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1. 发明公开

EP1218984A1 LASER CHAMBER WITH FULLY INTEGRATED ELECTRODE FEEDTHROUGH MAIN INSULATOR 审中-公开
标题翻译：全集成牵头执行总管上隔离器激光室
公开(公告)号：EP1218984A1
公开(公告)日：2002-07-03
申请号：EP00957540.8
申请日：2000-08-17
申请人： Cymer, Inc. , Webb, Kyle R. , Partlo, William N.
发明人： WEBB,R., Kyle , PARTLO, William, N.
IPC分类号： H01S3/22 , H01S3/03 , H01S3/097
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70558 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0971 , H01S3/225
摘要： A feedthrough structure (280) of a gas discharge laser chamber conducts electric power through the wall of a sealed gas enclosure (212) to a single piece electrode (218) inside the enclosure. The feedthrough structure includes a single piece integrated main insulator (276) larger than the electrode. The main insulator (276) is compressed between the electrode (218) and the wall of the enclosure (212). The surfaces forming interfaces between the electrode and the single piece insulator are the insulator and the wall are all very smooth to permit the parts to expand and contract as the chamber temperature varies. The feedthrough structure also provides mechanical support and alignment for the electrode and includes seals (184) to prevent gas leakage around the feedthrough structure.

2. 发明公开

EP1226634A1 SINGLE CHAMBER GAS DISCHARGE LASER WITH LINE NARROWED SEED BEAM 审中-公开
标题翻译：与缩减带宽核爆炸一院的气体放电激光器
公开(公告)号：EP1226634A1
公开(公告)日：2002-07-31
申请号：EP00990902.9
申请日：2000-10-10
申请人： Cymer, Inc. , Partlo, William N. , Pan, Xiaojiang , Onkels, Eckehard D.
发明人： PARTLO, William, N. , PAN, Xiaojiang , ONKELS, Eckehard, D.
IPC分类号： H01S3/03
CPC分类号： H01S3/2366 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/036 , H01S3/073 , H01S3/225 , H01S3/2333
摘要： A single chamber gas discharge laser system having a pulse power source for producing electrical discharges at the rate of at least 1000 pulses per second. The discharge, along with laser optics, create two short lived gain media, one for producing a seed beam and the other for amplifying the seed beam. Laser gas circulation around a chamber circulation path is provided and the electrodes (18A) and discharges are arranged so that debris from one of the gain medium is not circulated to the other gain medium during discharges until the debris has made a loop around at least 90 % of the chamber circulation path.

3. 发明专利

AU6914200A Laser chamber with fully integrated electrode feedthrough main insulator 未知
公开(公告)号：AU6914200A
公开(公告)日：2001-03-26
申请号：AU6914200
申请日：2000-08-17
申请人： CYMER INC , PARTLO WILLIAM N , WEBB R KYLE
发明人： WEBB R KYLE , PARTLO WILLIAM N
IPC分类号： H01S3/03 , G03F7/20 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0971 , H01S3/225 , H01S3/22 , H01S3/097
摘要： A feedthrough structure of a gas discharge laser chamber conducts electric power through the wall of a sealed gas enclosure to a single piece electrode inside the enclosure. The feedthrough structure includes a single piece integrated main insulator larger than the electrode. The main insulator is compressed between the electrode and the wall of the enclosure. The surfaces forming interfaces between the electrode and the single piece insulator are the insulator and the wall are all very smooth to permit the parts to expand and contract as the chamber temperature varies. The feedthrough structure also provides mechanical support and alignment for the electrode and includes seals to prevent gas leakage around the feedthrough structure.

4. 发明申请

WO2010118146A1 ALIGNMENT LASER 审中-公开
标题翻译：对准激光
公开(公告)号：WO2010118146A1
公开(公告)日：2010-10-14
申请号：PCT/US2010/030258
申请日：2010-04-07
申请人： CYMER, INC. , FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , PARTLO, William, N. , PAXTON, Jason, A. , KIM, Nam-Hyong , HOFFMAN, Jerzy, R.
发明人： FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , PARTLO, William, N. , PAXTON, Jason, A. , KIM, Nam-Hyong , HOFFMAN, Jerzy, R.
IPC分类号： H01S3/091
CPC分类号： H01S3/2232 , G03F7/70033 , H01S3/0014 , H01S3/0407 , H01S3/041 , H01S3/086 , H01S3/2308 , H05G2/008
摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.
摘要翻译：用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

5. 发明申请

WO2010117861A1 SYSTEM, METHOD AND APPARATUS FOR ALIGNING AND SYNCHRONIZING TARGET MATERIAL FOR OPTIMUM EXTREME ULTRAVIOLET LIGHT OUTPUT 审中-公开
标题翻译：用于最佳超极紫外光输出的对准和同步目标材料的系统，方法和装置
公开(公告)号：WO2010117861A1
公开(公告)日：2010-10-14
申请号：PCT/US2010/029447
申请日：2010-03-31
申请人： CYMER, INC. , CHROBAK, Christopher, P. , PARTLO, William N. , FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , CROUCH, James, H.
发明人： CHROBAK, Christopher, P. , PARTLO, William N. , FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , CROUCH, James, H.
IPC分类号： G01J3/10
CPC分类号： H05G2/005 , G03F7/70033 , G21K5/00 , H05G2/003 , H05G2/006
摘要： An extreme ultraviolet light system includes a drive laser system, an extreme ultraviolet light chamber including an extreme ultraviolet light collector and a target material dispenser including a target material outlet capable of outputting a plurality of portions of target material along a target material path, wherein the target material outlet is adjustable. The extreme ultraviolet light system further includes a drive laser steering device, a detection system including at least one detector directed to detect a reflection of the drive laser reflected from the first one of the plurality of portions of target material and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of a first one of the plurality of portions of target material from a first light reflected from the first target material.
摘要翻译：一种极紫外光系统包括驱动激光系统，包括极紫外光收集器的极紫外光室和包括能够沿目标材料路径输出多个目标材料部分的靶材料出口的目标材料分配器，其中，目标材料出口可调。所述极紫外光系统还包括驱动激光转向装置，所述检测系统包括至少一个检测器，所述检测器被引导以检测从所述目标材料的所述多个部分中的第一部分反射的所述驱动激光的反射，以及耦合到所述目标的控制器材料分配器，检测器系统和驱动激光转向装置。控制器包括用于从第一目标材料反射的第一光检测目标材料的多个部分中的第一部分的位置的逻辑。

6. 发明申请

WO2010117859A1 SYSTEM, METHOD AND APPARATUS FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET CHAMBER WITH HOT WALLS AND COLD COLLECTOR MIRROR 审中-公开
标题翻译：用于激光生产的等离子体超紫外线室的系统，方法和装置，具有热水和冷收集器
公开(公告)号：WO2010117859A1
公开(公告)日：2010-10-14
申请号：PCT/US2010/029441
申请日：2010-03-31
申请人： CYMER, INC. , PARTLO, William N. , FOMENKOV, Igor V.
发明人： PARTLO, William N. , FOMENKOV, Igor V.
IPC分类号： G01J1/42
CPC分类号： H05G2/005 , G03F7/70033 , G21K5/00 , H05G2/003 , H05G2/006
摘要： A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.
摘要翻译：一种用于极紫外光室的系统和方法，包括收集器反射镜，耦合到收集器反射镜的后侧的冷却系统，其用于冷却收集反射镜的反射表面和耦合到极紫外光室的缓冲气体源。

7. 发明申请

WO2009032055A1 SYSTEM MANAGING GAS FLOW BETWEEN CHAMBERS OF AN EXTREME ULTRAVIOLET (EUV) PHOTOLITHOGRAPHY APPARATUS 审中-公开
标题翻译：系统管理超级紫外线（EUV）光刻设备的灯泡之间的气体流量
公开(公告)号：WO2009032055A1
公开(公告)日：2009-03-12
申请号：PCT/US2008/009755
申请日：2008-08-15
申请人： CYMER, INC. , BYKANOV, Alexander, N. , BRANDT, David, C. , FOMENKOV, Igor, C. , PARTLO, William, N.
发明人： BYKANOV, Alexander, N. , BRANDT, David, C. , FOMENKOV, Igor, C. , PARTLO, William, N.
IPC分类号： G21G4/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70808 , G03F7/70841 , G03F7/70883 , G03F7/70908
摘要： A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.
摘要翻译：气体流量管理系统可以包括至少部分地围绕第一和第二相应空间的第一和第二封闭壁; 在第一空间中产生等离子体的系统，等离子体发射极紫外光; 限制从第一空间流到第二空间的细长体，所述主体至少部分地围绕通道并且具有允许EUV光从第一空间进入通道的第一开口端，以及允许EUV光从第二空间退出的第二开口端通道进入第二空间，身体形状以建立相对于第一和第二端具有减小的横截面面积的位置; 以及离开孔的气流，所述孔定位成在主体的第一端和具有减小的横截面积的位置之间的位置处将气体引入通道。

8. 发明申请

WO2007149282A2 BANDWIDTH CONTROL DEVICE 审中-公开
标题翻译：带宽控制装置
公开(公告)号：WO2007149282A2
公开(公告)日：2007-12-27
申请号：PCT/US2007/013875
申请日：2007-06-11
申请人： CYMER, INC. , FOMENKOV, Igor, V. , PARTLO, William, N. , REILEY, Daniel, J. , HOWEY, James, K. , AGULIAR, Stanley, C.
发明人： FOMENKOV, Igor, V. , PARTLO, William, N. , REILEY, Daniel, J. , HOWEY, James, K. , AGULIAR, Stanley, C.
IPC分类号： H01S3/10
CPC分类号： H01S3/225 , H01S3/03 , H01S3/034 , H01S3/08009 , H01S3/137 , H01S3/2256
摘要： A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.
摘要翻译：公开了用于操作可以包括标称中心波长和带宽选择光学器件的激光输出光束脉冲线窄化机构的方法和装置; 静态波前补偿机构整形选择光学元件的曲率; 主动波前补偿机构整形选择光学元件的曲率并独立于静态波前补偿机制工作。该方法和装置可以包括标称中心波长和带宽选择光学器件包括光栅; 静态波前补偿机构将预选的弯矩应用于光栅; 主动波前补偿机构响应于基于来自监视激光输出光束脉冲的带宽的带宽监视器的带宽反馈的弯矩控制器的控制，向光栅施加单独的选定弯矩。主动波前补偿机构可以包括气动驱动机构。

9. 发明申请

WO2007146329A2 DRIVE LASER FOR EUV LIGHT SOURCE 审中-公开
标题翻译：用于EUV光源的驱动激光器
公开(公告)号：WO2007146329A2
公开(公告)日：2007-12-21
申请号：PCT/US2007013862
申请日：2007-06-11
申请人： CYMER INC , ERSHOV ALEXANDER I , BYKANOV ALEXANDER N , HOFFMAN JERZY R , FOMENKOV IGOR V , PARTLO WILLIAM N
发明人： ERSHOV ALEXANDER I , BYKANOV ALEXANDER N , HOFFMAN JERZY R , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： H01S3/00
CPC分类号： H01S3/2316 , H01S3/0057 , H01S3/11 , H01S3/2232 , H01S3/225 , H05G1/54 , H05G2/008
摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (E s, 1 ) and a small signal gain (g o , 1 ); and the second amplifier may have a gain medium characterized by a saturation energy (E s, 2 ) and a small signal gain (g o , 2 ), with (g o , 1 ) > (g o , 2 ) and (E S , 2 ) > (E s,
摘要翻译：公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。对于源极，第一放大器可以具有特征在于饱和能量（E S，S 1）和小信号增益（g 1，...，）; 并且第二放大器可以具有特征在于饱和能量（E S，S 2）和小信号增益（g 0，S 2，N 2）的增益介质（g ，＆lt; 2＆gt;）和（E

10. 发明申请

WO2007145792A3 CHAMBER FOR A HIGH ENERGY EXCIMER LASER SOURCE 审中-公开
公开(公告)号：WO2007145792A3
公开(公告)日：2007-12-21
申请号：PCT/US2007/012393
申请日：2007-05-22
申请人： CYMER, INC. , STEIGER, Thomas, D. , PARTLO, William, N.
发明人： STEIGER, Thomas, D. , PARTLO, William, N.
IPC分类号： H01S3/20
摘要： A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electrical conductor may extend through the orifice to pass an electric current into the chamber volume. A member may be disposed between the conductor and the wall for preventing gas flow through the orifice to allow a chamber pressure to be maintained in the volume. The chamber may further comprise a pressurized compartment disposed adjacent to the orifice for maintaining a pressure on at least a portion of the outside surface of the wall to reduce bowing of the wall near the orifice due to chamber pressure.

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