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    • 4. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING DEVICE AND WAFER
    • 半导体发光器件和散热器
    • US20100059734A1
    • 2010-03-11
    • US12505053
    • 2009-07-17
    • Kei KANEKOYasuo OHBAHiroshi KATSUNOMitsuhiro Kushibe
    • Kei KANEKOYasuo OHBAHiroshi KATSUNOMitsuhiro Kushibe
    • H01L33/00
    • H01L33/0025H01L33/06H01L33/325
    • A semiconductor light emitting device includes a first layer made of at least one of n-type GaN and n-type AlGaN; a second layer made of Mg-containing p-type AlGaN; and a light emitting section provided between the first layer and the second layer. The light emitting section included a plurality of barrier layers made of Si-containing AlxGa1−x−yInyN (0≦x, 0≦y, x+y≦1), and a well layer provided between each pair of the plurality of barrier layers and made of GaInN or AlGaInN. The plurality of barrier layers have a nearest barrier layer and a far barrier layer. The nearest barrier layer is nearest to the second layer among the plurality of barrier layers. The nearest barrier layer includes a first portion and a second portion. The first portion is made of Si-containing AlxGa1−x−yInyN (0≦x, 0≦y, x+y≦1). The second portion is provided between the first portion and the second layer and is made of AlxGa1−x−yInyN (0≦x, 0≦y, x+y≦1). The Si concentration in the second portion is lower than a Si concentration in the first portion and lower than a Si concentration in the far barrier layer.
    • 半导体发光器件包括由n型GaN和n型AlGaN中的至少一种构成的第一层; 由含Mg的p型AlGaN制成的第二层; 以及设置在第一层和第二层之间的发光部。 发光部包括由含Si的Al x Ga 1-x-y In y N(0&nl; x,0&nl; y,x + y≦̸ 1)构成的多个阻挡层,以及设置在每对多个阻挡层 并由GaInN或AlGaInN制成。 多个阻挡层具有最近的阻挡层和远的阻挡层。 最近的阻挡层最接近多个阻挡层中的第二层。 最近的阻挡层包括第一部分和第二部分。 第一部分由含Si的Al x Ga 1-x-y In y N(0&nl; x,0&nl; y,x + y≦̸ 1)制成。 第二部分设置在第一部分和第二层之间,并由Al x Ga 1-x-y In y N(0< n 1; x,0&n 1; y,x + y和n 1; 1)制成。 第二部分中的Si浓度低于第一部分中的Si浓度,并且低于远阻隔层中的Si浓度。