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1. 发明申请

WO2012041459A2 IMAGING OPTICAL SYSTEM FOR MICROLITHOGRAPHY 审中-公开
标题翻译：成像光学系统
公开(公告)号：WO2012041459A2
公开(公告)日：2012-04-05
申请号：PCT/EP2011/004744
申请日：2011-09-22
申请人： CARL ZEISS SMT GMBH , ROGALSKY, Olaf , SCHNEIDER, Sonja , BITTNER, Boris , KUGLER, Jens , GELLRICH, Bernhard , FREIMANN, Rolf
发明人： ROGALSKY, Olaf , SCHNEIDER, Sonja , BITTNER, Boris , KUGLER, Jens , GELLRICH, Bernhard , FREIMANN, Rolf
IPC分类号： G03F7/20
CPC分类号： G02B17/06 , G02B17/0663 , G02B27/0012 , G03F7/70258 , G03F7/70308 , G03F7/70891
摘要： An imaging optical system (10), in particular a projection objective, for microlithography, comprises optical elements (M1-M6) configured to guide electromagnetic radiation (19) with a wavelength λ in an imaging beam path for imaging an object field (13) into an image plane (14), and a pupil (24), having coordinates (p, q) which, together with the image field (16), having coordinates (x, y), of the optical system (10), spans an extended 4-dimensional pupil space, having coordinates (x, y, p, q) as a function of which a wavefront W(x, y, p, q) of the radiation (19) passing through the optical system is defined. At least a first of the optical elements (M1-M6) has a non-rotationally symmetrical surface (26) having a respective surface deviation in relation to every rotationally symmetrical surface (28), which two-dimensional surface has a difference between its greatest elevation and its deepest valley of at least λ. A sub-aperture ratio of the non- rotationally symmetrical surface deviates at every point (Ο 1 , O 2 ) of the object field (13) by at least 0.01 from the sub-aperture ratio of every other surface of the optical elements, which is located in the imaging beam path, at the respective point (O 1 , O 2 ) of the object field (13). Furthermore, the surface (26) of the first optical element (M4) is configured such that by displacing the first optical element relative to the other optical elements a change to the wavefront of the optical system (10) can be brought about which has a portion with at least 2-fold symmetry, the maximum value of the wavefront change in the extended 4- dimensional pupil space being at least 1 x 10 -5 of the wavelength λ.
摘要翻译：用于微光刻的成像光学系统（10），特别是投影物镜，包括被配置为在成像光束路径中引导具有波长λ的电磁辐射（19）的光学元件（M1-M6）用于将物场（13）成像到图像平面（14）中，以及瞳孔（24），其具有与图像场（16）一起具有坐标（x，y）的坐标（p，q），光学系统（10）跨越具有坐标（x，y，p，q）的扩展的4维光瞳空间，其作为辐射（19）的波前W（x，y，p，q）通过光学系统的定义。至少第一光学元件（M1-M6）具有相对于每个旋转对称表面（28）具有各自的表面偏差的非旋转对称表面（26），该二维表面具有其最大值海拔及其最深的谷至少为λ。非旋转对称表面的子孔径比在物场（13）的每个点（0 1，0 2，0 2）处偏离至少0.01 位于成像光束路径中的光学元件的每个其他表面的子孔径比在物体的各个点（0 1，0 2，2）字段（13）。此外，第一光学元件（M4）的表面（26）被配置为使得通过相对于其他光学元件移位第一光学元件，可以实现对光学系统（10）的波前的改变，其具有部分具有至少2倍对称性，扩展的四维光瞳空间中波前变化的最大值至少为波长λ的1×10-5。

2. 发明申请

WO2022161658A1 MIRROR, OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM 审中-公开
公开(公告)号：WO2022161658A1
公开(公告)日：2022-08-04
申请号：PCT/EP2021/082558
申请日：2021-11-22
申请人： CARL ZEISS SMT GMBH , ENKISCH, Hartmut , GRUNER, Toralf , GELLRICH, Bernhard
发明人： ENKISCH, Hartmut , GRUNER, Toralf , GELLRICH, Bernhard
IPC分类号： G02B5/08 , G02B26/00 , G02B26/08 , G03F7/20 , G02B7/18
摘要： The invention relates to a method for operating an optical system, and to a mirror and to an optical system, in particular for a microlithographic projection exposure apparatus. A mirror, in particular for a microlithographic projection exposure apparatus, wherein the mirror has an optical effective surface, comprises a mirror substrate (101, 201, 301, 401, 501) and a plurality of cavities (110, 210, 310, 410, 411, 510) which are arranged in the mirror substrate and to each of which a fluid can be applied, wherein a deformation is transferable to the optical effective surface by varying the fluid pressure in these cavities (110, 210, 310, 410, 411, 510).

3. 发明申请

WO2011039124A1 OPTICAL ARRANGEMENT IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY 审中-公开
标题翻译：投影曝光装置的光学装置
公开(公告)号：WO2011039124A1
公开(公告)日：2011-04-07
申请号：PCT/EP2010/064198
申请日：2010-09-24
申请人： CARL ZEISS SMT GMBH , KULITSKY, Viktor , GELLRICH, Bernhard , XALTER, Stefan , KWAN, Yim-Bun-Patrick , DEUFEL, Peter , WURMBRAND, Andreas
发明人： KULITSKY, Viktor , GELLRICH, Bernhard , XALTER, Stefan , KWAN, Yim-Bun-Patrick , DEUFEL, Peter , WURMBRAND, Andreas
IPC分类号： G03F7/20 , G02B7/00
CPC分类号： G03F7/70916 , G02B7/00 , G03F7/70233 , G03F7/70808 , G03F7/70825 , G03F7/70891
摘要： The invention concerns an optical arrangement in a projection exposure apparatus for EUV lithography, comprising a multiplicity of optical elements (101, 102) and a carrier structure (100, 300) which carries the optical elements (101, 102), wherein the carrier structure is composed of at least two releasably interconnected modules (110-140, 310-340, 510, 610), and wherein each module (110-140, 310-340, 510, 610) is composed of at least one carrier structure subelement (121-124, 421, 511 -514, 612-614), wherein a subhousing is produced by a multiplicity of carrier structure subelements (121-124, 421, 511-514, 612-614) and/or modules (110-140, 310, 340, 510, 610), and wherein said subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in said projection exposure apparatus, said usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus.
摘要翻译：本发明涉及用于EUV光刻的投影曝光装置中的光学装置，包括多个光学元件（101,102）和承载光学元件（101,102）的载体结构（100,300），其中载体结构由至少两个可释放地互连的模块（110-140,310-340,510,610）组成，并且其中每个模块（110-140,310-340,510,610）由至少一个载体结构子元件 121-124,421,511-514,612-614），其中通过多个载体结构子元件（121-124,421,511-514,612-614）和/或模块（110-140）产生子阱，310,340,510,610），并且其中所述子孔具有至少在区域中对应于所述投影曝光设备中的可用光束路径而变化的几何形状，所述可用光束路径被定义为所有光的包络束可以从场平面中的所有场点传播到投影曝光的图像平面装置。

4. 发明申请

WO2016026888A1 MIRROR MODULE, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微镜模块，特别适用于微晶投影曝光装置
公开(公告)号：WO2016026888A1
公开(公告)日：2016-02-25
申请号：PCT/EP2015/069026
申请日：2015-08-19
申请人： CARL ZEISS SMT GMBH , PROCHNAU, Jens , SCHAFFER, Dirk , WURMBRAND, Andreas , GELLRICH, Bernhard , KERN, Markus
发明人： PROCHNAU, Jens , SCHAFFER, Dirk , WURMBRAND, Andreas , GELLRICH, Bernhard , KERN, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/7095 , G02B5/0891 , G02B7/181 , G03F7/70883 , G03F7/709
摘要： The invention relates to a mirror module, in particular for a microlithographic projection exposure apparatus, comprising a mirror, which has a mirror body (1) and an optically effective surface, wherein the mirror body (1) has a first material, and a supporting structure (2) for connecting the mirror body (1) to an objective structure (8), wherein the supporting structure (2) has a second material, wherein the first material and the second material differ in terms of their coefficients of thermal expansion (CTE) by less than 0.5*10 -6 K -1 in a temperature range around an operating temperature which is reached by the mirror module during operation in the region of the connection of the mirror body (1) to the supporting structure (2).
摘要翻译：本发明涉及一种镜模块，特别涉及一种微光刻投影曝光装置，其包括具有镜主体（1）和光学有效表面的反射镜，其中镜体（1）具有第一材料和支撑用于将镜体（1）连接到物镜结构（8）的结构（2），其中所述支撑结构（2）具有第二材料，其中所述第一材料和所述第二材料在其热膨胀系数方面不同（ CTE）在反射镜模块在镜体（1）与支撑结构（2）的连接区域中的操作期间达到的工作温度附近的温度范围内小于0.5×10-6K-1。

5. 发明申请

WO2006037651A1 OPTICAL PROJECTION SYSTEM 审中-公开
标题翻译：光学投影系统
公开(公告)号：WO2006037651A1
公开(公告)日：2006-04-13
申请号：PCT/EP2005/010819
申请日：2005-10-01
申请人： CARL ZEISS SMT AG , RAU, Johannes , SCHÖPPACH, Armin , GELLRICH, Bernhard , KUGLER, Jens , MAHLMANN, Martin , GEUPPERT, Bernhard , PETASCH, Thomas , FÜRTER, Gerhard
发明人： RAU, Johannes , SCHÖPPACH, Armin , GELLRICH, Bernhard , KUGLER, Jens , MAHLMANN, Martin , GEUPPERT, Bernhard , PETASCH, Thomas , FÜRTER, Gerhard
IPC分类号： G02B7/00 , G03F7/20 , G02B17/08
CPC分类号： G03F7/7015 , G02B7/00 , G02B7/008 , G02B7/021 , G02B7/028 , G02B7/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70883
摘要： An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.
摘要翻译：提供了包括第一光学元件模块和至少一个第二光学元件模块的光学投影单元。第一光学元件模块包括第一壳体单元和至少第一光学元件，第一光学元件被接收在第一壳体单元内并且具有限定第一光轴的光学使用的第一区域。所述至少一个第二光学元件模块位于与所述第一光学元件模块相邻并且包括至少一个第二光学元件，所述第二光学元件限定所述光学投影单元的第二光轴。第一壳体单元具有中心的第一壳体轴线和围绕第一壳体轴线在圆周方向上延伸的外壁。第一光轴是相对于第一壳体轴线的横向偏移和倾斜中的至少一个。此外，第一壳体轴线与第二光轴基本共线。

6. 发明申请

WO2008122313A1 OPTICAL ELEMENT MODULE WITH IMAGING ERROR AND POSITION CORRECTION 审中-公开
标题翻译：具有成像误差和位置校正的光学元件模块
公开(公告)号：WO2008122313A1
公开(公告)日：2008-10-16
申请号：PCT/EP2007/053382
申请日：2007-04-05
申请人： CARL ZEISS SMT AG , GELLRICH, Bernhard , KUGLER, Jens , LIMBACH, Guido
发明人： GELLRICH, Bernhard , KUGLER, Jens , LIMBACH, Guido
IPC分类号： G03F7/20 , G02B7/02
CPC分类号： G03F7/70825 , G02B7/023 , G02B27/0068 , G03F7/70258
摘要： There is provided an optical element module (106) comprising an optical element (107) and a support structure (108) supporting the optical element, the support structure comprising a first holding structure (109), an intermediate structure (110) and a second holding structure (111). The first holding structure (109) contacts the optical element (107) and is adapted to adjustably introduce defined deformations into the optical element. The intermediate structure (110) supports the first holding structure (109) while the second holding structure (111) supports the intermediate structure (110) and is adapted to adjust the position of the intermediate structure. The optical element module is used in microlithography systems for compensating aberrations. The holding structures are arranged Rinematically in series.
摘要翻译：提供了一种包括光学元件（107）和支撑光学元件的支撑结构（108）的光学元件模块（106），该支撑结构包括第一保持结构（109），中间结构（110）和第二保持结构（111）。第一保持结构（109）接触光学元件（107）并且适于将限定的变形引入到光学元件中。中间结构（110）支撑第一保持结构（109），而第二保持结构（111）支撑中间结构（110）并且适于调节中间结构的位置。光学元件模块用于微光刻系统中用于补偿像差。保持结构以串联方式排列。

7. 发明申请

WO2007128835A1 OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION 审中-公开
标题翻译：具有热衰减的光学成像装置
公开(公告)号：WO2007128835A1
公开(公告)日：2007-11-15
申请号：PCT/EP2007/054503
申请日：2007-05-09
申请人： CARL ZEISS SMT AG , GELLRICH, Bernhard , KUGLER, Jens , ITTNER, Thomas , HEMBACHER, Stefan , SCHIMITZEK, Karl-Heinz , TAYEBATI, Payam , HOLDERER, Hubert
发明人： GELLRICH, Bernhard , KUGLER, Jens , ITTNER, Thomas , HEMBACHER, Stefan , SCHIMITZEK, Karl-Heinz , TAYEBATI, Payam , HOLDERER, Hubert
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70891
摘要： An optical imaging device, in particular for use in microlithography, comprising a mask device for receiving a mask comprising a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and comprises a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. According to the invention a thermal attenuation device is provided, said thermal attenuation device being adapted to reduce fluctuations within the temperature distribution TE of the immersion element induced by the immersion medium.
摘要翻译：特别是用于微光刻的光学成像装置，包括用于接收包括投影图案的掩模的掩模装置，具有光学元件组的投影装置，用于接收基板的基板装置和浸没区。光学元件组适于将投影图案投影到基板上，并且包括具有浸没元件的多个光学元件，基板在操作期间至少临时定位到该元件。在操作期间，浸没区域位于浸没元件和基底之间，并且至少暂时填充浸没介质。根据本发明，提供一种热衰减装置，所述热衰减装置适于减少由浸没介质引起的浸没元件的温度分布TE内的波动。

8. 发明申请

WO2005015315A3 MIKROLITHOGRAPHISCHE PROJEKTIONSBELICHTUNGSANLAGE SOWIE VERFAHREN ZUM EINBRINGEN EINER IMMERSIONSFLÜSSIGKEIT IN EINEM IMMERSIONSRAUM 审中-公开
公开(公告)号：WO2005015315A3
公开(公告)日：2005-02-17
申请号：PCT/EP2004/007456
申请日：2004-07-08
申请人： CARL ZEISS SMT AG , GELLRICH, Bernhard , REISINGER, Gerd , SCHMEREK, Dieter , KUGLER, Jens
发明人： GELLRICH, Bernhard , REISINGER, Gerd , SCHMEREK, Dieter , KUGLER, Jens
IPC分类号： G03F7/20
摘要： Eine Projektionsbelichtungsanlage für die Mikrolithographie umfaßt eine Beleuchtungseinrichtung zur Erzeugung von Projektionslicht und ein Projektionsobjektiv mit mehreren optischen Elementen wie z.B. Linsen (L5), mit dem ein in einer Objektebene des Projektionsobjektivs anordenbares Retikel auf eine in einer Bildebene des Projektionsobjektivs anordenbare und auf einem Träger (30) aufgebrachte lichtempfindliche Oberfläche (26) abbildbar ist. Ferner ist eine Immersionseinrichtung zum Einbringen einer Immersionsflüssigkeit (34) in einen Immersionsraum (50) zwischen einem bildseitig letzten optischen Element (L5) des Projektionsobjektivs und der lichtempfindlichen Oberfläche (26) vorgesehen. Die Immersionseinrichtung weist Mittel (44; 66) auf, durch die das Auftreten von die Abbildungsqualität beeinträchtigenden Gasblasen (48) in der Immersionsflüssigkeit (34) verhindert werden kann und/oder bereits aufgetretene Gasblasen (48) entfernt werden können. Bei diesen Mitteln kann es sich z.B. um eine Ultraschallquelle (66) oder einen Entgaser (44) handeln.

9. 发明申请

WO2007112997A1 REFLECTING OPTICAL ELEMENT WITH ECCENTRIC OPTICAL PASSAGEWAY 审中-公开
标题翻译：用偏心光学通道反射光学元件
公开(公告)号：WO2007112997A1
公开(公告)日：2007-10-11
申请号：PCT/EP2007/002951
申请日：2007-04-02
申请人： CARL ZEISS SMT AG , SCHERLE, Hans-Jürgen , KWAN, Yim-Bun, Patrick , XALTER, Stefan , LIPPERT, Johannes , WEBER, Ulrich , GEUPPERT, Bernhard , GELLRICH, Bernhard , KUGLER, Jens , SORG, Franz , HEINTEL, Willi , KIRCHNER, Harald , KELLER, Wolfgang , FROMMEYER, Andreas , MORRISON, Fraser, G.
发明人： SCHERLE, Hans-Jürgen , KWAN, Yim-Bun, Patrick , XALTER, Stefan , LIPPERT, Johannes , WEBER, Ulrich , GEUPPERT, Bernhard , GELLRICH, Bernhard , KUGLER, Jens , SORG, Franz , HEINTEL, Willi , KIRCHNER, Harald , KELLER, Wolfgang , FROMMEYER, Andreas , MORRISON, Fraser, G.
IPC分类号： G02B17/08 , G03F7/20 , G02B7/182
CPC分类号： G02B17/0812 , G03F7/70225 , G03F7/70825
摘要： There is provided an optical element comprising an optical element body (107.1, 108.1), a reflecting area (107.4, 108.4) and an optical passageway (107.6, 108.6). The optical element body defines an axis of rotational symmetry (107.3, 108.3). The reflecting area is disposed on the optical element body and adapted to be optically used in an exposure process. The optical passageway is arranged within the optical element body and allows light to pass the optical element body, the optical passageway being arranged eccentrically with respect to the axis of rotational symmetry.
摘要翻译：提供了一种光学元件，包括光学元件主体（107.1,108.1），反射区域（107.4,108.4）和光学通道（107.6,108.6）。光学元件主体限定旋转对称轴（107.3,108.3）。反射区域设置在光学元件主体上并且适于在曝光过程中被光学地使用。光学通道布置在光学元件主体内并允许光通过光学元件主体，光学通道相对于旋转对称轴线偏心地布置。

10. 发明申请

WO2007031413A2 OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES 审中-公开
标题翻译：用于暴露过程的光学元件单元
公开(公告)号：WO2007031413A2
公开(公告)日：2007-03-22
申请号：PCT/EP2006/065892
申请日：2006-08-31
申请人： CARL ZEISS SMT AG , KUGLER, Jens , SCHWERTNER, Tilmann , BINGEL, Ulrich , LIMBACH, Guido , KALLER, Julian , SCHAFFER, Dirk , SCHERLE, Hans-Jürgen , GELLRICH, Bernhard
发明人： KUGLER, Jens , SCHWERTNER, Tilmann , BINGEL, Ulrich , LIMBACH, Guido , KALLER, Julian , SCHAFFER, Dirk , SCHERLE, Hans-Jürgen , GELLRICH, Bernhard
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G02B27/0006 , G03F7/70808 , G03F7/70825 , G03F7/70883 , G03F7/70908 , G03F7/70916 , G03F7/70933 , Y10T29/49
摘要： There is provided an optical element unit comprising at least a first optical element module and a sealing arrangement: The first optical element module occupies a first module space and comprises a first module component of a first component type and an associated second module component of a second component type, the first component type being optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.
摘要翻译：提供了一种光学元件单元，其至少包括第一光学元件模块和密封装置：第一光学元件模块占据第一模块空间并且包括第一部件类型的第一模块部件和第二组件类型的相关联的第二模块组件，第一组件类型是光学元件，并且第二组件类型不同于第一组件类型。密封装置将第一模块空间分隔成第一空间和第二空间，并且基本上至少在第一方向上防止物质从第一空间和第二空间中的一个空间侵入第一空间中的另一个中，以及第二个空间。第一模块组件至少部分地接触第一空间并且至少在其光学使用的区域中不接触第二空间。第二模块部件至少部分地接触第二空间。

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