE DEFINITION BY ADDITIVE PROCESS FOR PERPENDICULAR HEAD 有权
标题翻译：通过添加剂进行短期定义的方法
公开(公告)号：US20120107645A1
公开(公告)日：2012-05-03
申请号：US13339310
申请日：2011-12-28
申请人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
发明人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
IPC分类号： G11B5/33 , G11B5/127
CPC分类号： G11B5/3166 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T428/11 , Y10T428/1186
摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.
摘要翻译：一种用于制造用于垂直磁记录的磁写头的方法。该方法包括形成写极，然后沉积补充层。掩模结构可以形成在写极和再填充层上，掩模结构被配置为限定缝合极。然后可以执行离子铣或反应离子研磨以去除未被掩模结构保护的部分填充层。然后可以沉积磁性材料以形成限定二次闪光点的缝合写入极。缝合的杆也可以与电动研磨引导件自对准，以便相对于写入头的空气轴承表面精确地定位二次扩张点的前边缘。

9. 发明申请

US20090117407A1 SHORT FLARE DEFINITION BY ADDITIVE PROCESS FOR PERPENDICULAR HEAD 有权
标题翻译：通过添加剂进行快速定义
公开(公告)号：US20090117407A1
公开(公告)日：2009-05-07
申请号：US11934687
申请日：2007-11-02
申请人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
发明人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
IPC分类号： B05D5/12 , G11B5/33
CPC分类号： G11B5/3166 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T428/11 , Y10T428/1186
摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.
摘要翻译：一种用于制造用于垂直磁记录的磁写头的方法。该方法包括形成写极，然后沉积补充层。掩模结构可以形成在写极和再填充层上，掩模结构被配置为限定缝合极。然后可以执行离子铣或反应离子研磨以去除未被掩模结构保护的部分填充层。然后可以沉积磁性材料以形成限定二次闪光点的缝合写入极。缝合的杆也可以与电动研磨引导件自对准，以便相对于写入头的空气轴承表面精确地定位二次扩张点的前边缘。

10. 发明授权

US07363698B2 Process for creating a write head by forming a bump after the top pole is formed 失效
标题翻译：用于通过在形成顶极之后形成凸起来产生写入头的过程
公开(公告)号：US07363698B2
公开(公告)日：2008-04-29
申请号：US10956221
申请日：2004-09-30
申请人： Amanda Baer , Hamid Balamane , Daniel Wayne Bedell , Jyh-Shuey Jerry Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
发明人： Amanda Baer , Hamid Balamane , Daniel Wayne Bedell , Jyh-Shuey Jerry Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/1871 , G11B5/3163 , Y10T29/49021 , Y10T29/49032 , Y10T29/49034 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods for creating a write head by forming a bump after the top pole is formed are provided. In one embodiment, a bottom pole is created out of a first layer. A non-magnetic gap material is applied to the surface of the wafer. A top pole is created out of a second layer. After creating the top pole, a bump is created. The bump is used to protect at least a portion of the first layer while etching to create a stray flux absorber.
摘要翻译：提供了通过在形成顶极之后形成凸块来创建写入头的方法。在一个实施例中，从第一层产生底极。将非磁隙材料施加到晶片的表面。第二层创建顶杆。创建顶极后，会创建一个凸起。凸块用于在蚀刻时保护第一层的至少一部分以产生杂散通量吸收体。

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