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    • 3. 发明授权
    • Semiconductor light-emitting device
    • 半导体发光装置
    • US08729583B2
    • 2014-05-20
    • US12873670
    • 2010-09-01
    • Hiroshi KatsunoYasuo OhbaMitsuhiro KushibeKei KanekoShinji Yamada
    • Hiroshi KatsunoYasuo OhbaMitsuhiro KushibeKei KanekoShinji Yamada
    • H01L33/22
    • H01L33/382H01L33/22H01L33/405H01L2224/48091H01L2224/73265H01L2924/19107H01L2924/00014
    • According to one embodiment, a semiconductor light-emitting device includes a first semiconductor layer, a second semiconductor layer, a light-emitting layer, a third semiconductor layer and a first electrode. The first semiconductor layer of a first conductivity type has a first major surface provided with a first surface asperity. The second semiconductor layer of a second conductivity type is provided on an opposite side of the first semiconductor layer from the first major surface. The light-emitting layer is provided between the first and second semiconductor layers. The first semiconductor layer is disposed between a third semiconductor layer and the light-emitting layer. The third semiconductor layer has an impurity concentration lower than an impurity concentration of the first semiconductor layer, and includes an opening exposing the first surface asperity. The first electrode is in contact with the first surface asperity through the opening, and reflective to emission light emitted from the light-emitting layer.
    • 根据一个实施例,半导体发光器件包括第一半导体层,第二半导体层,发光层,第三半导体层和第一电极。 第一导电类型的第一半导体层具有设置有第一表面粗糙度的第一主表面。 第二导电类型的第二半导体层设置在第一半导体层与第一主表面相对的一侧上。 发光层设置在第一和第二半导体层之间。 第一半导体层设置在第三半导体层和发光层之间。 第三半导体层的杂质浓度低于第一半导体层的杂质浓度,并且包括露出第一表面粗糙度的开口。 第一电极通过开口与第一表面凹凸接触,并且反射到从发光层发射的发射光。
    • 4. 发明授权
    • Semiconductor light emitting device and wafer
    • 半导体发光器件和晶圆
    • US08692228B2
    • 2014-04-08
    • US13671578
    • 2012-11-08
    • Kei KanekoYasuo OhbaHiroshi KatsunoMitsuhiro Kushibe
    • Kei KanekoYasuo OhbaHiroshi KatsunoMitsuhiro Kushibe
    • H01L29/06
    • H01L33/0025H01L33/06H01L33/325
    • A semiconductor light emitting device includes a first layer including at least one of n-type GaN and n-type AlGaN; a second layer including Mg-containing p-type AlGaN; and a light emitting section provided between the first and second layers. The light emitting section includes barrier layers of Si-containing AlxGa1-x-yInyN (0≦x, 0≦y, x+y≦1), and a well layer provided between the barrier layers and made of GaInN or AlGaInN. The barrier layers have a nearest barrier layer nearest to the second layer among the barrier layers and a far barrier layer. The nearest barrier layer includes a first portion made of Si-containing AlxGa1-x-yInyN (0≦x, 0≦y, x+y≦1), and a second portion provided between the first portion and the second layer and made of AlxGa1-x-yInyN (0≦x, 0≦y, x+y≦1). The Si concentration in the second portion is lower than those in the first portion and in the far barrier layer.
    • 半导体发光器件包括包括n型GaN和n型AlGaN中的至少一种的第一层; 包含含Mg的p型AlGaN的第二层; 以及设置在第一层和第二层之间的发光部。 发光部分包括含Si的Al x Ga 1-x-y In y N(0&nl E; x,0&nl E; y,x + y≦̸ 1)的势垒层,以及设置在阻挡层之间并由GaInN或AlGaInN制成的阱层。 阻挡层在阻挡层和远的阻挡层之间具有最接近第二层的阻挡层。 最接近的阻挡层包括由含Si的Al x Ga 1-x-y In y N(0&nl; x,0&nl; y,x + y≦̸ 1)制成的第一部分,以及设置在第一部分和第二层之间的第二部分, Al x Ga 1-x-y In y N(0&nl E; x,0&nl E; y,x + y≦̸ 1)。 第二部分中的Si浓度低于第一部分和远侧阻挡层中的Si浓度。
    • 10. 发明授权
    • Semiconductor light emitting device and wafer
    • 半导体发光器件和晶圆
    • US08039830B2
    • 2011-10-18
    • US12505053
    • 2009-07-17
    • Kei KanekoYasuo OhbaHiroshi KatsunoMitsuhiro Kushibe
    • Kei KanekoYasuo OhbaHiroshi KatsunoMitsuhiro Kushibe
    • H01L29/06
    • H01L33/0025H01L33/06H01L33/325
    • A semiconductor light emitting device includes a first layer made of at least one of n-type GaN and n-type AlGaN; a second layer made of Mg-containing p-type AlGaN; and a light emitting section provided between the first layer and the second layer. The light emitting section included a plurality of barrier layers made of Si-containing AlxGa1-x-yInyN (0≦x, 0≦y, x+y≦1), and a well layer provided between each pair of the plurality of barrier layers and made of GaInN or AlGaInN. The plurality of barrier layers have a nearest barrier layer and a far barrier layer. The nearest barrier layer is nearest to the second layer among the plurality of barrier layers. The nearest barrier layer includes a first portion and a second portion. The first portion is made of Si-containing AlxGa1-x-yInyN (0≦x, 0≦y, x+y≦1). The second portion is provided between the first portion and the second layer and is made of AlxGa1-x-yInyN (0≦x, 0≦y, x+y≦1). The Si concentration in the second portion is lower than a Si concentration in the first portion and lower than a Si concentration in the far barrier layer.
    • 半导体发光器件包括由n型GaN和n型AlGaN中的至少一种构成的第一层; 由含Mg的p型AlGaN制成的第二层; 以及设置在第一层和第二层之间的发光部。 发光部包括由含Si的Al x Ga 1-x-y In y N(0&nl; x,0&nl; y,x + y≦̸ 1)构成的多个阻挡层,以及设置在每对多个阻挡层 并由GaInN或AlGaInN制成。 多个阻挡层具有最近的阻挡层和远的阻挡层。 最近的阻挡层最接近多个阻挡层中的第二层。 最近的阻挡层包括第一部分和第二部分。 第一部分由含Si的Al x Ga 1-x-y In y N(0&nl; x,0&nl; y,x + y≦̸ 1)制成。 第二部分设置在第一部分和第二层之间,并由Al x Ga 1-x-y In y N(0< n 1; x,0&n 1; y,x + y和n 1; 1)制成。 第二部分中的Si浓度低于第一部分中的Si浓度,并且低于远阻隔层中的Si浓度。