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1. 发明申请

US20110117333A1 NEGATIVE PHOTOSENSITIVE COMPOSITION, PARTITION WALLS FOR OPTICAL DEVICE USING IT AND OPTICAL DEVICE HAVING THE PARTITION WALLS 有权
标题翻译：负离子光敏组合物，使用其和具有分隔壁的光学装置的光学装置的分界面
公开(公告)号：US20110117333A1
公开(公告)日：2011-05-19
申请号：US13012939
申请日：2011-01-25
申请人： Yutaka FURUKAWA
发明人： Yutaka FURUKAWA
IPC分类号： G03F7/004 , G03F7/20 , B32B3/10
CPC分类号： G03F7/0757 , G02B5/201 , G02B5/223 , G02F1/133516 , G02F1/13439 , G03F7/0007 , G03F7/0046 , H01L27/3246 , H01L27/3283 , H01L51/0005 , Y10T428/24802
摘要： To provide a negative photosensitive composition applicable to preparation of partition walls which can maintain excellent ink repellency even after ink affinity-imparting treatment, and partition walls for an optical device using such a composition.A negative photosensitive composition comprising the following ink repellent (A) in an amount of from 0.01 to 10 mass % to the total amount, a photosensitive resin (B) having an acidic group and an ethylenic double bond in one molecule, and a photopolymerization initiator (C), and partition walls for an optical device using such a composition: Ink repellent (A): a hydrolyzed condensate of at least three hydrolyzable silane compounds, the three hydrolyzable silane compounds respectively selected from a trifunctional hydrolyzable silane compound having a C3-10 perfluoroalkyl group which may contain an etheric oxygen atom, a bi- to tetrafunctional hydrolyzable silane compound, and a bi- or trifunctional hydrolyzable silane compound having a (meth)acryloyl group, which has a fluorine atom content of from 10 to 55 mass %.
摘要翻译：为了提供适用于制备分隔壁的负型感光性组合物，即使在赋予油墨亲和力的处理之后也能够保持优异的拒墨性，以及使用这种组合物的光学装置的分隔壁。包含相对于总量为0.01〜10质量％的以下拒墨剂（A）的负型感光性组合物，1分子中具有酸性基团和烯属双键的感光性树脂（B）和光聚合引发剂（C）和使用这种组合物的光学装置的分隔壁：防墨水（A）：至少三种可水解硅烷化合物的水解缩合物，分别选自三官能可水解硅烷化合物的三种可水解硅烷化合物，其具有C3- 10个可以含有醚性氧原子的全氟烷基，双官能的水解性硅烷化合物和具有10〜55质量％的氟原子含量的具有（甲基）丙烯酰基的双官能或三官能的水解性硅烷化合物，。

2. 发明申请

US20100196702A9 TREATED SUBSTRATE HAVING HYDROPHILIC REGION AND WATER REPELLENT REGION, AND PROCESS FOR PRODUCING IT 失效
标题翻译：具有水文地区和水域的处理基底及其生产工艺
公开(公告)号：US20100196702A9
公开(公告)日：2010-08-05
申请号：US12204847
申请日：2008-09-05
申请人： Yutaka FURUKAWA
发明人： Yutaka FURUKAWA
IPC分类号： B32B33/00 , B32B27/00 , C08F2/48 , B05D5/00
CPC分类号： H01L21/02118 , G03F7/027 , G03F7/0755 , G03F7/0757 , H01L21/312 , Y10T428/265 , Y10T428/3154 , Y10T428/31663 , Y10T428/31667
摘要： To provide a treated substrate having a hydrophilic region and a water repellent region, of which contrast is high on its surface. Further, to provide a process for producing a treated substrate, wherein a specific equipment, light having a high energy or light irradiation for a long time is not required, and the treated substrate can be produced with a low amount of light for a short time.A treated substrate having a hydrophilic region and a water repellent region on a surface of a substrate, characterized in that the water repellent region is made of a water repellent film formed by curing the composition (A) comprising a photopolymerization initiator and a compound (a) having at least one (meth)acryloyl group, and a water repellent moiety and having a film thickness of from 0.1 to 100 nm. A process for producing a treated substrate, characterized by using a hydrophilic substrate or carrying out a hydrophilic treatment on a surface of a substrate to make the surface hydrophilic, then forming a film containing the composition (A) on the surface, then forming a water repellent film having a film thickness of from 0.1 to 100 nm by irradiating light on a part of the film surface to cure the composition (A) and then removing an uncured composition (A) present on the surface of the substrate in order to expose the hydrophilic surface.
摘要翻译：提供具有亲水区域和防水区域的处理过的基材，其表面上的对比度高。此外，为了提供一种处理基板的制造方法，其中特定的设备，不需要长时间的高能量或光照射的光，并且可以在短时间内以少量的光生产处理过的基板。一种在基材表面上具有亲水区域和防水区域的处理过的基材，其特征在于，所述防水区域由通过固化包含光聚合引发剂和化合物（a）的组合物（A）而形成的防水膜制成，）具有至少一个（甲基）丙烯酰基和斥水性部分，并且膜厚度为0.1-100nm。一种处理基材的制造方法，其特征在于，在基材表面使用亲水性基材或进行亲水处理，使表面亲水，然后在表面上形成含有组合物（A）的膜，然后形成水通过在膜表面的一部分上照射光来固化组合物（A），然后除去存在于基材表面上的未固化组合物（A），以使曝光的膜的厚度为0.1至100nm的防水膜亲水表面。

3. 发明申请

US20090011227A1 TREATED SUBSTRATE HAVING HYDROPHILIC REGION AND WATER REPELLENT REGION, AND PROCESS FOR PRODUCING IT 失效
标题翻译：具有水文地区和水域的处理基底及其生产工艺
公开(公告)号：US20090011227A1
公开(公告)日：2009-01-08
申请号：US12204847
申请日：2008-09-05
申请人： Yutaka FURUKAWA
发明人： Yutaka FURUKAWA
IPC分类号： B32B33/00 , B32B27/00 , C08F2/48 , B05D5/00
CPC分类号： H01L21/02118 , G03F7/027 , G03F7/0755 , G03F7/0757 , H01L21/312 , Y10T428/265 , Y10T428/3154 , Y10T428/31663 , Y10T428/31667
摘要： To provide a treated substrate having a hydrophilic region and a water repellent region, of which contrast is high on its surface. Further, to provide a process for producing a treated substrate, wherein a specific equipment, light having a high energy or light irradiation for a long time is not required, and the treated substrate can be produced with a low amount of light for a short time.A treated substrate having a hydrophilic region and a water repellent region on a surface of a substrate, characterized in that the water repellent region is made of a water repellent film formed by curing the composition (A) comprising a photopolymerization initiator and a compound (a) having at least one (meth)acryloyl group, and a water repellent moiety and having a film thickness of from 0.1 to 100 nm. A process for producing a treated substrate, characterized by using a hydrophilic substrate or carrying out a hydrophilic treatment on a surface of a substrate to make the surface hydrophilic, then forming a film containing the composition (A) on the surface, then forming a water repellent film having a film thickness of from 0.1 to 100 nm by irradiating light on a part of the film surface to cure the composition (A) and then removing an uncured composition (A) present on the surface of the substrate in order to expose the hydrophilic surface.
摘要翻译：提供具有亲水区域和防水区域的处理过的基材，其表面上的对比度高。此外，为了提供一种处理基板的制造方法，其中特定的设备，不需要长时间的高能量或光照射的光，并且可以在短时间内以少量的光生产处理过的基板。一种在基材表面上具有亲水区域和防水区域的处理过的基材，其特征在于，所述防水区域由通过固化包含光聚合引发剂和化合物（a）的组合物（A）而形成的防水膜制成，）具有至少一个（甲基）丙烯酰基和斥水性部分，并且膜厚度为0.1-100nm。一种处理基材的制造方法，其特征在于，在基材表面使用亲水性基材或进行亲水处理，使表面亲水，然后在表面上形成含有组合物（A）的膜，然后形成水通过在膜表面的一部分上照射光来固化组合物（A），然后除去存在于基材表面上的未固化组合物（A），以使曝光的膜的厚度为0.1至100nm的防水膜亲水表面。

4. 发明授权

US07393515B2 Fluorinated compound, water repellent composition and thin film 失效
标题翻译：氟化合物，防水组合物和薄膜
公开(公告)号：US07393515B2
公开(公告)日：2008-07-01
申请号：US11446200
申请日：2006-06-05
申请人： Taiki Hoshino , Yutaka Furukawa , Takashi Okazoe
发明人： Taiki Hoshino , Yutaka Furukawa , Takashi Okazoe
IPC分类号： B01J3/06 , C07F7/04
CPC分类号： B82Y10/00 , B82Y40/00 , C07F7/1804 , G03F7/0002 , G03F7/0045 , G03F7/0046
摘要： To provide a fluorinated compound, which can readily form a thin film having a hydrophobic/hydrophilic pattern, by employing an ultraviolet light having a relatively low energy.A thin film having a hydrophobic/hydrophilic pattern is formed by irradiating a thin film formed by employing a fluorinated compound represented by the following formula 1 (in the formula 1, each of R1, R2, R3 and R4 which are independent of one another, is a hydrogen atom, a halogen atom or a monovalent organic group, provided that at least one of them is a monovalent organic group having fluorine atoms, and R5 is a hydrogen atom or a monovalent organic group, R6 is a monovalent organic group, and A is a hetero atom) with ultraviolet light
摘要翻译：为了提供能够容易地形成具有疏水/亲水图案的薄膜的氟化化合物，通过使用具有较低能量的紫外光。通过照射通过使用由下式1表示的氟化化合物形成的薄膜来形成具有疏水/亲水图案的薄膜（在式1中，R 1，R 2， 2个，R 3和R 4彼此独立的是氢原子，卤素原子或一价有机基团，条件是至少其中一个是具有氟原子的一价有机基团，R 5是氢原子或一价有机基团，R 6是一价有机基团，A是一个杂原子）与紫外线

5. 发明申请

US20050113609A1 Fluorine-containing unsaturated compound and method for its production 审中-公开
标题翻译：含氟不饱和化合物及其制备方法
公开(公告)号：US20050113609A1
公开(公告)日：2005-05-26
申请号：US11026012
申请日：2005-01-03
申请人： Yutaka Furukawa
发明人： Yutaka Furukawa
IPC分类号： C07C43/17 , C07C41/00
CPC分类号： C07C43/17
摘要： A novel fluorine-containing unsaturated compound and a method for its production. A fluorine-containing unsaturated compound represented by R1CY1HCY2Y3OQ1CH═CH2 or CH2═CHQ2OCZ1Z2CZ3HR2CZ4HCZ5Z6OQ2CH═CH2 (wherein R1 is a monovalent fluorine containing organic group, etc., R2 is a bivalent fluorine containing organic group, etc., Y1 to Y3 and Z1 to Z6 are fluorine atoms, and Q1 and Q2 are alkylene groups, etc.). A method for producing a fluorine-containing unsaturated compound having a group represented by —CX1HCX2X3OQCH═CH2 (wherein X1 to X3 are fluorine atoms, and Q is an alkylene group, etc.), which comprises reacting a compound having —CX1═CX2X3 with HOQCH═CH2 in the presence of an alkali metal compound.
摘要翻译：一种新型含氟不饱和化合物及其制备方法。由R 1表示的含氟不饱和化合物1 CH 2 CH 2或CH 2 -CHQ 2 O 2 ZZZ 2 O 2 / SUP> CZ 3 2 > 2 CH-CH 2（其中R 1是一价含氟有机基团等，R 2是二价含氟有机基团等，Y 1至Y 3和Z 1至Z 6均为氟原子，Q 1和Q 2是亚烷基等）。一种具有由-CX 1 -OXCH 2 O 3 OQCH-CH 2表示的基团的含氟不饱和化合物的制备方法（其中X 1至X 3是氟原子，Q是亚烷基等），其包括使具有-CX 3 3。

6. 发明授权

US06448428B1 Fluorine-containing organic silicon compound and method for its production 失效
标题翻译：含氟有机硅化合物及其制备方法
公开(公告)号：US06448428B1
公开(公告)日：2002-09-10
申请号：US10002140
申请日：2001-12-05
申请人： Yutaka Furukawa , Takashige Yoneda
发明人： Yutaka Furukawa , Takashige Yoneda
IPC分类号： C07F708
CPC分类号： C07F7/0836 , C09K3/18
摘要： A fluorine-containing organic silicon compound represented by the following formula (1): (1) provided that the symbols in the formula (1) have the following meanings: R1 and R2: respectively independently monovalent hydrocarbon groups; Af: a group represented by the following formula (2), (3), (4) or (5): A1—X1— (2) A2—X2—O—X1— (3) A1—X2—O—X1— (4) A2—X1— (5) provided that the symbols in the formulae (2), (3), (4) and (5) have the following meanings: A1: a monovalent polyfluorohydrocarbon group; A2: a monovalent polyfluorohydrocarbon group containing an etheric oxygen atom; X1: —(CH2)a— (a is an integer of at least 3); X2: a bivalent hydrocarbon group.
摘要翻译：由下式（1）表示的含氟有机硅化合物：式（1）中的符号具有以下含义：R 1和R 2分别独立地为一价烃基; Af：由下式式（2），（3），（4）或（5）：式（2），（3），（4）和（5）中的符号具有下列含义：A1：一价多氟烃基; A2：含有醚性氧原子的一价多氟烃基; X1： - （CH2）a-（a为3以上的整数）; X2为二价烃基。

7. 发明授权

US5568239A Stainproofing oil for a heat fixing roller 失效
标题翻译：用于热定影辊的防油
公开(公告)号：US5568239A
公开(公告)日：1996-10-22
申请号：US412221
申请日：1995-03-27
申请人： Yutaka Furukawa , Seisaku Kumai , Mami Yoshino
发明人： Yutaka Furukawa , Seisaku Kumai , Mami Yoshino
IPC分类号： C09K3/00 , C08G77/24 , C10M107/50 , G03G15/20
CPC分类号： C08G77/24 , G03G15/2025 , G03G2215/2093 , Y10S118/01
摘要： A stainproofing oil for a heat fixing roller, which consists essentially of a fluorosilicone compound having a silicon atom to which a monovalent fluorine-containing group selected from the formulae (1) to (3) is bonded:R.sub.f.sup.1 --X.sup.1 -- (1)R.sub.f.sup.2 --X.sup.2 --O--X.sup.3 -- (2)R.sub.f.sup.3 --X.sup.4 --O--X.sup.5 -- (3)wherein R.sub.f.sup.1 is a monovalent polyfluorohydrocarbon group, R.sub.f.sup.2 is a monovalent polyfluoroalkyl group containing an ether oxygen atom, R.sub.f.sup.3 is a monovalent polyfluorohydrocarbon group, and each of X.sup.1 to X.sup.5 independently is a bivalent hydrocarbon group.
摘要翻译：用于热定影辊的防污油，其基本上由具有选自式（1）至（3）的一价含氟基团的具有硅原子的氟硅氧烷化合物组成：Rf1-X1-（1）Rf2 -X2-O-X3-（2）Rf3-X4-O-X5-（3）其中Rf1是一价多氟烃基，Rf2是含有醚氧原子的一价多氟烷基，Rf3是一价多氟烃基， X1〜X5独立地为二价烃基。

8. 发明授权

US08338502B2 Polymerizable fluorine-containing compound and treated substrate having a hydrophilic region and a water repellent region 失效
标题翻译：可聚合的含氟化合物和具有亲水区域和拒水区域的处理过的基材
公开(公告)号：US08338502B2
公开(公告)日：2012-12-25
申请号：US12365970
申请日：2009-02-05
申请人： Taiki Hoshino , Yutaka Furukawa
发明人： Taiki Hoshino , Yutaka Furukawa
IPC分类号： C08G18/67 , C08G61/00 , C08F2/46 , B05D3/02 , B41M5/00 , C07C55/36
CPC分类号： C07C69/708 , Y10T428/24802 , Y10T428/265 , Y10T442/2189
摘要： To provide a polymerizable fluorine-containing compound useful for producing a treated substrate having a hydrophilic region and a water repellent region, of which the contrast is high on its surface, without requiring a special apparatus, high energy light, or irradiation with light for a long time.A polymerizable fluorine-containing compound, which is a derivative of a polyhydric alcohol and comprises at least one following structure (A) and at least one following structure (B) in its molecule: structure (A): a structure wherein a compound having a fluoroalkyl group and a carboxyl group is bonded to one hydroxyl group of a polyhydric alcohol by an ester linkage, structure (B): a structure wherein a compound having an ethylenic double bond and a carboxyl group is bonded to one hydroxyl group of a polyhydric alcohol by an ester linkage or a structure wherein a compound having an ethylenic double bond and an isocyanate group is bonded to one hydroxyl group of a polyhydric alcohol by a urethane bond.
摘要翻译：为了提供可用于制备具有亲水区域和防水区域的处理基材的可聚合含氟化合物，其表面上的对比度高，而不需要特殊装置，高能量光或用于光的照射长时间。一种可聚合的含氟化合物，其是多元醇的衍生物，其分子中包含至少一种以下结构（A）和至少一种以下结构（B）：结构（A）：其中具有氟烷基和羧基通过酯键与多元醇的一个羟基键合，结构（B）：其中具有烯键式双键和羧基的化合物与多元醇的一个羟基键合的结构通过酯键或其中具有烯属双键和异氰酸酯基的化合物通过氨基甲酸酯键与多元醇的一个羟基键合的结构。

9. 发明授权

US5914422A Method for producing fluorine-containing silicone compound 失效
标题翻译：含氟硅氧烷化合物的制造方法
公开(公告)号：US5914422A
公开(公告)日：1999-06-22
申请号：US966482
申请日：1997-11-07
申请人： Yutaka Furukawa , Mami Kotera , Seisaku Kumai , Kazuya Oharu , Toshihiko Toma
发明人： Yutaka Furukawa , Mami Kotera , Seisaku Kumai , Kazuya Oharu , Toshihiko Toma
IPC分类号： C08G77/385 , C07F7/08
CPC分类号： C08G77/385
摘要： A method for producing a fluorine-containing silicone compound, which comprises subjecting a compound of the following formula (I) and a hydrosilicone compound having at least one hydrogen atom bonded to a silicon atom to hydrosilylation to obtain a fluorine-containing silicone compound having a R.sup.f --Q--CR.sup.1 R.sup.2 CR.sup.3 HCR.sup.4 R.sup.5 -- group bonded to the silicon atom:R.sup.f --Q--CR.sup.1 R.sup.2 CR.sup.3 .dbd.CR.sup.4 R.sup.5(I)wherein R.sup.f is a monovalent fluorine-containing organic group, Q is a single bond or a bivalent organic group containing no fluorine atom, and each of R.sup.1 to R.sup.5 which are independent of one another, is a hydrogen atom or a monovalent organic group.
摘要翻译：一种含氟硅氧烷化合物的制造方法，其特征在于，使下述式（I）的化合物与具有至少一个与硅原子键合的氢原子的氢硅氧烷化合物进行氢化硅烷化，得到具有 Rf-Q-CR1R2CR3HCR4R5-键合到硅原子上：Rf-Q-CR1R2CR3 = CR4R5（Ⅰ）其中Rf是一价含氟有机基团，Q是单键或不含氟原子的二价有机基团，和彼此独立的R 1至R 5中的每一个为氢原子或一价有机基团。

10. 发明授权

US5834612A Fluorine-containing organic compound 失效
标题翻译：含氟有机化合物
公开(公告)号：US5834612A
公开(公告)日：1998-11-10
申请号：US855947
申请日：1997-05-14
申请人： Yutaka Furukawa , Seisaku Kumai , Jeffery A. Cooke , Gerald J. Murphy , George A. Policello
发明人： Yutaka Furukawa , Seisaku Kumai , Jeffery A. Cooke , Gerald J. Murphy , George A. Policello
IPC分类号： C07C43/17 , C08G77/385 , C07F7/08
CPC分类号： C07C43/17 , C08G77/385
摘要： A fluorine-containing organic compound of the following formula (1): R.sup.f CH.sub.2 CH.sub.2 CH.sub.2 OCH.sub.2 CH.dbd.CH.sub.2 ( 1) wherein R.sup.f is a C.sub.1-20 fluoroalkyl group.
摘要翻译：下式（1）的含氟有机化合物：RfCH2CH2CH2OCH2CH = CH2（1）其中Rf是C1-20氟代烷基。

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