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1. 发明申请

US20060079156A1 Method for processing a substrate using multiple fluid distributions on a polishing surface 审中-公开
标题翻译：在抛光表面上使用多个流体分布来处理基底的方法
公开(公告)号：US20060079156A1
公开(公告)日：2006-04-13
申请号：US11262620
申请日：2005-10-31
申请人： Alexander Polyak , Avi Tepman
发明人： Alexander Polyak , Avi Tepman
IPC分类号： B24B1/00
CPC分类号： B24B37/04 , B24B37/042 , B24B57/02
摘要： A polishing fluid delivery apparatus has been provided that in one embodiment includes a support member, a dispense arm, a polishing fluid delivery tube and a variable restricting device. The dispense arm extends from an upper portion of the support member and has an outlet of the delivery tube coupled thereto. The restricting device interfaces with the delivery tube and is adapted to provide a variable restriction to flow passing through the delivery tube. In another embodiment, the restricting device is a pinch valve and the tube in continuous from the outlet to beyond a portion that interfaces with the pinch valve. In yet another embodiment, the position of the dispense arm is controllable.
摘要翻译：已经提供了一种抛光流体输送装置，其在一个实施例中包括支撑构件，分配臂，抛光流体输送管和可变限制装置。分配臂从支撑构件的上部延伸并且具有与其连接的输送管的出口。限制装置与输送管接口并且适于对通过输送管的流动提供可变的限制。在另一个实施例中，限制装置是夹管阀，并且管从出口连续到超过与夹紧阀相接合的部分。在另一个实施例中，分配臂的位置是可控的。

2. 发明授权

US5243867A Mechanism for feedthrough of rotary motion to a sealed chamber 失效
标题翻译：旋转运动到密封室的机构
公开(公告)号：US5243867A
公开(公告)日：1993-09-14
申请号：US765990
申请日：1991-09-26
申请人： Alexander Polyak
发明人： Alexander Polyak
IPC分类号： F16J15/50
CPC分类号： F16J15/50 , Y10T74/2111
摘要： A mechanism for feedthrough of rotary motion to a sealed chamber includes a shaft (220) rotatingly supported inside a hollow housing (200). The shaft (220) comprises a front portion (222), a middle portion (224), and a rear portion (226). The front portion (222) of the shaft protrudes into a sealed external vacuum chamber (202), which is attached to the housing (200). The rear portion (226) of the shaft (220) is eccentric with respect to the rotational axis of the shaft. A cylindrical end (244) of the shaft rotatingly supports a cap (252), which is coaxial with the shaft end (244). The housing (200) and the cap (252) are sealingly and movably connected by a bellows (246). A compensator (250), eccentric with respect to the cap (252) is rotatingly mounted at the periphery of the cap and is fitted into a cavity within an eccentric driver (248), the rotational axis of which is concentric with that of the shaft ( 220). The compensator (250) is rotatingly mounted inside a cylindrical cover (282), which is rigidly attached to the housing (200). Rotation of the driver (248) imparts planetary motion to the compensator (250), the cap (252), and the shaft end (244), which orbit the rotational axis of the shaft (220). Since the shaft end (244) is eccentric with respect to the rest of the shaft body, planetary motion of the shaft end translates into rotary motion of the shaft (220), which in turn rotates the sample inside the vacuum chamber (202).
摘要翻译：用于将旋转运动馈送到密封室的机构包括旋转地支撑在中空壳体（200）内的轴（220）。轴（220）包括前部（222），中间部分（224）和后部（226）。轴的前部（222）突出到密封的外部真空室（202）中，该外部真空室附接到壳体（200）。轴（220）的后部（226）相对于轴的旋转轴线是偏心的。轴的圆柱形端部（244）旋转地支撑与轴端（244）同轴的盖（252）。壳体（200）和盖（252）通过波纹管（246）密封地和可移动地连接。相对于盖（252）偏心的补偿器（250）旋转地安装在盖的周边，并被装配到偏心驱动器（248）内的空腔中，该偏心驱动器的旋转轴线与轴的旋转轴线同心（220）。补偿器（250）旋转地安装在刚性地附接到壳体（200）的圆柱形盖（282）内。驱动器（248）的旋转将行星运动施加到对轴（220）的旋转轴线进行轨道运动的补偿器（250），盖（252）和轴端（244）。由于轴端（244）相对于轴体的其余部分是偏心的，所以轴端的行星运动转变为轴（220）的旋转运动，轴（220）又使样品在真空室（202）内旋转。

3. 发明申请

US20080057836A1 PAD CONDITIONING HEAD FOR CMP PROCESS 失效
标题翻译：用于CMP工艺的PAD调节头
公开(公告)号：US20080057836A1
公开(公告)日：2008-03-06
申请号：US11927048
申请日：2007-10-29
申请人： Alexander Polyak , Avi Tepman
发明人： Alexander Polyak , Avi Tepman
IPC分类号： B24B1/00
CPC分类号： B24B53/017 , H01L21/31053
摘要： In a first aspect, a first apparatus is provided for a chemical mechanical polishing (CMP) process. The first apparatus includes (1) a rotatable member; (2) an end effector adapted to receive and retain a conditioning disk; and (3) an elastic device disposed between the rotatable member and the end effector. The elastic device is (a) adapted to rotate the end effector via a torque from the rotatable member, and (b) flexibly extensible so as to impart a force to the end effector while permitting the end effector to deviate from a perpendicular alignment with the rotatable member in order for a conditioning surface of the conditioning disk to conform to an irregular polishing surface of a pad being conditioned. Numerous other aspects are provided, including methods and apparatus for using liquid or gas to deter polishing slurry or debris from entering the conditioning head.
摘要翻译：在第一方面，提供了用于化学机械抛光（CMP）工艺的第一设备。第一装置包括（1）可旋转构件; （2）适于接收和保持调节盘的端部执行器; 和（3）设置在可旋转构件和末端执行器之间的弹性装置。弹性装置是（a）适于通过来自可旋转构件的扭矩旋转末端执行器，以及（b）柔性可伸展的，以便向末端执行器施加力，同时允许末端执行器偏离与可旋转构件，以便调节盘的调节表面与被调节的垫的不规则抛光表面相一致。提供了许多其它方面，包括使用液体或气体来阻止抛光浆料或碎屑进入调节头的方法和装置。

4. 发明申请

US20050272352A1 Slurry delivery arm 审中-公开
公开(公告)号：US20050272352A1
公开(公告)日：2005-12-08
申请号：US11176985
申请日：2005-07-08
申请人： Alexander Polyak , Avi Tepman
发明人： Alexander Polyak , Avi Tepman
IPC分类号： B24B37/04 , B24B57/02 , B24B1/00
CPC分类号： B24B37/04 , B24B37/042 , B24B57/02
摘要： A polishing fluid delivery apparatus has been provided that in one embodiment includes a support member, a dispense arm, a polishing fluid delivery tube and a variable restricting device. The dispense arm extends from an upper portion of the support member and has an outlet of the delivery tube coupled thereto. The restricting device interfaces with the delivery tube and is adapted to provide a variable restriction to flow passing through the delivery tube. In another embodiment, the restricting device is a pinch valve and the tube in continuous from the outlet to beyond a portion that interfaces with the pinch valve. In yet another embodiment, the position of the delivery arm is controllable.

5. 发明申请

US20080038998A1 METHOD FOR PROCESSING A SUBSTRATE USING MULTIPLE FLUID DISTRIBTUIONS ON A POLISHING SURFACE 审中-公开
标题翻译：在抛光表面处理使用多种流体分布的基板的方法
公开(公告)号：US20080038998A1
公开(公告)日：2008-02-14
申请号：US11876202
申请日：2007-10-22
申请人： Alexander Polyak , Avi Tepman
发明人： Alexander Polyak , Avi Tepman
IPC分类号： B24B7/04
CPC分类号： B24B37/04 , B24B37/042 , B24B57/02
摘要： A polishing fluid delivery apparatus has been provided that in one embodiment includes a support member, a dispense arm, a polishing fluid delivery tube and a variable restricting device. The dispense arm extends from an upper portion of the support member and has an outlet of the delivery tube coupled thereto. The restricting device interfaces with the delivery tube and is adapted to provide a variable restriction to flow passing through the delivery tube. In another embodiment, the restricting device is a pinch valve and the tube in continuous from the outlet to beyond a portion that interfaces with the pinch valve. In yet another embodiment, the position of the dispense arm is controllable.
摘要翻译：已经提供了一种抛光流体输送装置，其在一个实施例中包括支撑构件，分配臂，抛光流体输送管和可变限制装置。分配臂从支撑构件的上部延伸并且具有与其连接的输送管的出口。限制装置与输送管接口并且适于对通过输送管的流动提供可变的限制。在另一个实施例中，限制装置是夹管阀，并且管从出口连续到超过与夹紧阀相接合的部分。在另一个实施例中，分配臂的位置是可控的。

6. 发明申请

US20050167048A1 Pad conditioning head for CMP process 失效
标题翻译：用于CMP工艺的垫片调节头
公开(公告)号：US20050167048A1
公开(公告)日：2005-08-04
申请号：US10970365
申请日：2004-10-21
申请人： Alexander Polyak , Avi Tepman
发明人： Alexander Polyak , Avi Tepman
IPC分类号： B24B37/04 , B24B53/007 , H01L21/3105 , C23F1/00
CPC分类号： B24B53/017 , H01L21/31053
摘要： In a first aspect, a first apparatus is provided for a chemical mechanical polishing (CMP) process. The first apparatus includes (1) a rotatable member; (2) an end effector adapted to receive and retain a conditioning disk; and (3) an elastic device disposed between the rotatable member and the end effector. The elastic device is (a) adapted to rotate the end effector via a torque from the rotatable member, and (b) flexibly extensible so as to impart a force to the end effector while permitting the end effector to deviate from a perpendicular alignment with the rotatable member in order for a conditioning surface of the conditioning disk to conform to an irregular polishing surface of a pad being conditioned. Numerous other aspects are provided, including methods and apparatus for using liquid or gas to deter polishing slurry or debris from entering the conditioning head.
摘要翻译：在第一方面，提供了用于化学机械抛光（CMP）工艺的第一设备。第一装置包括（1）可旋转构件; （2）适于接收和保持调节盘的端部执行器; 和（3）设置在可旋转构件和末端执行器之间的弹性装置。弹性装置是（a）适于通过来自可旋转构件的扭矩旋转末端执行器，以及（b）柔性可伸展的，以便向末端执行器施加力，同时允许末端执行器偏离与可旋转构件，以便调节盘的调节表面与被调节的垫的不规则抛光表面相一致。提供了许多其它方面，包括使用液体或气体来阻止抛光浆料或碎屑进入调节头的方法和装置。

7. 发明申请

US20050087212A1 Scrubber box and methods for using the same 有权
标题翻译：洗涤箱和使用方法
公开(公告)号：US20050087212A1
公开(公告)日：2005-04-28
申请号：US10976012
申请日：2004-10-28
申请人： Joseph Yudovsky , Avi Tepman , Kenneth Reynolds , Younes Achkire , Dan Marohl , Steve Ghanayem , Alexander Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
发明人： Joseph Yudovsky , Avi Tepman , Kenneth Reynolds , Younes Achkire , Dan Marohl , Steve Ghanayem , Alexander Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
IPC分类号： B08B1/04 , H01L21/00
CPC分类号： H01L21/67046 , B08B1/04
摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.
摘要翻译：提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度刷子

8. 发明授权

US5207510A Linear ball bearing assembly 失效
标题翻译：直线球轴承总成
公开(公告)号：US5207510A
公开(公告)日：1993-05-04
申请号：US750954
申请日：1991-08-28
申请人： Alexander Polyak
发明人： Alexander Polyak
IPC分类号： F16C29/06
CPC分类号： F16C29/0678
摘要： An antifriction linear ball bearing assembly comprises a trihedral cassette (10) with flats (24, 26, and 28), and a central opening for rigidly holding a cylindrical shaft. The cassette (10) has flats which each contain a closed raceway circuit (36) having an elliptical shape. The raceway circuit is filled with bearing balls (14), kept within their track by a ball retainer (12). When the bearing assembly and the shaft, mounted into it, are translated inside an outer sleeve, the bearing balls (14) circulate within the raceway circuits, thus allowing smooth longitudinal movement of the shaft and ensuring uniform wear of the contact surfaces. The linear ball bearing assembly can be applied to mechanisms, such as a motion transmitting device or a feedthrough apparatus, where a shaft supported by antifriction bearings must longitudinally translate inside a hollow outer housing.
摘要翻译：减摩线性球轴承组件包括具有平面（24,26和28）的三面体盒（10）和用于刚性地保持圆柱形轴的中心开口。盒（10）具有平面，每个平面包含具有椭圆形形状的封闭的滚道回路（36）。滚道回路充满轴承球（14），通过球保持器（12）保持在其轨道内。当轴承组件和安装在其中的轴在外套筒中平移时，轴承滚珠（14）在滚道回路内循环，从而允许轴的平滑纵向移动并确保接触表面的均匀磨损。线性球轴承组件可以应用于诸如运动传递装置或馈通装置的机构，其中由减摩轴承支撑的轴必须在中空外壳内纵向平移。

9. 发明授权

US5139383A Device for positioning objects within a sealed chamber 失效
标题翻译：用于将物体定位在密封室内的装置
公开(公告)号：US5139383A
公开(公告)日：1992-08-18
申请号：US734473
申请日：1991-07-23
申请人： Alexander Polyak , Thu Huynh
发明人： Alexander Polyak , Thu Huynh
IPC分类号： H01J37/20 , H01L21/68
CPC分类号： H01J37/20 , H01L21/68 , H01J2237/20257 , Y10S403/01 , Y10T464/30 , Y10T74/18992
摘要： A device for positioning objects within a sealed vacuum chamber (112) comprises a stationay housing (114), which is sealingly attached to the vacuum chamber (112). Located within the housing (114) is a tubular body (158) capable of rotating and translating within the stationary housing (114) through the interaction of an outer magnet (116), which slides and rotates on the surface of the stationary housing, and an inner magnet (118), which is attached to the tubular body (158). A shaft (198) is located inside the tubular body, but cannot be shifted axially with respect to this body. The front end of shaft (198) extends into the vacuum chamber (112) and may carry a specimen or any other object to be treated or tested in the vacuum chamber. The shaft (198) is driven from an external drive mechanism (124). Rotation of the shaft can be converted into opening and closing movements of the jaws (218 and 220). Thus, the object can be clamped by the jaws, rotated, and linearly moved inside a sealed chamber under the control of external drive means.
摘要翻译：一种用于将物体定位在密封真空室（112）内的装置包括一个与真空室（112）密封连接的台架壳体（114）。位于壳体（114）内部的管状体（158）能够通过在固定壳体的表面上滑动并旋转的外部磁体（116）的相互作用而在固定壳体（114）内旋转和平移，并且内部磁体（118），其连接到管状体（158）上。轴（198）位于管状体内部，但不能相对于本体轴向移动。轴（198）的前端延伸到真空室（112）中，并且可以携带在真空室中待处理或测试的样品或任何其它物体。轴（198）从外部驱动机构（124）驱动。轴的旋转可以转换成夹爪（218和220）的打开和关闭运动。因此，物体可以在外部驱动装置的控制下被夹爪夹持，在密封室内旋转和线性移动。

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