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    • 1. 发明申请
    • SELECTED WORD LINE DEPENDENT SELECT GATE VOLTAGE DURING PROGRAM
    • 在程序期间选择的字线相关选择门电压
    • US20130250690A1
    • 2013-09-26
    • US13430502
    • 2012-03-26
    • Chun-Hung LaiDeepanshu DuttaShinji SatoGerrit Jan Hemink
    • Chun-Hung LaiDeepanshu DuttaShinji SatoGerrit Jan Hemink
    • G11C16/10
    • G11C11/5628G11C16/0483G11C16/10
    • Methods and devices for operating non-volatile storage are disclosed. One or more programming conditions depend on the location of the word line that is selected for programming, which may reduce or eliminate program disturb. The voltage applied to the gate of a select transistor of a NAND string may depend on the location of the selected word line. This could be either a source side or drain side select transistor. This may prevent or reduce program disturb that could result due to DIBL. This may also prevent or reduce program disturb that could result due to GIDL. A negative bias may be applied to the gate of a source side select transistor when programming at least some of the word lines. In one embodiment, progressively lower voltages are used for the gate of the drain side select transistor when programming progressively higher word lines.
    • 公开了用于操作非易失性存储器的方法和装置。 一个或多个编程条件取决于选择用于编程的字线的位置,这可以减少或消除程序干扰。 施加到NAND串的选择晶体管的栅极的电压可以取决于所选字线的位置。 这可以是源极侧或漏极侧选择晶体管。 这可能会阻止或减少由于DIBL而导致的程序干扰。 这也可以防止或减少由于GIDL可能导致的程序干扰。 当编程至少一些字线时,负偏压可以施加到源极侧选择晶体管的栅极。 在一个实施例中,当编程逐渐增加的字线时,逐渐降低的电压用于漏极侧选择晶体管的栅极。
    • 2. 发明授权
    • Selected word line dependent select gate voltage during program
    • 程序中所选字线相关选择栅极电压
    • US08638608B2
    • 2014-01-28
    • US13430502
    • 2012-03-26
    • Chun-Hung LaiDeepanshu DuttaShinji SatoGerrit Jan Hemink
    • Chun-Hung LaiDeepanshu DuttaShinji SatoGerrit Jan Hemink
    • G11C11/34
    • G11C11/5628G11C16/0483G11C16/10
    • Methods and devices for operating non-volatile storage are disclosed. One or more programming conditions depend on the location of the word line that is selected for programming, which may reduce or eliminate program disturb. The voltage applied to the gate of a select transistor of a NAND string may depend on the location of the selected word line. This could be either a source side or drain side select transistor. This may prevent or reduce program disturb that could result due to DIBL. This may also prevent or reduce program disturb that could result due to GIDL. A negative bias may be applied to the gate of a source side select transistor when programming at least some of the word lines. In one embodiment, progressively lower voltages are used for the gate of the drain side select transistor when programming progressively higher word lines.
    • 公开了用于操作非易失性存储器的方法和装置。 一个或多个编程条件取决于选择用于编程的字线的位置,这可以减少或消除程序干扰。 施加到NAND串的选择晶体管的栅极的电压可以取决于所选字线的位置。 这可以是源极侧或漏极侧选择晶体管。 这可能会阻止或减少由于DIBL而导致的程序干扰。 这也可以防止或减少由于GIDL可能导致的程序干扰。 当编程至少一些字线时,负偏压可以施加到源极侧选择晶体管的栅极。 在一个实施例中,当编程逐渐增加的字线时,逐渐降低的电压用于漏极侧选择晶体管的栅极。
    • 7. 发明申请
    • IMAGE SENSOR DEVICE WITH SILICON MICROSTRUCTURES AND FABRICATION METHOD THEREOF
    • 具有硅微结构的图像传感器装置及其制造方法
    • US20110001038A1
    • 2011-01-06
    • US12497146
    • 2009-07-02
    • Chi-Xiang TsengI-Hsiu ChenChen-Wei LuChun-Hung Lai
    • Chi-Xiang TsengI-Hsiu ChenChen-Wei LuChun-Hung Lai
    • H01L27/142H01L21/77
    • H01L27/14625H01L27/14621H01L27/14627H01L27/14685
    • An image sensor device is disclosed. The image sensor device includes a semiconductor substrate having a first pixel region and a second pixel region. A first photo-conversion device is disposed within the first pixel region of the semiconductor substrate to receive a first light source. A second photo-conversion device is disposed within the second pixel region of the semiconductor substrate to receive a second light source different from the first light source. The surface of the semiconductor substrate corresponding to the first photo-conversion device and the second photo-conversion device has a first microstructure and a second microstructure, respectively, permitting a reflectivity of the first pixel region with respect to the first light source to be lower than a reflectivity of the second pixel region with respect to the first light source. The invention also discloses a fabrication method of the image sensor device.
    • 公开了一种图像传感器装置。 图像传感器装置包括具有第一像素区域和第二像素区域的半导体衬底。 第一光转换装置设置在半导体衬底的第一像素区域内以接收第一光源。 第二光转换装置设置在半导体衬底的第二像素区域内,以接收与第一光源不同的第二光源。 对应于第一光转换装置和第二光转换装置的半导体基板的表面分别具有允许第一像素区域相对于第一光源的反射率较低的第一微结构和第二微结构 而不是第二像素区域相对于第一光源的反射率。 本发明还公开了一种图像传感器装置的制造方法。
    • 10. 发明申请
    • STACKABLE HEAT SINK
    • 堆叠式散热器
    • US20050056398A1
    • 2005-03-17
    • US10660596
    • 2003-09-12
    • Chun-Hung Lai
    • Chun-Hung Lai
    • H01L23/367H05K7/20
    • H01L23/3672H01L2924/0002H01L2924/00
    • A stackable heat sink comprising a plurality numbers of metal heat dissipation plates, the heat dissipation plate further comprises a bottom plate, two side plates facing each other locates on both sides of the bottom plate, a bending area is bent from the top of the side plate, two standing plates stretches up from the bending area and facing another standing plate, two fastening plates each is formed on the proper location on the standing plate, the fastening plate is bendable and forms a bending line with the standing plate; two fastening crevices each is located on the junction of the bottom plate and the side plate. When two of the heat dissipation plates stack together, the standing plate of the bottom heat dissipation plate inserts into the fastening crevice of the top heat dissipation plate to make the lower portion of the bending line of the fastening plate fastened on the bottom plate of the top heat dissipation plate, the two heat dissipation plates are fastened closely, a distance is formed between two heat dissipation plates is formed by side plates for heat dissipation.
    • 一种包括多个金属散热板的可堆叠散热片,散热板还包括底板,两个相互面对的侧板位于底板的两侧,弯曲区域从侧面的顶部弯曲 板,两个立板从弯曲区域向上延伸并面向另一个立板,两个紧固板各自形成在立板上的适当位置,紧固板可弯曲并与立板形成弯曲线; 两个紧固缝隙各自位于底板和侧板的接合处。 当两个散热板堆叠在一起时,底部散热板的立板插入顶部散热板的紧固缝隙中,使得紧固板的弯曲线的下部固定在 顶部散热板,两个散热板紧密连接,两个散热板之间形成一段距离,侧板由散热板形成。