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1. 发明申请

WO2005089131A3 LPP EUV LIGHT SOURCE 审中-公开
标题翻译： LPP EUV光源
公开(公告)号：WO2005089131A3
公开(公告)日：2006-06-08
申请号：PCT/US2005007063
申请日：2005-03-03
申请人： CYMER INC , PARTLO WILLIAM N , BROWN DANIEL J W , FOMENKOV IGOR V , BOWERING NORBERT R , RETTIG CURTIS L , MACFARLANE JOSEPH J , ERSHOV ALEXANDER I , HANSSON BJORN A M
发明人： PARTLO WILLIAM N , BROWN DANIEL J W , FOMENKOV IGOR V , BOWERING NORBERT R , RETTIG CURTIS L , MACFARLANE JOSEPH J , ERSHOV ALEXANDER I , HANSSON BJORN A M
IPC分类号： H01J35/20 , G03F7/20 , H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H01S3/0085 , H01S3/0092 , H01S3/1611 , H01S3/1653 , H01S3/2255 , H01S3/2325 , H01S3/2375 , H01S3/2383 , H05G2/005 , H05G2/008
摘要： An LPP EUV light source (20) comprises a laser initial target irradiation pulse generating mechanism (60) for irradiating a plasma initiation target (94) with an initial target irradiation pulse (55) to form an EUV generating plasma (30) having an emission region emitting in-band EUV light (40); a laser plasma irradiation pulse generating mechanism (72) for irradiating the plasma (30) with a plasma irradiation pulse (76) after the initial target irradiation pulse (55) to compress emission material in the plasma (30).
摘要翻译： LPP EUV光源（20）包括激光初始靶照射脉冲发生机构（60），用于用初始靶照射脉冲（55）照射等离子体引发靶（94）以形成具有发射的EUV产生等离子体（30）区域发射带内EUV光（40）; 用于在初始目标照射脉冲（55）之后用等离子体照射脉冲（76）照射等离子体（30）以压缩等离子体（30）中的发射材料的激光等离子体照射脉冲产生机构（72）。

2. 发明申请

WO2006020080A3 SYSTEMS AND METHODS FOR REDUCING THE INFLUENCE OF PLASMA-GENERATED DEBRIS ON THE INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE 审中-公开
标题翻译：用于减少等离子体生成物对EUV光源的内部成分的影响的系统和方法
公开(公告)号：WO2006020080A3
公开(公告)日：2007-04-05
申请号：PCT/US2005025232
申请日：2005-07-15
申请人： CYMER INC , ERSHOV ALEXANDER I , MARX WILLIAM F , BOWERING NORBERT R , HANSSON BJORN A M , KHODYKIN OLEH , FOMENKOV IGOR V , PARTLO WILLIAM N
发明人： ERSHOV ALEXANDER I , MARX WILLIAM F , BOWERING NORBERT R , HANSSON BJORN A M , KHODYKIN OLEH , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： C25F1/00 , G03F7/20 , G21K5/10 , H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/7085 , G03F7/70916 , G21K1/06 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.
摘要翻译：公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

3. 发明申请

WO2006093781A2 SYSTEMS FOR PROTECTING INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE FROM PLASMA-GENERATED DEBRIS 审中-公开
标题翻译：用于保护来自等离子体生物反应器的EUV光源的内部组分的系统
公开(公告)号：WO2006093781A2
公开(公告)日：2006-09-08
申请号：PCT/US2006006408
申请日：2006-02-24
申请人： CYMER INC , BOWERING NORBERT R , HANSSON BJORN A M , BYKANOV ALEXANDER N , KHODYKIN OLEH , ERSHOV ALEXANDER I , PARTLO WILLIAM N
发明人： BOWERING NORBERT R , HANSSON BJORN A M , BYKANOV ALEXANDER N , KHODYKIN OLEH , ERSHOV ALEXANDER I , PARTLO WILLIAM N
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
摘要翻译：公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

4. 发明申请

WO2007053334A3 EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源
公开(公告)号：WO2007053334A3
公开(公告)日：2009-04-30
申请号：PCT/US2006041102
申请日：2006-10-20
申请人： CYMER INC , BOWERING NORBERT R , HANSSON BJORN A M , SIMMONS RODNEY D
发明人： BOWERING NORBERT R , HANSSON BJORN A M , SIMMONS RODNEY D
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/006
摘要： An EUV light source and method of operating same is disclosed which may comprise: an EUV plasma production chamber comprising a chamber wall comprising an exit opening for the passage of produced EUV light focused to a focus point; a first EUV exit sleeve comprising a terminal end comprising an opening facing the exit opening; a first exit sleeve chamber housing the first exit sleeve and having an EUV light exit opening; a gas supply mechanism supplying gas under a pressure higher than the pressure within the plasma production chamber to the first exit sleeve chamber. The first exit sleeve may be tapered toward the terminal end opening, and may, e.g., be conical in shape comprising a narrowed end at the terminal end.
摘要翻译：公开了一种EUV光源及其操作方法，其可以包括：EUV等离子体生成室，其包括室壁，该室壁包括用于使产生的EUV光聚焦到聚焦点的通过的出口; 第一EUV出口套筒，其包括终端，所述终端包括面向所述出口的开口; 第一出口套筒室，其容纳所述第一出口套筒并具有EUV光出口; 气体供给机构，其在高于等离子体生成室内的压力的压力下向第一出口套筒室供给气体。第一出口套筒可以朝向终端开口渐缩，并且可以例如是在终端处包括窄端的圆锥形形状。

5. 发明公开

EP2095693A4 LASER PRODUCED PLASMA EUV LIGHT SOURCE 有权
标题翻译： LASERPRODUZIERTE PLASMA-EUV-LICHTQUELLE
公开(公告)号：EP2095693A4
公开(公告)日：2010-11-03
申请号：EP07862537
申请日：2007-12-04
申请人： CYMER INC
发明人： HANSSON BJORN A M , BYKANOV ALEXANDER N , FOMENKOV IGOR V , BRANDT DAVID C
IPC分类号： H05G2/00 , G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.
摘要翻译：公开了一种EUV光源，其可以包括多个目标，例如锡滴，以及产生预脉冲和主脉冲的系统，其中具有用于照射目标的预脉冲以产生扩展的目标。该系统还可以包括连续泵浦的激光器装置，其产生具有用于照射扩展的目标的主脉冲以产生EUV光脉冲的脉冲的主脉冲。该系统还可以具有在EUV光脉冲的突发期间改变至少一个预脉冲参数的控制器。此外，EUV光源还可以包括测量EUV光脉冲的脉冲串内的至少一个EUV光脉冲的强度的仪器，并且向控制器提供反馈信号以在脉冲串期间改变至少一个预脉冲参数 EUV光脉冲以产生具有预选剂量的EUV脉冲的脉冲串。

6. 发明公开

EP1853882A4 SYSTEMS FOR PROTECTING INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE FROM PLASMA-GENERATED DEBRIS 有权
标题翻译：制度保障AN EUV光源内部零件上等离子体产生的存款
公开(公告)号：EP1853882A4
公开(公告)日：2010-08-25
申请号：EP06735891
申请日：2006-02-24
申请人： CYMER INC
发明人： BOWERING NORBERT R , HANSSON BJORN A M , BYKANOV ALEXANDER N , KHODYKIN OLEH , ERSHOV ALEXANDER I , PARTLO WILLIAM N
IPC分类号： H05G2/00 , G01J1/00 , G03F7/20
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001

7. 发明公开

EP1779410A4 SYSTEMS AND METHODS FOR REDUCING THE INFLUENCE OF PLASMA-GENERATED DEBRIS ON THE INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE 有权转让
标题翻译：用于降低血浆的影响的系统和方法所产生的异物在EUV光源的内部组件
公开(公告)号：EP1779410A4
公开(公告)日：2010-11-10
申请号：EP05775431
申请日：2005-07-15
申请人： CYMER INC
发明人： ERSHOV ALEXANDER I , MARX WILLIAM F , BOWERING NORBERT R , HANSSON BJORN A M , KHODYKIN OLEH , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： C25F1/00 , G03F7/20 , G21K1/06
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/7085 , G03F7/70916 , G21K1/06 , G21K2201/06 , H05G2/001

8. 发明公开

EP1730764A4 LPP EUV LIGHT SOURCE 审中-公开
标题翻译： LPP EUV光源
公开(公告)号：EP1730764A4
公开(公告)日：2010-08-18
申请号：EP05724577
申请日：2005-03-03
申请人： CYMER INC
发明人： PARTLO WILLIAM N , BROWN DANIEL J W , FOMENKOV IGOR V , BOWERING NORBERT R , RETTIG CURTIS L , MACFARLANE JOSEPH J , ERSHOV ALEXANDER I , HANSSON BJORN A M
IPC分类号： H01J35/20 , G03F7/20 , H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H01S3/0085 , H01S3/0092 , H01S3/1611 , H01S3/1653 , H01S3/2255 , H01S3/2325 , H01S3/2375 , H01S3/2383 , H05G2/005 , H05G2/008

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