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1. 发明申请

US20110081501A1 TREATED SUBSTRATE HAVING HYDROPHILIC REGION AND WATER REPELLENT REGION, AND PROCESS FOR PRODUCING IT 审中-公开
标题翻译：具有水文地区和水域的处理基底及其生产工艺
公开(公告)号：US20110081501A1
公开(公告)日：2011-04-07
申请号：US12966105
申请日：2010-12-13
申请人： Yutaka FURUKAWA
发明人： Yutaka FURUKAWA
IPC分类号： B05D3/06 , B05D5/00
CPC分类号： H01L21/02118 , G03F7/027 , G03F7/0755 , G03F7/0757 , H01L21/312 , Y10T428/265 , Y10T428/3154 , Y10T428/31663 , Y10T428/31667
摘要： A treated substrate having a hydrophilic region and a water repellent region, of which contrast is high on its surface; a process for producing a treated substrate, wherein the treated substrate can be produced with a low amount of light for a short time; wherein the water repellent region is made of a water repellent film formed by curing the composition (A) comprising a photopolymerization initiator and a compound (a) having at least one (meth)acryloyl group, and a water repellent moiety and having a film thickness of from 0.1 to 100 nm; the process uses a hydrophilic substrate or makes the surface thereof hydrophilic, then forms a film containing the composition (A) on the surface, then forms said water repellent film by irradiating light on a part of the film surface to cure the composition (A) and then removes an uncured composition (A) present thereon in order to expose the hydrophilic surface.
摘要翻译：具有亲水区域和防水区域的处理过的基材，其表面上的对比度高; 处理过的基板的制造方法，其中处理过的基板能够在短时间内以少量的光生产; 其特征在于，所述防水区域由通过固化包含光聚合引发剂的组合物（A）和具有至少一个（甲基）丙烯酰基的化合物（a）和防水部分而形成的防水膜形成，并具有膜厚度为0.1〜100nm; 该方法使用亲水基材或使其表面亲水，然后在表面上形成含有组合物（A）的薄膜，然后通过在薄膜表面的一部分上照射光来形成所述防水薄膜以固化组合物（A）然后除去其上存在的未固化组合物（A）以露出亲水表面。

2. 发明申请

US20090317608A1 TREATED SUBSTRATE HAVING PATTERN OF WATER REPELLENT REGION, ITS PRODUCTION PROCESS, AND PROCESS FOR PRODUCING MEMBER HAVING PATTERN MADE OF FUNCTIONAL MATERIAL FILM FORMED 审中-公开
标题翻译：具有造水区域图案的处理基板及其生产工艺，以及生产具有形成功能材料薄膜图案的构件的工艺
公开(公告)号：US20090317608A1
公开(公告)日：2009-12-24
申请号：US12551863
申请日：2009-09-01
申请人： Yutaka FURUKAWA
发明人： Yutaka FURUKAWA
IPC分类号： B32B3/10 , B05D3/14 , B05D3/06
CPC分类号： G03F7/0757 , G03F7/40 , Y10T428/24802
摘要： To provide a treated substrate having a high contrast water repellent region on its surface, and a process for producing it.A treated substrate having a pattern of a water repellent region on a surface of a substrate, characterized in that the water repellent region is made of a water repellent cured film obtained by curing a curable composition containing an organopolysiloxane (A1) having hydrogen atoms bonded to silicon atoms and a photocurable group, or an organopolysiloxane (A2) having hydrogen atoms bonded to silicon atoms and having no photocurable group and a compound (B) having a photocurable group, and further optionally containing a photocuring-accelerating compound (C).
摘要翻译：提供其表面上具有高对比度防水区域的处理过的基材及其制造方法。在基材表面具有防水区域图案的被处理基材，其特征在于，所述防水区域由将含有氢原子键合的有机聚硅氧烷（A1）固化的固化性组合物固化而得到的防水性固化膜硅原子和光固化性基团，或具有与硅原子键合而不具有光固化性基团的有机聚硅氧烷（A2）和具有光固化性基团的化合物（B），进一步含有光固化促进化合物（C）。

3. 发明申请

US20110001849A1 IMAGING APPARATUS, FLASH DETERMINATION METHOD, AND RECORDING MEDIUM 有权
标题翻译：成像设备，闪光测定方法和记录介质
公开(公告)号：US20110001849A1
公开(公告)日：2011-01-06
申请号：US12828595
申请日：2010-07-01
申请人： Noriaki WADA , Yutaka FURUKAWA
发明人： Noriaki WADA , Yutaka FURUKAWA
IPC分类号： H04N5/217
CPC分类号： H04N5/2354 , H04N5/2353 , H04N5/3532
摘要： An imaging apparatus capable of increasing the accuracy of detection of an outside flash of light.The imaging apparatus includes an imaging unit that sequentially captures images using a CMOS-type image sensor, and a flash determination unit that determines the presence/absence of a flash based on the images captured by the imaging unit. The flash determination unit monitors an amount of change in the average luminance level of a predetermined region in the lower area of the screen in the images captured by the imaging unit, and determines the presence/absence of a flash based on the amount of change in the average luminance level.
摘要翻译：能够提高外部闪光灯的检测精度的摄像装置。成像装置包括使用CMOS型图像传感器顺序地拍摄图像的成像单元和基于由成像单元拍摄的图像来确定闪光的存在/不存在的闪光确定单元。闪光确定单元监视由成像单元拍摄的图像中的屏幕的下部区域中的预定区域的平均亮度水平的变化量，并且基于变化量来确定闪光的存在/不存在平均亮度级别。

4. 发明申请

US20110117333A1 NEGATIVE PHOTOSENSITIVE COMPOSITION, PARTITION WALLS FOR OPTICAL DEVICE USING IT AND OPTICAL DEVICE HAVING THE PARTITION WALLS 有权
标题翻译：负离子光敏组合物，使用其和具有分隔壁的光学装置的光学装置的分界面
公开(公告)号：US20110117333A1
公开(公告)日：2011-05-19
申请号：US13012939
申请日：2011-01-25
申请人： Yutaka FURUKAWA
发明人： Yutaka FURUKAWA
IPC分类号： G03F7/004 , G03F7/20 , B32B3/10
CPC分类号： G03F7/0757 , G02B5/201 , G02B5/223 , G02F1/133516 , G02F1/13439 , G03F7/0007 , G03F7/0046 , H01L27/3246 , H01L27/3283 , H01L51/0005 , Y10T428/24802
摘要： To provide a negative photosensitive composition applicable to preparation of partition walls which can maintain excellent ink repellency even after ink affinity-imparting treatment, and partition walls for an optical device using such a composition.A negative photosensitive composition comprising the following ink repellent (A) in an amount of from 0.01 to 10 mass % to the total amount, a photosensitive resin (B) having an acidic group and an ethylenic double bond in one molecule, and a photopolymerization initiator (C), and partition walls for an optical device using such a composition: Ink repellent (A): a hydrolyzed condensate of at least three hydrolyzable silane compounds, the three hydrolyzable silane compounds respectively selected from a trifunctional hydrolyzable silane compound having a C3-10 perfluoroalkyl group which may contain an etheric oxygen atom, a bi- to tetrafunctional hydrolyzable silane compound, and a bi- or trifunctional hydrolyzable silane compound having a (meth)acryloyl group, which has a fluorine atom content of from 10 to 55 mass %.
摘要翻译：为了提供适用于制备分隔壁的负型感光性组合物，即使在赋予油墨亲和力的处理之后也能够保持优异的拒墨性，以及使用这种组合物的光学装置的分隔壁。包含相对于总量为0.01〜10质量％的以下拒墨剂（A）的负型感光性组合物，1分子中具有酸性基团和烯属双键的感光性树脂（B）和光聚合引发剂（C）和使用这种组合物的光学装置的分隔壁：防墨水（A）：至少三种可水解硅烷化合物的水解缩合物，分别选自三官能可水解硅烷化合物的三种可水解硅烷化合物，其具有C3- 10个可以含有醚性氧原子的全氟烷基，双官能的水解性硅烷化合物和具有10〜55质量％的氟原子含量的具有（甲基）丙烯酰基的双官能或三官能的水解性硅烷化合物，。

5. 发明申请

US20100196702A9 TREATED SUBSTRATE HAVING HYDROPHILIC REGION AND WATER REPELLENT REGION, AND PROCESS FOR PRODUCING IT 失效
标题翻译：具有水文地区和水域的处理基底及其生产工艺
公开(公告)号：US20100196702A9
公开(公告)日：2010-08-05
申请号：US12204847
申请日：2008-09-05
申请人： Yutaka FURUKAWA
发明人： Yutaka FURUKAWA
IPC分类号： B32B33/00 , B32B27/00 , C08F2/48 , B05D5/00
CPC分类号： H01L21/02118 , G03F7/027 , G03F7/0755 , G03F7/0757 , H01L21/312 , Y10T428/265 , Y10T428/3154 , Y10T428/31663 , Y10T428/31667
摘要： To provide a treated substrate having a hydrophilic region and a water repellent region, of which contrast is high on its surface. Further, to provide a process for producing a treated substrate, wherein a specific equipment, light having a high energy or light irradiation for a long time is not required, and the treated substrate can be produced with a low amount of light for a short time.A treated substrate having a hydrophilic region and a water repellent region on a surface of a substrate, characterized in that the water repellent region is made of a water repellent film formed by curing the composition (A) comprising a photopolymerization initiator and a compound (a) having at least one (meth)acryloyl group, and a water repellent moiety and having a film thickness of from 0.1 to 100 nm. A process for producing a treated substrate, characterized by using a hydrophilic substrate or carrying out a hydrophilic treatment on a surface of a substrate to make the surface hydrophilic, then forming a film containing the composition (A) on the surface, then forming a water repellent film having a film thickness of from 0.1 to 100 nm by irradiating light on a part of the film surface to cure the composition (A) and then removing an uncured composition (A) present on the surface of the substrate in order to expose the hydrophilic surface.
摘要翻译：提供具有亲水区域和防水区域的处理过的基材，其表面上的对比度高。此外，为了提供一种处理基板的制造方法，其中特定的设备，不需要长时间的高能量或光照射的光，并且可以在短时间内以少量的光生产处理过的基板。一种在基材表面上具有亲水区域和防水区域的处理过的基材，其特征在于，所述防水区域由通过固化包含光聚合引发剂和化合物（a）的组合物（A）而形成的防水膜制成，）具有至少一个（甲基）丙烯酰基和斥水性部分，并且膜厚度为0.1-100nm。一种处理基材的制造方法，其特征在于，在基材表面使用亲水性基材或进行亲水处理，使表面亲水，然后在表面上形成含有组合物（A）的膜，然后形成水通过在膜表面的一部分上照射光来固化组合物（A），然后除去存在于基材表面上的未固化组合物（A），以使曝光的膜的厚度为0.1至100nm的防水膜亲水表面。

6. 发明申请

US20090011227A1 TREATED SUBSTRATE HAVING HYDROPHILIC REGION AND WATER REPELLENT REGION, AND PROCESS FOR PRODUCING IT 失效
标题翻译：具有水文地区和水域的处理基底及其生产工艺
公开(公告)号：US20090011227A1
公开(公告)日：2009-01-08
申请号：US12204847
申请日：2008-09-05
申请人： Yutaka FURUKAWA
发明人： Yutaka FURUKAWA
IPC分类号： B32B33/00 , B32B27/00 , C08F2/48 , B05D5/00
CPC分类号： H01L21/02118 , G03F7/027 , G03F7/0755 , G03F7/0757 , H01L21/312 , Y10T428/265 , Y10T428/3154 , Y10T428/31663 , Y10T428/31667
摘要： To provide a treated substrate having a hydrophilic region and a water repellent region, of which contrast is high on its surface. Further, to provide a process for producing a treated substrate, wherein a specific equipment, light having a high energy or light irradiation for a long time is not required, and the treated substrate can be produced with a low amount of light for a short time.A treated substrate having a hydrophilic region and a water repellent region on a surface of a substrate, characterized in that the water repellent region is made of a water repellent film formed by curing the composition (A) comprising a photopolymerization initiator and a compound (a) having at least one (meth)acryloyl group, and a water repellent moiety and having a film thickness of from 0.1 to 100 nm. A process for producing a treated substrate, characterized by using a hydrophilic substrate or carrying out a hydrophilic treatment on a surface of a substrate to make the surface hydrophilic, then forming a film containing the composition (A) on the surface, then forming a water repellent film having a film thickness of from 0.1 to 100 nm by irradiating light on a part of the film surface to cure the composition (A) and then removing an uncured composition (A) present on the surface of the substrate in order to expose the hydrophilic surface.
摘要翻译：提供具有亲水区域和防水区域的处理过的基材，其表面上的对比度高。此外，为了提供一种处理基板的制造方法，其中特定的设备，不需要长时间的高能量或光照射的光，并且可以在短时间内以少量的光生产处理过的基板。一种在基材表面上具有亲水区域和防水区域的处理过的基材，其特征在于，所述防水区域由通过固化包含光聚合引发剂和化合物（a）的组合物（A）而形成的防水膜制成，）具有至少一个（甲基）丙烯酰基和斥水性部分，并且膜厚度为0.1-100nm。一种处理基材的制造方法，其特征在于，在基材表面使用亲水性基材或进行亲水处理，使表面亲水，然后在表面上形成含有组合物（A）的膜，然后形成水通过在膜表面的一部分上照射光来固化组合物（A），然后除去存在于基材表面上的未固化组合物（A），以使曝光的膜的厚度为0.1至100nm的防水膜亲水表面。

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