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1. 发明授权

US08532949B2 Computer-implemented methods and systems for classifying defects on a specimen 有权
标题翻译：用于对样品上的缺陷进行分类的计算机实现的方法和系统
公开(公告)号：US08532949B2
公开(公告)日：2013-09-10
申请号：US11249144
申请日：2005-10-12
申请人： Cho Huak Teh , Tommaso Torelli , Dominic David , Chiuman Yeung , Michael Gordon Scott , Lalita A. Balasubramanian , Lisheng Gao , Tong Huang , Jianxin Zhang , Michal Kowalski , Jonathan Oakley
发明人： Cho Huak Teh , Tommaso Torelli , Dominic David , Chiuman Yeung , Michael Gordon Scott , Lalita A. Balasubramanian , Lisheng Gao , Tong Huang , Jianxin Zhang , Michal Kowalski , Jonathan Oakley
IPC分类号： G01N37/00
CPC分类号： G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： Various computer-implemented methods for classifying defects on a specimen are provided. One method includes assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The method also includes displaying information about the defect groups to a user. In addition, the method includes allowing the user to assign a classification to each of the defect groups. Systems configured to classify defects on a specimen are also provided. One system includes program instructions executable on a processor for assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The system also includes a user interface configured for displaying information about the defect groups to a user and allowing the user to assign a classification to each of the defect groups.
摘要翻译：提供了用于对样本上的缺陷进行分类的各种计算机实现的方法。一种方法包括基于单个缺陷的一个或多个特征将在样本上检测到的各个缺陷分配给缺陷组。该方法还包括向用户显示关于缺陷组的信息。此外，该方法包括允许用户为每个缺陷组分配分类。还提供了配置为对样品上的缺陷进行分类的系统。一个系统包括可在处理器上执行的程序指令，用于基于单个缺陷的一个或多个特征将在样本上检测到的各个缺陷分配给缺陷组。该系统还包括被配置为向用户显示关于缺陷组的信息的用户界面，并允许用户为每个缺陷组分配分类。

2. 发明申请

US20060082763A1 Computer-implemented methods and systems for classifying defects on a specimen 有权
公开(公告)号：US20060082763A1
公开(公告)日：2006-04-20
申请号：US11249144
申请日：2005-10-12
申请人： Cho Teh , Tommaso Torelli , Dominic David , Chiuman Yeung , Michael Scott , Lalita Balasubramanian , Lisheng Gao , Tong Huang , Jianxin Zhang , Michal Kowalski , Jonathan Oakley
发明人： Cho Teh , Tommaso Torelli , Dominic David , Chiuman Yeung , Michael Scott , Lalita Balasubramanian , Lisheng Gao , Tong Huang , Jianxin Zhang , Michal Kowalski , Jonathan Oakley
IPC分类号： G01N21/00 , H01J3/14
CPC分类号： G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： Various computer-implemented methods for classifying defects on a specimen are provided. One method includes assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The method also includes displaying information about the defect groups to a user. In addition, the method includes allowing the user to assign a classification to each of the defect groups. Systems configured to classify defects on a specimen are also provided. One system includes program instructions executable on a processor for assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The system also includes a user interface configured for displaying information about the defect groups to a user and allowing the user to assign a classification to each of the defect groups.

3. 发明申请

US20060265145A1 FLEXIBLE HYBRID DEFECT CLASSIFICATION FOR SEMICONDUCTOR MANUFACTURING 有权
标题翻译：用于半导体制造的灵活混合缺陷分类
公开(公告)号：US20060265145A1
公开(公告)日：2006-11-23
申请号：US10954968
申请日：2004-09-30
申请人： Patrick Huet , Maruti Shanbhag , Sandeep Bhagwat , Michal Kowalski , Vivekanand Kini , David Randall , Sharon McCauley , Tong Huang , Jianxin Zhang , Kenong Wu , Lisheng Gao , Ariel Tribble , Ashok Kulkarni , Cecelia Anne Campochiaro
发明人： Patrick Huet , Maruti Shanbhag , Sandeep Bhagwat , Michal Kowalski , Vivekanand Kini , David Randall , Sharon McCauley , Tong Huang , Jianxin Zhang , Kenong Wu , Lisheng Gao , Ariel Tribble , Ashok Kulkarni , Cecelia Anne Campochiaro
IPC分类号： G01B5/28
CPC分类号： G06T7/0004 , G01R31/2846 , G06T2200/24 , G06T2207/30148
摘要： Hybrid methods for classifying defects in semiconductor manufacturing are provided. The methods include applying a flexible sequence of rules for defects to inspection data. The sequence of rules includes deterministic rules, statistical rules, hybrid rules, or some combination thereof. The rules included in the sequence may be selected by a user using a graphical interface The method also includes classifying the defects based on results of applying the sequence of rules to the inspection data.
摘要翻译：提供了用于分类半导体制造中的缺陷的混合方法。这些方法包括将错误的规则序列应用于检查数据。规则序列包括确定性规则，统计规则，混合规则或其某种组合。包括在序列中的规则可以由用户使用图形界面来选择。该方法还包括基于将规则序列应用于检查数据的结果对缺陷进行分类。

4. 发明授权

US07142992B1 Flexible hybrid defect classification for semiconductor manufacturing 有权
标题翻译：用于半导体制造的灵活混合缺陷分类
公开(公告)号：US07142992B1
公开(公告)日：2006-11-28
申请号：US10954968
申请日：2004-09-30
申请人： Patrick Huet , Maruti Shanbhag , Sandeep Bhagwat , Michal Kowalski , Vivekanand Kini , David Randall , Sharon McCauley , Tong Huang , Jianxin Zhang , Kenong Wu , Lisheng Gao , Ariel Tribble , Ashok Kulkarni , Cecelia Anne Campochiaro
发明人： Patrick Huet , Maruti Shanbhag , Sandeep Bhagwat , Michal Kowalski , Vivekanand Kini , David Randall , Sharon McCauley , Tong Huang , Jianxin Zhang , Kenong Wu , Lisheng Gao , Ariel Tribble , Ashok Kulkarni , Cecelia Anne Campochiaro
IPC分类号： G01R31/00 , G06F19/00
CPC分类号： G06T7/0004 , G01R31/2846 , G06T2200/24 , G06T2207/30148
摘要： Hybrid methods for classifying defects in semiconductor manufacturing are provided. The methods include applying a flexible sequence of rules for defects to inspection data. The sequence of rules includes deterministic rules, statistical rules, hybrid rules, or some combination thereof. The rules included in the sequence may be selected by a user using a graphical interface. The method also includes classifying the defects based on results of applying the sequence of rules to the inspection data.
摘要翻译：提供了用于分类半导体制造中的缺陷的混合方法。这些方法包括将错误的规则序列应用于检查数据。规则序列包括确定性规则，统计规则，混合规则或其某种组合。序列中包括的规则可以由用户使用图形界面来选择。该方法还包括基于将规则序列应用于检查数据的结果对缺陷进行分类。

5. 发明授权

US07359544B2 Automatic supervised classifier setup tool for semiconductor defects 有权
标题翻译：用于半导体缺陷的自动监控分类器设置工具
公开(公告)号：US07359544B2
公开(公告)日：2008-04-15
申请号：US10713628
申请日：2003-11-13
申请人： Lisheng Gao , Bo Magluyan , Jianxin Zhang , Kevin Yeung , Kenong Wu , Tong Huang
发明人： Lisheng Gao , Bo Magluyan , Jianxin Zhang , Kevin Yeung , Kenong Wu , Tong Huang
IPC分类号： G06K9/00 , G06K9/62
CPC分类号： G06K9/6253 , G06T7/0004
摘要： Disclosed are methods and apparatus for efficiently setting up and maintaining a defect classification system. In general terms, the setup procedure optionally includes automatically grouping a set of provided defects and presenting a representative set from each defect group to the user for classification. After the initial manual classification of the representative defects, the setup procedure includes an automatic procedure for classifying the non-reviewed or unclassified defects based on the manual class codes from the user-reviewed defects. After the automatic classification operation, the user may also be presented with defects from each class which may require re-classification. In particular embodiments, the user is iteratively presented with defects which have classifications that are suspect, which are near classification boundaries, or have classifications that have a low confidence level until each class is pure or contains a same type of defect classes as assigned by the user.
摘要翻译：公开了用于有效地建立和维护缺陷分类系统的方法和装置。一般来说，设置过程可选地包括自动地对一组提供的缺陷进行分组，并将来自每个缺陷组的代表集合给用户进行分类。在对代表性缺陷进行初步手动分类后，安装步骤包括根据用户审查缺陷的手册类代码分类未经审查或未分类的缺陷的自动程序。在自动分类操作之后，用户也可能会出现每个类别可能需要重新分类的缺陷。在特定实施例中，用户被迭代地呈现具有可疑的分类的缺陷，其接近分类边界，或者具有低置信度水平的分类，直到每个类是纯的或包含由所分配的相同类型的缺陷类别用户。

6. 发明授权

US09601393B2 Selecting one or more parameters for inspection of a wafer 有权
公开(公告)号：US09601393B2
公开(公告)日：2017-03-21
申请号：US13148473
申请日：2010-02-05
申请人： Chris Lee , Lisheng Gao , Tao Luo , Kenong Wu , Tommaso Torelli , Michael J. Van Riet , Brian Duffy
发明人： Chris Lee , Lisheng Gao , Tao Luo , Kenong Wu , Tommaso Torelli , Michael J. Van Riet , Brian Duffy
IPC分类号： G01N21/95 , H01L21/66
CPC分类号： H01L22/20 , G01N21/9501 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Computer-implemented methods, computer-readable media, and systems for selecting one or more parameters for inspection of a wafer are provided.

7. 发明申请

US20110320149A1 Selecting One or More Parameters for Inspection of a Wafer 有权
标题翻译：选择一个或多个参数以检查晶圆
公开(公告)号：US20110320149A1
公开(公告)日：2011-12-29
申请号：US13148473
申请日：2010-02-05
申请人： Chris Lee , Lisheng Gao , Tao Luo , Kenong Wu , Tommaso Torelli , Michael J. Van Riet , Brian Duffy
发明人： Chris Lee , Lisheng Gao , Tao Luo , Kenong Wu , Tommaso Torelli , Michael J. Van Riet , Brian Duffy
IPC分类号： G06F19/00 , G01N21/88
CPC分类号： H01L22/20 , G01N21/9501 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Computer-implemented methods, computer-readable media, and systems for selecting one or more parameters for inspection of a wafer are provided.
摘要翻译：提供了计算机实现的方法，计算机可读介质和用于选择用于检查晶片的一个或多个参数的系统。

8. 发明授权

US07729529B2 Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle 有权
标题翻译：用于检测和/或排列掩模版设计图案中的缺陷的计算机实现的方法
公开(公告)号：US07729529B2
公开(公告)日：2010-06-01
申请号：US11005658
申请日：2004-12-07
申请人： Kenong Wu , David Randall , Kourosh Nafisi , Ramon Ynzunza , Ingrid B. Peterson , Ariel Tribble , Michal Kowalski , Lisheng Gao , Ashok Kulkarni
发明人： Kenong Wu , David Randall , Kourosh Nafisi , Ramon Ynzunza , Ingrid B. Peterson , Ariel Tribble , Michal Kowalski , Lisheng Gao , Ashok Kulkarni
IPC分类号： G06K9/00 , H01L21/66 , G06F17/50
CPC分类号： G03F1/84 , G01N21/95607 , G01N2021/95676 , G03F7/7065 , G03F7/70666
摘要： Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
摘要翻译：提供了各种计算机实现的方法。用于对掩模版的设计图案中的缺陷进行排序的一种方法包括使用与各个缺陷相关联的优先级信息，结合邻近各个缺陷的区域的一个或多个特征来搜索检查数据中的缺陷。优先级信息对应于与各个缺陷相关联的调制级别。通过比较为不同的光刻变量值生成的掩模版的图像来生成检查数据。图像包括至少一个参考图像和至少一个调制图像。可以从两个或更多个参考图像生成复合参考图像。该方法还包括将一个或多个标识符分配给感兴趣的缺陷。标识符可以包括例如缺陷分类和/或识别感兴趣的缺陷是否用于进一步处理的指标。

9. 发明申请

US20100226562A1 COMPUTER-IMPLEMENTED METHODS FOR DETECTING AND/OR SORTING DEFECTS IN A DESIGN PATTERN OF A RETICLE 有权
标题翻译：用于检测和/或分配错误设计图案中的缺陷的计算机实现方法
公开(公告)号：US20100226562A1
公开(公告)日：2010-09-09
申请号：US12780864
申请日：2010-05-15
申请人： Kenong Wu , David Randall , Kourosh Nafisi , Ramon Ynzunza , Ingrid B. Peterson , Ariel Tribble , Michal Kowalski , Lisheng Gao , Ashok Kulkami
发明人： Kenong Wu , David Randall , Kourosh Nafisi , Ramon Ynzunza , Ingrid B. Peterson , Ariel Tribble , Michal Kowalski , Lisheng Gao , Ashok Kulkami
IPC分类号： G06K9/62
CPC分类号： G03F1/84 , G01N21/95607 , G01N2021/95676 , G03F7/7065 , G03F7/70666
摘要： Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
摘要翻译：提供了各种计算机实现的方法。用于对掩模版的设计图案中的缺陷进行排序的一种方法包括使用与各个缺陷相关联的优先级信息，结合邻近各个缺陷的区域的一个或多个特征来搜索检查数据中的缺陷。优先级信息对应于与各个缺陷相关联的调制级别。通过比较为不同的光刻变量值生成的掩模版的图像来生成检查数据。图像包括至少一个参考图像和至少一个调制图像。可以从两个或更多个参考图像生成复合参考图像。该方法还包括将一个或多个标识符分配给感兴趣的缺陷。标识符可以包括例如缺陷分类和/或识别感兴趣的缺陷是否用于进一步处理的指示符。

10. 发明申请

US20060291714A1 Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle 有权
标题翻译：用于检测和/或排列掩模版设计图案中的缺陷的计算机实现的方法
公开(公告)号：US20060291714A1
公开(公告)日：2006-12-28
申请号：US11005658
申请日：2004-12-07
申请人： Kenong Wu , David Randall , Kourosh Nafisi , Ramon Ynzunza , Ingrid Peterson , Ariel Tribble , Michal Kowalski , Lisheng Gao , Ashok Kulkarni
发明人： Kenong Wu , David Randall , Kourosh Nafisi , Ramon Ynzunza , Ingrid Peterson , Ariel Tribble , Michal Kowalski , Lisheng Gao , Ashok Kulkarni
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G01N21/95607 , G01N2021/95676 , G03F7/7065 , G03F7/70666
摘要： Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
摘要翻译：提供了各种计算机实现的方法。用于对掩模版的设计图案中的缺陷进行排序的一种方法包括使用与各个缺陷相关联的优先级信息，结合邻近各个缺陷的区域的一个或多个特征来搜索检查数据中的缺陷。优先级信息对应于与各个缺陷相关联的调制级别。通过比较为不同的光刻变量值生成的掩模版的图像来生成检查数据。图像包括至少一个参考图像和至少一个调制图像。可以从两个或更多个参考图像生成复合参考图像。该方法还包括将一个或多个标识符分配给感兴趣的缺陷。标识符可以包括例如缺陷分类和/或识别感兴趣的缺陷是否用于进一步处理的指标。

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