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1. 发明申请

US20060079156A1 Method for processing a substrate using multiple fluid distributions on a polishing surface 审中-公开
标题翻译：在抛光表面上使用多个流体分布来处理基底的方法
公开(公告)号：US20060079156A1
公开(公告)日：2006-04-13
申请号：US11262620
申请日：2005-10-31
申请人： Alexander Polyak , Avi Tepman
发明人： Alexander Polyak , Avi Tepman
IPC分类号： B24B1/00
CPC分类号： B24B37/04 , B24B37/042 , B24B57/02
摘要： A polishing fluid delivery apparatus has been provided that in one embodiment includes a support member, a dispense arm, a polishing fluid delivery tube and a variable restricting device. The dispense arm extends from an upper portion of the support member and has an outlet of the delivery tube coupled thereto. The restricting device interfaces with the delivery tube and is adapted to provide a variable restriction to flow passing through the delivery tube. In another embodiment, the restricting device is a pinch valve and the tube in continuous from the outlet to beyond a portion that interfaces with the pinch valve. In yet another embodiment, the position of the dispense arm is controllable.
摘要翻译：已经提供了一种抛光流体输送装置，其在一个实施例中包括支撑构件，分配臂，抛光流体输送管和可变限制装置。分配臂从支撑构件的上部延伸并且具有与其连接的输送管的出口。限制装置与输送管接口并且适于对通过输送管的流动提供可变的限制。在另一个实施例中，限制装置是夹管阀，并且管从出口连续到超过与夹紧阀相接合的部分。在另一个实施例中，分配臂的位置是可控的。

2. 发明申请

US20080057836A1 PAD CONDITIONING HEAD FOR CMP PROCESS 失效
标题翻译：用于CMP工艺的PAD调节头
公开(公告)号：US20080057836A1
公开(公告)日：2008-03-06
申请号：US11927048
申请日：2007-10-29
申请人： Alexander Polyak , Avi Tepman
发明人： Alexander Polyak , Avi Tepman
IPC分类号： B24B1/00
CPC分类号： B24B53/017 , H01L21/31053
摘要： In a first aspect, a first apparatus is provided for a chemical mechanical polishing (CMP) process. The first apparatus includes (1) a rotatable member; (2) an end effector adapted to receive and retain a conditioning disk; and (3) an elastic device disposed between the rotatable member and the end effector. The elastic device is (a) adapted to rotate the end effector via a torque from the rotatable member, and (b) flexibly extensible so as to impart a force to the end effector while permitting the end effector to deviate from a perpendicular alignment with the rotatable member in order for a conditioning surface of the conditioning disk to conform to an irregular polishing surface of a pad being conditioned. Numerous other aspects are provided, including methods and apparatus for using liquid or gas to deter polishing slurry or debris from entering the conditioning head.
摘要翻译：在第一方面，提供了用于化学机械抛光（CMP）工艺的第一设备。第一装置包括（1）可旋转构件; （2）适于接收和保持调节盘的端部执行器; 和（3）设置在可旋转构件和末端执行器之间的弹性装置。弹性装置是（a）适于通过来自可旋转构件的扭矩旋转末端执行器，以及（b）柔性可伸展的，以便向末端执行器施加力，同时允许末端执行器偏离与可旋转构件，以便调节盘的调节表面与被调节的垫的不规则抛光表面相一致。提供了许多其它方面，包括使用液体或气体来阻止抛光浆料或碎屑进入调节头的方法和装置。

3. 发明申请

US20050272352A1 Slurry delivery arm 审中-公开
公开(公告)号：US20050272352A1
公开(公告)日：2005-12-08
申请号：US11176985
申请日：2005-07-08
申请人： Alexander Polyak , Avi Tepman
发明人： Alexander Polyak , Avi Tepman
IPC分类号： B24B37/04 , B24B57/02 , B24B1/00
CPC分类号： B24B37/04 , B24B37/042 , B24B57/02
摘要： A polishing fluid delivery apparatus has been provided that in one embodiment includes a support member, a dispense arm, a polishing fluid delivery tube and a variable restricting device. The dispense arm extends from an upper portion of the support member and has an outlet of the delivery tube coupled thereto. The restricting device interfaces with the delivery tube and is adapted to provide a variable restriction to flow passing through the delivery tube. In another embodiment, the restricting device is a pinch valve and the tube in continuous from the outlet to beyond a portion that interfaces with the pinch valve. In yet another embodiment, the position of the delivery arm is controllable.

4. 发明申请

US20080038998A1 METHOD FOR PROCESSING A SUBSTRATE USING MULTIPLE FLUID DISTRIBTUIONS ON A POLISHING SURFACE 审中-公开
标题翻译：在抛光表面处理使用多种流体分布的基板的方法
公开(公告)号：US20080038998A1
公开(公告)日：2008-02-14
申请号：US11876202
申请日：2007-10-22
申请人： Alexander Polyak , Avi Tepman
发明人： Alexander Polyak , Avi Tepman
IPC分类号： B24B7/04
CPC分类号： B24B37/04 , B24B37/042 , B24B57/02
摘要： A polishing fluid delivery apparatus has been provided that in one embodiment includes a support member, a dispense arm, a polishing fluid delivery tube and a variable restricting device. The dispense arm extends from an upper portion of the support member and has an outlet of the delivery tube coupled thereto. The restricting device interfaces with the delivery tube and is adapted to provide a variable restriction to flow passing through the delivery tube. In another embodiment, the restricting device is a pinch valve and the tube in continuous from the outlet to beyond a portion that interfaces with the pinch valve. In yet another embodiment, the position of the dispense arm is controllable.
摘要翻译：已经提供了一种抛光流体输送装置，其在一个实施例中包括支撑构件，分配臂，抛光流体输送管和可变限制装置。分配臂从支撑构件的上部延伸并且具有与其连接的输送管的出口。限制装置与输送管接口并且适于对通过输送管的流动提供可变的限制。在另一个实施例中，限制装置是夹管阀，并且管从出口连续到超过与夹紧阀相接合的部分。在另一个实施例中，分配臂的位置是可控的。

5. 发明申请

US20050167048A1 Pad conditioning head for CMP process 失效
标题翻译：用于CMP工艺的垫片调节头
公开(公告)号：US20050167048A1
公开(公告)日：2005-08-04
申请号：US10970365
申请日：2004-10-21
申请人： Alexander Polyak , Avi Tepman
发明人： Alexander Polyak , Avi Tepman
IPC分类号： B24B37/04 , B24B53/007 , H01L21/3105 , C23F1/00
CPC分类号： B24B53/017 , H01L21/31053
摘要： In a first aspect, a first apparatus is provided for a chemical mechanical polishing (CMP) process. The first apparatus includes (1) a rotatable member; (2) an end effector adapted to receive and retain a conditioning disk; and (3) an elastic device disposed between the rotatable member and the end effector. The elastic device is (a) adapted to rotate the end effector via a torque from the rotatable member, and (b) flexibly extensible so as to impart a force to the end effector while permitting the end effector to deviate from a perpendicular alignment with the rotatable member in order for a conditioning surface of the conditioning disk to conform to an irregular polishing surface of a pad being conditioned. Numerous other aspects are provided, including methods and apparatus for using liquid or gas to deter polishing slurry or debris from entering the conditioning head.
摘要翻译：在第一方面，提供了用于化学机械抛光（CMP）工艺的第一设备。第一装置包括（1）可旋转构件; （2）适于接收和保持调节盘的端部执行器; 和（3）设置在可旋转构件和末端执行器之间的弹性装置。弹性装置是（a）适于通过来自可旋转构件的扭矩旋转末端执行器，以及（b）柔性可伸展的，以便向末端执行器施加力，同时允许末端执行器偏离与可旋转构件，以便调节盘的调节表面与被调节的垫的不规则抛光表面相一致。提供了许多其它方面，包括使用液体或气体来阻止抛光浆料或碎屑进入调节头的方法和装置。

6. 发明申请

US20050087212A1 Scrubber box and methods for using the same 有权
标题翻译：洗涤箱和使用方法
公开(公告)号：US20050087212A1
公开(公告)日：2005-04-28
申请号：US10976012
申请日：2004-10-28
申请人： Joseph Yudovsky , Avi Tepman , Kenneth Reynolds , Younes Achkire , Dan Marohl , Steve Ghanayem , Alexander Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
发明人： Joseph Yudovsky , Avi Tepman , Kenneth Reynolds , Younes Achkire , Dan Marohl , Steve Ghanayem , Alexander Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
IPC分类号： B08B1/04 , H01L21/00
CPC分类号： H01L21/67046 , B08B1/04
摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.
摘要翻译：提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度刷子

7. 发明申请

US20080292433A1 BATCH EQUIPMENT ROBOTS AND METHODS OF ARRAY TO ARRAY WORK-PIECE TRANSFER FOR PHOTOVOLTAIC FACTORY 审中-公开
标题翻译：批量设备机器人和方法阵列工程转让光伏工厂
公开(公告)号：US20080292433A1
公开(公告)日：2008-11-27
申请号：US11747391
申请日：2007-05-11
申请人： Robert Z. Bachrach , Avi Tepman , Alexander S. Polyak
发明人： Robert Z. Bachrach , Avi Tepman , Alexander S. Polyak
IPC分类号： B65H5/00
CPC分类号： C23C16/54 , C23C14/568 , H01L31/18
摘要： The present invention generally comprises equipment for an automated high volume batch work-piece manufacturing factory comprising work-piece handling and work-piece processing in a high productivity factory architecture capable of producing 1,000 or more work-piece an hour. The work-pieces may be presented to the equipment from a stacked supply to a parallel array. Additionally, the work-pieces may be transferred between manufacturing architectures by an array to array batch transfer. The work-pieces may be transferred within the manufacturing architecture in a parallel to parallel batch transfer operation. The robotic operations may be between robotic devices, between robotic devices and processing equipment, and within processing equipment.
摘要翻译：本发明通常包括用于自动化大批量批量工件制造工厂的设备，其包括能够每小时生产1,000个或更多个工件的高生产率工厂结构中的工件处理和工件加工。工件可以从堆叠的供应提供给设备到并行阵列。另外，工件可以通过阵列在制造架构之间转移到阵列批量传输。工件可以在并行批量传输操作的同时在制造架构内转移。机器人操作可以在机器人设备之间，机器人设备和处理设备之间以及处理设备内。

8. 发明申请

US20080210258A1 SCRUBBER BOX AND METHODS FOR USING THE SAME 有权
标题翻译： SCRUBBER BOX及其使用方法
公开(公告)号：US20080210258A1
公开(公告)日：2008-09-04
申请号：US12102846
申请日：2008-04-14
申请人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
发明人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
IPC分类号： B08B7/00 , A47L25/00
CPC分类号： H01L21/67046 , B08B1/04
摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.
摘要翻译：提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度刷子

9. 发明申请

US20060006058A1 Staggered target tiles 有权
公开(公告)号：US20060006058A1
公开(公告)日：2006-01-12
申请号：US10888383
申请日：2004-07-09
申请人： Avi Tepman
发明人： Avi Tepman
IPC分类号： C23C14/32
CPC分类号： C23C14/3407
摘要： A sputtering target, particularly for sputter depositing a target material onto large rectangular panels, in which a plurality of target tiles are bonded to a backing plate in a two-dimensional non-rectangular array such that the tiles meet at interstices of no more than three tile, thus locking the tiles against excessive misalignment during bonding. The rectangular tiles may be arranged in staggered rows or in a herringbone or zig-zag pattern. Hexagonal and triangular tiles also provide many of the advantages of the invention.

10. 发明申请

US20050139160A1 Clamshell and small volume chamber with fixed substrate support 审中-公开
标题翻译：蛤壳式和小容积室具有固定衬底支撑
公开(公告)号：US20050139160A1
公开(公告)日：2005-06-30
申请号：US11059846
申请日：2005-02-16
申请人： Lawrence Lei , Alfred Mak , Gwo-Chuan Tzu , Avi Tepman , Ming Xi , Walter Glenn
发明人： Lawrence Lei , Alfred Mak , Gwo-Chuan Tzu , Avi Tepman , Ming Xi , Walter Glenn
IPC分类号： C23C16/44 , C23C16/455 , H01L21/00 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/4412 , C23C16/45521 , C23C16/45574 , H01L21/6719
摘要： Embodiments of the present invention generally relate to a small volume chamber with a substrate support. One embodiment of a processing chamber includes a first assembly having a substrate support, a pumping ring disposed around a perimeter of the substrate receiving surface, and a gas distribution assembly disposed over the substrate support. The chamber may further include a gas distribution assembly disposed over the substrate support. The first assembly and the gas distribution assembly can be selectively positioned between an open position and a closed position.
摘要翻译：本发明的实施例通常涉及具有基板支撑件的小容积室。处理室的一个实施例包括具有衬底支撑件的第一组件，围绕衬底接收表面的周边设置的泵送环以及设置在衬底支撑件上方的气体分配组件。该腔室还可包括设置在衬底支撑件上方的气体分配组件。第一组件和气体分配组件可以选择性地定位在打开位置和关闭位置之间。

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