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1. 发明申请

WO2003021731A1 SIX TO TEN KHz, OR GREATER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：六至十赫兹或更大气体放电激光系统
公开(公告)号：WO2003021731A1
公开(公告)日：2003-03-13
申请号：PCT/US2002/026011
申请日：2002-08-16
申请人： CYMER, INC. , WATSON, Tom, A. , UJAZDOWSKI, Richard, C. , IVASCHENKO, Alex, P. , SHANNON, Robert, A. , SANDSTROM, Richard, L. , WEBB, Robert, Kyle , PALENSCHAT, Frederick, A. , HOFMANN, Thomas , RETTIG, Curtis, L. , NESS, Richard, L. , MELCHER, Paul, C. , ERSHOV, Alexander, I.
发明人： WATSON, Tom, A. , UJAZDOWSKI, Richard, C. , IVASCHENKO, Alex, P. , SHANNON, Robert, A. , SANDSTROM, Richard, L. , WEBB, Robert, Kyle , PALENSCHAT, Frederick, A. , HOFMANN, Thomas , RETTIG, Curtis, L. , NESS, Richard, L. , MELCHER, Paul, C. , ERSHOV, Alexander, I.
IPC分类号： H01S3/22
CPC分类号： H01S3/0385 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,000 pulses per second. Preferred embodiments are configured as KrF, ArF and F 2 lasers used in photolithography. Improvements include a suction fan (555) in the immediate vicinity of the anode (542) to increase gas flow. The intake of the fan (555) is between the anode (542) and the insulating spacer (544B).
摘要翻译：本发明提供了能够以6,000至10,000个脉冲/秒的重复频率在生产线容量中可靠长期运行的气体放电激光系统。优选实施例被配置为用于光刻的KrF，ArF和F2激光器。改进包括在阳极（542）附近的吸入风扇（555）以增加气体流量。风扇（555）的入口位于阳极（542）和绝缘间隔物（544B）之间。

2. 发明公开

EP1430573A1 SIX TO TEN KHz, OR GREATER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：六到十千赫或多个气体放电激光器系统
公开(公告)号：EP1430573A1
公开(公告)日：2004-06-23
申请号：EP02757140.5
申请日：2002-08-16
申请人： Cymer, Inc.
发明人： WATSON, Tom, A. , UJAZDOWSKI, Richard, C. , IVASCHENKO, Alex, P. , SHANNON, Robert, A. , SANDSTROM, Richard, L. , WEBB, Robert, Kyle , PALENSCHAT, Frederick, A. , HOFMANN, Thomas , RETTIG, Curtis, L. , NESS, Richard, L. , MELCHER, Paul, C. , ERSHOV, Alexander, I.
IPC分类号： H01S3/22
CPC分类号： H01S3/0385 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,000 pulses per second. Preferred embodiments are configured as KrF, ArF and F2 lasers used in photolithography. Improvements include a suction fan (555) in the immediate vicinity of the anode (542) to increase gas flow. The intake of the fan (555) is between the anode (542) and the insulating spacer (544B).

3. 发明公开

EP1310022A2 LASER WAVELENGTH CONTROL UNIT WITH PIEZOELECTRIC DRIVER 有权
标题翻译：带压电驱动器激光波长控制单元
公开(公告)号：EP1310022A2
公开(公告)日：2003-05-14
申请号：EP01954584.7
申请日：2001-04-30
申请人： Cymer, Inc.
发明人： SPANGLER, Ronald, L. , JACQUES, Robert, N. , EVERAGE, George, J. , ANDERSON, Stuart, L. , PALENSCHAT, Frederick, A. , FOMENKOV, Igor, V. , SANDSTROM, Richard, L. , PARTLO, William, N. , ALGOTS, John, M. , BROWN, Daniel, J., W.
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： Fast wavelenght correction equipment for an electric discharge laser includes at least one piezoelectic drive (80) and a fast wavelength measurement system and a fast feedback response time. In a preferred embodiment equipment is provided to control wavelength on a slow, intermediate amd fast time scales, which vary in range from several milliseconds to a few microseconds respectively. Techniques include a combination of a relatively slow stepper motor (82) and a very fast piezoelectric drive (80) for tuning the laser wavelength using a tuning mirror (14).

4. 发明申请

WO2006105119A2 6 KHz AND ABOVE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译： 6 KHz和以上气体放电激光系统
公开(公告)号：WO2006105119A2
公开(公告)日：2006-10-05
申请号：PCT/US2006/011339
申请日：2006-03-27
申请人： CYMER, INC. , UJAZDOWSKI, Richard, C. , NESS, Richard, M. , ALGOTS, J., Martin , FLEUROV, Vladimir, B. , PALENSCHAT, Frederick, A. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , STEIGER, Thomas, D. , SMITH, Brett, D. , MCKELVY, Thomas, E.
发明人： UJAZDOWSKI, Richard, C. , NESS, Richard, M. , ALGOTS, J., Martin , FLEUROV, Vladimir, B. , PALENSCHAT, Frederick, A. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , STEIGER, Thomas, D. , SMITH, Brett, D. , MCKELVY, Thomas, E.
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： H01S3/036 , H01F3/10 , H01F27/22 , H01F27/266 , H01F38/10 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/09702 , H01S3/225 , H01S3/2308
摘要： A high pulse repetition rate gas discharge laser system pulse power system magnetic reactor may comprise a housing comprising a core containing compartment between an inner wall of the housing, an outer wall and a bottom wall of the housing; a cooling mechanism operative to withdraw heat from the at least one of the inner wall, outer wall and bottom of the housing; at least one two magnetic cores contained within the core containing compartment; a cooling fin disposed between each of the at least two magnetic cores; and a thermal conductivity enhancement mechanism intermediate at least one of each respective cooling fin and each respective core and a respective one of the inner wall, the outer wall or the bottom wall, the thermal conductivity enhancement mechanism comprising a band comprising a plurality of torsion spring or leaf spring elements.
摘要翻译：高脉冲重复率气体放电激光系统脉冲功率系统磁反应器可以包括壳体，该壳体包括在壳体的内壁，外壁和壳体的底壁之间的容纳核心的隔间; 冷却机构，用于从壳体的内壁，外壁和底部中的至少一个中提取热量; 至少一个两个磁芯包含在所述芯容纳室内; 设置在所述至少两个磁芯中的每一个之间的冷却翅片; 以及在每个相应的冷却翅片和每个相应的芯部以及内壁，外壁或底壁中的相应的一个中的至少一个的热导率增强机构，所述热导率增强机构包括包括多个扭转弹簧或板簧元件。

5. 发明申请

WO2005089130A3 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2005089130A3
公开(公告)日：2005-09-29
申请号：PCT/US2005/007056
申请日：2005-03-03
申请人： CYMER, INC. , AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
IPC分类号： H01J35/20
摘要： An EUV light source apparatus (20) comprises a pulse laser (22) providing laser pulses (55) at a selected pulse repetition rate focused at a desired target ignition site (28); a target formation system (92) providing discrete targets (94); a target steering system (350) intermediate the target formation system (92) and the ignition site (28); a target tracking system (42) providing information about movement of the target (94) between the target formation system (92) and the target steering system (350); an electrostatic plasma containment apparatus (314) providing an electric plasma confinement field (316) at or near the ignition site (28) at the time of ignition; a vessel (30) having an intermediate wall (282) for passing EUV light; and a magnetic plasma confinement mechanism (329) creating a magnetic field (320) in the vicinity of the ignition site (28).

6. 发明申请

WO2004081503A2 DISCHARGE PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：排放生产等离子体光源
公开(公告)号：WO2004081503A2
公开(公告)日：2004-09-23
申请号：PCT/US2004/006551
申请日：2004-03-03
申请人： CYMER, INC. , PARTLO, William, N. , BLUMENSTOCK, Gerry, M. , BOWERING, Norbert , BRUZZONE, Kent, A. , COBB, Dennis, W. , DYER, Timothy, S. , DUNLOP, John , FOMENKOV, Igor, V. , HYSHAM, James, Christopher , OLIVER, Roger, I. , PALENSCHAT, Frederick, A. , PAN, Xiaojiang, J. , RETTIG, Curtis, L. , SIMMONS, Rodney, S. , WALKER, John , WEBB, Kyle, R. , HOFMANN, Thomas
发明人： PARTLO, William, N. , BLUMENSTOCK, Gerry, M. , BOWERING, Norbert , BRUZZONE, Kent, A. , COBB, Dennis, W. , DYER, Timothy, S. , DUNLOP, John , FOMENKOV, Igor, V. , HYSHAM, James, Christopher , OLIVER, Roger, I. , PALENSCHAT, Frederick, A. , PAN, Xiaojiang, J. , RETTIG, Curtis, L. , SIMMONS, Rodney, S. , WALKER, John , WEBB, Kyle, R. , HOFMANN, Thomas
IPC分类号： G01J
CPC分类号： H01S3/005 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70908 , G03F7/70916 , H01S3/225 , H05G2/003 , H05G2/005 , H05H1/06
摘要： An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO 2 . The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.
摘要翻译：公开了一种DPP EUV源，其可以包括使用从离开等离子体的碎片产生金属卤化物的金属卤素气体的碎片减缓装置。 EUV源可以具有碎片屏蔽，其可以包括多个曲线屏蔽构件，其具有通过与焦点对准的光通道连接的内表面和外表面，该屏蔽构件可以与它们之间的开放空间交替，并且可以具有形成在一个旋转轴上的圆圈和另一个轴上的椭圆。电极可以被供给放电脉冲，该放电脉冲在放电的轴向耗尽阶段期间产生适度的电流，并且在放电的径向压缩阶段期间发生峰值。光源可以包括涡轮分子泵，其具有连接到发电室的入口，并且可操作以比来自该室的缓冲气体优先地泵送更多的源气体。源可以包括调谐的导电电极，包括：掺杂在第一区域中以至少选择电导率的差分掺杂陶瓷材料，并且在第二区域中至少选择导热性。第一区域可以在电极结构的外表面处或附近，并且陶瓷材料可以是SiC或氧化铝，并且掺杂剂是BN或包括SiO或TiO 2的金属氧化物。源可以包括可移动电极组件安装件，其可操作以将电极组件安装座从更换位置移动到操作位置，可移动安装件在波纹管上。源可以具有可操作地连接到收集器的温度控制机构，并且可操作地调节相应壳体部件的温度，以保持温度相关几何形状优化来自相应外壳部件的入射反射的扫掠角，或机械定位器壳成员。壳可能会被电压偏置。可以使用离焦激光辐射来制造碎片屏蔽。阳极可以用限定两个冷却剂通道或限定通道的多孔金属的中空内部冷却。碎片屏蔽可以由连接到安装环或轮毂的多个大的，中间的和小的翅片形成，或者彼此具有提供均匀分离和强化并且不阻挡任何显着量的光的互锁突起。

7. 发明申请

WO2002069461A1 LASER WAVELENGTH CONTROL UNIT WITH PIEZOELECTRIC DRIVER 审中-公开
标题翻译：具有压电驱动器的激光波长控制单元
公开(公告)号：WO2002069461A1
公开(公告)日：2002-09-06
申请号：PCT/US2002/004623
申请日：2002-02-15
申请人： CYMER, INC. , SPANGLER, Ronald, L. , JACQUES, Robert, N. , RULE, John, A. , PALENSCHAT, Frederick, A. , FOMENKOV, Igor, V. , ALGOTS, John, M. , LIPCON, Jacob, P. , SANDSTROM, Richard, L.
发明人： SPANGLER, Ronald, L. , JACQUES, Robert, N. , RULE, John, A. , PALENSCHAT, Frederick, A. , FOMENKOV, Igor, V. , ALGOTS, John, M. , LIPCON, Jacob, P. , SANDSTROM, Richard, L.
IPC分类号： H01S3/10
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： An electric discharge laser (34) with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system (104) and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver. Preferred embodiments provide fast feedback control based on wavelength measurements, fast vibration control, active damping using the load cell and an active damping module (320), and transient inversion using feed forward algorithms based on historical burst data.
摘要翻译：具有快速波长校正的放电激光器（34）。快速波长校正设备包括至少一个压电驱动器和快速波长测量系统（104）和快速反馈响应时间。在优选实施例中，提供设备以在从大约1到5毫秒的中间时间和几微秒的非常快的时间帧上在几毫秒的慢时间帧上控制波长。优选的技术包括相对较慢的步进电机和非常快的压电驱动器的组合，用于使用调谐镜来调谐激光波长。非常快的波长控制与压电驱动器组合地设置有压电测力传感器。优选实施例提供基于波长测量，快速振动控制，使用负载传感器的主动阻尼和主动阻尼模块（320）的快速反馈控制，以及使用基于历史突发数据的前馈算法的瞬态反转。

8. 发明公开

EP1726028A2 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 有权
标题翻译：用高重复率产生的等离子体EUV光源的激光
公开(公告)号：EP1726028A2
公开(公告)日：2006-11-29
申请号：EP05724572.2
申请日：2005-03-03
申请人： Cymer, Inc.
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
IPC分类号： H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap.

9. 发明公开

EP1602116A2 DISCHARGE PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：放电产生血浆EUV光源
公开(公告)号：EP1602116A2
公开(公告)日：2005-12-07
申请号：EP04716949.5
申请日：2004-03-03
申请人： Cymer, Inc.
发明人： PARTLO, William, N. , BLUMENSTOCK, Gerry, M. , BOWERING, Norbert , BRUZZONE, Kent, A. , COBB, Dennis W. , DYER, Timothy, S. , DUNLOP, John , FOMENKOV, Igor, V. , HYSHAM, James, Christopher , OLIVER, Roger, I. , PALENSCHAT, Frederick, A. , PAN, Xiaojiang, J. , RETTIG, Curtis, L. , SIMMONS, Rodney, S. , WALKER, John , WEBB, Kyle, R. , HOFMANN, Thomas , KHODYKIN, Oleh
IPC分类号： H01J1/52
CPC分类号： H01S3/005 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70908 , G03F7/70916 , H01S3/225 , H05G2/003 , H05G2/005 , H05H1/06
摘要： An EUV source (20) includes a debris mitigation apparatus (60) employing a metal halogen gas producing a metal halide from debris exiting the plasma, a debris shield (36) having a plurality of curvilinear shield members (102) having inner and outer surface connected by light passages (104) and electrodes (28,88) for providing a discharged plasma (32) in a chamber (22).

10. 发明授权

EP1726028B1 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 有权
标题翻译：用高重复率产生的等离子体EUV光源的激光
公开(公告)号：EP1726028B1
公开(公告)日：2014-05-21
申请号：EP05724572.2
申请日：2005-03-03
申请人： Cymer, Inc.
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008

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