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1. 发明专利

JP2009079960A Detection element and detector using the same 有权
标题翻译：检测元件和使用它的检测器
公开(公告)号：JP2009079960A
公开(公告)日：2009-04-16
申请号：JP2007248433
申请日：2007-09-26
申请人： Mizuho Morita , 瑞穂森田
发明人： MORITA MIZUHO , HIROKANE TAKAAKI
IPC分类号： G01N27/04 , G01N15/14 , G01N21/64 , G01N27/22
CPC分类号： G01N27/07 , G01N15/1031 , G01N15/1056 , G01N2015/0065 , G01N2015/0088
摘要： PROBLEM TO BE SOLVED: To provide a detection element capable of being enhanced in sensitivity. SOLUTION: The detection element 10 includes substrates 1 and 4, insulating members 2 and 3, a support 5 and electrodes 6 and 7. The insulating member 2 is formed on one main surface of the substrate 1 and has a recess and the insulating member 3 is formed so as to be in contact with the insulating member 2 and the substrate 4. The substrate 4 is formed on one main surface of the support 5 and the electrode 6 is formed on the surface opposite to the surface on which the insulating member 2 of the substrate 1 is formed, and the electrode 7 is formed on the surface 5A, side surface 5B and back 5C of the support 5 so as to be connected to the substrate 4. As a result, the detection element 10 includes the gap part 8 surrounded by the insulating members 2 and 3. Further, the substrate 1 is bonded to the substrate 4 through the insulating members 2 and 3 and the support 5 (quartz). Then, the current flowing through the substrates 1 and 4 when voltage is applied across the electrodes 6 and 7 is measured and the detection target entering the gap part 8 is detected or analyzed. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供能够提高灵敏度的检测元件。检测元件10包括基板1和4，绝缘构件2和3，支撑件5和电极6和7.绝缘构件2形成在基板1的一个主表面上并具有凹部绝缘构件3形成为与绝缘构件2和基板4接触。基板4形成在支撑件5的一个主表面上，并且电极6形成在与其上的表面相对的表面上形成基板1的绝缘构件2，并且将电极7形成在支撑体5的表面5A，侧面5B和背面5C上，从而与基板4连接。结果，检测元件10包括间隙部分8被绝缘构件2和3包围。此外，基板1通过绝缘构件2和3以及支撑件5（石英）结合到基板4。然后，测量在跨电极6和7施加电压时流过基板1和4的电流，并且检测或分析进入间隙部分8的检测目标。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2003315296A Detection device 有权
标题翻译：检测装置
公开(公告)号：JP2003315296A
公开(公告)日：2003-11-06
申请号：JP2002121228
申请日：2002-04-23
申请人： Mizuho Morita , 瑞穂森田
发明人： MORITA MIZUHO
IPC分类号： G01L21/00 , G01N15/12 , G01N27/02 , G01N27/04 , G01N27/22 , G01N27/416
摘要： PROBLEM TO BE SOLVED: To provide a detection device with a high sensitivity capable of detecting, with a high sensitivity, a detection object smaller in size than a detection object which a conventional art has targeted. SOLUTION: The detection device is provided with a first conductive base body, an insulative body connected with the first conductive body, a second conductive base body connected with the insulative body insulatively from the first conductive base body, and a detection section with a gap provided between the first base body and the second base body. The distance between the first body and the second body is prescribed by the thickness of the insulative body. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：为了提供具有高灵敏度的检测装置，能够以高灵敏度检测尺寸小于常规技术所针对的检测对象的检测对象。解决方案：检测装置设置有第一导电基体，与第一导电体连接的绝缘体，与绝缘体绝缘地从第一导电性基体连接的第二导电性基体，以及具有设置在第一基体和第二基体之间的间隙。第一主体和第二主体之间的距离由绝缘体的厚度规定。版权所有（C）2004，JPO

3. 发明申请

US20050206018A1 Oxide film forming method 审中-公开
标题翻译：氧化膜成型方法
公开(公告)号：US20050206018A1
公开(公告)日：2005-09-22
申请号：US11129710
申请日：2005-05-13
申请人： Tadahiro Ohmi , Takashi Imaoka , Hisayuki Shimada , Nobuhiro Konishi , Mizuho Morita , Takeo Yamashita , Tadashi Shibata , Hidetoshi Wakamatsu , Jinzo Watanabe , Shintaro Aoyama , Masakazu Nakamura
发明人： Tadahiro Ohmi , Takashi Imaoka , Hisayuki Shimada , Nobuhiro Konishi , Mizuho Morita , Takeo Yamashita , Tadashi Shibata , Hidetoshi Wakamatsu , Jinzo Watanabe , Shintaro Aoyama , Masakazu Nakamura
IPC分类号： B01J19/08 , C23C8/10 , C23C8/36 , C23C14/02 , C23C14/48 , C23C16/02 , C23C16/44 , C30B23/02 , C30B25/02 , G01N23/00 , H01L21/66
CPC分类号： C30B23/02 , C23C8/10 , C23C8/36 , C23C14/022 , C23C14/48 , C23C16/02 , C23C16/4401 , C30B25/02 , C30B29/16 , Y10S438/903
摘要： Vacuum processing equipment capable of preventing particles from sticking to objects to be processed in vacuum vessels. The vacuum equipment comprises a series of vacuum vessels separated by doors, and the pressure in the vessels are reducible respectively. The vessels are so configured that objects to be processed are moveable among them and there is provided light projection means for projecting ultra rays on gases introduced to at least of the vessels.
摘要翻译：真空处理设备能够防止颗粒粘附在真空容器中被处理物体。真空设备包括一系列由门隔开的真空容器，容器中的压力分别可减少。容器被配置成使待处理的物体在它们之间是可移动的，并且设置有用于将超光线投射到至少导入到容器中的气体的光投射装置。

4. 发明申请

US20140234198A1 ETCHING METHOD AND METHOD FOR PERFORMING SURFACE PROCESSING ON SOLID MATERIAL FOR SOLAR CELL 审中-公开
标题翻译：用于对太阳能电池进行固体表面处理的蚀刻方法和方法
公开(公告)号：US20140234198A1
公开(公告)日：2014-08-21
申请号：US14237948
申请日：2012-08-10
申请人： Mizuho Morita , Junichi Uchikoshi , Kentaro Tsukamoto , Takabumi Nagai , Kenji Adachi
发明人： Mizuho Morita , Junichi Uchikoshi , Kentaro Tsukamoto , Takabumi Nagai , Kenji Adachi
IPC分类号： H01L31/0236 , H01L31/18
CPC分类号： H01L31/02366 , H01L31/02363 , H01L31/18 , Y02E10/50
摘要： Provided is an etching method including: (1) bringing a material containing at least one organic compound having an N—F bond into contact with the surface of a solid material; and (2) a step of heating the solid material; whereby etching can be performed safely and in a simple manner, at a higher etching rate, without the use of a high-environmental-load gas that causes global warming or highly reactive and toxic fluorine gas or hydrofluoric acid. The etching method may further include: (3) a step of exposing the solid material to light from the side of the material containing at least one organic compound having an N—F bond; and (4) a step of removing the material containing at least one organic compound having an N—F bond together with the residue remained between said material and the solid material. In particular, performing heating at a high temperature and applying light irradiation make it possible to form inverted pyramid-shaped recesses that are suitable for applying light-trapping and/or anti-reflection processing to the surface of the solid material for a solar cell.
摘要翻译：提供一种蚀刻方法，包括：（1）使含有至少一种具有N-F键的有机化合物的材料与固体材料的表面接触; 和（2）加热固体材料的步骤; 从而能够以更高的蚀刻速度安全地且以简单的方式执行蚀刻，而不使用引起全球变暖的高环境负荷气体或高反应性和有毒的氟气或氢氟酸。蚀刻方法可以进一步包括：（3）将固体材料从含有至少一种具有N-F键的有机化合物的材料侧暴露于光的步骤; 和（4）除去含有至少一种具有N-F键的有机化合物的材料与残留物在所述材料和固体材料之间的步骤。特别是，在高温下进行加热并施加光照射使得可以形成适于对太阳能电池的固体材料的表面进行光捕获和/或抗反射处理的倒棱锥形凹部。

5. 发明授权

US08421485B2 Detection device and detection system using the same 有权
标题翻译：检测装置和检测系统使用相同
公开(公告)号：US08421485B2
公开(公告)日：2013-04-16
申请号：US12665431
申请日：2007-12-13
申请人： Mizuho Morita , Takaaki Hirokane
发明人： Mizuho Morita , Takaaki Hirokane
IPC分类号： G01R27/08
CPC分类号： G01N27/07 , G01N15/1031 , G01N15/1056 , G01N2015/0065 , G01N2015/0088
摘要： A particle detection device (10) included substrates (1, 4), insulating members (2, 3), supporting member (5), and electrodes (6, 7). The insulating member (2) is provided on a principal surface of the substrate (1) and has a recess. The insulating member (3) is provided so as to make contact with the insulating member (3) and the substrate (4). The substrate (4) is formed on a principal surface of the supporting member (5). The electrode (6) is formed on a surface, which is opposite to the surface where the insulating member (2) is formed, of the substrate (1). The electrode (7) is formed on the surface (5A), the side surface (5B), and the rear surface (5C) of the supporting member (5) so as to be connected to the substrate (4). Accordingly, the detection device 10 includes a gap (8) surrounded by the insulating members (2, 3). The substrate (1) is connected to the substrate (4) with the insulating members (2, 3) and the supporting member (5) (quartz). In one embodiment, the insulating member (3) consist of quantum dots. Detection of the particles is either optically or electrically.
摘要翻译：颗粒检测装置（10）包括基板（1,4），绝缘构件（2,3），支撑构件（5）和电极（6,7）。绝缘构件（2）设置在基板（1）的主表面上并具有凹部。绝缘构件（3）设置成与绝缘构件（3）和基板（4）接触。基板（4）形成在支撑部件（5）的主表面上。电极（6）形成在与基板（1）的形成有绝缘部件（2）的表面相反的表面上。电极（7）形成在支撑部件（5）的表面（5A），侧面（5B）和后表面（5C）上，以与基板（4）连接。因此，检测装置10包括由绝缘构件（2,3）包围的间隙（8）。基板（1）通过绝缘构件（2,3）和支撑构件（5）（石英）与基板（4）连接。在一个实施例中，绝缘构件（3）由量子点组成。颗粒的光学或电学检测。

6. 发明申请

US20100201383A1 DETECTION DEVICE AND DETECTION SYSTEM USING THE SAME 有权
标题翻译：检测装置和使用该检测装置的检测系统
公开(公告)号：US20100201383A1
公开(公告)日：2010-08-12
申请号：US12665431
申请日：2007-12-13
申请人： Mizuho Morita , Takaaki Hirokane
发明人： Mizuho Morita , Takaaki Hirokane
IPC分类号： H01L29/66 , H01J40/14 , G01R27/08
CPC分类号： G01N27/07 , G01N15/1031 , G01N15/1056 , G01N2015/0065 , G01N2015/0088
摘要： A particle detection device (10) included substrates (1, 4), insulating members (2, 3), supporting member (5), and electrodes (6, 7). The insulating member (2) is provided on a principal surface of the substrate (1) and has a recess. The insulating member (3) is provided so as to make contact with the insulating member (3) and the substrate (4). The substrate (4) is formed on a principal surface of the supporting member (5). The electrode (6) is formed on a surface, which is opposite to the surface where the insulating member (2) is formed, of the substrate (1). The electrode (7) is formed on the surface (5A), the side surface (5B), and the rear surface (5C) of the supporting member (5) so as to be connected to the substrate (4). Accordingly, the detection device 10 includes a gap (8) surrounded by the insulating members (2, 3). The substrate (1) is connected to the substrate (4) with the insulating members (2, 3) and the supporting member (5) (quartz). In one embodiment, the insulating member (3) consist of quantum dots. Detection of the particles is either optically or electrically.
摘要翻译：颗粒检测装置（10）包括基板（1,4），绝缘构件（2,3），支撑构件（5）和电极（6,7）。绝缘构件（2）设置在基板（1）的主表面上并具有凹部。绝缘构件（3）设置成与绝缘构件（3）和基板（4）接触。基板（4）形成在支撑部件（5）的主表面上。电极（6）形成在与基板（1）的形成有绝缘部件（2）的表面相反的表面上。电极（7）形成在支撑部件（5）的表面（5A），侧面（5B）和后表面（5C）上，以与基板（4）连接。因此，检测装置10包括由绝缘构件（2,3）包围的间隙（8）。基板（1）通过绝缘构件（2,3）和支撑构件（5）（石英）与基板（4）连接。在一个实施例中，绝缘构件（3）由量子点组成。颗粒的光学或电学检测。

7. 发明授权

US6146135A Oxide film forming method 失效
公开(公告)号：US6146135A
公开(公告)日：2000-11-14
申请号：US680519
申请日：1996-07-09
申请人： Jinzo Watanabe , Takeo Yamashita , Masakazu Nakamura , Shintaro Aoyama , Hidetoshi Wakamatsu , Tadashi Shibata , Tadahiro Ohmi , Nobuhiro Konishi , Mizuho Morita , Hisayuki Shimada , Takashi Imaoka
发明人： Jinzo Watanabe , Takeo Yamashita , Masakazu Nakamura , Shintaro Aoyama , Hidetoshi Wakamatsu , Tadashi Shibata , Tadahiro Ohmi , Nobuhiro Konishi , Mizuho Morita , Hisayuki Shimada , Takashi Imaoka
IPC分类号： B01J19/08 , C23C8/10 , C23C8/36 , C23C14/02 , C23C14/48 , C23C16/02 , C23C16/44 , C30B23/02 , C30B25/02 , G01N23/00 , H01L21/66 , F26B21/00 , F26B3/00 , F26B19/00
CPC分类号： C30B23/02 , C23C14/022 , C23C14/48 , C23C16/02 , C23C16/4401 , C23C8/10 , C23C8/36 , C30B25/02 , C30B29/16 , Y10S438/903
摘要： Vacuum processing equipment capable of preventing particles from sticking to objects to be processed in vacuum vessels. The vacuum equipment comprises a series of vacuum vessels separated by doors, and the pressure in the vessels are reducible respectively. The vessels are so configured that objects to be processed are movable among them, and there is provided light projection means for projecting ultra rays on gases introduced to at least of the vessels.

8. 发明授权

US06949478B2 Oxide film forming method 失效
标题翻译：氧化膜成型方法
公开(公告)号：US06949478B2
公开(公告)日：2005-09-27
申请号：US10120628
申请日：2002-04-11
申请人： Tadahiro Ohmi , Takashi Imaoka , Hisayuki Shimada , Nobuhiro Konishi , Mizuho Morita , Takeo Yamashita , Tadashi Shibata , Hidetoshi Wakamatsu , Jinzo Watanabe , Shintaro Aoyama , Masakazu Nakamura
发明人： Tadahiro Ohmi , Takashi Imaoka , Hisayuki Shimada , Nobuhiro Konishi , Mizuho Morita , Takeo Yamashita , Tadashi Shibata , Hidetoshi Wakamatsu , Jinzo Watanabe , Shintaro Aoyama , Masakazu Nakamura
IPC分类号： B01J19/08 , C23C8/10 , C23C8/36 , C23C14/02 , C23C14/48 , C23C16/02 , C23C16/44 , C30B23/02 , C30B25/02 , G01N23/00 , H01L21/66 , H01L21/31
CPC分类号： C30B23/02 , C23C8/10 , C23C8/36 , C23C14/022 , C23C14/48 , C23C16/02 , C23C16/4401 , C30B25/02 , C30B29/16 , Y10S438/903
摘要： A method of forming an oxide film having high insularity capability is performed within an ultra clean environment, using charged particles.
摘要翻译：使用带电粒子在超清洁环境下进行形成具有高绝缘性的氧化膜的方法。

9. 发明授权

US5360768A Method of forming oxide film 失效
标题翻译：形成氧化膜的方法
公开(公告)号：US5360768A
公开(公告)日：1994-11-01
申请号：US784434
申请日：1991-11-06
申请人： Tadahiro Ohmi , Mizuho Morita
发明人： Tadahiro Ohmi , Mizuho Morita
IPC分类号： H01L21/316 , H01G21/316
CPC分类号： H01L21/31683 , H01L21/31654 , Y10S438/903
摘要： The present invention relates to a method of forming an oxide film comprising;a first step to form an oxide film on the surface of a substrate by bringing a solution containing oxygen and/or oxygen-containing molecule in contact with the surface of said substrate, and a second step to strengthen bond between oxygen and atoms constituting the surface of said substrate in said oxide film by the thermal treatment of said oxide film at a temperature higher than 20.degree. C. in vapor phase of oxygen, oxygen-containing molecule, inert gas alone, or a mixture of two or more of them.
摘要翻译： PCT No.PCT / JP90 / 00581 Sec。 371日期1991年11月6日 102（e）日期1991年11月6日PCT提交1990年5月7日PCT公布。出版物WO90 / 13911 日期：1990年11月15日。本发明涉及形成氧化膜的方法。通过使含有氧和/或含氧分子的溶液与所述衬底的表面接触而在衬底的表面上形成氧化膜的第一步骤，以及加强构成表面的氧和原子之间的键的第二步骤通过在氧气，含氧分子，单独的惰性气体或其两种或更多种的混合物的气相中在高于20℃的温度下热处理所述氧化物膜，在所述氧化物膜中的所述衬底。

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