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1. 发明申请

WO2008105989A3 LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源
公开(公告)号：WO2008105989A3
公开(公告)日：2009-02-19
申请号：PCT/US2008001349
申请日：2008-02-01
申请人： CYMER INC , BYKANOV ALEXANDER N , BOWERING NORBERT R , FOMENKOV IGOR V , BRANDT DAVID C , ERSHOV ALEXANDER I , KHODYKIN OLEH V , PARTLO WILLIAM N
发明人： BYKANOV ALEXANDER N , BOWERING NORBERT R , FOMENKOV IGOR V , BRANDT DAVID C , ERSHOV ALEXANDER I , KHODYKIN OLEH V , PARTLO WILLIAM N
IPC分类号： G01J3/10
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic, hi one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
摘要翻译：公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。该装置还可以包括一个光学元件，例如多个远离现场的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，在离子到达光学器件之前，将离子能量降低到预选值以下。在一个实施方案中，气体可以包含氢气，并且在特定的实施方案中，气体可以包含大于50体积％的氢气。

2. 发明申请

WO2009117048A3 SYSTEM AND METHODS FOR TARGET MATERIAL DELIVERY IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源的目标物质输送系统与方法
公开(公告)号：WO2009117048A3
公开(公告)日：2009-12-30
申请号：PCT/US2009000994
申请日：2009-02-17
申请人： CYMER INC , VASCHENKO GEORGIY O , BYKANOV ALEXANDER N , BOWERING NORBERT R , BRANDT DAVID C , ERSHOV ALEXANDER I , SIMMONS RODNEY D , KHODYKIN OLEH V , FOMENKOV IGOR V
发明人： VASCHENKO GEORGIY O , BYKANOV ALEXANDER N , BOWERING NORBERT R , BRANDT DAVID C , ERSHOV ALEXANDER I , SIMMONS RODNEY D , KHODYKIN OLEH V , FOMENKOV IGOR V
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译：本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。

3. 发明申请

WO2008048415A3 DRIVE LASER DELIVERY SYSTEMS FOR EUV LIGHT SOURCE 审中-公开
标题翻译：用于EUV光源的驱动激光输送系统
公开(公告)号：WO2008048415A3
公开(公告)日：2008-08-14
申请号：PCT/US2007020897
申请日：2007-09-27
申请人： CYMER INC A NEVADA CORP , BYKANOV ALEXANDER N , FOMENKOV IGOR V , KHODYKIN OLEH V , ERSHOV ALEXANDER I
发明人： BYKANOV ALEXANDER N , FOMENKOV IGOR V , KHODYKIN OLEH V , ERSHOV ALEXANDER I
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , H01S3/0064 , H01S3/073 , H01S3/0805 , H01S3/08054 , H01S3/08059 , H01S3/083 , H01S3/10092 , H01S3/105 , H01S3/1066 , H01S3/115 , H01S3/121 , H01S3/127 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/2383 , H05G2/008
摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.
摘要翻译：公开了一种LPP EUV光源，其具有位于等离子体室中的光学器件，用于反射在其中产生的EUV光和激光输入窗口。对于该方面，EUV光源可以被配置为将窗口暴露于更低的气体蚀刻剂压力以将窗口暴露于气体蚀刻剂压力以进行光学清洁，以避免窗口涂层变质。在另一方面，EUV光源可以包括沿着光束路径定位以参与与光束路径上的光的第一相互作用的目标材料; 光放大器; 以及至少一个光导向光子从第一相互作用散射到光放大器中以在光束路径上产生激光束，用于随后与目标材料的相互作用以产生EUV发光等离子体。

4. 发明申请

WO2007146329A2 DRIVE LASER FOR EUV LIGHT SOURCE 审中-公开
标题翻译：用于EUV光源的驱动激光器
公开(公告)号：WO2007146329A2
公开(公告)日：2007-12-21
申请号：PCT/US2007013862
申请日：2007-06-11
申请人： CYMER INC , ERSHOV ALEXANDER I , BYKANOV ALEXANDER N , HOFFMAN JERZY R , FOMENKOV IGOR V , PARTLO WILLIAM N
发明人： ERSHOV ALEXANDER I , BYKANOV ALEXANDER N , HOFFMAN JERZY R , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： H01S3/00
CPC分类号： H01S3/2316 , H01S3/0057 , H01S3/11 , H01S3/2232 , H01S3/225 , H05G1/54 , H05G2/008
摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (E s, 1 ) and a small signal gain (g o , 1 ); and the second amplifier may have a gain medium characterized by a saturation energy (E s, 2 ) and a small signal gain (g o , 2 ), with (g o , 1 ) > (g o , 2 ) and (E S , 2 ) > (E s,
摘要翻译：公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。对于源极，第一放大器可以具有特征在于饱和能量（E S，S 1）和小信号增益（g 1，...，）; 并且第二放大器可以具有特征在于饱和能量（E S，S 2）和小信号增益（g 0，S 2，N 2）的增益介质（g ，＆lt; 2＆gt;）和（E

5. 发明申请

WO2006093781A2 SYSTEMS FOR PROTECTING INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE FROM PLASMA-GENERATED DEBRIS 审中-公开
标题翻译：用于保护来自等离子体生物反应器的EUV光源的内部组分的系统
公开(公告)号：WO2006093781A2
公开(公告)日：2006-09-08
申请号：PCT/US2006006408
申请日：2006-02-24
申请人： CYMER INC , BOWERING NORBERT R , HANSSON BJORN A M , BYKANOV ALEXANDER N , KHODYKIN OLEH , ERSHOV ALEXANDER I , PARTLO WILLIAM N
发明人： BOWERING NORBERT R , HANSSON BJORN A M , BYKANOV ALEXANDER N , KHODYKIN OLEH , ERSHOV ALEXANDER I , PARTLO WILLIAM N
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
摘要翻译：公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

6. 发明申请

WO2006093693A2 METHOD AND APPARATUS FOR EUV PLASMA SOURCE TARGET DELIVERY 审中-公开
标题翻译：用于EUV等离子体源目标传送的方法和装置
公开(公告)号：WO2006093693A2
公开(公告)日：2006-09-08
申请号：PCT/US2006005647
申请日：2006-02-17
申请人： CYMER INC , ALGOTS JOHN MARTIN , FOMENKOV IGOR V , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , HEMBERG OSCAR , BYKANOV ALEXANDER N , COBB DENNIS W
发明人： ALGOTS JOHN MARTIN , FOMENKOV IGOR V , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , HEMBERG OSCAR , BYKANOV ALEXANDER N , COBB DENNIS W
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.
摘要翻译：公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

7. 发明申请

WO2007005414A3 ALTERNATIVE FUELS FOR EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源替代燃料
公开(公告)号：WO2007005414A3
公开(公告)日：2008-10-02
申请号：PCT/US2006024959
申请日：2006-06-27
申请人： CYMER INC , BOWERING NORBERT R , KHODYKIN OLEH , BYKANOV ALEXANDER N , FOMENKOV IGOR V
发明人： BOWERING NORBERT R , KHODYKIN OLEH , BYKANOV ALEXANDER N , FOMENKOV IGOR V
IPC分类号： G01J3/10 , H05G2/00
CPC分类号： H05G2/006 , B82Y10/00 , G21K2201/061 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and / or Indium.
摘要翻译：公开了一种EUV光源，其可以包括至少一个具有表面的光学元件，例如多层收集镜; 产生激光束的激光源; 以及由激光束照射以形成等离子体并发射EUV光的源材料。在一个方面，源材料可以基本上由锡化合物组成，并且可以通过沉积在光学元件上的等离子体形成而产生锡屑，此外，锡化合物可以包括有效蚀刻沉积在光学上的锡的元素元素表面。锡化合物可以包括SnBr 4，SnBr 2和SnH 4。在另一方面，EUV光源可以包括由激光束照射以形成等离子体并发射EUV光的熔融源材料，源材料包含锡和至少一种其它金属，例如具有镓和/或铟的锡。

8. 发明申请

WO2007005415A3 LPP EUV LIGHT SOURCE DRIVE LASER SYSTEM 审中-公开
标题翻译： LPP EUV光源驱动激光系统
公开(公告)号：WO2007005415A3
公开(公告)日：2008-11-20
申请号：PCT/US2006024960
申请日：2006-06-27
申请人： CYMER INC , ERSHOV ALEXANDER I , BYKANOV ALEXANDER N , KHODYKN OLEH , FOMENKOV IGOR V
发明人： ERSHOV ALEXANDER I , BYKANOV ALEXANDER N , KHODYKN OLEH , FOMENKOV IGOR V
IPC分类号： G01J1/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam (fig. 4, 172); a drive laser beam first path having a first axis; a drive laser redirecting mechanism (fig. 4, 170) transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element (fig. 4, 30) having a centrally located aperture; and a focusing mirror (fig. 4, 180) in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis (fig. 4, 28). The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 µm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO 2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译：公开了一种装置和方法，其可以包括激光产生的等离子体EUV系统，其可以包括产生驱动激光束的驱动激光器（图4,172）; 具有第一轴的驱动激光束第一路径; 将驱动激光束从第一路径传递到第二路径的驱动激光重定向机构（图4,170），第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件（图4,30）和聚焦镜（图4,180），并且位于孔内并且将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置（图4,28）。该装置和方法可以包括驱动激光束由具有波长的驱动激光产生，该激光具有如下优点：在有效等离子体产生能量的情况下聚焦在小于约100μm的EUV目标液滴上，如果在所涉及的几何形状的约束条件下聚焦镜头驱动激光器可以包括CO 2激光器。驱动激光重定向机构可以包括镜子。

9. 发明申请

WO2007005409A2 LPP EUV PLASMA SOURCE MATERIAL TARGET DELIVERY SYSTEM 审中-公开
标题翻译： LPP EUV等离子体源材料目标传送系统
公开(公告)号：WO2007005409A2
公开(公告)日：2007-01-11
申请号：PCT/US2006024941
申请日：2006-06-27
申请人： CYMER INC , BYKANOV ALEXANDER N , ALGOTS MARTIN J , KHODYKIN OLEH , HEMBERG OSCAR
发明人： BYKANOV ALEXANDER N , ALGOTS MARTIN J , KHODYKIN OLEH , HEMBERG OSCAR
IPC分类号： G21G4/00
CPC分类号： H05G2/001
摘要： An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site. The apparatus and method may further comprise a droplet detection mechanism that may comprise a droplet detection radiation detector positioned to detect droplet detection radiation reflected from a plasma source material droplet.
摘要翻译：公开了一种EUV发光系统和方法，其可以包括产生等离子体源材料的液滴发生器，目标液滴朝向等离子体源材料靶照射部位附近传播; 驱动激光器具有第一操作中心波长范围的驱动激光聚焦光学元件; 具有第二操作中心波长范围的液滴检测辐射源; 驱动激光操纵元件，其包括在第一波长范围的至少一部分内具有高度反射性的材料，并且在第二中心波长范围的至少一部分内具有高度透射性; 液滴检测辐射瞄准机构，其引导液滴检测辐射通过驱动激光转向元件和透镜，以聚焦在液滴发生器和照射部位之间的选定液滴检测位置。该装置和方法还可以包括液滴检测机构，其可以包括液滴检测放射线检测器，其被定位成检测从等离子体源物质液滴反射的液滴检测辐射。

10. 发明申请

WO2006091948A3 LASER PRODUCED PLASMA EUV LIGHT SOURCE WITH PRE-PULSE 审中-公开
标题翻译：激光生产等离子体光源与预脉冲
公开(公告)号：WO2006091948A3
公开(公告)日：2008-01-24
申请号：PCT/US2006006947
申请日：2006-02-24
申请人： CYMER INC , BYKANOV ALEXANDER N , KHODYKIN OLEH
发明人： BYKANOV ALEXANDER N , KHODYKIN OLEH
IPC分类号： G01J1/00 , H01J35/08
CPC分类号： H05G2/003 , H05G2/005 , H05G2/008
摘要： A method for generating EUV light is disclosed which may include the acts / steps of providing a source material; generating a plurality of source material droplets; simultaneously irradiating a plurality of source material droplets with a first light pulse to create irradiated source material; and thereafter exposing the irradiated source material to a second light pulse to generate EUV light, e.g. by generating a plasma of the source material. In another aspect, an EUV light source may include a droplet generator delivering a plurality of source material droplets to a target volume; a source of a first light pulse for simultaneously irradiating a plurality of droplets in the target volume to produce an irradiated source material; and a source of a second light pulse for exposing the irradiated source material to generate EUV light. The droplet generator may comprise a non-modulating droplet generator and may comprise a multi-orifice nozzle.
摘要翻译：公开了一种用于产生EUV光的方法，其可以包括提供源材料的动作/步骤; 产生多个源材料液滴; 同时用第一光脉冲照射多个源材料液滴以产生辐射源材料; 然后将照射的源材料暴露于第二光脉冲以产生EUV光，例如，通过产生源材料的等离子体。在另一方面，EUV光源可以包括将多个源材料液滴输送到目标体积的液滴发生器; 用于同时照射目标体积中的多个液滴的第一光脉冲源，以产生照射的源材料; 以及第二光脉冲源，用于曝光照射的源材料以产生EUV光。液滴发生器可以包括非调节液滴发生器，并且可以包括多孔喷嘴。

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