会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • FRACTIONAL PROGRAM COMMANDS FOR MEMORY DEVICES
    • 内存设备的部分程序命令
    • US20110060875A1
    • 2011-03-10
    • US12990945
    • 2009-05-06
    • Brent S. HauknessIan ShaefferGary B. Bronner
    • Brent S. HauknessIan ShaefferGary B. Bronner
    • G06F12/00G06F12/02
    • G11C16/10G06F3/0611G06F3/0659G06F3/0688
    • A memory system (100B) includes an array of non-volatile memory cells (140) and a memory controller (110) having a first port (port connected to line 101) to receive a program command that addresses a number of the memory cells for a programming operation, having a second port (port connected to lines 102 and 103) coupled to the memory array via a command pipeline, and configured to create a plurality of fractional program commands in response to the program command. Execution of each fractional program command applies a single program pulse to the addressed memory cells to incrementally program the addressed memory cells with program data, where the duration of the program pulse associated with each fractional program command is a selected fraction of the total programming time typically required to program the memory cells.
    • 存储器系统(100B)包括非易失性存储单元阵列(140)和存储器控制器(110),存储器控制器(110)具有第一端口(连接到线101的端口),以接收编址命令, 编程操作,具有经由命令流水线耦合到存储器阵列的第二端口(连接到线102和103的端口),并且被配置为响应于程序命令创建多个分数程序命令。 每个分数程序命令的执行将单个程序脉冲施加到所寻址的存储器单元,以使用程序数据递增地编程所寻址的存储器单元,其中与每个分数程序命令相关联的编程脉冲的持续时间通常为总编程时间的选定分数 需要对存储单元进行编程。
    • 10. 发明授权
    • Silicon-on-insulator vertical array device trench capacitor DRAM
    • 绝缘体上的垂直阵列器件沟槽电容器DRAM
    • US06566177B1
    • 2003-05-20
    • US09427257
    • 1999-10-25
    • Carl J. RadensGary B. BronnerTze-chiang ChenBijan DavariJack A. MandelmanDan MoyDevendra K. SadanaGhavam Ghavami ShahidiScott R. Stiffler
    • Carl J. RadensGary B. BronnerTze-chiang ChenBijan DavariJack A. MandelmanDan MoyDevendra K. SadanaGhavam Ghavami ShahidiScott R. Stiffler
    • H01L2100
    • H01L27/10864H01L27/1087
    • A silicon on insulator (SOI) dynamic random access memory (DRAM) cell and array and method of manufacture. The memory cell includes a trench storage capacitor connected by a self aligned buried strap to a vertical access transistor. A buried oxide layer isolates an SOI layer from a silicon substrate. The trench capacitor is formed in the substrate and the access transistor is formed on a sidewall of the SOI layer. A polysilicon strap connected to the polysilicon plate of the storage capacitor provides a self-aligned contact to the source of the access transistor. Initially, the buried oxide layer is formed in the wafer. Deep trenches are etched, initially just through the SOI layer and the BOX layer. Protective sidewalls are formed in the trenches. Then, the deep trenches are etched into the substrate. The volume in the substrate is expanded to form a bottle shaped trench. A polysilicon capacitor plate is formed in the deep trenches and conductive polysilicon straps are formed in the trenches between the capacitor plates and the SOI sidewalls. Device regions are defined in the wafer and a sidewall gate is formed in the deep trenches. Shallow trenches isolation (STI) is used to isolate and define cells. Bitlines and wordlines are formed on the wafer.
    • 一种绝缘体上硅(SOI)动态随机存取存储器(DRAM)单元及阵列及其制造方法。 存储单元包括通过自对准埋入带连接到垂直存取晶体管的沟槽存储电容器。 掩埋氧化层将SOI层与硅衬底隔离。 沟槽电容器形成在衬底中,并且存取晶体管形成在SOI层的侧壁上。 连接到存储电容器的多晶硅板的多晶硅带提供与存取晶体管的源极的自对准接触。 最初,在晶圆中形成掩埋氧化物层。 深沟槽被蚀刻,最初刚刚通过SOI层和BOX层。 在沟槽中形成保护侧壁。 然后,将深沟槽蚀刻到衬底中。 衬底中的体积被扩大以形成瓶形沟槽。 在深沟槽中形成多晶硅电容器板,并且在电容器板和SOI侧壁之间的沟槽中形成导电多晶硅带。 在晶片中限定器件区域,并且在深沟槽中形成侧壁栅极。 浅沟槽隔离(STI)用于隔离和定义细胞。 在晶片上形成位线和字线。