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1. 发明申请

WO2007145792A3 CHAMBER FOR A HIGH ENERGY EXCIMER LASER SOURCE 审中-公开
公开(公告)号：WO2007145792A3
公开(公告)日：2007-12-21
申请号：PCT/US2007/012393
申请日：2007-05-22
申请人： CYMER, INC. , STEIGER, Thomas, D. , PARTLO, William, N.
发明人： STEIGER, Thomas, D. , PARTLO, William, N.
IPC分类号： H01S3/20
摘要： A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electrical conductor may extend through the orifice to pass an electric current into the chamber volume. A member may be disposed between the conductor and the wall for preventing gas flow through the orifice to allow a chamber pressure to be maintained in the volume. The chamber may further comprise a pressurized compartment disposed adjacent to the orifice for maintaining a pressure on at least a portion of the outside surface of the wall to reduce bowing of the wall near the orifice due to chamber pressure.

2. 发明申请

WO2005089130A3 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2005089130A3
公开(公告)日：2005-09-29
申请号：PCT/US2005/007056
申请日：2005-03-03
申请人： CYMER, INC. , AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
IPC分类号： H01J35/20
摘要： An EUV light source apparatus (20) comprises a pulse laser (22) providing laser pulses (55) at a selected pulse repetition rate focused at a desired target ignition site (28); a target formation system (92) providing discrete targets (94); a target steering system (350) intermediate the target formation system (92) and the ignition site (28); a target tracking system (42) providing information about movement of the target (94) between the target formation system (92) and the target steering system (350); an electrostatic plasma containment apparatus (314) providing an electric plasma confinement field (316) at or near the ignition site (28) at the time of ignition; a vessel (30) having an intermediate wall (282) for passing EUV light; and a magnetic plasma confinement mechanism (329) creating a magnetic field (320) in the vicinity of the ignition site (28).

3. 发明申请

WO2005104313A2 GAS DISCHARGE LASER CHAMBER IMPROVEMENTS 审中-公开
标题翻译：气体放电激光室改进
公开(公告)号：WO2005104313A2
公开(公告)日：2005-11-03
申请号：PCT/US2005/007168
申请日：2005-03-03
申请人： CYMER, INC. , PARTLO, William, N. , AMADA, Yoshiho , CARMICHAEL, James, A. , DYER, Timothy, S. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , RETTIG, Curtis, L. , STRATE, Brian, D. , STEIGER, Thomas, D. , TRINTCHOUK, Fedor, B. , UJAZDOWSKI, Richard, C.
发明人： PARTLO, William, N. , AMADA, Yoshiho , CARMICHAEL, James, A. , DYER, Timothy, S. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , RETTIG, Curtis, L. , STRATE, Brian, D. , STEIGER, Thomas, D. , TRINTCHOUK, Fedor, B. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial fitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.
摘要翻译：如果公开的方法和装置，其可以包括高功率高重复率气体放电激光器UV光源，其可以包括：气体放电室，其包括包括垂直壁和相邻底壁的内壁; 气体循环风扇，其产生邻近内部垂直壁和相邻底壁的气体流动路径; 室内除尘器定位低气流区域，其可以沿着内壁并且可以包括至少一个网状筛网，例如多个网状筛网，其可以包括至少两个不同的规格网状筛网。除尘器可以沿着室的底部内壁和/或内壁的垂直部分延伸。除尘器可以包括具有第一量规的第一网状筛网; 第二网眼屏幕，其具有小于第一规格的第二规格; 并且第二网状屏幕在第一网状筛网和内壁之间中间。腔室可以包括在腔室的垂直内壁和底壁中的至少一个中的多个集尘凹部，其可以从包括一部分凹部和多部分凹部的组中选择，该组包括两个相对于彼此成角度的部分。除尘器可以包括定位在主绝缘体的一部分和室的内壁之间的压力阱。该腔室可以包括气体循环风扇，其包括具有风扇切断装置的横流风扇，其可以包括涡流控制袋。所述腔室可以包括预电离机构，其包括在所述预电离管内的细长开口内包含接地棒的前置离子槽，其可以包括柔顺构件，自动预除电切断机构，预电离起始控制机构和/或聚焦元件。腔室可以包括细长的挡板，其可以包括多个金字塔结构，其包括不同数量的大体锥体元件，并且以不同数量的大体锥体元件组成并且沿纵向轴线并且横向于纵向轴线定向。通过将人工钳位器引入激光放电的定时，也可以通过在脉冲串内从脉冲到脉冲随机地或以重复模式改变脉冲周期的时间来减小腔室内的声共振。

4. 发明申请

WO2002093699A1 FOUR KHz GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：四吉兹气体放电激光系统
公开(公告)号：WO2002093699A1
公开(公告)日：2002-11-21
申请号：PCT/US2002/012062
申请日：2002-04-15
申请人： CYMER, INC. , WITTAK, Christian, J. , PARTLO, William, N. , SANDSTROM, Richard, L. , MELCHER, Paul, C. , JOHNS, David, M. , SAETHRE, Robert, B. , NESS, Richard, M. , RETTIG, Curtis, L. , SHANNON, Robert, A. , UJAZDOWSKI, Richard, C. , ROKNI, Shahryar , SMITH, Scott , ANDERSON, Stuart, L. , ALGOTS, John, M. , SPANGLER, Ronald, L. , FOMENKOV, Igor , STEIGER, Thomas, D. , EMILO, Jerome, A. , TITUS, Clay, C. , IVASCHENKO, Alex, P. , ZAMBON, Paolo , PADMABANDU, Gamaralalage, G. , BRANHAM, Mark, S. , PHATAK, Sanjay , CYBULSKI, Raymond
发明人： WITTAK, Christian, J. , PARTLO, William, N. , SANDSTROM, Richard, L. , MELCHER, Paul, C. , JOHNS, David, M. , SAETHRE, Robert, B. , NESS, Richard, M. , RETTIG, Curtis, L. , SHANNON, Robert, A. , UJAZDOWSKI, Richard, C. , ROKNI, Shahryar , SMITH, Scott , ANDERSON, Stuart, L. , ALGOTS, John, M. , SPANGLER, Ronald, L. , FOMENKOV, Igor , STEIGER, Thomas, D. , EMILO, Jerome, A. , TITUS, Clay, C. , IVASCHENKO, Alex, P. , ZAMBON, Paolo , PADMABANDU, Gamaralalage, G. , BRANHAM, Mark, S. , PHATAK, Sanjay , CYBULSKI, Raymond
IPC分类号： H01S3/10
CPC分类号： G03F7/70025 , G03F7/70933 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter (4K) with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror, which is in a line narrowing module (15K) and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors (16K and 17K) drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以约4,000Hz的脉冲速率产生高质量的脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长计（4K）监视输出光束参数，并控制一个非常快的PZT驱动调光镜，它在一个线路变窄模块（15K）和脉冲功率充电电压，以保持波长和脉冲能量达到所需的极限。在优选实施例中，两个风扇马达（16K和17K）驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

5. 发明公开

EP1226634A1 SINGLE CHAMBER GAS DISCHARGE LASER WITH LINE NARROWED SEED BEAM 审中-公开
标题翻译：与缩减带宽核爆炸一院的气体放电激光器
公开(公告)号：EP1226634A1
公开(公告)日：2002-07-31
申请号：EP00990902.9
申请日：2000-10-10
申请人： Cymer, Inc. , Partlo, William N. , Pan, Xiaojiang , Onkels, Eckehard D.
发明人： PARTLO, William, N. , PAN, Xiaojiang , ONKELS, Eckehard, D.
IPC分类号： H01S3/03
CPC分类号： H01S3/2366 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/036 , H01S3/073 , H01S3/225 , H01S3/2333
摘要： A single chamber gas discharge laser system having a pulse power source for producing electrical discharges at the rate of at least 1000 pulses per second. The discharge, along with laser optics, create two short lived gain media, one for producing a seed beam and the other for amplifying the seed beam. Laser gas circulation around a chamber circulation path is provided and the electrodes (18A) and discharges are arranged so that debris from one of the gain medium is not circulated to the other gain medium during discharges until the debris has made a loop around at least 90 % of the chamber circulation path.

6. 发明公开

EP1218984A1 LASER CHAMBER WITH FULLY INTEGRATED ELECTRODE FEEDTHROUGH MAIN INSULATOR 审中-公开
标题翻译：全集成牵头执行总管上隔离器激光室
公开(公告)号：EP1218984A1
公开(公告)日：2002-07-03
申请号：EP00957540.8
申请日：2000-08-17
申请人： Cymer, Inc. , Webb, Kyle R. , Partlo, William N.
发明人： WEBB,R., Kyle , PARTLO, William, N.
IPC分类号： H01S3/22 , H01S3/03 , H01S3/097
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70558 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0971 , H01S3/225
摘要： A feedthrough structure (280) of a gas discharge laser chamber conducts electric power through the wall of a sealed gas enclosure (212) to a single piece electrode (218) inside the enclosure. The feedthrough structure includes a single piece integrated main insulator (276) larger than the electrode. The main insulator (276) is compressed between the electrode (218) and the wall of the enclosure (212). The surfaces forming interfaces between the electrode and the single piece insulator are the insulator and the wall are all very smooth to permit the parts to expand and contract as the chamber temperature varies. The feedthrough structure also provides mechanical support and alignment for the electrode and includes seals (184) to prevent gas leakage around the feedthrough structure.

7. 发明申请

WO2010118146A1 ALIGNMENT LASER 审中-公开
标题翻译：对准激光
公开(公告)号：WO2010118146A1
公开(公告)日：2010-10-14
申请号：PCT/US2010/030258
申请日：2010-04-07
申请人： CYMER, INC. , FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , PARTLO, William, N. , PAXTON, Jason, A. , KIM, Nam-Hyong , HOFFMAN, Jerzy, R.
发明人： FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , PARTLO, William, N. , PAXTON, Jason, A. , KIM, Nam-Hyong , HOFFMAN, Jerzy, R.
IPC分类号： H01S3/091
CPC分类号： H01S3/2232 , G03F7/70033 , H01S3/0014 , H01S3/0407 , H01S3/041 , H01S3/086 , H01S3/2308 , H05G2/008
摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.
摘要翻译：用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

8. 发明申请

WO2009032055A1 SYSTEM MANAGING GAS FLOW BETWEEN CHAMBERS OF AN EXTREME ULTRAVIOLET (EUV) PHOTOLITHOGRAPHY APPARATUS 审中-公开
标题翻译：系统管理超级紫外线（EUV）光刻设备的灯泡之间的气体流量
公开(公告)号：WO2009032055A1
公开(公告)日：2009-03-12
申请号：PCT/US2008/009755
申请日：2008-08-15
申请人： CYMER, INC. , BYKANOV, Alexander, N. , BRANDT, David, C. , FOMENKOV, Igor, C. , PARTLO, William, N.
发明人： BYKANOV, Alexander, N. , BRANDT, David, C. , FOMENKOV, Igor, C. , PARTLO, William, N.
IPC分类号： G21G4/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70808 , G03F7/70841 , G03F7/70883 , G03F7/70908
摘要： A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.
摘要翻译：气体流量管理系统可以包括至少部分地围绕第一和第二相应空间的第一和第二封闭壁; 在第一空间中产生等离子体的系统，等离子体发射极紫外光; 限制从第一空间流到第二空间的细长体，所述主体至少部分地围绕通道并且具有允许EUV光从第一空间进入通道的第一开口端，以及允许EUV光从第二空间退出的第二开口端通道进入第二空间，身体形状以建立相对于第一和第二端具有减小的横截面面积的位置; 以及离开孔的气流，所述孔定位成在主体的第一端和具有减小的横截面积的位置之间的位置处将气体引入通道。

9. 发明申请

WO2007149282A2 BANDWIDTH CONTROL DEVICE 审中-公开
标题翻译：带宽控制装置
公开(公告)号：WO2007149282A2
公开(公告)日：2007-12-27
申请号：PCT/US2007/013875
申请日：2007-06-11
申请人： CYMER, INC. , FOMENKOV, Igor, V. , PARTLO, William, N. , REILEY, Daniel, J. , HOWEY, James, K. , AGULIAR, Stanley, C.
发明人： FOMENKOV, Igor, V. , PARTLO, William, N. , REILEY, Daniel, J. , HOWEY, James, K. , AGULIAR, Stanley, C.
IPC分类号： H01S3/10
CPC分类号： H01S3/225 , H01S3/03 , H01S3/034 , H01S3/08009 , H01S3/137 , H01S3/2256
摘要： A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.
摘要翻译：公开了用于操作可以包括标称中心波长和带宽选择光学器件的激光输出光束脉冲线窄化机构的方法和装置; 静态波前补偿机构整形选择光学元件的曲率; 主动波前补偿机构整形选择光学元件的曲率并独立于静态波前补偿机制工作。该方法和装置可以包括标称中心波长和带宽选择光学器件包括光栅; 静态波前补偿机构将预选的弯矩应用于光栅; 主动波前补偿机构响应于基于来自监视激光输出光束脉冲的带宽的带宽监视器的带宽反馈的弯矩控制器的控制，向光栅施加单独的选定弯矩。主动波前补偿机构可以包括气动驱动机构。

10. 发明申请

WO2007005512A2 GAS DISCHARGE LASER LINE NARROWING MODULE 审中-公开
标题翻译：气体放电激光线窄行模块
公开(公告)号：WO2007005512A2
公开(公告)日：2007-01-11
申请号：PCT/US2006/025350
申请日：2006-06-28
申请人： CYMER, INC. , CYBULSKI, Raymond, F. , BERGSTEDT, Robert, A. , PARTLO, William, N. , SANDSTROM, Richard, L. , WANG, Gon
发明人： CYBULSKI, Raymond, F. , BERGSTEDT, Robert, A. , PARTLO, William, N. , SANDSTROM, Richard, L. , WANG, Gon
IPC分类号： H01S3/22 , H01S3/03
CPC分类号： H01S3/03 , H01S3/034 , H01S3/036 , H01S3/1055 , H01S3/225
摘要： A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.
摘要翻译：公开了一种线变窄的气体放电激光系统及其操作方法，其可以包括色散中心波长选择元件; 包括多个折射元件的扩束器; 折射元件定位机构，所述折射元件定位机构定位所述折射元件中的至少一个，以改变所述色散中心波长选择元件上的激光束的入射角; 色散中心波长选择元件和扩束器中的每一个彼此对齐并且与至少包含色散中心波长选择元件的外壳对齐; 壳体定位机构，其相对于气体放电激光系统的光轴定位壳体。色散元件可以包括光栅，并且扩束器可以包括多个棱镜。外壳可以包含色散中心波长选择元件和扩束器。外壳定位元件可以包括位置锁定机构。

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