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1. 发明授权

US08488117B2 Inspection system and method for fast changes of focus 有权
标题翻译：检测系统和方法快速改变焦点
公开(公告)号：US08488117B2
公开(公告)日：2013-07-16
申请号：US13224096
申请日：2011-09-01
申请人： Haim Feldman , Boris Morgenstein , Roman Naidis , Adam Baer
发明人： Haim Feldman , Boris Morgenstein , Roman Naidis , Adam Baer
IPC分类号： G01N21/00
CPC分类号： G02F1/29 , G01N21/8806 , G01N21/9501 , G02F1/11 , G02F2001/294
摘要： An inspection system includes a first focusing unit configured to perform fast focus changes to a first focusing function applied to an incident light beam. A traveling lens acousto-optic device is arranged to receive the light beam focused by the first focusing function and produce focused spots using a plurality of traveling lenses generated in response to radio frequency signals. The traveling lenses apply a second focusing function and the traveling lens acousto-optic device is arranged to alter the second focusing function at a fast rate. The inspection system also includes optics arranged to direct the focused spots onto an inspected object and to direct radiation from the inspected object to a sensor.
摘要翻译：检查系统包括被配置为对应用于入射光束的第一聚焦功能执行快速聚焦改变的第一聚焦单元。移动透镜声光装置被布置成接收由第一聚焦功能聚焦的光束，并且使用响应于射频信号产生的多个行进透镜产生聚焦点。行进透镜应用第二聚焦功能，并且行进透镜声光装置被布置成以快速的速度改变第二聚焦功能。检查系统还包括被布置成将聚焦点引导到被检查对象并将来自被检查对象的辐射引导到传感器的光学系统。

2. 发明授权

US07315364B2 System for inspecting a surface employing configurable multi angle illumination modes 失效
标题翻译：用于使用可配置的多角度照明模式检查表面的系统
公开(公告)号：US07315364B2
公开(公告)日：2008-01-01
申请号：US11123454
申请日：2005-05-05
申请人： Adam Baer , Boris Golberg
发明人： Adam Baer , Boris Golberg
IPC分类号： G01N21/00
CPC分类号： G01N21/9501
摘要： Apparatus for inspection of a surface, the apparatus including an objective having central and peripheral regions, which is positioned to focus an input beam through the central region in a normal direction onto the surface. The apparatus further includes a first periscope which is positionable to divert the input beam so as to pass through the peripheral region of the objective, whereby the objective focuses the input beam in an oblique direction onto the surface. There is also a second periscope which is positionable to capture radiation reflected from the surface in the oblique direction after passage of the reflected radiation through the peripheral region of the objective.
摘要翻译：用于检查表面的装置，该装置包括具有中心和周边区域的物镜，其被定位成将输入光束通过中心区域沿法向方向聚焦到该表面上。该装置还包括第一潜望镜，其可定位以使输入光束转向以通过物镜的周边区域，由此物镜将倾斜方向上的输入光束聚焦在该表面上。还有一个第二潜望镜，其可定位成在经过反射的辐射通过物镜的周边区域之后沿倾斜方向捕获从表面反射的辐射。

3. 发明申请

US20060244976A1 Determination of irradiation parameters for inspection of a surface 失效
标题翻译：确定表面检查的照射参数
公开(公告)号：US20060244976A1
公开(公告)日：2006-11-02
申请号：US10903125
申请日：2004-07-29
申请人： Adam Baer , Ditza Auerbach
发明人： Adam Baer , Ditza Auerbach
IPC分类号： G01B11/30
CPC分类号： G01N21/9501 , G03F7/7065
摘要： Apparatus for inspection of a surface, including irradiating optics which are adapted to irradiate the surface with an irradiating beam having an adjustable polarization. The apparatus further includes at least one detector, each detector being associated with a respective analyzer having an orientation and adapted to generate signals in response to light received via the analyzer from an irradiated area on the surface, one of the at least one detector being adapted to receive scattered light from the irradiated area. The apparatus also includes a controller which is adapted to direct the irradiating optics to irradiate the irradiated area and which, in response to calibration signals generated thereby at the at least one detector, is adapted to set the adjustable polarization and the orientation of the respective analyzer of each detector.
摘要翻译：用于检查表面的装置，包括照射光学元件，其适于用具有可调偏振的照射光束照射该表面。该装置还包括至少一个检测器，每个检测器与具有取向的相应分析器相关联，并且适于响应于经由分析器从表面上的照射区域接收的光产生信号，该至少一个检测器中的一个适于以接收来自照射区域的散射光。该装置还包括控制器，其适于引导照射光学器件照射照射区域，并且响应于由此在至少一个检测器处产生的校准信号，其适于设置相应分析器的可调极化和取向的每个检测器。

4. 发明授权

US08207504B2 Inspection of EUV masks by a DUV mask inspection tool 有权
标题翻译：通过DUV面罩检查工具检查EUV面罩
公开(公告)号：US08207504B2
公开(公告)日：2012-06-26
申请号：US12950058
申请日：2010-11-19
申请人： Chaim Braude , Mariano Abramson , Adam Baer , Jimmy Vishnipolsky , Yuri Belenky
发明人： Chaim Braude , Mariano Abramson , Adam Baer , Jimmy Vishnipolsky , Yuri Belenky
IPC分类号： G01J1/42
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/84
摘要： A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses an EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged to scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and (c) a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator.
摘要翻译：一种系统，包括：（a）掩模操纵器，其被设置为：接收包围EUV掩模的不透明EUV舱，在高度清洁的环境中从EUV的外舱和内舱提取EUV掩模并且覆盖EUV面罩的上表面，其保护罩对于DUV辐射至少部分透明; （b）扫描器，被设置为使用DUV照明扫描EUV掩模，同时在扫描仪中保持清洁度低于耐受的EUV面罩清洁度水平的环境; 以及（c）运送系统，其布置成在扫描仪和掩模操纵器之间输送EUV掩模和保护盖。

5. 发明授权

US07239389B2 Determination of irradiation parameters for inspection of a surface 失效
标题翻译：确定表面检查的照射参数
公开(公告)号：US07239389B2
公开(公告)日：2007-07-03
申请号：US10903125
申请日：2004-07-29
申请人： Adam Baer , Ditza Auerbach
发明人： Adam Baer , Ditza Auerbach
IPC分类号： G01J4/00 , G01N21/00 , G06F17/18
CPC分类号： G01N21/9501 , G03F7/7065
摘要： Apparatus for inspection of a surface, including irradiating optics which are adapted to irradiate the surface with an irradiating beam having an adjustable polarization. The apparatus further includes at least one detector, each detector being associated with a respective analyzer having an orientation and adapted to generate signals in response to light received via the analyzer from an irradiated area on the surface, one of the at least one detector being adapted to receive scattered light from the irradiated area. The apparatus also includes a controller which is adapted to direct the irradiating optics to irradiate the irradiated area and which, in response to calibration signals generated thereby at the at least one detector, is adapted to set the adjustable polarization and the orientation of the respective analyzer of each detector.
摘要翻译：用于检查表面的装置，包括照射光学元件，其适于用具有可调偏振的照射光束照射该表面。该装置还包括至少一个检测器，每个检测器与具有取向的相应分析器相关联，并且适于响应于经由分析器从表面上的照射区域接收的光产生信号，该至少一个检测器中的一个适于以接收来自照射区域的散射光。该装置还包括控制器，其适于引导照射光学器件照射照射区域，并且响应于由此在至少一个检测器处产生的校准信号，其适于设置相应分析器的可调极化和取向的每个检测器。

6. 发明申请

US20060087648A1 System for inspecting a surface employing configurable multi angle illumination modes 失效
标题翻译：用于使用可配置的多角度照明模式检查表面的系统
公开(公告)号：US20060087648A1
公开(公告)日：2006-04-27
申请号：US11123454
申请日：2005-05-05
申请人： Adam Baer , Boris Golberg
发明人： Adam Baer , Boris Golberg
IPC分类号： G01N21/88
CPC分类号： G01N21/9501
摘要： Apparatus for inspection of a surface, the apparatus including an objective having central and peripheral regions, which is positioned to focus an input beam through the central region in a normal direction onto the surface. The apparatus further includes a first periscope which is positionable to divert the input beam so as to pass through the peripheral region of the objective, whereby the objective focuses the input beam in an oblique direction onto the surface. There is also a second periscope which is positionable to capture radiation reflected from the surface in the oblique direction after passage of the reflected radiation through the peripheral region of the objective.
摘要翻译：用于检查表面的装置，该装置包括具有中心和周边区域的物镜，其被定位成将输入光束通过中心区域沿法向方向聚焦到该表面上。该装置还包括第一潜望镜，其可定位以使输入光束转向以通过物镜的周边区域，由此物镜将倾斜方向上的输入光束聚焦在该表面上。还有一个第二潜望镜，其可定位成在经过反射的辐射通过物镜的周边区域之后沿倾斜方向捕获从表面反射的辐射。

7. 发明申请

US20120086937A1 INSPECTION SYSTEM AND METHOD FOR FAST CHANGES OF FOCUS 有权
标题翻译：检验系统和方法快速变化
公开(公告)号：US20120086937A1
公开(公告)日：2012-04-12
申请号：US13224096
申请日：2011-09-01
申请人： Haim Feldman , Boris Morgenstein , Roman Naidis , Adam Baer
发明人： Haim Feldman , Boris Morgenstein , Roman Naidis , Adam Baer
IPC分类号： G01N21/88 , G02F1/33 , G02F1/29
CPC分类号： G02F1/29 , G01N21/8806 , G01N21/9501 , G02F1/11 , G02F2001/294
摘要： An inspection system includes a first focusing unit configured to perform fast focus changes to a first focusing function applied to an incident light beam. A traveling lens acousto-optic device is arranged to receive the light beam focused by the first focusing function and produce focused spots using a plurality of traveling lenses generated in response to radio frequency signals. The traveling lenses apply a second focusing function and the traveling lens acousto-optic device is arranged to alter the second focusing function at a fast rate. The inspection system also includes optics arranged to direct the focused spots onto an inspected object and to direct radiation from the inspected object to a sensor.
摘要翻译：检查系统包括被配置为对应用于入射光束的第一聚焦功能执行快速聚焦改变的第一聚焦单元。移动透镜声光装置被布置成接收由第一聚焦功能聚焦的光束，并且使用响应于射频信号产生的多个行进透镜产生聚焦点。行进透镜应用第二聚焦功能，并且行进透镜声光装置被布置成以快速的速度改变第二聚焦功能。检查系统还包括被布置成将聚焦点引导到被检查对象并将来自被检查对象的辐射引导到传感器的光学系统。

8. 发明申请

US20110121193A1 INSPECTION OF EUV MASKS BY A DUV MASK INSPECTION TOOL 有权
标题翻译：通过DUV面罩检查工具检查EUV面罩
公开(公告)号：US20110121193A1
公开(公告)日：2011-05-26
申请号：US12950058
申请日：2010-11-19
申请人： Chaim Braude , Mariano Abramson , Adam Baer , Jimmy Vishnipolsky , Yuri Belenky
发明人： Chaim Braude , Mariano Abramson , Adam Baer , Jimmy Vishnipolsky , Yuri Belenky
IPC分类号： G01J1/42
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/84
摘要： A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses a EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator.
摘要翻译：一种系统，包括：（a）掩模操纵器，其被设置为：接收包围EUV掩模的不透明EUV舱，在高度清洁的环境中从EUV的外舱和内舱提取EUV掩模并且覆盖EUV面罩的上表面，其保护罩对于DUV辐射至少部分透明; （b）扫描仪，扫描EUV掩模，使用DUV照明，同时在扫描仪中保持清洁度低于可耐受的EUV面罩清洁度水平的环境; 以及传送系统，其布置成在扫描仪和掩模操纵器之间传送EUV掩模和保护盖。

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