专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07330249B2 Qualification of a mask 有权
标题翻译：面具资格
公开(公告)号：US07330249B2
公开(公告)日：2008-02-12
申请号：US11554309
申请日：2006-10-30
申请人： Avishai Barotv , Gadi Greenberg , Chaim Braude
发明人： Avishai Barotv , Gadi Greenberg , Chaim Braude
IPC分类号： G01N21/00
CPC分类号： H04W4/18 , H04L51/066 , H04L51/24 , H04L67/02 , H04W8/18
摘要： A method for qualifying printability of a mask, including performing a first inspection of the mask with an optical assembly at a first numerical aperture of collection (NAC) of radiation from the mask, and determining, in response to the first inspection, a first possible defect in the mask and a first location of the first possible defect. The method also includes performing a second inspection of the mask with the optical assembly at a second NAC of radiation from the mask, different from the first NAC, and determining, in response thereto, a second possible defect in the mask and a second location of the second possible defect. The method further includes performing a comparison of the first and second locations, and in response to the comparison, determining that the first and second possible defects represent a real defect if the first location matches the second location.
摘要翻译：一种用于限定掩模的可印刷性的方法，包括在来自掩模的辐射的第一数值孔径（NAC）下用光学组件执行掩模的第一次检查，并且响应于第一检查确定第一可能的掩模中的缺陷和第一可能缺陷的第一位置。该方法还包括在来自不同于第一NAC的掩模的第二NAC辐射下，用光学组件执行掩模的第二次检查，并且响应于此，确定掩模中的第二可能的缺陷和第二位置第二个可能的缺陷。该方法还包括执行第一和第二位置的比较，并且响应于比较，如果第一位置与第二位置匹配，则确定第一和第二可能缺陷代表实际缺陷。

2. 发明申请

US20080166038A1 METHOD AND SYSTEM FOR EVALUATING AN EVALUATED PATTERN OF A MASK 有权
标题翻译：用于评估掩模的评估图案的方法和系统
公开(公告)号：US20080166038A1
公开(公告)日：2008-07-10
申请号：US11971209
申请日：2008-01-08
申请人： Ishai Schwarzband , Shmoolik Mangan , Chaim Braude , Michael Ben-Yishai , Gadi Greenberg
发明人： Ishai Schwarzband , Shmoolik Mangan , Chaim Braude , Michael Ben-Yishai , Gadi Greenberg
IPC分类号： G06K9/00
CPC分类号： G06T7/0006 , G06T7/66 , G06T2207/30148
摘要： A method, system and a computer program product for evaluating an evaluated pattern of a mask, the method includes: receiving multiple moments that represent an image of the evaluated pattern; wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern; and processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern.
摘要翻译：一种用于评估掩模的评估图案的方法，系统和计算机程序产品，所述方法包括：接收表示所评估图案的图像的多个时刻; 其中用于表示所述多个时刻所需的信息的大小显着小于形成所述评估图案的图像的像素信息的大小; 并且处理多个时刻以便确定评估图案的至少一个形状参数。

3. 发明授权

US08098926B2 Method and system for evaluating an evaluated pattern of a mask 有权
标题翻译：用于评估掩模的评估图案的方法和系统
公开(公告)号：US08098926B2
公开(公告)日：2012-01-17
申请号：US11971209
申请日：2008-01-08
申请人： Ishai Schwarzband , Shmoolik Mangan , Chaim Braude , Michael Ben-Yishai , Gadi Greenberg
发明人： Ishai Schwarzband , Shmoolik Mangan , Chaim Braude , Michael Ben-Yishai , Gadi Greenberg
IPC分类号： G06K9/00
CPC分类号： G06T7/0006 , G06T7/66 , G06T2207/30148
摘要： A method, system and a computer program product for evaluating an evaluated pattern of a mask, the method includes: receiving multiple moments that represent an image of the evaluated pattern; wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern; and processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern.
摘要翻译：一种用于评估掩模的评估图案的方法，系统和计算机程序产品，所述方法包括：接收表示所评估图案的图像的多个时刻; 其中用于表示所述多个时刻所需的信息的大小显着小于形成所述评估图案的图像的像素信息的大小; 并且处理多个时刻以便确定评估图案的至少一个形状参数。

4. 发明申请

US20070127017A1 QUALIFICATION OF A MASK 有权
标题翻译：面具资格
公开(公告)号：US20070127017A1
公开(公告)日：2007-06-07
申请号：US11554309
申请日：2006-10-30
申请人： AVISHAI BARTOV , Gadi Greenberg , Chaim Braude
发明人： AVISHAI BARTOV , Gadi Greenberg , Chaim Braude
IPC分类号： G01N21/88
CPC分类号： H04W4/18 , H04L51/066 , H04L51/24 , H04L67/02 , H04W8/18
摘要： A method for qualifying printability of a mask, including performing a first inspection of the mask with an optical assembly at a first numerical aperture of collection (NAC) of radiation from the mask, and determining, in response to the first inspection, a first possible defect in the mask and a first location of the first possible defect. The method also includes performing a second inspection of the mask with the optical assembly at a second NAC of radiation from the mask, different from the first NAC, and determining, in response thereto, a second possible defect in the mask and a second location of the second possible defect. The method further includes performing a comparison of the first and second locations, and in response to the comparison, determining that the first and second possible defects represent a real defect if the first location matches the second location.
摘要翻译：一种用于限定掩模的可印刷性的方法，包括在来自掩模的辐射的第一数值孔径（NAC）下用光学组件执行掩模的第一次检查，并且响应于第一检查确定第一可能的掩模中的缺陷和第一可能缺陷的第一位置。该方法还包括在来自不同于第一NAC的掩模的第二NAC辐射下，用光学组件执行掩模的第二次检查，并且响应于此，确定掩模中的第二可能的缺陷和第二位置第二个可能的缺陷。该方法还包括执行第一和第二位置的比较，并且响应于比较，如果第一位置与第二位置匹配，则确定第一和第二可能缺陷代表实际缺陷。

5. 发明授权

US08213024B2 Method and system for aerial imaging of a reticle 有权
标题翻译：光罩的空中成像方法和系统
公开(公告)号：US08213024B2
公开(公告)日：2012-07-03
申请号：US11831100
申请日：2007-07-31
申请人： Shmuel Mangan , Boris Goldberg , Ishai Schwarzband , On Haran , Michael Ben-Yishay , Amir Sagiv , Chaim Braude
发明人： Shmuel Mangan , Boris Goldberg , Ishai Schwarzband , On Haran , Michael Ben-Yishay , Amir Sagiv , Chaim Braude
IPC分类号： G01B11/14 , G01N21/21
CPC分类号： G01N21/956 , G01N21/21 , G01N2021/95676 , G03F7/7065 , G03F7/70666
摘要： A system, method and computer readable medium for reticle evaluation, the method includes: (i) obtaining, during an imaging process, multiple images of the reticle under different polarization and optionally interferometric conditions; and (ii) generating an output aerial image in response to (i) the multiple images and (ii) differences between the imaging process and an exposure process; wherein during the exposure process an image of the reticle is projected onto a wafer.
摘要翻译：一种用于掩模版评估的系统，方法和计算机可读介质，所述方法包括：（i）在成像过程期间获得在不同极化和任选干涉条件下的掩模版的多个图像; 以及（ii）响应于（i）所述多个图像和（ii）所述成像处理和曝光处理之间的差异而产生输出空间图像; 其中在曝光过程中，将掩模版的图像投影到晶片上。

6. 发明申请

US20110121193A1 INSPECTION OF EUV MASKS BY A DUV MASK INSPECTION TOOL 有权
标题翻译：通过DUV面罩检查工具检查EUV面罩
公开(公告)号：US20110121193A1
公开(公告)日：2011-05-26
申请号：US12950058
申请日：2010-11-19
申请人： Chaim Braude , Mariano Abramson , Adam Baer , Jimmy Vishnipolsky , Yuri Belenky
发明人： Chaim Braude , Mariano Abramson , Adam Baer , Jimmy Vishnipolsky , Yuri Belenky
IPC分类号： G01J1/42
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/84
摘要： A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses a EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator.
摘要翻译：一种系统，包括：（a）掩模操纵器，其被设置为：接收包围EUV掩模的不透明EUV舱，在高度清洁的环境中从EUV的外舱和内舱提取EUV掩模并且覆盖EUV面罩的上表面，其保护罩对于DUV辐射至少部分透明; （b）扫描仪，扫描EUV掩模，使用DUV照明，同时在扫描仪中保持清洁度低于可耐受的EUV面罩清洁度水平的环境; 以及传送系统，其布置成在扫描仪和掩模操纵器之间传送EUV掩模和保护盖。

7. 发明授权

US08207504B2 Inspection of EUV masks by a DUV mask inspection tool 有权
标题翻译：通过DUV面罩检查工具检查EUV面罩
公开(公告)号：US08207504B2
公开(公告)日：2012-06-26
申请号：US12950058
申请日：2010-11-19
申请人： Chaim Braude , Mariano Abramson , Adam Baer , Jimmy Vishnipolsky , Yuri Belenky
发明人： Chaim Braude , Mariano Abramson , Adam Baer , Jimmy Vishnipolsky , Yuri Belenky
IPC分类号： G01J1/42
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/84
摘要： A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses an EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged to scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and (c) a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator.
摘要翻译：一种系统，包括：（a）掩模操纵器，其被设置为：接收包围EUV掩模的不透明EUV舱，在高度清洁的环境中从EUV的外舱和内舱提取EUV掩模并且覆盖EUV面罩的上表面，其保护罩对于DUV辐射至少部分透明; （b）扫描器，被设置为使用DUV照明扫描EUV掩模，同时在扫描仪中保持清洁度低于耐受的EUV面罩清洁度水平的环境; 以及（c）运送系统，其布置成在扫描仪和掩模操纵器之间输送EUV掩模和保护盖。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式