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    • 5. 发明申请
    • COMMUNICATION DEVICE AND SEMICONDUCTOR CHIP
    • 通信设备和半导体芯片
    • US20120319912A1
    • 2012-12-20
    • US13494713
    • 2012-06-12
    • Masao TAGUCHI
    • Masao TAGUCHI
    • H01Q21/00H01Q7/06H01Q7/00
    • G06K19/07345
    • A device includes a first substrate that has a first antenna having a first loop and second loop that form loop shapes viewed in a planar projection; and a second substrate that has a second antenna having a third loop and fourth loop that form loop shapes viewed in the planar projection. The first substrate and the second substrate are disposed so that the first antenna and the second antenna face each other. At least when the first substrate and the second substrate operate, the first antenna and the second antenna are in a state that the first antenna and the second antenna are capable of being magnetically coupled.
    • 一种器件包括第一衬底,其具有第一天线,其具有第一环和第二环,所述第一环形成在平面突起中形成的环形形状; 以及具有第二天线的第二基板,所述第二天线具有形成在所述平面投影中观察的环形的第三环和第四环。 第一基板和第二基板被配置为使得第一天线和第二天线彼此面对。 至少当第一基板和第二基板工作时,第一天线和第二天线处于第一天线和第二天线能够被磁耦合的状态。
    • 8. 发明授权
    • Direct tunneling memory with separated transistor and tunnel areas
    • 具有分离晶体管和隧道区域的直接隧道存储器
    • US07462539B2
    • 2008-12-09
    • US11892872
    • 2007-08-28
    • Kouji TsunodaTatsuya UsukiMasao Taguchi
    • Kouji TsunodaTatsuya UsukiMasao Taguchi
    • H01L21/00H01L21/20
    • H01L27/11526G11C16/0416H01L27/105H01L27/11543H01L29/0692H01L29/7883
    • A semiconductor device has: an isolation region formed on a semiconductor substrate and defining a continuous active region including a select transistor region and a direct tunnel element region; a gate insulating film formed on a channel region of the select transistor region; a tunnel insulating film formed on a partial area of the direct tunnel element region and having a thickness different from a thickness of the gate insulating film; a continuous floating gate electrode formed above the gate insulating film and the tunnel insulating film; an inter-electrode insulating film formed on a surface of the floating gate electrode; a control gate electrode facing the floating gate electrode via the inter-electrode insulating film; and a pair of source/drain regions formed on both sides of the channel region of the select transistor region and not overlapping the tunnel insulating film.
    • 半导体器件具有形成在半导体衬底上的隔离区域,并且限定包括选择晶体管区域和直接隧道元件区域的连续有源区域; 形成在所述选择晶体管区域的沟道区上的栅极绝缘膜; 隧道绝缘膜,其形成在所述直接隧道元件区域的部分区域上,并且具有与所述栅极绝缘膜的厚度不同的厚度; 形成在栅极绝缘膜和隧道绝缘膜上方的连续浮栅; 形成在所述浮栅电极的表面上的电极间绝缘膜; 通过所述电极间绝缘膜与所述浮栅相对的控制栅电极; 以及形成在选择晶体管区域的沟道区域的两侧并且不与隧道绝缘膜重叠的一对源极/漏极区域。