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1. 发明申请

WO2012041459A2 IMAGING OPTICAL SYSTEM FOR MICROLITHOGRAPHY 审中-公开
标题翻译：成像光学系统
公开(公告)号：WO2012041459A2
公开(公告)日：2012-04-05
申请号：PCT/EP2011/004744
申请日：2011-09-22
申请人： CARL ZEISS SMT GMBH , ROGALSKY, Olaf , SCHNEIDER, Sonja , BITTNER, Boris , KUGLER, Jens , GELLRICH, Bernhard , FREIMANN, Rolf
发明人： ROGALSKY, Olaf , SCHNEIDER, Sonja , BITTNER, Boris , KUGLER, Jens , GELLRICH, Bernhard , FREIMANN, Rolf
IPC分类号： G03F7/20
CPC分类号： G02B17/06 , G02B17/0663 , G02B27/0012 , G03F7/70258 , G03F7/70308 , G03F7/70891
摘要： An imaging optical system (10), in particular a projection objective, for microlithography, comprises optical elements (M1-M6) configured to guide electromagnetic radiation (19) with a wavelength λ in an imaging beam path for imaging an object field (13) into an image plane (14), and a pupil (24), having coordinates (p, q) which, together with the image field (16), having coordinates (x, y), of the optical system (10), spans an extended 4-dimensional pupil space, having coordinates (x, y, p, q) as a function of which a wavefront W(x, y, p, q) of the radiation (19) passing through the optical system is defined. At least a first of the optical elements (M1-M6) has a non-rotationally symmetrical surface (26) having a respective surface deviation in relation to every rotationally symmetrical surface (28), which two-dimensional surface has a difference between its greatest elevation and its deepest valley of at least λ. A sub-aperture ratio of the non- rotationally symmetrical surface deviates at every point (Ο 1 , O 2 ) of the object field (13) by at least 0.01 from the sub-aperture ratio of every other surface of the optical elements, which is located in the imaging beam path, at the respective point (O 1 , O 2 ) of the object field (13). Furthermore, the surface (26) of the first optical element (M4) is configured such that by displacing the first optical element relative to the other optical elements a change to the wavefront of the optical system (10) can be brought about which has a portion with at least 2-fold symmetry, the maximum value of the wavefront change in the extended 4- dimensional pupil space being at least 1 x 10 -5 of the wavelength λ.
摘要翻译：用于微光刻的成像光学系统（10），特别是投影物镜，包括被配置为在成像光束路径中引导具有波长λ的电磁辐射（19）的光学元件（M1-M6）用于将物场（13）成像到图像平面（14）中，以及瞳孔（24），其具有与图像场（16）一起具有坐标（x，y）的坐标（p，q），光学系统（10）跨越具有坐标（x，y，p，q）的扩展的4维光瞳空间，其作为辐射（19）的波前W（x，y，p，q）通过光学系统的定义。至少第一光学元件（M1-M6）具有相对于每个旋转对称表面（28）具有各自的表面偏差的非旋转对称表面（26），该二维表面具有其最大值海拔及其最深的谷至少为λ。非旋转对称表面的子孔径比在物场（13）的每个点（0 1，0 2，0 2）处偏离至少0.01 位于成像光束路径中的光学元件的每个其他表面的子孔径比在物体的各个点（0 1，0 2，2）字段（13）。此外，第一光学元件（M4）的表面（26）被配置为使得通过相对于其他光学元件移位第一光学元件，可以实现对光学系统（10）的波前的改变，其具有部分具有至少2倍对称性，扩展的四维光瞳空间中波前变化的最大值至少为波长λ的1×10-5。

2. 发明申请

WO2006053751A3 PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION 审中-公开
标题翻译：投影镜头的微光刻投射曝光设备
公开(公告)号：WO2006053751A3
公开(公告)日：2006-10-12
申请号：PCT/EP2005012327
申请日：2005-11-17
申请人： ZEISS CARL SMT AG , BEIERL HELMUT , BLEIDISTEL SASCHA , SINGER WOLFGANG , GRUNER TORALF , EPPLE ALEXANDER , WABRA NORBERT , BEDER SUSANNE , WEBER JOCHEN , FELDMANN HEIKO , SCHWAER BAERBEL , ROGALSKY OLAF , KAZI ARI
发明人： BEIERL HELMUT , BLEIDISTEL SASCHA , SINGER WOLFGANG , GRUNER TORALF , EPPLE ALEXANDER , WABRA NORBERT , BEDER SUSANNE , WEBER JOCHEN , FELDMANN HEIKO , SCHWAER BAERBEL , ROGALSKY OLAF , KAZI ARIF
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure installation comprises a projection lens system (20), which projects an object (24) onto a focal plane (28) and which has a lens (L3) with a curved surface (S). A liquid or solid medium (34) is located in the projection lens system (20) and directly abuts against the curved surface (S) over an area that can be used for the projection of the object (24). The projection exposure installation also comprises an adjustable manipulator (M) for reducing a curvature of field that is caused by a heating of the medium (34) during the projection operation.
摘要翻译：微光刻投射曝光设备包括：一个投影透镜（20），该图像的对象（24）到图像平面（28）和具有弯曲表面（S）的透镜（L3）。在投影透镜（20）是液体或固体培养基（34），紧邻所述弯曲表面（S）在一定范围内作为用于所述对象（24）的成像。的投影曝光装置还包括一个可调节的操纵器（M），以减少的场曲，这是由投影操作期间介质（34）的加热而引起的。

3. 发明申请

WO2008003442A1 METHOD FOR REVISING/REPAIRING A LITHOGRAPHIC PROJECTION OBJECTIVE 审中-公开
标题翻译：修正/修正地平线投影目标的方法
公开(公告)号：WO2008003442A1
公开(公告)日：2008-01-10
申请号：PCT/EP2007/005837
申请日：2007-07-02
申请人： CARL ZEISS SMT AG , ROGALSKY, Olaf , BITTNER, Boris , PETASCH, Thomas , HAEUSSLER, Jochen
发明人： ROGALSKY, Olaf , BITTNER, Boris , PETASCH, Thomas , HAEUSSLER, Jochen
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70258 , G03F7/70975
摘要： A method for revising/iepaiiiiig A projection objective of a lithography projection exposure apparatus (10), the projection objective comprising a plurality of optical elements between an object plane (12) and an image plane (16), the plurality of optical elements comprising at least one first optical element having a refractive power, comprises, without exchanging all of the optical elements, removing the at least one first optical element from the projection objective in the field, inserting at least one first spare optical element into the projection objective at the location of the at least one first optical element, and adjusting an image quality of the projection objective to a desired quality.
摘要翻译：一种修改/修改光刻投影曝光设备（10）的投影物镜的方法，所述投影物镜包括在物平面（12）和像平面（16）之间的多个光学元件，所述多个光学元件包括具有屈光力的至少一个第一光学元件包括，在不交换所有光学元件的情况下，从场中的投影物镜移除至少一个第一光学元件，将至少一个第一备用光学元件插入投影物镜所述至少一个第一光学元件的位置，以及将所述投影物镜的图像质量调整到期望的质量。

4. 发明申请

WO2012041459A3 IMAGING OPTICAL SYSTEM FOR MICROLITHOGRAPHY 审中-公开
标题翻译：成像光学系统的微观算法
公开(公告)号：WO2012041459A3
公开(公告)日：2012-08-30
申请号：PCT/EP2011004744
申请日：2011-09-22
申请人： ZEISS CARL SMT GMBH , ROGALSKY OLAF , SCHNEIDER SONJA , BITTNER BORIS , KUGLER JENS , GELLRICH BERNHARD , FREIMANN ROLF
发明人： ROGALSKY OLAF , SCHNEIDER SONJA , BITTNER BORIS , KUGLER JENS , GELLRICH BERNHARD , FREIMANN ROLF
IPC分类号： G03F7/20 , G02B27/00
CPC分类号： G02B17/06 , G02B17/0663 , G02B27/0012 , G03F7/70258 , G03F7/70308 , G03F7/70891
摘要： An imaging optical system (10), in particular a projection objective, for microlithography, comprises optical elements (M1-M6) configured to guide electromagnetic radiation (19) with a wavelength ? in an imaging beam path for imaging an object field (13) into an image plane (14), and a pupil (24), having coordinates (p, q) which, together with the image field (16), having coordinates (x, y), of the optical system (10), spans an extended 4-dimensional pupil space, having coordinates (x, y, p, q) as a function of which a wavefront W(x, y, p, q) of the radiation (19) passing through the optical system is defined. At least a first of the optical elements (M1-M6) has a non-rotationally symmetrical surface (26) having a respective surface deviation in relation to every rotationally symmetrical surface (28), which two-dimensional surface has a difference between its greatest elevation and its deepest valley of at least ?. A sub-aperture ratio of the non- rotationally symmetrical surface deviates at every point (?1, O2) of the object field (13) by at least 0.01 from the sub-aperture ratio of every other surface of the optical elements, which is located in the imaging beam path, at the respective point (O1, O2) of the object field (13). Furthermore, the surface (26) of the first optical element (M4) is configured such that by displacing the first optical element relative to the other optical elements a change to the wavefront of the optical system (10) can be brought about which has a portion with at least 2-fold symmetry, the maximum value of the wavefront change in the extended 4- dimensional pupil space being at least 1 x 10-5 of the wavelength ?.
摘要翻译：用于微光刻的成像光学系统（10），特别是投影物镜包括光学元件（M1-M6），其被配置为引导具有波长λ的电磁辐射（19）在用于将物场（13）成像到图像平面（14）的成像光束路径中，以及具有坐标（p，q）的光瞳（24），其与图像场（16）一起具有坐标（x，（x，y，p，q）的波前W（x，y，p，q）的函数，跨越具有坐标（x，y，p，q）的扩展的4维瞳孔空间，定义通过光学系统的辐射（19）。至少第一光学元件（M1-M6）具有相对于每个旋转对称表面（28）具有相应表面偏差的非旋转对称表面（26），该二维表面具有最大的海拔及其最深的山谷至少？非旋转对称表面的子孔径比从物体场（13）的每个点（θ1，O 2）偏离光学元件的每个其他表面的子孔径比至少0.01，这是位于成像光束路径中，位于物场（13）的相应点（O1，O2）处。此外，第一光学元件（M4）的表面（26）被配置为使得通过相对于其它光学元件移位第一光学元件，可以使光学系统（10）的波前的改变具有具有至少2倍对称性的部分，扩展的四维光瞳空间中的波前变化的最大值为波长λ的至少1×10 -5。

5. 发明申请

WO2006053751A2 PROJEKTIONSOBJEKTIV EINER MIKROLITHOGRAPHISCHEN PROJEKTIONSBELICHTUNGSANLAGE 审中-公开
标题翻译：微型投影曝光设备的投影目标
公开(公告)号：WO2006053751A2
公开(公告)日：2006-05-26
申请号：PCT/EP2005/012327
申请日：2005-11-17
申请人： CARL ZEISS SMT AG , BEIERL, Helmut , BLEIDISTEL, Sascha , SINGER, Wolfgang , GRUNER, Toralf , EPPLE, Alexander , WABRA, Norbert , BEDER, Susanne , WEBER, Jochen , FELDMANN, Heiko , SCHWAER, Bärbel , ROGALSKY, Olaf , KAZI, Ari
发明人： BEIERL, Helmut , BLEIDISTEL, Sascha , SINGER, Wolfgang , GRUNER, Toralf , EPPLE, Alexander , WABRA, Norbert , BEDER, Susanne , WEBER, Jochen , FELDMANN, Heiko , SCHWAER, Bärbel , ROGALSKY, Olaf , KAZI, Ari
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70891
摘要： Eine mikrolithographische Projektionsbelichtungsanlage weist ein Projektionsobjektiv (20) auf, das ein Objekt (24) auf eine Bildebene (28) abbildet und eine Linse (L3) mit einer gekrümmten Fläche (S) hat. In dem Projektionsobjektiv (20) befindet sich ein flüssiges oder festes Medium (34), das unmittelbar an die gekrümmte Fläche (S) über einen Bereich hinweg angrenzt, der für die Abbildung des Objekts (24) nutzbar ist. Die Projektionsbelichtungsanlage weist außerdem einen verstellbaren Manipulator (M) zur Verringerung einer Bildfeldwölbung auf, die durch eine Erwärmung des Mediums (34) während des Projektionsbetriebs verursacht wird.
摘要翻译：
的微光刻投射曝光设备包括：一个投影透镜（20）到图像平面（28）的图像的对象（24）和具有一个冠导航中使用的透镜（L3）奈德FL＆AUML;枝（S）具有，在投影透镜20中，存在液体或固体介质34，其在与图像相邻的区域上紧邻曲面S 物体（24）的尺寸是可用的。投影曝光＆害羞;植物具有坳道除了可调节的操纵器（M），以减少一个Bildfeldw＆OUML; lbung，其通过EI＆害羞; NE广告＆AUML;所述介质（34）的变暖W＆AUML; Projektionsbe＆期间害羞;引起驱动。

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