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1. 发明申请

WO2005094205A2 VERY HIGH ENERGY, HIGH STABILITY GAS DISCHARGE LASER SURFACE TREATMENT SYSTEM 审中-公开
标题翻译：高能量，高稳定性气体放电激光表面处理系统
公开(公告)号：WO2005094205A2
公开(公告)日：2005-10-13
申请号：PCT/US2004/024160
申请日：2004-07-26
申请人： CYMER, INC. , DAS, Palash, P. , BOLLIGER, Bruce, E. , PATEL, Parthiv , KLENE, Brian, C. , MELCHER, Paul, C. , SAETHRE, Robert, B.
发明人： DAS, Palash, P. , BOLLIGER, Bruce, E. , PATEL, Parthiv , KLENE, Brian, C. , MELCHER, Paul, C. , SAETHRE, Robert, B.
IPC分类号： B23K26/00 , B23K26/06 , B23K26/40 , H01S3/00 , H01S3/097 , H01S3/225 , H01S3/23
CPC分类号： B23K26/0604 , B23K26/0624 , B23K2201/40 , C30B29/06 , C30B33/02 , C30B35/00 , H01S3/0057 , H01S3/097 , H01S3/225 , H01S3/2253 , H01S3/2333 , H01S3/2366
摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in the substrate of a workpiece is disclosed which may comprise, a multichamber laser system comprising, a first laser unit comprising, a first and second gas discharge chamber; each with a pair of elongated spaced apart opposing electrodes contained within the chamber, forming an elongated gas discharge region; a laser gas contained within the chamber comprising a halogen and a noble gas selected to produce laser light at a center wavelength optimized to the crystallization process to be carried out on the workpiece; a power supply module comprising, a DC power source; a first and a second pulse compression and voltage step up circuit connected to the DC power source and connected to the respective electrodes, comprising a multistage fractional step up transformer having a plurality of primary windings connected in series and a single secondary winding passing through each of the plurality of primary windings, and a solid state trigger switch; and a laser timing and control module operative to time the closing of the respective solid state switch based upon operating parameters of the respective first and second pulse compression and voltage step up circuit to effect operation of the first and second laser units as either a POPA configured laser system or a POPO configured laser system to produce a single output laser light pulse beam. As a POPA laser system relay optics may be operative to direct a first output laser light pulse beam from the first laser unit into the second gas discharge chamber; and, the timing and control module operates to create a gas discharge between the second pair of electrodes while the first output laser light pulse beam is transiting the second discharge region, within plus or minus 3 ns and as a POPO, combining optics combine the output beams, and timing creates pulse separation in the combined output a preselected time plus or minus 3 ns. A beam delivery unit and a pulse stretcher may be included, and timing and control may be processor controlled based on signals representing charging voltage and component temperatures in the pulse compression and voltage step up circuits.
摘要翻译：公开了一种气体放电激光结晶装置和方法，用于在工件的基板中进行晶体组成或取向的变换，其可以包括：多室激光器系统，包括：第一激光单元，包括第一和第二气体放电室; 每个具有包含在所述腔室内的一对细长间隔开的相对电极，形成细长的气体放电区域; 包含在所述室内的激光气体包括卤素和惰性气体，所述惰性气体被选择为产生对于在所述工件上进行的结晶过程优化的中心波长的激光; 电源模块，包括：直流电源; 连接到直流电源并连接到各个电极的第一和第二脉冲压缩和升压电路，包括具有串联连接的多个初级绕组的多级分数升压变压器和通过每个多个初级绕组和固态触发开关; 以及激光定时和控制模块，用于基于相应的第一和第二脉冲压缩和电压升压电路的操作参数对相应固态开关的闭合进行时间控制，以实现第一和第二激光单元的操作，作为POPA配置激光系统或POPO配置的激光系统产生单个输出的激光光束。作为POPA激光系统，中继光学器件可操作以将来自第一激光单元的第一输出激光束脉冲光引导到第二气体放电室中; 并且，正时和控制模块操作以在第二对电极之间产生气体放电，同时第一输出激光束脉冲束在正或负3ns内转移第二放电区域，并且作为POPO，组合光学器件组合输出光束和定时在组合输出中产生脉冲分离，预选时间加或减3 ns。可以包括光束传送单元和脉冲展开器，并且可以基于表示脉冲压缩和电压升压电路中的充电电压和分量温度的信号来对处理器进行控制。

2. 发明申请

WO2004012308A2 CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER 审中-公开
标题翻译：两台气体放电激光器的控制系统
公开(公告)号：WO2004012308A2
公开(公告)日：2004-02-05
申请号：PCT/US2003/024146
申请日：2003-07-30
申请人： CYMER, INC. , FALLON, John, P. , RULE, John, A. , JACQUES, Robert, N. , LIPCON, Jacob, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , ERSHOV, Alexander I. , ISHIHARA, Toshihiko , MEISNER, John , NESS, Richard, M. , MELCHER, Paul, C.
发明人： FALLON, John, P. , RULE, John, A. , JACQUES, Robert, N. , LIPCON, Jacob, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , ERSHOV, Alexander I. , ISHIHARA, Toshihiko , MEISNER, John , NESS, Richard, M. , MELCHER, Paul, C.
IPC分类号： H01S
CPC分类号： H01S3/2333 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultra violet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F 2 injection controls with novel learning algorithm.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。特别适用于双室气体放电激光系统的新型控制功能包括：（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度控制和（4）F2注入控制与新的学习算法。

3. 发明申请

WO2005001995A2 METHOD AND APPARATUS FOR ELECTRICALLY INTERCONNECTING HIGH VOLTAGE MODULES POSITIONED IN RELATIVELY CLOSE PROXIMITY 审中-公开
标题翻译：用于电互连高压模块的方法和装置，其位置相对近接近
公开(公告)号：WO2005001995A2
公开(公告)日：2005-01-06
申请号：PCT/US2004/018943
申请日：2004-06-14
申请人： CYMER, INC. , SAETHRE, Robert, B. , MELCHER, Paul, C. , FERGUSON, George, X.
发明人： SAETHRE, Robert, B. , MELCHER, Paul, C. , FERGUSON, George, X.
IPC分类号： H01R
CPC分类号： H01R13/53
摘要： An apparatus and method for electrically connecting two closely positioned high voltage modules with little or no bend and without any loops in an electrical interconnecting coaxial cable, is disclosed, which may comprise a high voltage connector attached to at least a portion of the cable on at least one end of the cable; a push through high voltage connector receptor within one module; and a disconnection mechanism within the one module adapted to move the high voltage connector and the at least a portion of cable to which the high voltage connector is attached through the connector receptor from a contact position to a housed position in a direction away from the other module to which high voltage connection is to be made. The high voltage connector receptor may comprise an open cylindrical connector with a contacting surface contained on the interior wall of the cylindrical connector. The apparatus may further comprise an interlock mechanism in operative connection with the disconnection mechanism and adapted to provide an indication of the high voltage connector being in a position other than in the contact position relative to the connector receptor, and an engaging mechanism engaging the cable and holding the cable in a fixed position relative to the disconnection mechanism as the high voltage connector moves between the contact position and the housed position. The apparatus may further comprise a clamping mechanism in cooperative connection with the disconnection mechanism when the high voltage connector is in the contact position and cooperative with the clamping mechanism to prevent the high voltage connector from moving from the contact position. The invention may also include a retractable connector within a second module moveable toward the first module from a retracted position into an extended position, in which extended position electrical contact is made with the second hih voltage connector.
摘要翻译：公开了一种用于电连接两个紧密定位的高电压模块的装置和方法，所述高电压模块在电互连同轴电缆中具有很少或没有弯曲且没有任何环路，其可以包括连接到在电缆的至少一端上的电缆的至少一部分; 在一个模块内推入高压连接器接收器; 以及所述一个模块内的断开机构，所述断开机构适于通过所述连接器接收器将所述高电压连接器和所述高压连接器所附接到的所述电缆的至少一部分从接触位置移动到远离另一接收位置的容纳位置高压连接的模块。高压连接器接收器可以包括具有容纳在圆柱形连接器的内壁上的接触表面的开放式圆柱形连接器。该设备可以进一步包括与断开机构可操作地连接并且适于提供高压连接器相对于连接器接收器处于除了接触位置之外的位置的指示的联锁机构以及与电缆接合的接合机构以及当高压连接器在接触位置和容纳位置之间移动时，将电缆保持在相对于断开机构的固定位置。所述装置可进一步包括与所述断开机构协作连接的夹紧机构，当所述高压连接器处于所述接触位置时并且与所述夹紧机构配合以防止所述高压连接器从所述接触位置移动。本发明还可以包括第二模块内的可缩回连接器，该第二模块能够从缩回位置朝向第一模块移动到伸展位置，在伸展位置中，伸展位置电接触与第二电压连接器形成。

4. 发明申请

WO2001011733A1 HIGH PULSE RATE PULSE POWER SYSTEM WITH FAST RISE TIME AND LOW LEAKAGE CURRENT 审中-公开
标题翻译：具有快速上升时间和低漏电流的高脉冲速率脉冲电源系统
公开(公告)号：WO2001011733A1
公开(公告)日：2001-02-15
申请号：PCT/US2000/020266
申请日：2000-07-25
申请人： CYMER, INC. , BIRX, Deborah, L. , PARTLO, William, N. , NESS, Richard, M. , ROTHWEIL, Daniel, A. , MELCHER, Paul, C. , SMITH, Brett, D.
发明人： PARTLO, William, N. , NESS, Richard, M. , ROTHWEIL, Daniel, A. , MELCHER, Paul, C. , SMITH, Brett, D.
IPC分类号： H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A high pulse rate pulse power source (20) for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source (20) includes a pulse generating circuit (50) including a charging capacitor (42), a solid state switch (46) and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer (56) increases peak voltage to at least 12,000 volts. A very fast regulated power supply (20) is provided for charging the charging capacitor (42) in less than 400 microseconds and a pulse control system including a programmed processor (102) controls the charging of the charging capacitor (42) to an accuracy of less than about one percent at a rate of at least 2000 charges per second.
摘要翻译：用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源（20）。源极（20）包括包括充电电容器（42），固态开关（46）和限流电感器的脉冲发生电路（50）。在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩，并且升压脉冲变压器（56）将峰值电压增加到至少12000伏特。提供了一种非常快速的调节电源（20），用于在小于400微秒内为充电电容器（42）充电，以及包括编程处理器（102）的脉冲控制系统，其将充电电容器（42）的充电控制到不到百分之一，每秒至少要2000次。

5. 发明申请

WO2007041232A3 6K PULSE REPETITION RATE AND ABOVE GAS DISCHARGE LASER SYSTEM SOLID STATE PULSE POWER SYSTEM IMPROVEMENTS 审中-公开
公开(公告)号：WO2007041232A3
公开(公告)日：2007-04-12
申请号：PCT/US2006/037884
申请日：2006-09-27
申请人： CYMER, INC. , HUANG, Chaofeng , MELCHER, Paul, C. , NESS, Richard, M.
发明人： HUANG, Chaofeng , MELCHER, Paul, C. , NESS, Richard, M.
IPC分类号： H01S3/22
摘要： A method and apparatus for operating a very high repetition gas discharge laser system magnetic switch pulsed power system is disclosed, which may comprise a solid state switch, a charging power supply electrically connected to one side of the solid state switch; a charging inductor electrically connected to the other side of the solid state switch; a deque circuit electrically in parallel with the solid state switch comprising a deque switch; a peaking capacitor electrically connected to the charging inductor, a peaking capacitor charging control system operative to charge the peaking capacitor by opening the deque switch and leaving the solid state switch open and then shutting the solid state switch. The solid state switch may comprise a plurality of solid state switches electrically in parallel.

6. 发明申请

WO2002093699A1 FOUR KHz GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：四吉兹气体放电激光系统
公开(公告)号：WO2002093699A1
公开(公告)日：2002-11-21
申请号：PCT/US2002/012062
申请日：2002-04-15
申请人： CYMER, INC. , WITTAK, Christian, J. , PARTLO, William, N. , SANDSTROM, Richard, L. , MELCHER, Paul, C. , JOHNS, David, M. , SAETHRE, Robert, B. , NESS, Richard, M. , RETTIG, Curtis, L. , SHANNON, Robert, A. , UJAZDOWSKI, Richard, C. , ROKNI, Shahryar , SMITH, Scott , ANDERSON, Stuart, L. , ALGOTS, John, M. , SPANGLER, Ronald, L. , FOMENKOV, Igor , STEIGER, Thomas, D. , EMILO, Jerome, A. , TITUS, Clay, C. , IVASCHENKO, Alex, P. , ZAMBON, Paolo , PADMABANDU, Gamaralalage, G. , BRANHAM, Mark, S. , PHATAK, Sanjay , CYBULSKI, Raymond
发明人： WITTAK, Christian, J. , PARTLO, William, N. , SANDSTROM, Richard, L. , MELCHER, Paul, C. , JOHNS, David, M. , SAETHRE, Robert, B. , NESS, Richard, M. , RETTIG, Curtis, L. , SHANNON, Robert, A. , UJAZDOWSKI, Richard, C. , ROKNI, Shahryar , SMITH, Scott , ANDERSON, Stuart, L. , ALGOTS, John, M. , SPANGLER, Ronald, L. , FOMENKOV, Igor , STEIGER, Thomas, D. , EMILO, Jerome, A. , TITUS, Clay, C. , IVASCHENKO, Alex, P. , ZAMBON, Paolo , PADMABANDU, Gamaralalage, G. , BRANHAM, Mark, S. , PHATAK, Sanjay , CYBULSKI, Raymond
IPC分类号： H01S3/10
CPC分类号： G03F7/70025 , G03F7/70933 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter (4K) with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror, which is in a line narrowing module (15K) and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors (16K and 17K) drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以约4,000Hz的脉冲速率产生高质量的脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长计（4K）监视输出光束参数，并控制一个非常快的PZT驱动调光镜，它在一个线路变窄模块（15K）和脉冲功率充电电压，以保持波长和脉冲能量达到所需的极限。在优选实施例中，两个风扇马达（16K和17K）驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

7. 发明申请

WO2005001853A2 METHOD AND APPARATUS FOR COOLING MAGNETIC CIRCUIT ELEMENTS 审中-公开
标题翻译：用于冷却磁电元件的方法和装置
公开(公告)号：WO2005001853A2
公开(公告)日：2005-01-06
申请号：PCT/US2004/018941
申请日：2004-06-14
申请人： CYMER, INC. , NESS, Richard, M. , PARTLO, William, N. , MELCHER, Paul, C. , FERGUSON, George, X. , SAETHRE, Robert, B.
发明人： NESS, Richard, M. , PARTLO, William, N. , MELCHER, Paul, C. , FERGUSON, George, X. , SAETHRE, Robert, B.
IPC分类号： H01F
CPC分类号： H01F27/266 , H01F27/025 , H01F27/10 , H01S3/097
摘要： An apparatus and method for providing cooling to a magnetic circuit element having a magnetic core disposed around a centrally located core support member having at least one core support member wall is disclosed which may comprise a core support coolant inlet; a core support coolant outlet; a plurality of interconnected coolant flow passages contained within the core support member wall and interconnected and arranged to pass coolant from one coolant flow passage to the next within the core support member wall along a coolant flow path within at least a substantial portion of the core support member wall from the core support coolant inlet to the core support coolant outlet. The apparatus may also comprise each core support coolant flow passage is in fluid communication with a fluid communication plenum at each end of each respective core support coolant flow passage, with each respective fluid communication plenum forming an outlet plenum for at least a first one of the respective core support coolant flow passages and an inlet plenum for at least a second one of the respective core support coolant flow passages along the coolant flow path from the core support coolant inlet to the core support coolant outlet. The core support member may comprise a flange extending from the core support member, the flange having an inner dimension and an outer dimension, which may also comprise a plurality of interconnected flange coolant flow passages extending alternatively toward the inner dimension and away from the outer dimension and then toward the outer dimension and away from the inner dimension, between the core support coolant inlet and the core support coolant outlet. The core and core support may be contained in a housing which may comprise a housing wall; a housing coolant inlet; a housing coolant outlet; and a plurality of interconnected housing coolant flow passages contained within the housing wall and interconnected and arranged to pass coolant from one coolant flow passage to the next within the housing wall along a coolant flow path within at least a substantial portion of the housing wall from the housing coolant inlet to the housing coolant outlet. The housing and core support may forma a part of at least a portion of an electrical current flow path forming two turns around the magnetic core. In another aspect of the invention buswork may be coated with a thin film of electrically conductive material.
摘要翻译：公开了一种用于向具有设置在具有至少一个芯支撑构件壁的中心定位的芯支撑构件周围的磁芯的磁路元件提供冷却的装置和方法，其可包括芯支撑冷却剂入口; 核心支撑冷却液出口; 多个互连的冷却剂流动通道，其容纳在所述芯部支撑构件壁内并且互连并且布置成沿着所述芯部支撑件的至少大部分内的冷却剂流动路径将冷却剂从一个冷却剂流动通道传递到所述芯部支撑构件壁内的下一个构件壁从芯部支撑冷却剂入口到芯部支撑冷却剂出口。该装置还可以包括每个芯支撑冷却剂流动通道与每个相应的芯支撑冷却剂流动通道的每个端部处的流体连通通气室流体连通，每个相应的流体连通增压室形成出口压力室，用于至少第一个相应的芯支撑冷却剂流动通道和用于沿着从芯支撑冷却剂入口到芯支撑冷却剂出口的冷却剂流动路径的相应的芯支撑冷却剂流动通道中的至少第二个的入口气室。芯支撑构件可以包括从芯支撑构件延伸的凸缘，凸缘具有内部尺寸和外部尺寸，该凸缘还可以包括多个互连的凸缘冷却剂流动通道，所述凸缘冷却剂流动通道相对于内部尺寸交替地延伸并远离外部尺寸然后朝向外部尺寸并远离内部尺寸，在核心支撑冷却剂入口和芯部支撑冷却剂出口之间。芯和芯支撑件可以包含在可以包括壳体壁的壳体中; 壳体冷却剂入口; 外壳冷却液出口; 以及多个互连的壳体冷却剂流动通道，其容纳在所述壳体壁内并且被互连并且布置成将冷却剂沿着沿着所述壳体壁的至少大部分内的冷却剂流动路径从所述壳体壁在所述壳体壁内向下流动将冷却剂入口容纳到壳体冷却剂出口。壳体和芯部支撑件可以形成绕磁芯形成两圈的电流流路的至少一部分的一部分。在本发明的另一方面，母线可以涂覆有导电材料的薄膜。

8. 发明申请

WO2003021731A1 SIX TO TEN KHz, OR GREATER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：六至十赫兹或更大气体放电激光系统
公开(公告)号：WO2003021731A1
公开(公告)日：2003-03-13
申请号：PCT/US2002/026011
申请日：2002-08-16
申请人： CYMER, INC. , WATSON, Tom, A. , UJAZDOWSKI, Richard, C. , IVASCHENKO, Alex, P. , SHANNON, Robert, A. , SANDSTROM, Richard, L. , WEBB, Robert, Kyle , PALENSCHAT, Frederick, A. , HOFMANN, Thomas , RETTIG, Curtis, L. , NESS, Richard, L. , MELCHER, Paul, C. , ERSHOV, Alexander, I.
发明人： WATSON, Tom, A. , UJAZDOWSKI, Richard, C. , IVASCHENKO, Alex, P. , SHANNON, Robert, A. , SANDSTROM, Richard, L. , WEBB, Robert, Kyle , PALENSCHAT, Frederick, A. , HOFMANN, Thomas , RETTIG, Curtis, L. , NESS, Richard, L. , MELCHER, Paul, C. , ERSHOV, Alexander, I.
IPC分类号： H01S3/22
CPC分类号： H01S3/0385 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,000 pulses per second. Preferred embodiments are configured as KrF, ArF and F 2 lasers used in photolithography. Improvements include a suction fan (555) in the immediate vicinity of the anode (542) to increase gas flow. The intake of the fan (555) is between the anode (542) and the insulating spacer (544B).
摘要翻译：本发明提供了能够以6,000至10,000个脉冲/秒的重复频率在生产线容量中可靠长期运行的气体放电激光系统。优选实施例被配置为用于光刻的KrF，ArF和F2激光器。改进包括在阳极（542）附近的吸入风扇（555）以增加气体流量。风扇（555）的入口位于阳极（542）和绝缘间隔物（544B）之间。

9. 发明公开

EP1101258A1 HIGH PULSE RATE PULSE POWER SYSTEM 有权
标题翻译：具有高脉冲频率脉冲发生器系统
公开(公告)号：EP1101258A1
公开(公告)日：2001-05-23
申请号：EP99930661.6
申请日：1999-06-24
申请人： Cymer, Inc.
发明人： PARTLO, William, N. , BIRX, Daniel, L. , NESS, Richard, M. , ROTHWEIL, Daniel, A. , MELCHER, Paul, C. , SMITH, Brett, D.
IPC分类号： H01S3/00
CPC分类号： G03F7/70483 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A high pulse rate pulse power source (20) for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source (20) includes a pulse generating circuit (30) including a charging capacitor (42), a solid state switch (46) and a current limiting inductor (48). Pulses generated in the pulse generating circuit (30) are compressed in at least two pulse compression circuits (61, 65) and a step-up pulse transformer (56) increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor (42) in less than 400 microseconds and a pulse control system including a programmed processor (102) controls the charging of the charging capacitor (42) to an accuracy of less than about one percent at a rate of at least 2000 charges per second.

10. 发明授权

EP1224717B1 HIGH PULSE RATE PULSE POWER SYSTEM WITH FAST RISE TIME AND LOW LEAKAGE CURRENT 有权
标题翻译：具有高脉冲速率，时间短，增加了低泄漏功率脉冲布置
公开(公告)号：EP1224717B1
公开(公告)日：2005-05-04
申请号：EP00953674.9
申请日：2000-07-25
申请人： Cymer, Inc.
发明人： BIRX, Daniel, L. DI , PARTLO, William, N. , NESS, Richard, M. , ROTHWEIL, Daniel, A. , MELCHER, Paul, C. , SMITH, Brett, D.
IPC分类号： H01S3/00 , H03K3/57 , H03K17/80 , H01S3/097
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A high pulse rate pulse power source (20) for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source (20) includes a pulse generating circuit (50) including a charging capacitor (42), a solid state switch (46) and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer (56) increases peak voltage to at least 12,000 volts. A very fast regulated power supply (20) is provided for charging the charging capacitor (42) in less than 400 microseconds and a pulse control system including a programmed processor (102) controls the charging of the charging capacitor (42) to an accuracy of less than about one percent at a rate of at least 2000 charges per second.

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