专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2003273035A Plasma processing apparatus, driving method therefor and plasma processing method 有权
标题翻译：等离子体加工设备，其驱动方法和等离子体处理方法
公开(公告)号：JP2003273035A
公开(公告)日：2003-09-26
申请号：JP2002344709
申请日：2002-11-27
申请人： Alps Electric Co Ltd , Tadahiro Omi , アルプス電気株式会社 , 忠弘大見
发明人： NAKANO AKIRA , KUMAGAI MASA , OBA TOMOFUMI , OMI TADAHIRO
IPC分类号： H05H1/46 , B01J19/08 , C23C16/509 , H01L21/205 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a plasma processing apparatus in which the time until a system goes into an efficient plasma discharge state, after plasma is discharged from a start of plasma discharge power supply can be shortened. SOLUTION: The plasma processor has a matching circuit 2A for matching impedance between a high-frequency power source 1 and a plasma processing chamber CN and a matching controller 31 for matching output impedance in the matching circuit 2A with impedance in the plasma processing chamber CN in a non-discharge state, prior to discharge for generating plasma. Impedance Z0 before plasma discharging in the plasma processing chamber is stored in a storage part 32, for example. The matching controller 31 calls impedance Z0 from the storage part 32, when high-frequency power is supplied from the high frequency power source 1 and adjusts capacitance of a load capacitor 206 and a tuning capacitor 205, which constitute the matching circuit 2A. Thus, the impedance of the plasma processing chamber CN, prior to discharge, is started from supply of high-frequency power is adjusted easily. COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种等离子体处理装置，其中直到系统进入有效的等离子体放电状态的时间，等离子体从等离子体放电电源的开始放电之后可以缩短。解决方案：等离子体处理器具有用于匹配高频电源1和等离子体处理室CN之间的阻抗的匹配电路2A和用于将匹配电路2A中的输出阻抗与等离子体处理中的阻抗匹配的匹配控制器31 在放电等离子体之前，处于非放电状态的室CN。等离子体处理室等离子体放电之前的阻抗Z0例如存储在存储部32中。当从高频电源1提供高频电力并调整构成匹配电路2A的负载电容器206和调谐电容器205的电容时，匹配控制器31调用来自存储部分32的阻抗Z0。因此，容易地调整等离子体处理室CN在放电之前从高频电源的供给开始的阻抗。版权所有（C）2003，JPO

2. 发明专利

JP2003017414A Plasma processing equipment and plasma processing system 有权
标题翻译：等离子体处理设备和等离子体处理系统
公开(公告)号：JP2003017414A
公开(公告)日：2003-01-17
申请号：JP2001199900
申请日：2001-06-29
申请人： Alps Electric Co Ltd , Tadahiro Omi , Seiko Epson Corp , アルプス電気株式会社 , セイコーエプソン株式会社 , 忠弘大見
发明人： NAKANO AKIRA , ASUKE SHINTARO , MIYASHITA TAKESHI , OMI TADAHIRO
IPC分类号： H05H1/46 , B01J19/08 , C23C16/505 , H01L21/205 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To reduce a feeding loss by reducing high-frequency resistance in a current returning section and suppressing changes in high frequency resistance with the passage of time.
SOLUTION: A plasma processing equipment comprises a plasma processing chamber unit 75, which comprises a plasma processing chamber 60 provided with electrodes 4 and 8 for exciting plasma, a high-frequency power supply 1 for supplying high-frequency power, and a matching circuit 2A which has an input terminal and an output terminal PR, with the input terminal being connected by the high-frequency power supply 1 and the output terminal PR connected by the electrode 4 via a high-frequency power distributor 3, and which obtains impedance matching between the plasma processing chamber 60 and the high-frequency power supply 1. In a DC ground-side part from the electrode 8, a low resistance section RL, for reducing the electrical resistance, is provided on at least a part of the surface thereof.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：通过降低电流返回部分中的高频电阻来减少馈送损耗，并且随着时间的推移抑制高频阻抗的变化。解决方案：等离子体处理设备包括等离子体处理室单元75，其包括设置有用于激发等离子体的电极4和8的等离子体处理室60，用于提供高频电力的高频电源1和匹配电路2A 其具有输入端子和输出端子PR，其输入端子由高频电源1和由电极4经由高频配电器3连接的输出端子PR连接，并获得等离子体处理室60和高频电源1.在来自电极8的DC接地侧部分中，在其表面的至少一部分上设置有用于降低电阻的低电阻部RL。

3. 发明专利

JP2003017299A Plasma treatment device, plasma treatment system and its stabilization method 有权
标题翻译：等离子体处理装置，等离子体处理系统及其稳定方法
公开(公告)号：JP2003017299A
公开(公告)日：2003-01-17
申请号：JP2001199901
申请日：2001-06-29
申请人： Alps Electric Co Ltd , Tadahiro Omi , Seiko Epson Corp , アルプス電気株式会社 , セイコーエプソン株式会社 , 忠弘大見
发明人： NAKANO AKIRA , ASUKE SHINTARO , MIYASHITA TAKESHI , OMI TADAHIRO
IPC分类号： H05H1/46 , B01J19/08 , C23C16/505 , H01L21/205
摘要： PROBLEM TO BE SOLVED: To realize reduction in the inductance and the power supply loss and suppression of the change with the passage of time at the coaxial cable part.
SOLUTION: The device comprises a plasma treatment chamber 60 having electrodes 4, 8 for exciting plasma, a high frequency power source 1 for supplying high frequency power, and a plasma treatment-chamber unit 75 which comprises an input terminal and an output terminal PR and in which the high frequency power source 1 is connected to the input terminal through a high frequency power feeder 1A and the electrode 4 is connected to the output terminal PR through a high frequency power distributor 3A, and which is equipped with a matching circuit 2A for obtaining impedance matching between the plasma treatment chamber 60 and the high frequency power source 1. The high frequency power feeder 1A or the high frequency power distributor 3A is fixed at the floor GF by the high frequency impedance adjusters B1, B1 so that the high frequency impedance A, B may not fluctuate.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：实现电感和电源损耗的降低以及在同轴电缆部分时随时间的变化的抑制。解决方案：该装置包括具有用于激发等离子体的电极4,6等离子体处理室60，用于提供高频功率的高频电源1和等离子体处理室单元75，其包括输入端和输出端PR 其中高频电源1通过高频电力馈送器1A连接到输入端，并且电极4通过高频配电器3A连接到输出端PR，并且配备有匹配电路2A，用于获得等离子体处理室60和高频电源1之间的阻抗匹配。高频电力馈送器1A或高频电力分配器3A通过高频阻抗调节器B1，B1固定在地板GF上，使得高频电源阻抗A，B可能不会波动。

4. 发明专利

JP2003017298A Plasma treatment device and plasma treatment system 有权
标题翻译：等离子体处理装置和等离子体处理系统
公开(公告)号：JP2003017298A
公开(公告)日：2003-01-17
申请号：JP2001199899
申请日：2001-06-29
申请人： Alps Electric Co Ltd , Tadahiro Omi , Seiko Epson Corp , アルプス電気株式会社 , セイコーエプソン株式会社 , 忠弘大見
发明人： NAKANO AKIRA , ASUKE SHINTARO , MIYASHITA TAKESHI , OMI TADAHIRO
IPC分类号： H05H1/46 , C23C14/40 , C23C16/509 , H01L21/205 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To realize reduction in inductance, and high frequency resistance, and power supply loss, and to prevent drifting of high frequency current.
SOLUTION: The device comprises a plasma treatment chamber 60 having electrodes 4, 8 for exciting plasma, a high frequency power source 1 for supplying a high frequency power, and a plasma treatment chamber unit 75 which comprises an input terminal and an output terminal PR and in which the high frequency power source 1 is connected to the input terminal and the electrode 4 is connected to the output terminal PR through a high frequency power distributor 3 and comprises a matching circuit 2A for obtaining impedance matching between the plasma treatment chamber 60 and the high frequency power source 1. In the high frequency power distributor 3, the mean density per unit volume of the high frequency power supplied by the high frequency power source 1 is set to become coarse from the output terminal PR side toward the electrode 4 side.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：实现电感降低，高频阻抗和电源损耗，并防止高频电流漂移。解决方案：该装置包括具有用于激发等离子体的电极4,6等离子体处理室60，用于提供高频功率的高频电源1和等离子体处理室单元75，其包括输入端和输出端PR 其中高频电源1连接到输入端，并且电极4通过高频配电器3连接到输出端PR，并且包括用于获得等离子体处理室60和等离子体处理室60之间的阻抗匹配的匹配电路2A 在高频电力分配器3中，由高频电源1供给的高频电力的每单位体积的平均密度被设定为从输出端子PR侧向电极4侧变粗。

5. 发明专利

JP2006302512A Lamp unit 审中-公开
标题翻译：灯泡单元
公开(公告)号：JP2006302512A
公开(公告)日：2006-11-02
申请号：JP2005117829
申请日：2005-04-15
申请人： Alps Electric Co Ltd , アルプス電気株式会社
发明人： UCHIDA RYOSUKE , HAYAMA TAKESHI , NAKANO AKIRA , TAKAHASHI HIDEYUKI , MIYAZAWA SATOSHI
IPC分类号： F21V23/00 , B60Q3/02 , F21V3/02 , F21Y101/02 , H05B37/02
摘要： PROBLEM TO BE SOLVED: To reduce the size while securing good operability and to regulate light amount.
SOLUTION: This lamp unit is provided with a printed wiring board 2, on which an LED element 6 used as a light source is mounted and a resistor pattern 4 and a wiring pattern 5 are formed, and a lamp cover 3 having a terminal 7, which connects the resistor pattern 4 and the wiring pattern 5 on the printed wiring board 2 together, on the lower face. When a resistance value in the circuit is varied according to rotational operation applied to the lamp cover 3, voltage impressed to the LED element 6 is changed, and consequently, the light amount of the LED element 6 is changed.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：在确保良好的可操作性和调节光量的同时减小尺寸。解决方案：该灯单元设置有印刷线路板2，其上安装了用作光源的LED元件6，并且形成有电阻图案4和布线图案5，以及具有端子7，其将印刷电路板2上的电阻图案4和布线图案5一起连接在下表面上。当电路中的电阻值根据施加到灯罩3的旋转操作而变化时，施加到LED元件6的电压改变，因此LED元件6的光量发生变化。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2006294259A Switching device 审中-公开
标题翻译：切换设备
公开(公告)号：JP2006294259A
公开(公告)日：2006-10-26
申请号：JP2005108950
申请日：2005-04-05
申请人： Alps Electric Co Ltd , アルプス電気株式会社
发明人： TAKAHASHI HIDEYUKI , SASAKI YASUNARI , ONODERA MIKIO , HAYAMA TAKESHI , SHIBAZAKI TAKESHI , NAKANO AKIRA
IPC分类号： H01H25/00 , H01H13/02 , H01H13/58 , H01H89/00
CPC分类号： H01H13/585 , H01H13/023
摘要： PROBLEM TO BE SOLVED: To provide a switching device easy to manufacture with the less number of production processes and components.
SOLUTION: When a top end of a pushing member 12 is pushed down against a spring, the pushing member 12 will go downward and a cam side 12e of the pushing member 12 comes in contact with a cam side 13a of a rotating member 13. Then, a driving force is given to the rotating member 13 by a launcher mechanism and the rotating member 13 is rotated 45 degrees in a direction of an arrow mark B. Accordingly, a segment 13c slides on a conductive pattern member 14 and is connected with the conductive pattern 14a at a convex part 14b. As a result, an electric current is supplied to a LED element 12b and a LED element 12b emits light.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种易于制造的开关装置，其生产过程和部件数量较少。解决方案：当推动构件12的顶端向下压靠弹簧时，推动构件12将向下移动，并且推动构件12的凸轮侧12e与旋转构件的凸轮侧13a接触然后，通过发射机构向旋转构件13施加驱动力，并且旋转构件13沿箭头标记B的方向旋转45度。因此，段13c在导电图案构件14上滑动，并且是在凸部14b与导电图案14a连接。结果，向LED元件12b提供电流，并且LED元件12b发光。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2005302994A Electronic component module 审中-公开
标题翻译：电子元件模块
公开(公告)号：JP2005302994A
公开(公告)日：2005-10-27
申请号：JP2004116675
申请日：2004-04-12
申请人： Alps Electric Co Ltd , アルプス電気株式会社
发明人： MIYAZAWA SATOSHI , NAGAI TAKUYA , NAKANO AKIRA
IPC分类号： H01L25/18 , H01L25/04
摘要： PROBLEM TO BE SOLVED: To provide an electronic component module having sealed function and high in the degree of freedom of configuration designing while being inexpensive.
SOLUTION: In the electronic component module 1, a plurality of substrates 10, 30 are constituted by connecting them so as to form a closed space 50 therein, and electronic components 23, 43 are mounted by forming circuit patterns 21, 41 on the inner surfaces 11, 31 of respective substrates 10, 30. Shield layers 24, 44 consisting of a conductive film are formed on substantially the whole outer surfaces 13, 33 of respective substrates 10, 30, and a wiring 26 for transmitting and receiving a signal to and from the outside of the module is connected to the circuit pattern 21 and is exposed from the closed space 50. In this case, respective substrates 10, 30 are provided on the connecting units 11a, 31a for connecting to the other substrates with conduction units 22, 42 for conducting the circuit patterns 21, 41 with each other and a gap section 51, in which the connecting units 11a, 31a are formed so as to be separated from each other, while the wiring 26 is exposed from the closed space 50 through the gap section 51.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供具有密封功能的电子部件模块，并且配置设计的自由度高，而价格便宜。解决方案：在电子部件模块1中，多个基板10,30通过连接而构成，以便在其中形成封闭空间50，并且通过将电路图案41,41形成在电子部件23,43上而安装每个基板10,30的内表面11,31。由导电膜组成的屏蔽层24,44形成在各个基板10,30的基本上整个外表面13,33上，以及布线26，用于发送和接收与模块外部的信号连接到电路图案21并从封闭空间50露出。在这种情况下，各个基板10,30设置在连接单元11a，31a上，用于连接到其它基板用于将电路图案21,41彼此导通的导通单元22和42以及连接单元11a，31a形成为彼此分离的间隙部51，同时布线26从闭合 SPAC （C）2006年，JPO＆NCIPI

8. 发明专利

JP2007303923A Servo-type pressure sensor 审中-公开
标题翻译：伺服型压力传感器
公开(公告)号：JP2007303923A
公开(公告)日：2007-11-22
申请号：JP2006131549
申请日：2006-05-10
申请人： Alps Electric Co Ltd , アルプス電気株式会社
发明人： TAMURA MANABU , SASAKI NOBUHIKO , HAGA NOBUAKI , NAKANO AKIRA , MORI ATSUO , BITO MITSUO
IPC分类号： G01L9/00 , H01L29/84
摘要： PROBLEM TO BE SOLVED: To provide a servo-type pressure sensor without the risk of discharge and moreover, is capable of accurately exhibiting precisely servo functions.
SOLUTION: The risk of the discharge is precluded from generating, because the main face 17a
1 in a cavity 18 of a diaphragm 17a is pressed by a fluid heated by a heating body, in this servo-type pressure sensor. Since the main face 17a
1 of the diaphragm 17a is pressed due to the volume expansion of the fluid, the main face 17a
1 can be pressed uniformly. Accordingly, the servo functions can be exhibited with high accuracy.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种没有放电风险的伺服型压力传感器，并且能够精确地显示精确的伺服功能。解决方案：由于隔膜17a的腔18中的主面17a <1> 被被加热体加热的流体挤压，所以不排除放电的危险，在该伺服型压力传感器。由于膜片17a的主面17a 1 由于流体的体积膨胀而被按压，所以能够均匀地压制主面17a <1>。因此，可以高精度地显示伺服功能。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2005303221A Elastic contact 审中-公开
标题翻译：弹性联系人
公开(公告)号：JP2005303221A
公开(公告)日：2005-10-27
申请号：JP2004121045
申请日：2004-04-16
申请人： Alps Electric Co Ltd , アルプス電気株式会社
发明人： YOSHIDA MAKOTO , OKAMOTO YASUSHI , NAKANO AKIRA , TSUJI YOSHIOMI , MYOCHIN KATSUMI , SOEDA KAORU
IPC分类号： H05K9/00 , H05K1/18
摘要： PROBLEM TO BE SOLVED: To provide an elastic contact characterized in that an exclusive bypass capacitor is not necessary, that a reduction of manufacturing cost and a miniaturization of a circuit board are performed, and that noise is effectively removed or reduced simultaneously.
SOLUTION: When mounting an electronic component 1 such as a semiconductor device to a connector, a dielectric film 23 prepared in a spiral contact (elastic contact) 20B which is arranged in connector side elastically contacts to a power supply electrode 1a1 prepared in a bottom face of the electronic component 1. At this time, the above-mentioned dielectric film 23 forms a capacitor C1 in such a way that it is sandwiched between the above-mentioned power supply 1a1, a contact portion 22a of the spiral contact 20B and an elastic portion 22, so that it functions as a bypass capacitor.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供弹性接触，其特征在于，不需要专用旁路电容器，从而进行制造成本的降低和电路板的小型化，并且同时有效地去除或减少噪声。解决方案：当将诸如半导体器件的电子部件1安装到连接器时，以连接器侧布置的螺旋接触（弹性接触）20B制备的电介质膜23弹性地接触到制备在电源电极1a1中的电源电极1a1 电子部件1的底面。此时，上述电介质膜23形成电容器C1，使其夹在上述电源1a1之间，螺旋形触头20B的接触部分22a 和弹性部分22，使其用作旁路电容器。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2005303038A Connection structure of micro-contact and bump with built-in capacitor 审中-公开
标题翻译：微型接触式和BUMP与内置电容器的连接结构
公开(公告)号：JP2005303038A
公开(公告)日：2005-10-27
申请号：JP2004117709
申请日：2004-04-13
申请人： Alps Electric Co Ltd , アルプス電気株式会社
发明人： NAKANO AKIRA , YOSHIDA MAKOTO , OKAMOTO YASUSHI , TSUJI YOSHIOMI , SOEDA KAORU , MYOCHIN KATSUMI
IPC分类号： H01L21/60
CPC分类号： H01L2924/0002 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide a highly reliable connection structure of a bump with built-in, capacitor and to provide the micro-contact of the capacitor built-in bump suitably used for this connection structure.
SOLUTION: This micro-contact of the bump with built-in capacitor comprises the bump with built-in capacitor mounted on a semiconductor device; a first contact 2 which is provided on a mounting substrate, on which the semiconductor device is mounted, and is in contact with the base part of the bump with built-in capacitor near the semiconductor device; and a second contact 3 in contact with the tip of the bump with built-in capacitor.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供具有内置的电容器的凸块的高度可靠的连接结构，并且提供适合用于该连接结构的电容器内置凸块的微接触。
解决方案：凸块与内置电容器的微接触包括安装在半导体器件上的内置电容器的凸块; 设置在安装基板上的第一触点2，半导体器件安装在该安装基板上，并且与半导体器件附近具有内置电容器的突起的基部接触; 以及与具有内置电容器的凸块尖端接触的第二触点3。版权所有（C）2006，JPO＆NCIPI

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式