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1. 发明申请

WO2010118146A1 ALIGNMENT LASER 审中-公开
标题翻译：对准激光
公开(公告)号：WO2010118146A1
公开(公告)日：2010-10-14
申请号：PCT/US2010/030258
申请日：2010-04-07
申请人： CYMER, INC. , FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , PARTLO, William, N. , PAXTON, Jason, A. , KIM, Nam-Hyong , HOFFMAN, Jerzy, R.
发明人： FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , PARTLO, William, N. , PAXTON, Jason, A. , KIM, Nam-Hyong , HOFFMAN, Jerzy, R.
IPC分类号： H01S3/091
CPC分类号： H01S3/2232 , G03F7/70033 , H01S3/0014 , H01S3/0407 , H01S3/041 , H01S3/086 , H01S3/2308 , H05G2/008
摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.
摘要翻译：用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

2. 发明申请

WO2009032055A1 SYSTEM MANAGING GAS FLOW BETWEEN CHAMBERS OF AN EXTREME ULTRAVIOLET (EUV) PHOTOLITHOGRAPHY APPARATUS 审中-公开
标题翻译：系统管理超级紫外线（EUV）光刻设备的灯泡之间的气体流量
公开(公告)号：WO2009032055A1
公开(公告)日：2009-03-12
申请号：PCT/US2008/009755
申请日：2008-08-15
申请人： CYMER, INC. , BYKANOV, Alexander, N. , BRANDT, David, C. , FOMENKOV, Igor, C. , PARTLO, William, N.
发明人： BYKANOV, Alexander, N. , BRANDT, David, C. , FOMENKOV, Igor, C. , PARTLO, William, N.
IPC分类号： G21G4/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70808 , G03F7/70841 , G03F7/70883 , G03F7/70908
摘要： A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.
摘要翻译：气体流量管理系统可以包括至少部分地围绕第一和第二相应空间的第一和第二封闭壁; 在第一空间中产生等离子体的系统，等离子体发射极紫外光; 限制从第一空间流到第二空间的细长体，所述主体至少部分地围绕通道并且具有允许EUV光从第一空间进入通道的第一开口端，以及允许EUV光从第二空间退出的第二开口端通道进入第二空间，身体形状以建立相对于第一和第二端具有减小的横截面面积的位置; 以及离开孔的气流，所述孔定位成在主体的第一端和具有减小的横截面积的位置之间的位置处将气体引入通道。

3. 发明申请

WO2007149282A2 BANDWIDTH CONTROL DEVICE 审中-公开
标题翻译：带宽控制装置
公开(公告)号：WO2007149282A2
公开(公告)日：2007-12-27
申请号：PCT/US2007/013875
申请日：2007-06-11
申请人： CYMER, INC. , FOMENKOV, Igor, V. , PARTLO, William, N. , REILEY, Daniel, J. , HOWEY, James, K. , AGULIAR, Stanley, C.
发明人： FOMENKOV, Igor, V. , PARTLO, William, N. , REILEY, Daniel, J. , HOWEY, James, K. , AGULIAR, Stanley, C.
IPC分类号： H01S3/10
CPC分类号： H01S3/225 , H01S3/03 , H01S3/034 , H01S3/08009 , H01S3/137 , H01S3/2256
摘要： A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.
摘要翻译：公开了用于操作可以包括标称中心波长和带宽选择光学器件的激光输出光束脉冲线窄化机构的方法和装置; 静态波前补偿机构整形选择光学元件的曲率; 主动波前补偿机构整形选择光学元件的曲率并独立于静态波前补偿机制工作。该方法和装置可以包括标称中心波长和带宽选择光学器件包括光栅; 静态波前补偿机构将预选的弯矩应用于光栅; 主动波前补偿机构响应于基于来自监视激光输出光束脉冲的带宽的带宽监视器的带宽反馈的弯矩控制器的控制，向光栅施加单独的选定弯矩。主动波前补偿机构可以包括气动驱动机构。

4. 发明申请

WO2007145792A3 CHAMBER FOR A HIGH ENERGY EXCIMER LASER SOURCE 审中-公开
公开(公告)号：WO2007145792A3
公开(公告)日：2007-12-21
申请号：PCT/US2007/012393
申请日：2007-05-22
申请人： CYMER, INC. , STEIGER, Thomas, D. , PARTLO, William, N.
发明人： STEIGER, Thomas, D. , PARTLO, William, N.
IPC分类号： H01S3/20
摘要： A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electrical conductor may extend through the orifice to pass an electric current into the chamber volume. A member may be disposed between the conductor and the wall for preventing gas flow through the orifice to allow a chamber pressure to be maintained in the volume. The chamber may further comprise a pressurized compartment disposed adjacent to the orifice for maintaining a pressure on at least a portion of the outside surface of the wall to reduce bowing of the wall near the orifice due to chamber pressure.

5. 发明申请

WO2007005512A2 GAS DISCHARGE LASER LINE NARROWING MODULE 审中-公开
标题翻译：气体放电激光线窄行模块
公开(公告)号：WO2007005512A2
公开(公告)日：2007-01-11
申请号：PCT/US2006/025350
申请日：2006-06-28
申请人： CYMER, INC. , CYBULSKI, Raymond, F. , BERGSTEDT, Robert, A. , PARTLO, William, N. , SANDSTROM, Richard, L. , WANG, Gon
发明人： CYBULSKI, Raymond, F. , BERGSTEDT, Robert, A. , PARTLO, William, N. , SANDSTROM, Richard, L. , WANG, Gon
IPC分类号： H01S3/22 , H01S3/03
CPC分类号： H01S3/03 , H01S3/034 , H01S3/036 , H01S3/1055 , H01S3/225
摘要： A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.
摘要翻译：公开了一种线变窄的气体放电激光系统及其操作方法，其可以包括色散中心波长选择元件; 包括多个折射元件的扩束器; 折射元件定位机构，所述折射元件定位机构定位所述折射元件中的至少一个，以改变所述色散中心波长选择元件上的激光束的入射角; 色散中心波长选择元件和扩束器中的每一个彼此对齐并且与至少包含色散中心波长选择元件的外壳对齐; 壳体定位机构，其相对于气体放电激光系统的光轴定位壳体。色散元件可以包括光栅，并且扩束器可以包括多个棱镜。外壳可以包含色散中心波长选择元件和扩束器。外壳定位元件可以包括位置锁定机构。

6. 发明申请

WO2006105101A3 GAS DISCHARGE LASER OUTPUT LIGHT BEAM PARAMETER CONTROL 审中-公开
公开(公告)号：WO2006105101A3
公开(公告)日：2006-10-05
申请号：PCT/US2006/011305
申请日：2006-03-27
申请人： CYMER, INC. , BESAUCELE, Herve, A. , FOMENKOV, Igor, V. , PARTLO, William, N. , TRINTICHOUK, Fedor , TON-THAT, Hao
发明人： BESAUCELE, Herve, A. , FOMENKOV, Igor, V. , PARTLO, William, N. , TRINTICHOUK, Fedor , TON-THAT, Hao
IPC分类号： H01S3/00
摘要： A line narrowed gas discharge laser system and method of operation are disclosed which may comprise: an oscillator cavity; a laser chamber comprising a chamber housing containing a lasing medium gas; at least one peaking capacitor electrically connected to the chamber housing and to a first one of a pair of electrodes; a second one of the pair of electrodes connected to an opposite terminal of the at least one peaking capacitor; a current return path connected to the chamber housing; the one terminal, the first one of the electrodes, the lasing medium gas, the second one of the electrodes, the current return path and the second terminal forming a head current inductive loop having an inductance unique to the particular head current inductive loop; a spectral quality tuning mechanism comprising a mechanism for changing the particular head current inductive loop inductance value for the particular head current inductance loop.

7. 发明申请

WO2006009852A3 OPTICAL ELEMENTS WITH PROTECTIVE UNDERCOATING 审中-公开
公开(公告)号：WO2006009852A3
公开(公告)日：2006-01-26
申请号：PCT/US2005/021475
申请日：2005-06-17
申请人： CYMER, INC. , PARTLO, William, N. , BROWN, Daniel, J., W. , YAGER, Thomas, A. , ZHANG, Kevin, Weiman
发明人： PARTLO, William, N. , BROWN, Daniel, J., W. , YAGER, Thomas, A. , ZHANG, Kevin, Weiman
IPC分类号： B32B9/00 , B05D5/06
摘要： An apparatus and method are disclosed for an optical element which may comprise a main optical body comprising a crystal containing halogen atoms; a reflectivity coating for changing the reflectivity of a surface of the main body; and, an intermediate protective layer comprising a material containing free halogen atoms. The crystal may comprise an alkaline earth metal and may comprise fluorine atoms, e.g., calcium fluoride or magnesium fluoride. The intermediate protective layer may comprises a material containing free fluorine atoms, e.g., a material doped with fluorine atoms, e.g., doped fused silica. The intermediate layer comprises an amorphous portion and a polycrystalline portion. The optical element may also comprise a main optical element body; a reflectivity coating comprising a metal halide on an exterior the a surface of the main optical body; and a thin layer of protective outer coating on the reflectivity coating comprising a dense non-porous material thin enough to be transparent to the light of a selected short wavelength. The reflectivity coating may comprise a plurality of layers with at least one layer comprising a metal fluoride and the protective outer coating may comprise a layer of silicon oxyfluoride.

8. 发明申请

WO2004012308A2 CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER 审中-公开
标题翻译：两台气体放电激光器的控制系统
公开(公告)号：WO2004012308A2
公开(公告)日：2004-02-05
申请号：PCT/US2003/024146
申请日：2003-07-30
申请人： CYMER, INC. , FALLON, John, P. , RULE, John, A. , JACQUES, Robert, N. , LIPCON, Jacob, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , ERSHOV, Alexander I. , ISHIHARA, Toshihiko , MEISNER, John , NESS, Richard, M. , MELCHER, Paul, C.
发明人： FALLON, John, P. , RULE, John, A. , JACQUES, Robert, N. , LIPCON, Jacob, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , ERSHOV, Alexander I. , ISHIHARA, Toshihiko , MEISNER, John , NESS, Richard, M. , MELCHER, Paul, C.
IPC分类号： H01S
CPC分类号： H01S3/2333 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultra violet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F 2 injection controls with novel learning algorithm.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。特别适用于双室气体放电激光系统的新型控制功能包括：（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度控制和（4）F2注入控制与新的学习算法。

9. 发明申请

WO2003021728A3 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 审中-公开
公开(公告)号：WO2003021728A3
公开(公告)日：2003-03-13
申请号：PCT/US2002/027925
申请日：2002-08-28
申请人： CYMER, INC. , KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
IPC分类号： H01S3/11
摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4,000 Hz or greater by cleaning debris from the discharge region in less time that the approximately 0.25 milliseconds between pulses. The masters oscillation is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

10. 发明申请

WO2012050685A1 METHOD FOR LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS 审中-公开
标题翻译：在EUV非输出期间的LPP驱动激光输出的方法
公开(公告)号：WO2012050685A1
公开(公告)日：2012-04-19
申请号：PCT/US2011/050565
申请日：2011-09-06
申请人： CYMER, INC. , PARTLO, William, N. , SANDSTROM, Richard, L. , BROWN, Daniel, J.w. , FOMENKOV, Igor, V.
发明人： PARTLO, William, N. , SANDSTROM, Richard, L. , BROWN, Daniel, J.w. , FOMENKOV, Igor, V.
IPC分类号： A61N5/06
CPC分类号： G21K5/00 , G03F7/70033 , H01S3/117 , H01S3/2232 , H01S3/2308 , H05G2/008
摘要： A device is disclosed, herein which may comprise a droplet generator producing droplets of target material; a sensor providing an. intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the. intercept time signal; a. laser source responsive to a trigger signal to produce a laser pulse-; and a system controlling said delay circuit to provide a. trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light -pulse which is not focused on a droplet.
摘要翻译：本文公开了一种装置，其可以包括产生目标材料的液滴的液滴发生器; 传感器提供。当液滴到达预选位置时截获时间信号; 与所述传感器耦合的延迟电路，所述延迟电路产生从所述传感器延迟的触发信号。拦截时间信号; 一个。激光源响应于触发信号以产生激光脉冲; 以及控制所述延迟电路以提供a的系统。触发信号从截取时间延迟第一延迟时间，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生不聚焦在液滴上的光脉冲。

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