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1. 发明申请

WO2007149282A2 BANDWIDTH CONTROL DEVICE 审中-公开
标题翻译：带宽控制装置
公开(公告)号：WO2007149282A2
公开(公告)日：2007-12-27
申请号：PCT/US2007/013875
申请日：2007-06-11
申请人： CYMER, INC. , FOMENKOV, Igor, V. , PARTLO, William, N. , REILEY, Daniel, J. , HOWEY, James, K. , AGULIAR, Stanley, C.
发明人： FOMENKOV, Igor, V. , PARTLO, William, N. , REILEY, Daniel, J. , HOWEY, James, K. , AGULIAR, Stanley, C.
IPC分类号： H01S3/10
CPC分类号： H01S3/225 , H01S3/03 , H01S3/034 , H01S3/08009 , H01S3/137 , H01S3/2256
摘要： A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.
摘要翻译：公开了用于操作可以包括标称中心波长和带宽选择光学器件的激光输出光束脉冲线窄化机构的方法和装置; 静态波前补偿机构整形选择光学元件的曲率; 主动波前补偿机构整形选择光学元件的曲率并独立于静态波前补偿机制工作。该方法和装置可以包括标称中心波长和带宽选择光学器件包括光栅; 静态波前补偿机构将预选的弯矩应用于光栅; 主动波前补偿机构响应于基于来自监视激光输出光束脉冲的带宽的带宽监视器的带宽反馈的弯矩控制器的控制，向光栅施加单独的选定弯矩。主动波前补偿机构可以包括气动驱动机构。

2. 发明申请

WO2007143145A3 HIGH POWER EXCIMER LASER WITH A PULSE STRETCHER 审中-公开
公开(公告)号：WO2007143145A3
公开(公告)日：2007-12-13
申请号：PCT/US2007/013032
申请日：2007-05-31
申请人： CYMER, INC. , ERSHOV, Alexander, I. , FERRELL, James, J. , HOFMANN, Thomas , REILEY, Daniel, J. , REMEN, Chris, R.
发明人： ERSHOV, Alexander, I. , FERRELL, James, J. , HOFMANN, Thomas , REILEY, Daniel, J. , REMEN, Chris, R.
IPC分类号： H01S3/223
摘要： An apparatus and method is disclosed which include a high power excimer or molecular fluorine gas discharge laser DUV light source system which includes a pulse stretcher which includes an optical delay path mirror, an optical delay path mirror gas purging assembly which includes a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror includes a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system includes a purging gas supply line; a purging gas distributing and directing mechanism which direct purging gas across the face of the respective optical delay path mirror.

3. 发明申请

WO2007005511A2 ACTIVE BANDWIDTH CONTROL FOR A LASER 审中-公开
标题翻译：激光的有源带宽控制
公开(公告)号：WO2007005511A2
公开(公告)日：2007-01-11
申请号：PCT/US2006/025349
申请日：2006-06-28
申请人： CYMER, INC. , REILEY, Daniel, J. , RYLOV, German, E. , BERGSTEDT, Robert, A.
发明人： REILEY, Daniel, J. , RYLOV, German, E. , BERGSTEDT, Robert, A.
IPC分类号： A61N5/00
CPC分类号： G03F7/70575 , G03F7/70025 , H01S3/005 , H01S3/08036 , H01S3/106 , H01S3/137 , H01S3/225
摘要： In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range and increase a bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is above the predetermined bandwidth range. In another aspect an active bandwidth control system may include an optic for altering a wavefront of a laser beam in a laser cavity of the laser source to selectively adjust an output laser bandwidth in response to the control signal. In yet another aspect, the bandwidth of a laser having a wavelength variation across an aperture may be actively controlled by an aperture blocking element that is moveable to adjust a size of the aperture.
摘要翻译：在第一方面，光刻设备可以包括使用光学邻近校正（OPC），脉冲激光源和有源带宽控制系统设计的掩模，该有源带宽控制系统被配置为增加后续脉冲的带宽响应于低于预定带宽范围的测量脉冲带宽并且响应于高于预定带宽范围的测量脉冲带宽来增加后续脉冲的带宽。在另一方面，有源带宽控制系统可以包括用于改变激光源的激光腔中的激光束的波阵面的光学器件，以响应于控制信号选择性地调整输出激光器带宽。在又一个方面中，具有穿过孔径的波长变化的激光器的带宽可以由可移动以调节孔径尺寸的孔径阻挡元件主动控制。

4. 发明授权

EP2036170B1 HIGH POWER EXCIMER LASER WITH A PULSE STRETCHER 有权转让
标题翻译：带脉冲拖拉机HIGH准分子激光
公开(公告)号：EP2036170B1
公开(公告)日：2013-08-21
申请号：EP07815066.1
申请日：2007-05-31
申请人： Cymer, Inc.
发明人： ERSHOV, Alexander, I. , FERRELL, James, J. , HOFMANN, Thomas , REILEY, Daniel, J. , REMEN, Chris, R.
IPC分类号： H01S3/223 , H01S3/225
CPC分类号： H01S3/225 , H01S3/0057 , H01S3/03 , H01S3/034

5. 发明公开

EP2036170A2 HIGH POWER EXCIMER LASER WITH A PULSE STRETCHER 有权转让
标题翻译：带脉冲拖拉机HIGH准分子激光
公开(公告)号：EP2036170A2
公开(公告)日：2009-03-18
申请号：EP07815066.1
申请日：2007-05-31
申请人： Cymer, Inc.
发明人： ERSHOV, Alexander, I. , FERRELL, James, J. , HOFMANN, Thomas , REILEY, Daniel, J. , REMEN, Chris, R.
IPC分类号： H01S3/223
CPC分类号： H01S3/225 , H01S3/0057 , H01S3/03 , H01S3/034
摘要： An apparatus and method is disclosed which include a high power excimer or molecular fluorine gas discharge laser DUV light source system which includes a pulse stretcher which includes an optical delay path mirror, an optical delay path mirror gas purging assembly which includes a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror includes a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system includes a purging gas supply line; a purging gas distributing and directing mechanism which direct purging gas across the face of the respective optical delay path mirror.

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